Delft University of Technology First-principles investigation of the adsorption behaviors of CH 2 O on BN, AlN, GaN, InN, BP, and P monolayers Feng, Chuang; Qin, Hongbo; Yang, Daoguo; Zhang, Guoqi DOI 10.3390/ma12040676 Publication date 2019 Document Version Final published version Published in Materials Citation (APA) Feng, C., Qin, H., Yang, D., & Zhang, G. (2019). First-principles investigation of the adsorption behaviors of CH O on BN, AlN, GaN, InN, BP, and P monolayers. Materials, 12(4), 1-8. [676]. https://doi.org/10.3390/ma120406762 Important note To cite this publication, please use the final published version (if applicable). Please check the document version above. Copyright Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons. Takedown policy Please contact us and provide details if you believe this document breaches copyrights. We will remove access to the work immediately and investigate your claim. This work is downloaded from Delft University of Technology. For technical reasons the number of authors shown on this cover page is limited to a maximum of 10. materials Article First-Principles Investigation of the Adsorption Behaviors of CH2O on BN, AlN, GaN, InN, BP, and P Monolayers Chuang Feng 1, Hongbo Qin 1,* , Daoguo Yang 1 and Guoqi Zhang 1,2 1 School of Mechanical and Electronic Engineering, Guilin University of Electronic Technology, Guilin 541004, China;
[email protected] (C.F.);
[email protected] (D.Y.);
[email protected] (G.Z.) 2 EEMCS Faculty, Delft University of Technology, 2628 Delft, The Netherlands * Correspondence:
[email protected]; Tel.: +86-773-2290108 Received: 29 January 2019; Accepted: 18 February 2019; Published: 25 February 2019 Abstract: CH2O is a common toxic gas molecule that can cause asthma and dermatitis in humans.