Basics of CMOS Logic Ics Application Note
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Hybrid Memristor–CMOS Implementation of Combinational Logic Based on X-MRL †
electronics Article Hybrid Memristor–CMOS Implementation of Combinational Logic Based on X-MRL † Khaled Alhaj Ali 1,* , Mostafa Rizk 1,2,3 , Amer Baghdadi 1 , Jean-Philippe Diguet 4 and Jalal Jomaah 3 1 IMT Atlantique, Lab-STICC CNRS, UMR, 29238 Brest, France; [email protected] (M.R.); [email protected] (A.B.) 2 Lebanese International University, School of Engineering, Block F 146404 Mazraa, Beirut 146404, Lebanon 3 Faculty of Sciences, Lebanese University, Beirut 6573, Lebanon; [email protected] 4 IRL CROSSING CNRS, Adelaide 5005, Australia; [email protected] * Correspondence: [email protected] † This paper is an extended version of our paper published in IEEE International Conference on Electronics, Circuits and Systems (ICECS) , 27–29 November 2019, as Ali, K.A.; Rizk, M.; Baghdadi, A.; Diguet, J.P.; Jomaah, J. “MRL Crossbar-Based Full Adder Design”. Abstract: A great deal of effort has recently been devoted to extending the usage of memristor technology from memory to computing. Memristor-based logic design is an emerging concept that targets efficient computing systems. Several logic families have evolved, each with different attributes. Memristor Ratioed Logic (MRL) has been recently introduced as a hybrid memristor–CMOS logic family. MRL requires an efficient design strategy that takes into consideration the implementation phase. This paper presents a novel MRL-based crossbar design: X-MRL. The proposed structure combines the density and scalability attributes of memristive crossbar arrays and the opportunity of their implementation at the top of CMOS layer. The evaluation of the proposed approach is performed through the design of an X-MRL-based full adder. -
Three-Dimensional Integrated Circuit Design: EDA, Design And
Integrated Circuits and Systems Series Editor Anantha Chandrakasan, Massachusetts Institute of Technology Cambridge, Massachusetts For other titles published in this series, go to http://www.springer.com/series/7236 Yuan Xie · Jason Cong · Sachin Sapatnekar Editors Three-Dimensional Integrated Circuit Design EDA, Design and Microarchitectures 123 Editors Yuan Xie Jason Cong Department of Computer Science and Department of Computer Science Engineering University of California, Los Angeles Pennsylvania State University [email protected] [email protected] Sachin Sapatnekar Department of Electrical and Computer Engineering University of Minnesota [email protected] ISBN 978-1-4419-0783-7 e-ISBN 978-1-4419-0784-4 DOI 10.1007/978-1-4419-0784-4 Springer New York Dordrecht Heidelberg London Library of Congress Control Number: 2009939282 © Springer Science+Business Media, LLC 2010 All rights reserved. This work may not be translated or copied in whole or in part without the written permission of the publisher (Springer Science+Business Media, LLC, 233 Spring Street, New York, NY 10013, USA), except for brief excerpts in connection with reviews or scholarly analysis. Use in connection with any form of information storage and retrieval, electronic adaptation, computer software, or by similar or dissimilar methodology now known or hereafter developed is forbidden. The use in this publication of trade names, trademarks, service marks, and similar terms, even if they are not identified as such, is not to be taken as an expression of opinion as to whether or not they are subject to proprietary rights. Printed on acid-free paper Springer is part of Springer Science+Business Media (www.springer.com) Foreword We live in a time of great change. -
Efficient Design of 2'S Complement Adder/Subtractor Using QCA
International Journal of Engineering Research & Technology (IJERT) ISSN: 2278-0181 Vol. 2 Issue 11, November - 2013 Efficient Design of 2'S complement Adder/Subtractor Using QCA. D.Ajitha 1 Dr.K.Venkata Ramanaiah 3 , Assistant Professor, Dept of ECE, Associate Professor, ECE Dept , S.I.T.A.M..S., Chittoor, Y S R Engineering college of Yogi Vemana A.P. India. University, Proddatur. 2 4 P.Yugesh Kumar, Dr.V.Sumalatha , SITAMS,Chittoor, Associate Professor, Dept of ECE, J.N.T.U.C.E.A Ananthapur, A.P. Abstract: The alternate digital design of In this paper efficient 1-bit full adder [10] has CMOS Technology fulfilled with the Quantum taken to implement the above circuit by comparing with previous 1-bit full adder designs [7-9]. A full adder with Dot Cellular Automata. In this paper, the 2’s reduced one inverter is used and implemented with less complement adder design with overflow was number of cells. Latency and power consumption is also implemented as first time in QCA & have the reduced with the help of optimization process [5]. smallest area with the least number of cells, Therefore efficient two‟s complement adder is also reduced latency and low cost achieved with designed using the efficient 1-bit full adder [10] and reduced all the parameters like area delay and cost one inverter reduced full adder using majority compared with CMOS [14]. logic. The circuit was simulated with QCADesigner and results were included in The paper is organized as follows: In Section 2, this paper. QCA basics and design methods to implement gates functionalities is presented. -
LDMOS for Improved Performance
> Submitted to IEEE Transactions on Electron Devices < Final MS # 8011B 1 Extended-p+ Stepped Gate (ESG) LDMOS for Improved Performance M. Jagadesh Kumar, Senior Member, IEEE and Radhakrishnan Sithanandam Abstract—In this paper, we propose a new Extended-p+ Stepped Gate (ESG) thin film SOI LDMOS with an extended-p+ region beneath the source and a stepped gate structure in the drift region of the LDMOS. The hole current generated due to impact ionization is now collected from an n+p+ junction instead of an n+p junction thus delaying the parasitic BJT action. The stepped gate structure enhances RESURF in the drift region, and minimizes the gate-drain capacitance. Based on two- dimensional simulation results, we show that the ESG LDMOS exhibits approximately 63% improvement in breakdown voltage, 38% improvement in on-resistance, 11% improvement in peak transconductance, 18% improvement in switching speed and 63% reduction in gate-drain charge density compared with the conventional LDMOS with a field plate. Index Terms—LDMOS, silicon on insulator (SOI), breakdown voltage, transconductance, on- resistance, gate charge I. INTRODUCTION ATERALLY double diffused metal oxide semiconductor (LDMOS) on SOI substrate is a promising Ltechnology for RF power amplifiers and wireless applications [1-5]. In the recent past, developing high voltage thin film LDMOS has gained importance due to the possibility of its integration with low power CMOS devices and heterogeneous microsystems [6]. But realization of high voltage devices in thin film SOI is challenging because floating body effects affect the breakdown characteristics. Often, body contacts are included to remove the floating body effects in RF devices [7]. -
Negation-Limited Complexity of Parity and Inverters
数理解析研究所講究録 第 1554 巻 2007 年 131-138 131 Negation-Limited Complexity of Parity and Inverters 森住大樹 1 垂井淳 2 岩間一雄 1 1 京都大学大学院情報学研究科, {morizumi, iwama}@kuis.kyoto-u.ac.jp 2 電気通信大学情報通信工学科, [email protected] Abstract 1 Introduction and Summary In negation-limited complexity, one considers circuits Although exponential lower bounds are known for the with a limited number of NOT gates, being mo- monotone circuit size [4], [6], at present we cannot tivated by the gap in our understanding of mono- prove a superlinear lower bound for the size of circuits tone versus general circuit complexity, and hop- computing an explicit Boolean function: the largest ing to better understand the power of NOT gates. known lower bound is $5n-o(n)[\eta, |10],$ $[8]$ . It is We give improved lower bounds for the size (the natural to ask: What happens if we allow a limited number of $AND/OR/NOT$) of negation-limited cir- number of NOT gatae? The hope is that by the study cuits computing Parity and for the size of negation- of negation-limited complexity of Boolean functions limited inverters. An inverter is a circuit with inputs under various scenarios [3], [17], [15]. [2], $|1$ ], $[13]$ , we $x_{1},$ $\ldots,x_{\mathfrak{n}}$ $\neg x_{1},$ $po\mathfrak{n}^{r}er$ and outputs $\ldots,$ $\neg x_{n}$ . We show that understand the of NOT gates better. (a) For $n=2^{f}-1$ , circuits computing Parity with $r-1$ We consider circuits consisting of $AND/OR/NOT$ NOT gates have size at least $6n-\log_{2}(n+1)-O(1)$, gates. -
Advanced MOSFET Structures and Processes for Sub-7 Nm CMOS Technologies
Advanced MOSFET Structures and Processes for Sub-7 nm CMOS Technologies By Peng Zheng A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering - Electrical Engineering and Computer Sciences in the Graduate Division of the University of California, Berkeley Committee in charge: Professor Tsu-Jae King Liu, Chair Professor Laura Waller Professor Costas J. Spanos Professor Junqiao Wu Spring 2016 © Copyright 2016 Peng Zheng All rights reserved Abstract Advanced MOSFET Structures and Processes for Sub-7 nm CMOS Technologies by Peng Zheng Doctor of Philosophy in Engineering - Electrical Engineering and Computer Sciences University of California, Berkeley Professor Tsu-Jae King Liu, Chair The remarkable proliferation of information and communication technology (ICT) – which has had dramatic economic and social impact in our society – has been enabled by the steady advancement of integrated circuit (IC) technology following Moore’s Law, which states that the number of components (transistors) on an IC “chip” doubles every two years. Increasing the number of transistors on a chip provides for lower manufacturing cost per component and improved system performance. The virtuous cycle of IC technology advancement (higher transistor density lower cost / better performance semiconductor market growth technology advancement higher transistor density etc.) has been sustained for 50 years. Semiconductor industry experts predict that the pace of increasing transistor density will slow down dramatically in the sub-20 nm (minimum half-pitch) regime. Innovations in transistor design and fabrication processes are needed to address this issue. The FinFET structure has been widely adopted at the 14/16 nm generation of CMOS technology. -
Digital IC Listing
BELS Digital IC Report Package BELS Unit PartName Type Location ID # Price Type CMOS 74HC00, Quad 2-Input NAND Gate DIP-14 3 - A 500 0.24 74HCT00, Quad 2-Input NAND Gate DIP-14 3 - A 501 0.36 74HC02, Quad 2 Input NOR DIP-14 3 - A 417 0.24 74HC04, Hex Inverter, buffered DIP-14 3 - A 418 0.24 74HC04, Hex Inverter (buffered) DIP-14 3 - A 511 0.24 74HCT04, Hex Inverter (Open Collector) DIP-14 3 - A 512 0.36 74HC08, Quad 2 Input AND Gate DIP-14 3 - A 408 0.24 74HC10, Triple 3-Input NAND DIP-14 3 - A 419 0.31 74HC32, Quad OR DIP-14 3 - B 409 0.24 74HC32, Quad 2-Input OR Gates DIP-14 3 - B 543 0.24 74HC138, 3-line to 8-line decoder / demultiplexer DIP-16 3 - C 603 1.05 74HCT139, Dual 2-line to 4-line decoders / demultiplexers DIP-16 3 - C 605 0.86 74HC154, 4-16 line decoder/demulitplexer, 0.3 wide DIP - Small none 445 1.49 74HC154W, 4-16 line decoder/demultiplexer, 0.6wide DIP none 446 1.86 74HC190, Synchronous 4-Bit Up/Down Decade and Binary Counters DIP-16 3 - D 637 74HCT240, Octal Buffers and Line Drivers w/ 3-State outputs DIP-20 3 - D 643 1.04 74HC244, Octal Buffers And Line Drivers w/ 3-State outputs DIP-20 3 - D 647 1.43 74HCT245, Octal Bus Transceivers w/ 3-State outputs DIP-20 3 - D 649 1.13 74HCT273, Octal D-Type Flip-Flops w/ Clear DIP-20 3 - D 658 1.35 74HCT373, Octal Transparent D-Type Latches w/ 3-State outputs DIP-20 3 - E 666 1.35 74HCT377, Octal D-Type Flip-Flops w/ Clock Enable DIP-20 3 - E 669 1.50 74HCT573, Octal Transparent D-Type Latches w/ 3-State outputs DIP-20 3 - E 674 0.88 Type CMOS CD4000 Series CD4001, Quad 2-input -
MOS Caps II; Mosfets I
6.012 - Microelectronic Devices and Circuits Lecture 10 - MOS Caps II; MOSFETs I - Outline G cS vGS + SiO2 – • Review - MOS Capacitor (= vGB) The "Delta-Depletion Approximation" n+ (n-MOS example) p-Si Flat-band voltage: VFB ≡ vGB such that φ(0) = φp-Si: VFB = φp-Si – φm Threshold voltage: VT ≡ vGB such B 1/2 * that φ(0) = – φp-Si: VT = VFB – 2φp-Si + [2εSi qNA|2φp-Si| ] /Cox * * Inversion layer sheet charge density: qN = – Cox [vGC – VT] • Charge stores - qG(vGB) from below VFB to above VT Gate Charge: qG(vGB) from below VFB to above VT Gate Capacitance: Cgb(VGB) Sub-threshold charge: qN(vGB) below VT • 3-Terminal MOS Capacitors - Bias between B and C Impact is on VT(vBC): |2φp-Si| → (|2φp-Si| - vBC) • MOS Field Effect Transistors - Basics of model Gradual Channel Model: electrostatics problem normal to channel drift problem in the plane of the channel Clif Fonstad, 10/15/09 Lecture 10 - Slide 1 G CS vGS + SiO2 – (= vGB) The n-MOS capacitor n+ Right: Basic device p-Si with vBC = 0 B Below: One-dimensional structure for depletion approximation analysis* vGB + – SiO 2 p-Si G B x -tox 0 * Note: We can't forget the n+ region is there; we Clif Fonstad, 10/15/09 will need electrons, and they will come from there. Lecture 10 - Slide 2 MOS Capacitors: Where do the electrons in the inversion layer come from? Diffusion from the p-type substrate? If we relied on diffusion of minority carrier electrons from the p-type substrate it would take a long time to build up the inversion layer charge. -
Physical Structure of CMOS Integrated Circuits
Physical Structure of CMOS Integrated Circuits Dae Hyun Kim EECS Washington State University References • John P. Uyemura, “Introduction to VLSI Circuits and Systems,” 2002. – Chapter 3 • Neil H. Weste and David M. Harris, “CMOS VLSI Design: A Circuits and Systems Perspective,” 2011. – Chapter 1 Goal • Understand the physical structure of CMOS integrated circuits (ICs) Logical vs. Physical • Logical structure • Physical structure Source: http://www.vlsi-expert.com/2014/11/cmos-layout-design.html Integrated Circuit Layers • Semiconductor – Transistors (active elements) • Conductor – Metal (interconnect) • Wire • Via • Insulator – Separators Integrated Circuit Layers • Silicon substrate, insulator, and two wires (3D view) Substrate • Side view Metal 1 layer Insulator Substrate • Top view Integrated Circuit Layers • Two metal layers separated by insulator (side view) Metal 2 layer Via 12 (connecting M1 and M2) Insulator Metal 1 layer Insulator Substrate • Top view Connected Not connected Integrated Circuit Layers Integrated Circuit Layers • Signal transfer speed is affected by the interconnect resistance and capacitance. – Resistance ↑ => Signal delay ↑ – Capacitance ↑ => Signal delay ↑ Integrated Circuit Layers • Resistance – = = = Direction of • : sheet resistance (constant) current flows ∙ ∙ • : resistivity (= , : conductivity) 1 – Material property (constant) – Unit: • : thickess (constant) Ω ∙ • : width (variable) • : length (variable) Cross-sectional area = • Example ∙ – : 17. , : 0.13 , : , : 1000 • = 17.1 -
Characterization of the Cmos Finfet Structure On
CHARACTERIZATION OF THE CMOS FINFET STRUCTURE ON SINGLE-EVENT EFFECTS { BASIC CHARGE COLLECTION MECHANISMS AND SOFT ERROR MODES By Patrick Nsengiyumva Dissertation Submitted to the Faculty of the Graduate School of Vanderbilt University in partial fulfillment of the requirements for the degree of DOCTOR OF PHILOSOPHY in Electrical Engineering May 11, 2018 Nashville, Tennessee Approved: Lloyd W. Massengill, Ph.D. Michael L. Alles, Ph.D. Bharat B. Bhuva, Ph.D. W. Timothy Holman, Ph.D. Alexander M. Powell, Ph.D. © Copyright by Patrick Nsengiyumva 2018 All Rights Reserved DEDICATION In loving memory of my parents (Boniface Bimuwiha and Anne-Marie Mwavita), my uncle (Dr. Faustin Nubaha), and my grandmother (Verediana Bikamenshi). iii ACKNOWLEDGEMENTS This dissertation work would not have been possible without the support and help of many people. First of all, I would like to express my deepest appreciation and thanks to my advisor Dr. Lloyd Massengill for his continual support, wisdom, and mentoring throughout my graduate program at Vanderbilt University. He has pushed me to look critically at my work and become a better research scholar. I would also like to thank Dr. Michael Alles and Dr. Bharat Bhuva, who have helped me identify new paths in my research and have been a constant source of ideas. I am also very grateful to Dr. W. T. Holman and Dr. Alexander Powell for serving on my committee and for their constructive comments. Special thanks go to Dr. Jeff Kauppila, Jeff Maharrey, Rachel Harrington, and Tim Haeffner for their support with test IC designs and experiments. I would also like to thank Dennis Ball (Scooter) for his tremendous help with TCAD models. -
Photovoltaic Couplers for MOSFET Drive for Relays
Photocoupler Application Notes Basic Electrical Characteristics and Application Circuit Design of Photovoltaic Couplers for MOSFET Drive for Relays Outline: Photovoltaic-output photocouplers(photovoltaic couplers), which incorporate a photodiode array as an output device, are commonly used in combination with a discrete MOSFET(s) to form a semiconductor relay. This application note discusses the electrical characteristics and application circuits of photovoltaic-output photocouplers. ©2019 1 Rev. 1.0 2019-04-25 Toshiba Electronic Devices & Storage Corporation Photocoupler Application Notes Table of Contents 1. What is a photovoltaic-output photocoupler? ............................................................ 3 1.1 Structure of a photovoltaic-output photocoupler .................................................... 3 1.2 Principle of operation of a photovoltaic-output photocoupler .................................... 3 1.3 Basic usage of photovoltaic-output photocouplers .................................................. 4 1.4 Advantages of PV+MOSFET combinations ............................................................. 5 1.5 Types of photovoltaic-output photocouplers .......................................................... 7 2. Major electrical characteristics and behavior of photovoltaic-output photocouplers ........ 8 2.1 VOC-IF characteristics .......................................................................................... 9 2.2 VOC-Ta characteristic ........................................................................................ -
Fundamentals of MOSFET and IGBT Gate Driver Circuits
Application Report SLUA618A–March 2017–Revised October 2018 Fundamentals of MOSFET and IGBT Gate Driver Circuits Laszlo Balogh ABSTRACT The main purpose of this application report is to demonstrate a systematic approach to design high performance gate drive circuits for high speed switching applications. It is an informative collection of topics offering a “one-stop-shopping” to solve the most common design challenges. Therefore, it should be of interest to power electronics engineers at all levels of experience. The most popular circuit solutions and their performance are analyzed, including the effect of parasitic components, transient and extreme operating conditions. The discussion builds from simple to more complex problems starting with an overview of MOSFET technology and switching operation. Design procedure for ground referenced and high side gate drive circuits, AC coupled and transformer isolated solutions are described in great details. A special section deals with the gate drive requirements of the MOSFETs in synchronous rectifier applications. For more information, see the Overview for MOSFET and IGBT Gate Drivers product page. Several, step-by-step numerical design examples complement the application report. This document is also available in Chinese: MOSFET 和 IGBT 栅极驱动器电路的基本原理 Contents 1 Introduction ................................................................................................................... 2 2 MOSFET Technology ......................................................................................................