CMOS Image Sensors Are Entering a New Age
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Discrete Cosine Transform Based Image Fusion Techniques VPS Naidu MSDF Lab, FMCD, National Aerospace Laboratories, Bangalore, INDIA E.Mail: [email protected]
View metadata, citation and similar papers at core.ac.uk brought to you by CORE provided by NAL-IR Journal of Communication, Navigation and Signal Processing (January 2012) Vol. 1, No. 1, pp. 35-45 Discrete Cosine Transform based Image Fusion Techniques VPS Naidu MSDF Lab, FMCD, National Aerospace Laboratories, Bangalore, INDIA E.mail: [email protected] Abstract: Six different types of image fusion algorithms based on 1 discrete cosine transform (DCT) were developed and their , k 1 0 performance was evaluated. Fusion performance is not good while N Where (k ) 1 and using the algorithms with block size less than 8x8 and also the block 1 2 size equivalent to the image size itself. DCTe and DCTmx based , 1 k 1 N 1 1 image fusion algorithms performed well. These algorithms are very N 1 simple and might be suitable for real time applications. 1 , k 0 Keywords: DCT, Contrast measure, Image fusion 2 N 2 (k 1 ) I. INTRODUCTION 2 , 1 k 2 N 2 1 Off late, different image fusion algorithms have been developed N 2 to merge the multiple images into a single image that contain all useful information. Pixel averaging of the source images k 1 & k 2 discrete frequency variables (n1 , n 2 ) pixel index (the images to be fused) is the simplest image fusion technique and it often produces undesirable side effects in the fused image Similarly, the 2D inverse discrete cosine transform is defined including reduced contrast. To overcome this side effects many as: researchers have developed multi resolution [1-3], multi scale [4,5] and statistical signal processing [6,7] based image fusion x(n1 , n 2 ) (k 1 ) (k 2 ) N 1 N 1 techniques. -
Hybrid Memristor–CMOS Implementation of Combinational Logic Based on X-MRL †
electronics Article Hybrid Memristor–CMOS Implementation of Combinational Logic Based on X-MRL † Khaled Alhaj Ali 1,* , Mostafa Rizk 1,2,3 , Amer Baghdadi 1 , Jean-Philippe Diguet 4 and Jalal Jomaah 3 1 IMT Atlantique, Lab-STICC CNRS, UMR, 29238 Brest, France; [email protected] (M.R.); [email protected] (A.B.) 2 Lebanese International University, School of Engineering, Block F 146404 Mazraa, Beirut 146404, Lebanon 3 Faculty of Sciences, Lebanese University, Beirut 6573, Lebanon; [email protected] 4 IRL CROSSING CNRS, Adelaide 5005, Australia; [email protected] * Correspondence: [email protected] † This paper is an extended version of our paper published in IEEE International Conference on Electronics, Circuits and Systems (ICECS) , 27–29 November 2019, as Ali, K.A.; Rizk, M.; Baghdadi, A.; Diguet, J.P.; Jomaah, J. “MRL Crossbar-Based Full Adder Design”. Abstract: A great deal of effort has recently been devoted to extending the usage of memristor technology from memory to computing. Memristor-based logic design is an emerging concept that targets efficient computing systems. Several logic families have evolved, each with different attributes. Memristor Ratioed Logic (MRL) has been recently introduced as a hybrid memristor–CMOS logic family. MRL requires an efficient design strategy that takes into consideration the implementation phase. This paper presents a novel MRL-based crossbar design: X-MRL. The proposed structure combines the density and scalability attributes of memristive crossbar arrays and the opportunity of their implementation at the top of CMOS layer. The evaluation of the proposed approach is performed through the design of an X-MRL-based full adder. -
Three-Dimensional Integrated Circuit Design: EDA, Design And
Integrated Circuits and Systems Series Editor Anantha Chandrakasan, Massachusetts Institute of Technology Cambridge, Massachusetts For other titles published in this series, go to http://www.springer.com/series/7236 Yuan Xie · Jason Cong · Sachin Sapatnekar Editors Three-Dimensional Integrated Circuit Design EDA, Design and Microarchitectures 123 Editors Yuan Xie Jason Cong Department of Computer Science and Department of Computer Science Engineering University of California, Los Angeles Pennsylvania State University [email protected] [email protected] Sachin Sapatnekar Department of Electrical and Computer Engineering University of Minnesota [email protected] ISBN 978-1-4419-0783-7 e-ISBN 978-1-4419-0784-4 DOI 10.1007/978-1-4419-0784-4 Springer New York Dordrecht Heidelberg London Library of Congress Control Number: 2009939282 © Springer Science+Business Media, LLC 2010 All rights reserved. This work may not be translated or copied in whole or in part without the written permission of the publisher (Springer Science+Business Media, LLC, 233 Spring Street, New York, NY 10013, USA), except for brief excerpts in connection with reviews or scholarly analysis. Use in connection with any form of information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed is forbidden. The use in this publication of trade names, trademarks, service marks, and similar terms, even if they are not identified as such, is not to be taken as an expression of opinion as to whether or not they are subject to proprietary rights. Printed on acid-free paper Springer is part of Springer Science+Business Media (www.springer.com) Foreword We live in a time of great change. -
Temperature Compensation Circuit for ISFET Sensor
Journal of Low Power Electronics and Applications Article Temperature Compensation Circuit for ISFET Sensor Ahmed Gaddour 1,2,* , Wael Dghais 2,3, Belgacem Hamdi 2,3 and Mounir Ben Ali 3,4 1 National Engineering School of Monastir (ENIM), University of Monastir, Monastir 5000, Tunisia 2 Electronics and Microelectronics Laboratory, LR99ES30, Faculty of Sciences of Monastir, University of Monastir, Monastir 5000, Tunisia; [email protected] (W.D.); [email protected] (B.H.) 3 Higher Institute of Applied Sciences and Technology of Sousse (ISSATSo), University of Sousse, Sousse 4003, Tunisia; [email protected] 4 Nanomaterials, Microsystems for Health, Environment and Energy Laboratory, LR16CRMN01, Centre for Research on Microelectronics and Nanotechnology, Sousse 4034, Tunisia * Correspondence: [email protected]; Tel.: +216-50998008 Received: 3 November 2019; Accepted: 21 December 2019; Published: 4 January 2020 Abstract: PH measurements are widely used in agriculture, biomedical engineering, the food industry, environmental studies, etc. Several healthcare and biomedical research studies have reported that all aqueous samples have their pH tested at some point in their lifecycle for evaluation of the diagnosis of diseases or susceptibility, wound healing, cellular internalization, etc. The ion-sensitive field effect transistor (ISFET) is capable of pH measurements. Such use of the ISFET has become popular, as it allows sensing, preprocessing, and computational circuitry to be encapsulated on a single chip, enabling miniaturization and portability. However, the extracted data from the sensor have been affected by the variation of the temperature. This paper presents a new integrated circuit that can enhance the immunity of ion-sensitive field effect transistors (ISFET) against the temperature. -
LDMOS for Improved Performance
> Submitted to IEEE Transactions on Electron Devices < Final MS # 8011B 1 Extended-p+ Stepped Gate (ESG) LDMOS for Improved Performance M. Jagadesh Kumar, Senior Member, IEEE and Radhakrishnan Sithanandam Abstract—In this paper, we propose a new Extended-p+ Stepped Gate (ESG) thin film SOI LDMOS with an extended-p+ region beneath the source and a stepped gate structure in the drift region of the LDMOS. The hole current generated due to impact ionization is now collected from an n+p+ junction instead of an n+p junction thus delaying the parasitic BJT action. The stepped gate structure enhances RESURF in the drift region, and minimizes the gate-drain capacitance. Based on two- dimensional simulation results, we show that the ESG LDMOS exhibits approximately 63% improvement in breakdown voltage, 38% improvement in on-resistance, 11% improvement in peak transconductance, 18% improvement in switching speed and 63% reduction in gate-drain charge density compared with the conventional LDMOS with a field plate. Index Terms—LDMOS, silicon on insulator (SOI), breakdown voltage, transconductance, on- resistance, gate charge I. INTRODUCTION ATERALLY double diffused metal oxide semiconductor (LDMOS) on SOI substrate is a promising Ltechnology for RF power amplifiers and wireless applications [1-5]. In the recent past, developing high voltage thin film LDMOS has gained importance due to the possibility of its integration with low power CMOS devices and heterogeneous microsystems [6]. But realization of high voltage devices in thin film SOI is challenging because floating body effects affect the breakdown characteristics. Often, body contacts are included to remove the floating body effects in RF devices [7]. -
Advanced MOSFET Structures and Processes for Sub-7 Nm CMOS Technologies
Advanced MOSFET Structures and Processes for Sub-7 nm CMOS Technologies By Peng Zheng A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering - Electrical Engineering and Computer Sciences in the Graduate Division of the University of California, Berkeley Committee in charge: Professor Tsu-Jae King Liu, Chair Professor Laura Waller Professor Costas J. Spanos Professor Junqiao Wu Spring 2016 © Copyright 2016 Peng Zheng All rights reserved Abstract Advanced MOSFET Structures and Processes for Sub-7 nm CMOS Technologies by Peng Zheng Doctor of Philosophy in Engineering - Electrical Engineering and Computer Sciences University of California, Berkeley Professor Tsu-Jae King Liu, Chair The remarkable proliferation of information and communication technology (ICT) – which has had dramatic economic and social impact in our society – has been enabled by the steady advancement of integrated circuit (IC) technology following Moore’s Law, which states that the number of components (transistors) on an IC “chip” doubles every two years. Increasing the number of transistors on a chip provides for lower manufacturing cost per component and improved system performance. The virtuous cycle of IC technology advancement (higher transistor density lower cost / better performance semiconductor market growth technology advancement higher transistor density etc.) has been sustained for 50 years. Semiconductor industry experts predict that the pace of increasing transistor density will slow down dramatically in the sub-20 nm (minimum half-pitch) regime. Innovations in transistor design and fabrication processes are needed to address this issue. The FinFET structure has been widely adopted at the 14/16 nm generation of CMOS technology. -
Physical Structure of CMOS Integrated Circuits
Physical Structure of CMOS Integrated Circuits Dae Hyun Kim EECS Washington State University References • John P. Uyemura, “Introduction to VLSI Circuits and Systems,” 2002. – Chapter 3 • Neil H. Weste and David M. Harris, “CMOS VLSI Design: A Circuits and Systems Perspective,” 2011. – Chapter 1 Goal • Understand the physical structure of CMOS integrated circuits (ICs) Logical vs. Physical • Logical structure • Physical structure Source: http://www.vlsi-expert.com/2014/11/cmos-layout-design.html Integrated Circuit Layers • Semiconductor – Transistors (active elements) • Conductor – Metal (interconnect) • Wire • Via • Insulator – Separators Integrated Circuit Layers • Silicon substrate, insulator, and two wires (3D view) Substrate • Side view Metal 1 layer Insulator Substrate • Top view Integrated Circuit Layers • Two metal layers separated by insulator (side view) Metal 2 layer Via 12 (connecting M1 and M2) Insulator Metal 1 layer Insulator Substrate • Top view Connected Not connected Integrated Circuit Layers Integrated Circuit Layers • Signal transfer speed is affected by the interconnect resistance and capacitance. – Resistance ↑ => Signal delay ↑ – Capacitance ↑ => Signal delay ↑ Integrated Circuit Layers • Resistance – = = = Direction of • : sheet resistance (constant) current flows ∙ ∙ • : resistivity (= , : conductivity) 1 – Material property (constant) – Unit: • : thickess (constant) Ω ∙ • : width (variable) • : length (variable) Cross-sectional area = • Example ∙ – : 17. , : 0.13 , : , : 1000 • = 17.1 -
Characterization of the Cmos Finfet Structure On
CHARACTERIZATION OF THE CMOS FINFET STRUCTURE ON SINGLE-EVENT EFFECTS { BASIC CHARGE COLLECTION MECHANISMS AND SOFT ERROR MODES By Patrick Nsengiyumva Dissertation Submitted to the Faculty of the Graduate School of Vanderbilt University in partial fulfillment of the requirements for the degree of DOCTOR OF PHILOSOPHY in Electrical Engineering May 11, 2018 Nashville, Tennessee Approved: Lloyd W. Massengill, Ph.D. Michael L. Alles, Ph.D. Bharat B. Bhuva, Ph.D. W. Timothy Holman, Ph.D. Alexander M. Powell, Ph.D. © Copyright by Patrick Nsengiyumva 2018 All Rights Reserved DEDICATION In loving memory of my parents (Boniface Bimuwiha and Anne-Marie Mwavita), my uncle (Dr. Faustin Nubaha), and my grandmother (Verediana Bikamenshi). iii ACKNOWLEDGEMENTS This dissertation work would not have been possible without the support and help of many people. First of all, I would like to express my deepest appreciation and thanks to my advisor Dr. Lloyd Massengill for his continual support, wisdom, and mentoring throughout my graduate program at Vanderbilt University. He has pushed me to look critically at my work and become a better research scholar. I would also like to thank Dr. Michael Alles and Dr. Bharat Bhuva, who have helped me identify new paths in my research and have been a constant source of ideas. I am also very grateful to Dr. W. T. Holman and Dr. Alexander Powell for serving on my committee and for their constructive comments. Special thanks go to Dr. Jeff Kauppila, Jeff Maharrey, Rachel Harrington, and Tim Haeffner for their support with test IC designs and experiments. I would also like to thank Dennis Ball (Scooter) for his tremendous help with TCAD models. -
A Novel MEMS Pressure Sensor with MOSFET on Chip
A Novel MEMS Pressure Sensor with MOSFET on Chip Zhao-Hua Zhang *, Yan-Hong Zhang, Li-Tian Liu, Tian-Ling Ren Tsinghua National Laboratory for Information Science and Technology Institute of Microelectronics, Tsinghua University Beijing 100084, China [email protected] Abstract—A novel MOSFET pressure sensor was proposed Figure 1. Two PMOSFET’s and two piezoresistors are based on the MOSFET stress sensitive phenomenon, in which connected to form a Wheatstone bridge. To obtain the the source-drain current changes with the stress in channel maximum sensitivity, these components are placed near the region. Two MOSFET’s and two piezoresistors were employed four sides of the silicon diaphragm, which are the high stress to form a Wheatstone bridge served as sensitive unit in the regions. The MOSFET’s has the same structure parameter novel sensor. Compared with the traditional piezoresistive W/L, same threshold voltage VT and gate-source voltage VGS pressure sensor, this MOSFET sensor’s sensitivity is improved (equal to VG-Vdd). They are designed to work in the significantly, meanwhile the power consumption can be saturation region. The piezoresistors also have the same decreased. The fabrication of the novel pressure sensor is low- resistance R . cost and compatible with standard IC process. It shows the 0 great promising application of MOSFET-bridge-circuit structure for the high performance pressure sensor. This kind of MEMS pressure sensor with signal process circuit on the same chip can be used in positive or negative Tire Pressure Monitoring System (TPMS) which is very hot in automotive electron research field. I. -
Simplifying Current Sensing (Rev. A)
Simplifying Current Sensing How to design with current sense amplifiers Table of contents Introduction . 3 Chapter 4: Integrating the current-sensing signal chain Chapter 1: Current-sensing overview Integrating the current-sensing signal path . 40 Integrating the current-sense resistor . 42 How integrated-resistor current sensors simplify Integrated, current-sensing PCB designs . 4 analog-to-digital converter . 45 Shunt-based current-sensing solutions for BMS Enabling Precision Current Sensing Designs with applications in HEVs and EVs . 6 Non-Ratiometric Magnetic Current Sensors . 48 Common uses for multichannel current monitoring . 9 Power and energy monitoring with digital Chapter 5: Wide VIN and isolated current sensors . 11 current measurement 12-V Battery Monitoring in an Automotive Module . 14 Simplifying voltage and current measurements in Interfacing a differential-output (isolated) amplifier battery test equipment . 17 to a single-ended-input ADC . 50 Extending beyond the maximum common-mode range of discrete current-sense amplifiers . 52 Chapter 2: Out-of-range current measurements Low-Drift, Precision, In-Line Isolated Magnetic Motor Current Measurements . 55 Measuring current to detect out-of-range conditions . 20 Monitoring current for multiple out-of-range Authors: conditions . 22 Scott Hill, Dennis Hudgins, Arjun Prakash, Greg Hupp, High-side motor current monitoring for overcurrent protection . 25 Scott Vestal, Alex Smith, Leaphar Castro, Kevin Zhang, Maka Luo, Raphael Puzio, Kurt Eckles, Guang Zhou, Chapter 3: Current sensing in Stephen Loveless, Peter Iliya switching systems Low-drift, precision, in-line motor current measurements with enhanced PWM rejection . 28 High-side drive, high-side solenoid monitor with PWM rejection . 30 Current-mode control in switching power supplies . -
Integrated Switch Current Sensor for Shortcircuit Protection and Current Control of 1.7-Kv Sic MOSFET Modules
Integrated Switch Current Sensor for Shortcircuit Protection and Current Control of 1.7-kV SiC MOSFET Modules Jun Wang, Zhiyu Shen, Rolando Burgos, Dushan Boroyevich Center for Power Electronics Systems Virginia Polytechnic Institute and State Blacksburg, VA 24061, USA [email protected] Abstract—This paper presents design and implementations of a switch current sensor based on Rogowski coils. The current sensor is designed to address the issue of using desaturation circuit to protect the SiC MOSFET during shortcircuit. Specifications are given to meet the application requirement for SiC MOSFETs. It is also designed for high accuracy and high bandwidth for converter current control. PCB-based winding and shielding layout is proposed to minimize the noises caused by the high dv/dt at switching. The coil on PCB are modeled by impedance measurement, thus the bandwidth of coil is calculated. At the end, various test results are demonstrated to validate the great performance of the switch current sensor. Fig. 1. Output characteristics comparison: Si IGBT vs. SiC MOSFET Keywords—current sensing; Rogowski; SiC MOSFET; shortcircuit; current control I. INTRODUCTION SiC MOSFET, as a wide-bandgap device, has superior performance for its high breakdown electric field, low on-state resistance, fast switching speed and high working temperature [1]. High switching speed enables high switching frequency, which improves the power density of high power converters. The gradual cost reduction and packaging advancement bring a Fig. 2. Principle shortcircuit current comparison: Si IGBT vs. SiC MOSFET promising trend of replacing the conventional Si IGBTs with SiC MOSFET modules in high power applications. quickly and reaches its saturation value, where the VCE hits the Shortcircuit protection is one of the major challenges protection threshold value (“Fault detection” in the Fig.1). -
Development of MEMS Capacitive Sensor Using a MOSFET Structure
Extended Summary 本文は pp.102-107 Development of MEMS Capacitive Sensor Using a MOSFET Structure Hayato Izumi Non-member (Kansai University, [email protected]) Yohei Matsumoto Non-member (Kansai University, [email protected] u.ac.jp) Seiji Aoyagi Member (Kansai University, [email protected] u.ac.jp) Yusaku Harada Non-member (Kansai University, [email protected] u.ac.jp) Shoso Shingubara Non-member (Kansai University, [email protected]) Minoru Sasaki Member (Toyota Technological Institute, [email protected]) Kazuhiro Hane Member (Tohoku University, [email protected]) Hiroshi Tokunaga Non-member (M. T. C. Corp., [email protected]) Keywords : MOSFET, capacitive sensor, accelerometer, circuit for temperature compensation The concept of a capacitive MOSFET sensor for detecting voltage change, is proposed (Fig. 4). This circuitry is effective for vertical force applied to its floating gate was already reported by compensating ambient temperature, since two MOSFETs are the authors (Fig. 1). This sensor detects the displacement of the simultaneously suffer almost the same temperature change. The movable gate electrode from changes in drain current, and this performance of this circuitry is confirmed by SPICE simulation. current can be amplified electrically by adding voltage to the gate, The operating point, i.e., the output voltage, is stable irrespective i.e., the MOSFET itself serves as a mechanical sensor structure. of the ambient temperature change (Fig. 5(a)). The output voltage Following this, in the present paper, a practical test device is has comparatively good linearity to the gap length, which would fabricated.