Ultraclean Surface Processing of Silicon Wafers Springer-Verlag Berlin Heidelberg GmbH Takeshi Hattori (Ed.) Ultraclean Surface Processing of Silicon Wafers Secrets of VLSI Manufacturing With 464 Figures , Springer Dr. Takeshi Hattori ULSI R&D Laboratories Sony Corporation Semiconductor Company Atsugi 243-8585, Japan E-mail:
[email protected] Translators: Dr. Takeshi Hattori Stefan Heusler ULSI R&D Laboratories Blumenthalstr. 83 Sony Corporation Semiconductor Co. D-50668 KOln, Germany Jason P. Webb 12107 Lake Carrol Drive Tampa, FL 33618-3729, USA Revised, updated and enlarged translation of the original Japanese edition Originally published in Japanese under the title: Silicon Wafer Hyomen no Clean-ka Gijutsu Published by Realize Inc. © 1995 Library of Congress Cataloging-in-Publication Data. Ultraclean surface processing of silicon wafers: secrets of VLSI manufacturing 1 Takeshi Hattori (ed.). p. cm. ISBN 3-540-61672-1 (alk. paper) 1. Semiconductor wafers-Cleaning. 2. Silicon-Surfaces. 3. Surface preparation. l. Hattori, Takeshi, 1945-. TK7871.85.U48 1998 621.3815'2-DC21 98-10353 ISBN 978-3-642-08272-6 ISBN 978-3-662-03535-1 (eBook) DOI 10.1007/978-3-662-03535-1 This work is subject to copyright. All rights are reserved, whether the whole or part of the material is concerned, specifically the rights of translation, reprinting, reuse of illustrations, recitation, broad casting, reproduction on microfilm or in any other way, and storage in data banks. Duplication of this publication or parts thereof is permitted only under the provisions of the German Copyright Law of September 9, 1965, in its current version, and permission for use must always be obtained from Springer-Verlag.