University of Tennessee, Knoxville TRACE: Tennessee Research and Creative Exchange Doctoral Dissertations Graduate School 12-2013 Chemical Vapor Deposition of Heteroepitaxial Boron Phosphide Thin Films John Daniel Brasfield University of Tennessee - Knoxville,
[email protected] Follow this and additional works at: https://trace.tennessee.edu/utk_graddiss Part of the Semiconductor and Optical Materials Commons Recommended Citation Brasfield, John Daniel, "Chemical aporV Deposition of Heteroepitaxial Boron Phosphide Thin Films. " PhD diss., University of Tennessee, 2013. https://trace.tennessee.edu/utk_graddiss/2558 This Dissertation is brought to you for free and open access by the Graduate School at TRACE: Tennessee Research and Creative Exchange. It has been accepted for inclusion in Doctoral Dissertations by an authorized administrator of TRACE: Tennessee Research and Creative Exchange. For more information, please contact
[email protected]. To the Graduate Council: I am submitting herewith a dissertation written by John Daniel Brasfield entitled "Chemical Vapor Deposition of Heteroepitaxial Boron Phosphide Thin Films." I have examined the final electronic copy of this dissertation for form and content and recommend that it be accepted in partial fulfillment of the equirr ements for the degree of Doctor of Philosophy, with a major in Chemistry. Charles S. Feigerle, Major Professor We have read this dissertation and recommend its acceptance: Laurence Miller, Frank Vogt, Ziling Xue Accepted for the Council: Carolyn R. Hodges Vice Provost and Dean of the Graduate School (Original signatures are on file with official studentecor r ds.) Chemical Vapor Deposition of Heteroepitaxial Boron Phosphide Thin Films A Dissertation Presented for the Doctor of Philosophy Degree The University of Tennessee, Knoxville John Daniel Brasfield December 2013 Copyright © 2013 by John Daniel Brasfield All rights reserved.