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July 1999 CNF Nanometer

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July 1999 CNF Nanometer NNNANOANOMMMETERETER Newsletter for Cornell Nanofabrication Facility Volume 10 July 1999 Number 2 The Director’s Corner The number of new projects starting The 1999 CNF Annual at Cornell Nanofabrication Facility has The 1999 CNF Annual been increasing at a fairly fast rate. The breadth and scope of this new work is a MeetingMeeting andand CareerCareer FairFair constant source of surprise and pleasure. One particular area showing a large surge in interest is work related to biology. This The CNF Annual Meeting and Career issue highlights Andrea Perez, a graduate Fair will be held on Thursday and student in Applied and Engineering Friday, September 16th and 17th at the Physics; it is exciting to see her work and Statler Hotel on Cornell campus. This the interesting ideas that underlay it, as year’s opening speaker will be Dr. Mark well as to watch the scope of work from T. Bohr from Intel Corporation, and the other external and internal users reaching after-dinner speaker will be Dr. Gregory down to molecular dimensions. Galvin from Kionix, Inc., Ithaca, NY. We all take great pride in being helpers If you would like to attend the annual in such endeavors and are delighted to meeting and / or the career fair, please see it rapidly approaching a critical mass. contact Ms. Denise Budinger at: 607- The history of the facility has several 255-2329 or [email protected]. examples of such periods of changes where the moment is just right; nearly all of this past work went on to influence The CNF Annual Meeting and Career Fair is: many areas of modern technology in a • Oral and Poster Presentations which allow CNF's students and users to show you their significant way. CNF’s openness, recent research and discoveries. embrace, and this help in execution has • Informal lunches which offer additional one-on-one time with students and faculty been its traditional strength. CNF is a members. melting pot of science and engineering. • Thursday night dinner: a more formal occasion to meet, and hear an invited speaker. To biology, CNF brings its knowledge of microelectronics and micromechanical • An opportunity for CNF and Cornell University engineering students to learn about your career opportunities in engineering or related industries. processing, as well as the ability to make structures in the 10-30 nm range through • A proactive event designed to help you the work in nanostructure physics. These illustrate the benefits of employment in are biological molecular dimensions. your company, including internships or In This Issue . Greg Baxter, who joined us last year after full-time experiences, to a focused group of engineering students. a number of years working with The CNF Annual Mtg & Career Fair .. 1 biological applications, helps build the • A chance to showcase your commitment New Equipment .................................... 2 to diversity by providing our students bridges between the work and techniques New Staff at CNF ................................. 3 with access to recent hires, minority of the electronic and biological executives and substantive information User Profile ........................................... 4 communities. If you have interests or about entry-level positions in your CNF REU Update ................................. 5 ideas you would like to pursue, but are not organization. Publications .......................................... 6 sure where to start, I encourage you to call • An opportunity to complete on-campus him. interviews with experienced nano- Sandip Tiwari fabricators. This issue was formatted by Melanie-Claire Mallison Cornell Nanofabrication Facility 1 www.cnf.cornell.edu New Equipment at the CNF ○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○ The VB-6 has a thermal field emission also added an automated resist coat/ electron source running at 100 kV develop system from Brewer Scientific; providing the high brightness and small the Cee 6000. This provides source size required for nanolithography. reproducible resist coating and Minimum feature sizes < 0.03 µm are development of large batches of wafers. possible over field sizes up to 655 µm. µ The addition of the VB6 places CNF For 0.1 m lithography, beam currents as at the forefront in nanolithography high as 10 nA are possible. These capability. This new e-beam system is features, combined with the precise the result of many years of effort by the addressability of the 16 bit field, make µ CNF staff and management. It was made high resolution lithography of 0.1 m possible, in part, by funds from the NSF The Cornell Nanofabrication Facility features routine. Academic Research Infrastucture (CNF) houses a Leica VB-6HR, the The system has a large precision stage program, with significant additional newest in its series of electron beam which will handle 8" wafers. CNF is support from Cornell University and the lithography tools. The VB6 is one of the equipped to routinely handle 3, 4, 6, and semiconductor industry. We are excited most advanced electron beam 8" wafers, as well as small pieces and 5 about this new capability and look lithography tools in the world. or 6" masks. Stage positioning is forward to an exciting future. The VB6 has replaced the JEOL monitored by a laser interferometer with λ 5DIIU which served our nanofabrication /1024 = 0.6 nm precision. The VB6 is Of note: needs for over 9 years. The JEOL joins also equipped with a height sensor for 100 KeV Field Emission the CNF Leica EBMF10.5 in providing dynamic field size corrections, and 25 MHz Advanced Pattern Generator complementary electron beam dynamic focus / astigmatism corrections. The stage handles 8" wafers lithography capability extending from To support the VB6 and lithography Minimum feature size is under 30 nm above 1 µm to below 0.03 µm. on batches of larger wafers, CNF has The stage is precise to lambda/1024 ○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○○ At right: “Nanofabrication using a Stencil Mask.” CNF Project # 598-96 User: Mandar M. Deshmukh PI: Dan Ralph We have developed nm-scale stencil masks to use for direct deposition of nanostructures without employing a resist layer. Fig. 1a : STEM (Scanning Transmission Electron Microscope) image of a 5-nm-diameter hole in the silicon nitride membrane. Fig.1b: STEM image of a dot fabricated by evaporating metal through a hole similar to one shown in Fig. 1a. Fig. 1c: STEM image of a 15-20 nm wide line shaped orifice etched in a silicon nitride membrane. Fig. 1d: STEM image of two lines made by depositing material through a line shaped orifice. Cornell Nanofabrication Facility 2 www.cnf.cornell.edu New Faces at the CNF FROM LEFT TO RIGHT: Michael Deeb is a native of Ithaca and 1996. Currently, John is working to complete diagnosis of semiconductor materials and went to college here in the area. He is our his M.S. in Engineering Science from LSU optical devices. Since December, Gabor has research equipment and clean room while serving on the CNF technical staff. been responsible for CNF processing technician. John’s position is primarily dedicated to involving electron beam lithography with the device fabrication and processing for the EBMF and LEO-NPGS systems, as well MEMS Exchange. This multi-site foundry scanning electron microscopy. Sandip Tiwari is the Lester B. Knight provides low cost processing to a variety of Director of CNF. Tiwari, who earned his researchers in an effort to expand the doctorate in electrical engineering at Cornell industrialization of MEMS. Shijie Yang, below, received his B.S. in in 1980, is also a Cornell professor of computer science in 1984, and his M.S. in electrical engineering. The new director was computer science in 1987, both from the born in India and received his undergraduate After receiving his Ph.D. in biochemistry Northeast University, P. R. China. He has degree at the Indian Institute of Technology, and molecular biology from UCSB, Gregory worked for the Wearnes Technology Co. both Kanpur. He earned his master’s degree in Baxter worked for Syntex Research in Palo in P. R. China and San Jose, CA. He has also electrical and systems engineering at Alto, CA in the department of Cancer and worked at Appalachian State University, Rensselaer Polytechnic Institute, Troy, N.Y., Developmental Biology. His research Compucel Services, Laurel, MD, and before coming to Cornell for his Ph.D. He entailed elucidating the signal transduction UTStarcom, Inc. Iselin, NJ. Here at CNF, joined IBM’s Watson Center as a research mechanisms involved in growth factor Shijie maintains and improves the local area staff member in 1982 and became a manager stimulation of proliferation in small cell lung network to campus-wide area network for exploratory memory and device modeling carcinoma cells. Greg then worked for interface, keeps the CNF phone system in 1989. Molecular Devices Corp., where he was ringing, maintains the DEC cluster system involved with developing a cell-based high- and our desktop computers, all the while throughput screening device for drug supporting CNF staff on hardware/software- Marsha Appleby previously worked for six discovery applications. After leaving related issues and web development. years at Bethel Grove Bible Church. She Molecular Devices, he worked for the went to Florida on a mission for youth, and National Cancer Institute’s Chemoprevention returned to Ithaca to assist at the Ithaca Branch. Greg joined the staff at CNF in June, Pregnancy Center, working in administration 1998. His primary function is to provide and also counseling young women in crisis special attention to the needs of biology users pregnancies. Marsha joined the CNF staff and increase the visibility of CNF within the this past January as receptionist and feels like biology and biomedical communities. she’s fitting right in. (Especially the crisis part!) Gabor Nagy did his undergraduate studies in physics at Cornell, and his graduate and John Williams received his B.S. in Physics Ph.D.
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