The Electronics Handbook

Total Page:16

File Type:pdf, Size:1020Kb

The Electronics Handbook 8 Microelectronics Tom Chen Colorado State University Samuel O. Agbo 8.1 Integrated Circuits .................................... 708 California Polytechnic State University Introduction • High-Speed Design Techniques Eugene D. Fabricius 8.2 Integrated Circuit Design.............................. 716 • California Polytechnic State University Introduction An Overview of the IC Design Process • General Considerations in IC Design • Design of Small-Scale Robert J. Feugate, Jr. and Medium-Scale Integrated Circuits • LSI and VLSI Circuit • University of Arizona Design Increasing Packing Density and Reducing Power Dissipation in MOS Circuits • Gate Arrays • Standard Cells Shih-Lien Lu • Programmable Logic Devices • Reducing Propagation Delays Oregon State University • Output Buffers ................................. James G. Cottle 8.3 Digital Logic Families 739 Introduction • Transistor-Transistor Logic • CMOS Logic Hewlett-Packard • Emitter-Coupled Logic • Programmable Logic Susan A. Garrod 8.4 Memory Devices ...................................... 755 Purdue University Introduction • Memory Organization • Memory Device Types • Interfacing Memory Devices • Error Detection and Constantine N. Correction Anagnostopoulos 8.5 Microprocessors ...................................... 775 Eastman Kodak Company Introduction • Architecture Basics Paul P.K. Lee 8.6 D/A and A/D Converters .............................. 784 • Eastman Kodak Company Introduction D/A and A/D Circuits 8.7 Application-Specific Integrated Circuits................ 791 Jonathon A. Chambers Introduction • Full Custom ASICs • Semicustom ASICs Cardiff University 8.8 Digital Filters ......................................... 808 • • Sawasd Tantaratana Introduction FIR Filters Infinite Impulse Response (IIR) Filters • Finite Wordlength Effects University of Massachusetts 8.9 Multichip Module Technology ........................ 832 Bruce W. Bomar Introduction • Multichip Module Technology Definitions University of Tennessee Space Institute • Design, Repair, and Test • When to Use Multichip Modules • Issues in the Design of Multichip Modules Paul D. Franzon 8.10 Testing of Integrated Circuits .......................... 844 North Carolina State University Introduction • Defect Types • Concepts of Test • Test Wayne Needham Tradeoffs Intel Corporation 8.11 Integrated Circuit Packages............................ 852 Introduction • Surface Mount Packages • Chip-Scale Packaging Victor Meeldijk • Bare Die • Through-Hole Packages • Module Assemblies Intel Corporation • Lead Finish • The Future 707 Copyright 2005 by Taylor & Francis Group 708 Electronics Handbook 8.1 Integrated Circuits Tom Chen 8.1.1 Introduction Transistors and their fabrication into very large scale integrated (VLSI) circuits are the invention that has made modern computing possible. Since its inception, integrated circuits have been advancing rapidly from a few transistors on a small silicon die in the early 1960s to 4 millions of transistors integrated on to a single large silicon substrate. The dominant type of transistor used in today’s integrated circuits is the metal-oxide-semiconductor (MOS) type transistor. The rapid technological advances in integrated circuit (IC) technology accelerated during and after the 1980s, and one of the most influential factors for such a rapid advance is the technology scaling, that is, the reduction in MOS transistor feature sizes. The MOS feature size is typically measured by the MOS transistor channel length. The smaller the transistors, the more dense the integrated circuits in terms of the number of transistors packed on to a unit area of silicon substrate, and the faster the transistor can switch. Not only can we pack more transistors onto a unit silicon area, the chip size has also increase. As the transistor gets smaller and silicon chip size gets bigger, the transistor’s driving capability decreases and the interconnect parasitics (interconnect capacitance and resistance) increases. Consequently, the entire VLSI system has to be designed very carefully to meet the speed demands of the future. Common design issues include optimal gate design and transistor sizing, minimization of clock skew and proper timing budgeting, and realistic modeling of interconnect parasitics. 8.1.2 High-Speed Design Techniques A modern VLSI device typically consists of several megacells, such as memory blocks and data-path arithmetic blocks, and a lot of basic MOS logic gates, such as inverters and NAND/NOR gates. Comple- mentary MOS (CMOS) is one of the most widely used logic families, mainly because of its low-power consumption and high-noise margin. Other logic families include NMOS and PMOS logic. Because of its popularity, only the CMOS logic will be discussed. Many approaches to high-speed design discussed here are equally applicable to other logic families. Optimizing a VLSI device for high-speed operation can be carried out at the system level, as well as at the circuit and logic level. To achieve the maximum operating speed at the circuit and logic levels for a given technology, it is essential to properly set the size of each transistor in a logic gate to optimally drive the output load. If the output load is very large, a string of drivers with geometrically increasing sizes is needed. The size of transistors in a logic gate is also determined by the impact of the transistors as a load to be driven by their preceding gates. Optimization of Gate Level Design p-type transistor V V To optimize the gate level design, let us look at the VOLTAGE dd in Vin Vout performance of a single CMOS inverter as shown Vdd in Fig. 8.1. Delay of a gate is typically defined as the n-type 2 transistor GATE timedifferencebetweeninputtransitionandoutput DELAY Vout transition at 50% of supply voltage. The inverter TIME gate delay can be analytically expressed as FIGURE 8.1 Gate delay in a single inverter. Td = Cl (An/βn + Ap/βp)/2 where Cl is the load capacitance of the inverter; βn and βp are the forward current gains of n-type and p-type transistors, respectively, and are proportional to the transistor’s channel width and inversely pro- portional to the transistor’s channel length; An and Ap are process related parameters for a given supply voltage and they are determined by An = [2n/(1 − n) + n((2(1 − n) − V0)/V0)][Vdd(1 − n)] An = [−2p/(1 + p) + n((2(1 + p) − V0)/V0)][Vdd(1 + p)] Copyright 2005 by Taylor & Francis Group Microelectronics 709 where n = Vthn/Vdd and p = Vthp/Vdd. Vthn and Vthp are gate threshold voltages for n-channel and p-channel transistors, respectively. This expression does not take the input signal slope into account. Otherwise, the expression would become more complicated. For more complex CMOS gates, an equivalent inverter structure is constructed to reflect the effective strength of their p-tree and n-tree in order to apply the inverter delay model. In practice, CMOS gate delay is treated in a simple fashion. The delay of a logic gate can be divided into two parts: the intrinsic delay Dins, and the load-related delay Dload. The gate intrinsic delay is determined by the internal characteristics of the gate including the implementing technology, the gate structure, and the transistor sizes. The load-related delay is a function of the total load capacitance at the gate’s output. The total gate delay can be expressed as = + ∗ Td Dins Cl S ∗ where Cl is the total load capacitance and S is the factor for gate’s driving strength. Cl S represents the gate’s load-related delay. In most CMOS circuits using leading-edge submicron technologies, the total delay of a gate can be dominated by the load-related delay. For an inverter in a modern submicron CMOS technology of around 0.5-µm feature size, Dins can range from 0.08 to 0.12 ns and S can range from 0.00065 to 0.00085 ns/fF depending on specifics in the technology and the minimum transistor feature size. For other more complex gates such as NAND and NOR gates, Dins and S generally increase. Tooptimize a VLSI circuit for its maximum operating speed, critical paths must be identified. A critical path in a circuit is a signal path with the longest time delay from a primary input to a primary output. The time delay on the critical path in a circuit determines the maximum operating speed of the circuit. The time delay of a critical path can be minimized by altering the size of the transistors on the critical path. Using the lumped resistor-capacitor (RC) delay model, the problem of transistor sizing can be formulated to an optimization problem with a convex relationship between the path delay and the sizes of the transistors on the path. This optimization problem is simple to solve. The solutions often have 20–30% deviation, however, compared to the SPICE simulation results. Realistic modeling of gate delay taking some second- order variables, such as input signal slope, into consideration has shown that the relationship between the path delay and the sizes of the transistors on the path is not convex. Such detailed analysis led to more sophisticated transistor sizing algorithms. One of these algorithms suggested using genetic methods to search for an optimal solution and has shown some promising results. Clocks and Clock Schemes in High-Speed Circuit Design Most of the modern electronic systems are synchronous systems. The clock is a central pace setter in a synchronous system to step the desired system operations through various stages of the computation. Latches are often used to facilitate catching the output data at the end of each clock cycle. Figure 8.2 shows the typical synchronous circuit with random logic clusters as computational blocks and latches as pace setting devices. When there exist feedbacks, as shown in Fig. 8.2, the circuit is referred to as sequential circuit. A latch is also called a register or a flip-flop. The way a latch catches data depends on how it is triggered by the clock signal. Generally, there are level-triggered and edge-triggered latches, the former can be further subdivided according to the triggering polarity as positive or negative level or edge-triggered latches. The performance of a digital circuit is often determined by the maximum clock frequency the circuit can run.
Recommended publications
  • Plastic Packaging and the Effects of Surface Mount Soldering Techniques
    AN598 Plastic Packaging and the Effects of Surface Mount Soldering Techniques The heat from soldering causes a buildup of additional Author: John Barber stresses within the device that were not present from Surface Mount Technology Team the manufacturing process. Board level solder processes, such as IR reflow and Vapor phase reflow, are well-known areas where temperatures can reach PURPOSE levels sufficient to cause failure of the package This application note is intended to inform and assist integrity. A plastic semiconductor package forms a rigid the customers of Microchip Technology Inc. with system where the various components are locked Surface Mount Devices (SMD’s). The process of together. Differences in the physical expansion rate of packaging a semiconductor in plastic brings to pass a materials will result in internal package stresses somewhat unlikely marriage of different materials. In because the constituent parts cannot move. When a order to minimize potential adverse effects of surface package is heated, the stresses in the device are applied to the die in such a way that the maximum mount solder techniques, it is worthwhile to understand 1 the interaction of the package materials during the time areas of stress are at the corners. Forces can build to they are subjected to thermal stress. Understanding the point where the areas of adhesion between both the limits of thermal stressing that SMD’s can different components of the package give way causing withstand and how those stresses interact to produce device failure. Failure modes associated with excess failures are crucial to successfully maintaining stress include delamination of surfaces, fracturing of reliability in the finished product.
    [Show full text]
  • Heterogeneous Integration
    2.0 INTERNATIONAL TECHNOLOGY ROADMAP FOR SEMICONDUCTORS 2.0 2015 EDITION HETEROGENEOUS INTEGRATION THE ITRS 2.0 IS DEVISED AND INTENDED FOR TECHNOLOGY ASSESSMENT ONLY AND IS WITHOUT REGARD TO ANY COMMERCIAL CONSIDERATIONS PERTAINING TO INDIVIDUAL PRODUCTS OR EQUIPMENT. ITRS 2.0 HETEROGENEOUS INTEGRATION CHAPTER: 2015 i ITRS 2.0 HETEROGENEOUS INTEGRATION CHAPTER: 2015 1 Table of Contents 01. Introduction.....................................................................................................................1614 12. Scope .............................................................................................................................1624 2Mission Statement .......................................................................................................................... 1636 33. Difficult Challenges.........................................................................................................1646 44. Single and Multi- Chip Packaging Overall Requirements ...............................................1658 5Electrical Requirements.................................................................................................................. 1668 6Interconnect................................................................................................................................................. 1679 7Cross Talk................................................................................................................................................... 1689 8Power Integrity.........................................................................................................................................
    [Show full text]
  • SRAM Read/Write Margin Enhancements Using Finfets
    IEEE TRANSACTIONS ON VERY LARGE SCALE INTEGRATION (VLSI) SYSTEMS, VOL. 18, NO. 6, JUNE 2010 887 SRAM Read/Write Margin Enhancements Using FinFETs Andrew Carlson, Member, IEEE, Zheng Guo, Student Member, IEEE, Sriram Balasubramanian, Member, IEEE, Radu Zlatanovici, Member, IEEE, Tsu-Jae King Liu, Fellow, IEEE, and Borivoje Nikolic´, Senior Member, IEEE Abstract—Process-induced variations and sub-threshold [1]. Accurate control is essential for high read stability. Sim- leakage in bulk-Si technology limit the scaling of SRAM into ilarly, variability and device leakage affect the writeability of the sub-32 nm nodes. New device architectures are being considered cell. To maintain both desired writeability and read stability of to improve control and reduce short channel effects. Among the SRAM arrays, several radical departures from the conven- the likely candidates, FinFETs are the most attractive option be- cause of their good scalability and possibilities for further SRAM tional design have been considered as follows. performance and yield enhancement through independent gating. 1) Scaling of the traditional six-transistor (6-T) SRAM cell The enhancements to read/write margins and yield are investi- at a slower pace, since a transistor with a larger area is gated in detail for two cell designs employing independently gated more immune to variations. This is a common approach FinFETs. It is shown that FinFET-based 6-T SRAM cells designed in 65- and 45-nm technology nodes; while it still might with pass-gate feedback (PGFB) achieve significant improvements in the cell read stability without area penalty. The write-ability of be applicable to small arrays in future, it fundamentally the cell can be improved through the use of pull-up write gating undermines the objective of technology scaling.
    [Show full text]
  • Design and Implementation of 4 Bit Carry Skip Adder Using Nmos and Pmos Transmission Gate
    EasyChair Preprint № 2561 Design and Implementation of 4 Bit Carry Skip Adder Using Nmos and Pmos Transmission Gate Ashutosh Pandey, Harshit Singh, Vivek Kumar Chaubey and Utkarsh Jaiswal EasyChair preprints are intended for rapid dissemination of research results and are integrated with the rest of EasyChair. February 5, 2020 CHAPTER-1 INTRODUCTION In the field of electronics, a digital circuit that performs addition of numbers is called an adder or summer. In various kinds of processors like computers, adders have many applications in the arithmetic logic units, as well as in other parts, where these are used to compute table indices, addresses and similar operations. Mostly, the common adders operate on binary numbers, but they can also be constructed for many other numerical representations, such as excess-3 or binary coded decimal (BCD). It is insignificant to customize the adder into an adder-subtractor unit in situations where negative numbers are represented by one's or two's complement. The usage of power efficient VLSI circuits is required to satiate the perennial need for mobile electronic devices. The calculations in these devices ought to be performed using area efficient and low power circuits working at higher speed. The most elementary arithmetic operation is addition; and the most basic arithmetic component of the processor is the adder. Depending upon the delay, area and power consumption requirements; certain adder implementations such as ripple carry, carry-skip, carry select and carry look ahead are available. When large bit numbers are used, the ripple carry adder (RCA) is not very efficient. With the bit length, there is a linear increase in delay.
    [Show full text]
  • High Performance Ripple Carry Adder Using Domino
    International Research Journal of Engineering and Technology (IRJET) e-ISSN: 2395 -0056 Volume: 02 Issue: 08 | Nov-2015 www.irjet.net p-ISSN: 2395-0072 HIGH PERFORMANCE RIPPLE CARRY ADDER USING DOMINO LOGIC Dr.J.Karpagam1 , A.Arunadevi2 1 Professor, Department of ECE, KPRIET, Coimbatore, Tamilnadu, India 2 PG Scholar, Department of ECE, KPRIET, Coimbatore, Tamilnadu, India ---------------------------------------------------------------------***--------------------------------------------------------------------- ABSTRACT excessively with a mixer of dynamic and static circuit styles, use of dual supply voltages and dual threshold The demand and popularity of portable electronics is voltages. driving designers to strive for small silicon area, higher speeds, low power dissipation and reliability. Domino logic Domino logic is a clocked logic family which means that circuits are important as it provides better speed and has every single logic gate has a clock signal present. When the lesser transistor requirement when compared to static clock signal turns low, node N0 goes high, causing the CMOS logic circuits. This project presents the design and output of the gate to go low. This represents the only performance of 8-bit Ripple Carry Adder using CMOS mechanism for the gate output to go low once it has been Domino logic targeting at full-custom high speed driven high. The operating period of the cell when its input applications. The constant delay characteristic of this logic clock and output are low is called the recharge phase or style regardless of the logic expression makes it suitable for cycle. The next phase, when the clock is high, is called the implementing complicated logic expression such as addition. evaluate phase or cycle.
    [Show full text]
  • Advanced MOSFET Designs and Implications for SRAM Scaling
    Advanced MOSFET Designs and Implications for SRAM Scaling By Changhwan Shin A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering - Electrical Engineering and Computer Sciences in the Graduate Division of the University of California, Berkeley Committee in charge: Professor Tsu-Jae King Liu, Chair Professor Borivoje Nikolić Professor Eugene E. Haller Spring 2011 Advanced MOSFET Designs and Implications for SRAM Scaling Copyright © 2011 by Changhwan Shin Abstract Advanced MOSFET Designs and Implications for SRAM Scaling by Changhwan Shin Doctor of Philosophy in Engineering – Electrical Engineering and Computer Sciences University of California, Berkeley Professor Tsu-Jae King Liu, Chair Continued planar bulk MOSFET scaling is becoming increasingly difficult due to increased random variation in transistor performance with decreasing gate length, and thereby scaling of SRAM using minimum-size transistors is further challenging. This dissertation will discuss various advanced MOSFET designs and their benefits for extending density and voltage scaling of static memory (SRAM) arrays. Using three- dimensional (3-D) process and design simulations, transistor designs are optimized. Then, using an analytical compact model calibrated to the simulated transistor current-vs.-voltage characteristics, the performance and yield of six-transistor (6-T) SRAM cells are estimated. For a given cell area, fully depleted silicon-on-insulator (FD-SOI) MOSFET technology is projected to provide for significantly improved yield across a wide range of operating voltages, as compared with conventional planar bulk CMOS technology. Quasi-Planar (QP) bulk silicon MOSFETs are a lower-cost alternative and also can provide for improved SRAM yield. A more printable "notchless" QP bulk SRAM cell layout is proposed to reduce lithographic variations, and is projected to achieve six-sigma yield (required for terabit-scale SRAM arrays) with a minimum operating voltage below 1 Volt.
    [Show full text]
  • Book of Knowledge (BOK) for NASA Electronic Packaging Roadmap
    National Aeronautics and Space Administration Book of Knowledge (BOK) for NASA Electronic Packaging Roadmap Reza Ghaffarian, Ph.D. Jet Propulsion Laboratory Pasadena, California Jet Propulsion Laboratory California Institute of Technology Pasadena, California JPL Publication 15-4 2/15 National Aeronautics and Space Administration Book of Knowledge (BOK) for NASA Electronic Packaging Roadmap NASA Electronic Parts and Packaging (NEPP) Program Office of Safety and Mission Assurance Reza Ghaffarian, Ph.D. Jet Propulsion Laboratory Pasadena, California NASA WBS: 724297.40.43 JPL Project Number: 104593 Task Number: 40.49.02.24 Jet Propulsion Laboratory 4800 Oak Grove Drive Pasadena, CA 91109 http://nepp.nasa.gov i This research was carried out at the Jet Propulsion Laboratory, California Institute of Technology, and was sponsored by the National Aeronautics and Space Administration Electronic Parts and Packaging (NEPP) Program. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not constitute or imply its endorsement by the United States Government or the Jet Propulsion Laboratory, California Institute of Technology. ©2015 California Institute of Technology. Government sponsorship acknowledged. Acknowledgments The author would like to acknowledge many people from industry and the Jet Propulsion Laboratory (JPL) who were critical to the progress of this activity. The author extends his appreciation to program managers of the National Aeronautics and Space Administration Electronics Parts and Packaging (NEPP) Program, including Michael Sampson, Ken LaBel, Dr. Charles Barnes, and Dr. Douglas Sheldon, for their continuous support and encouragement. ii OBJECTIVES AND PRODUCTS The objective of this document is to update the NASA roadmap on packaging technologies (initially released in 2007) and to present the current trends toward further reducing size and increasing functionality.
    [Show full text]
  • (12) United States Patent (1O) Patent No.: US 7,489,538 B2 Mari Et Al
    mu uuuu ui iiui iiui mu mil uui uui lull uui uuii uu uii mi (12) United States Patent (1o) Patent No.: US 7,489,538 B2 Mari et al. (45) Date of Patent: Feb. 10, 2009 (54) RADIATION TOLERANT COMBINATIONAL 5,406,513 A * 4/1995 Canafis et al . .............. 365/181 LOGIC CELL (Continued) (75) Inventors: Gary R. Maki, Post Falls, ID (US); OTHER PUBLICATIONS Jody W. Gambles, Post Falls, ID (US); Sterling Whitaker, Albuquerque, NM "Ionizing Radiation Effects in MOS Devices and Circuits", Edited by (US) T.P. Ma., Department of Electrical Engineering, Yale University, New Haven Connecticut and Paul V. Dressendorfer, Sandia National (73) Assignee: University of Idaho, Moscow, ID (US) Laboratories, Albuquerque, NM, A Wiley-Interscience Publication, John Wiley & Sons, pp. 484-589. (*) Notice: Subject to any disclaimer, the term of this (Continued) patent is extended or adjusted under 35 U.S.C. 154(b) by 263 days. Primary Examiner Vu A Le (74) Attorney, Agent, or Firm Haverstock & Owens LLP (21) Appl. No.: 11/527,375 (57) ABSTRACT (22) Filed: Sep. 25, 2006 A system has a reduced sensitivity to Single Event Upset (65) Prior Publication Data and/or Single Event Transient(s) compared to traditional logic devices. In a particular embodiment, the system US 2007/0109865 Al May 17, 2007 includes an input, a logic block, a bias stage, a state machine, and an output. The logic block is coupled to the input. The Related U.S. Application Data logic block is for implementing a logic function, receiving a (60) Provisional application No. 60/736,979, filed on Nov.
    [Show full text]
  • 2.5D and 3D Semiconductor Package Technology: Evolution and Innovation
    As originally published in the IPC APEX EXPO Proceedings. 2.5D and 3D Semiconductor Package Technology: Evolution and Innovation Vern Solberg Solberg Technical Consulting Saratoga, California USA Abstract The electronics industry is experiencing a renaissance in semiconductor package technology. A growing number of innovative 3D package assembly methodologies have evolved to enable the electronics industry to maximize their products functionality. By integrating multiple die elements within a single package outline, product boards can be made significantly smaller than their forerunners and the shorter interconnect resulting from this effort has contributed to improving both electrical performance and functional capability. Multiple die packaging commonly utilizes some form of substrate interposer as a base. Assembly of semiconductor die onto a substrate is essentially the same as those used for standard I/C packaging in lead frames; however, substrate based IC packaging for 3D applications can adopt a wider range of materials and there are several alternative processes that may be used in their assembly. Companies that have already implemented some form of 3D package technology have found success in both stacked die and stacked package technology but these package methodologies cannot always meet the complexities of the newer generation of large-scale multiple function processors. A number of new semiconductor families are emerging that demand greater interconnect densities than possible with traditional organic substrate fabrication technology. Two alternative base materials have already evolved as more suitable for both current and future, very high-density package interposer applications; silicon and glass. Both materials, however, require adopting unique via formation and metallization methodologies. While the infrastructure for supplying the glass-based interposer is currently in development by a number of organizations, the silicon-based interposer supply infrastructure is already well established.
    [Show full text]
  • Strip for Semiconductor Packages the Wieland Group
    Strip for semiconductor packages The Wieland Group Europe Austria Greece Rolling mills and slitting centres Belarus Hungary North America Belgium Italy USA Croatia Poland Czech Republic Portugal Denmark Russia Finland Spain France Sweden Germany Switzerland Great Britain Turkey Wieland-Werke AG, Ulm, Germany Asia The Wieland Group, headquartered in Wieland supplies over 100 different China the southern German city of Ulm, is one copper alloys to customers in many India of the world’s leading manufacturers of different markets, first and foremost Japan semi-finished and special products in the electric and electronic sector, but Singapore copper and copper alloys: strip, sheet, other important consumers include the South Korea tube, rod, wire and sections as well as building trade, the automotive industry Taiwan slide bearings, finned tubes and heat and air-conditioning and refrigeration exchangers. engineering. The Company can trace its history right Wieland produces strip in all major back to the 19th century. Its founder, economic regions of the world: in Philipp Jakob Wieland, took over his Germany in the three rolling mills in uncle’s fine art and bell foundry in Ulm Vöhringen, Velbert-Langenberg and in 1820, and by 1828 he was already Villingen-Schwenningen. Further fabricating sheet and wire from brass. manufacturing companies are based South America Africa Australia in Great Britain, Singapore and the Brazil South Africa Today, Wieland’s output reaches about USA. A global network of slitting centres Colombia 500,000 tonnes a year in copper alloy ensures swift and flexible product products. The starting point of the deliveries worldwide. Wieland-Werke AG, Vöhringen, Germany production process is Europe’s biggest foundry for copper alloys at Wieland’s Vöhringen/Iller location.
    [Show full text]
  • Classification of Semiconductor Package
    www.connect.co.jp www.jccherry.com Technical Data Classification of semiconductor package SIP ZIP Single In-line Package Zigzag In-line Package A package having leads on a single side of the body. A package having Zig-zag formed leads on a single side of the body. DIP PGA Dual In-line Package Pin Grid Array A package having leads in parallel rows A package having pins on top or bottom on two opposite sides of the body for face in a matrix layout of at least three through-hole insertion. rows and three columns. SDIP Shrink DIP A package which reduced the lead pitch of DIP. SOP SON Small Outline Package Small Outline Non-leaded Package A package having gull-wing-shaped leads A package having single-inline terminal on two opposite sides of the body. pads along two opposite edges of the bottom face. The terminal pads may or may not be exposed on the package sides. TSOP Thin SOP SOJ A package height of SOP exceeds 1.0 mm, Small Outline J-leaded Package and 1.2 mm or less. A package having J-shaped leads on two opposite sides of the body. SSOP Shrink SOP A package which reduced the lead pitch of SOP. 50-01 www.connect.co.jp www.jccherry.com Classification of semiconductor package QFP LGA Quad Flat Package Land Grid Array A package having gull-wing-shaped leads A package having lands on top or bottom on four sides of the body. face in a matrix of at least three rows and three columns.
    [Show full text]
  • Design for Flip-Chip and Chip-Size Package Technology
    As originally published in the IPC APEX EXPO Proceedings. Design for Flip-Chip and Chip-Size Package Technology Vern Solberg Solberg Technology Consulting Madison, Wisconsin Abstract As new generations of electronic products emerge they often surpass the capability of existing packaging and interconnection technology and the infrastructure needed to support newer technologies. This movement is occurring at all levels: at the IC, at the IC package, at the module, at the hybrid, the PC board which ties all the systems together. Interconnection density and methodology becomes the measure of successfully managing performance. The gap between printed boards and semiconductor technology (wafer level integration) is greater than one order of magnitude in interconnection density capability, although the development of fine-pitch substrates and assembly technology has narrowed the gap somewhat. All viable efforts are being used in filling this void utilizing uncased integrated circuits (flip-chip) and incorporating more than one die or more than one part in the assembly process. This paper provides a comparison of different commonly used technologies including flip-chip, chip-size and wafer level array package methodologies detailed in a new publication, IPC-7094. It considers the effect of bare die or die-size components in an uncased or minimally cased format, the impact on current component characteristics and reviews the appropriate PCB design guidelines to ensure efficient assembly processing. The focus of the IPC document is to provide useful and practical information to those who are considering the adoption of bare die or die size array components. Introduction The flip-chip process was originally established for applications requiring aggressive miniaturization.
    [Show full text]