Fab-Finder W. Size Build Code Module Manufacturer Model (mm) Serial No. Year Status Description / Comments

LE240 DCVD Advanced Energy RS94A 200 TiCl4 supply unit LE241 DCVD Advanced Energy RS94A 200 TiCl4 supply unit LV110 Test Advantest Corporation M6751AD 200 EDS LV111 Test Advantest Corporation M6751AD 200 EDS LV112 Test Advantest Corporation M6751AD 200 EDS LV114 Test Advantest Corporation T5382A1 200 EDS LW115 Test Advantest Corporation T5371 2001 Memory type prober - 2 station LV115 Test Advantest Corporation T5585 - 2002 High-Speed Memory Test System LV113 Test Agilent 16702A 200 EDS LF104 Reclaim Akrion 200 Reclaim (Used Tool) LH105 Cleaning AOC Techno Co AOC 200/300 FK11102 2013 In Crates 4 quartz tanks for chemicals - 2 rinse tanks LF108 Thin Film Applied Materials CENTURA 200 Sub-atmosphereTool never ran. Brand TREOS new. BPSG CVD LJ107 Thin Film Applied Materials P5000 200 4666 1996 Warehouse 2 BPSG Chambers LJ108 Thin Film Applied Materials P5000 200 50014 1996 Warehouse 3 USG + 1 Sputter chambers LJ109 Thin Film Applied Materials P5000 200 A0035 1996 Cleanroom 3 USG Chambers LJ110 Thin Film Applied Materials P5000 200 7347 1997 Warehouse 1 ch. MXP+ / 1 MkII LJ111 Thin Film Applied Materials P5000 200 7348 1997 Warehouse 1 ch. MkII LJ112 Thin Film Applied Materials CENTURA 5200 IPS 200 EA58 1999 Warehouse IPS (oxide etch) - Silicon dome missing LV104 Thin Film Applied Materials ULTIMA 5200 200 2006 CVD LV105 Thin Film Applied Materials CENTURA DxZ 200 1997 SMIF CVD LV106 Thin Film Applied Materials ENDURA 5500 200 1995 PVD LV107 Thin Film Applied Materials ENDURA 200 1993 AlCu/ TiN/Ti LT100 CVD Applied Materials P5000 200 1105150 2002 PEOX , 3chamber , DPS+ POLY, CENTURA LV108 Etch Applied Materials I-PH.2 200 1999 POLY ETCH 1997 Centura 1 Body, Flat type, Ph 1, Narrow L/L, HP LT102 Etch Applied Materials SUPER-E (Centura 1) 200 9085 Robot, 3Chamber, ENI OEM-12B 1999 Centura 1 Body, Flat type, Ph 2, Narrow L/L, HP LT103 Etch Applied Materials SUPER-E (Centura 1) 200 EB76 Robot, 3Chamber, ENI OEM-12B LT104 Etch Applied Materials SUPER-E (Centura 1) 200 9957 1998 Centura 1Body. LJ106 Implant Applied Materials PI 9500 200 M123 1993 Cleanroom Implanter Particule Wafer Inspection - PDI / CCD installed LW113 Metrology Applied Materials WF-736XS 200 2001 50 / 60Hz common defaults inspection laser Particule Wafer Inspection - PDI / CCD installed LW114 Metrology Applied Materials WF-736XS 200 2001 50 / 60Hz common defaults inspection laser LE261 DIFF ASM UHV-A600 200 HSG Growth (3 units available) LE274 DCVD ASM EAGLE-10 200 Plasma SiO2 CVD (3 units available) LM150 PHOTO ASML ASML100 200 STEPPER ASM 5500/100 LM151 PHOTO ASML ASML200 200 ASML/200 LV101 Litho ASML PAS5500/300C 200 1997 PHOTO LV100 Litho ASML PAS5500/300C 200 1997 Stepper LT112 PHOTO ASML ASML100 200 3420 1996 LT113 PHOTO ASML ASML250 200 4161 2002 LF111 Bonding ASM- Pacific Tech AB559 200 Wire & Die Bonder LE 200 DCVD Aviza Technology WJ1500TFv1.0 200 Atmosphere TEOS BPSG CVD LM110 Diffusion AVIZA-SPTS AVP8000 200 AVP8000 Oxide Furnace (2 units available) LJ113 Strip AXCELIS Fusion MCU 200 200 MU5J331C 1996 Cleanroom Stripper/Asher - HV module not functional (2 units LJ114 Strip AXCELIS Fusion MCU 200 MU5J3228B 1996 Warehouse each available) LE265 PVD Beckman Coulter DU-650 200 Surface reflection measurement LG110 Metrology BRUCKER Nano defectivity 200/300 120 2003 Discon'ed Not operational, need to change parts LM115 Metrology CAMITEK FALCON 200 200 Thelma inspection camitek LS101 Litho Canon FPA-2500 i2 200 309144 1993 Lithography - stepper (4 units available) LS105 Litho Canon MPA600 super 200 9105131 Lithography - Aligner LT114 Litho Canon ES3 200 1046247 2001 Cymer Laser (good Condition) LE246 ETCH Canon-ANELVA ILD-4100SR & SD II 200 W Dry Etcher (14 units available) LE207 PVD Canon-ANELVA I-1060SV2+1 200 PVD (5 units available LE257 DIFF Canon Marketing Japan HeatPulse8108 200 Std RTA (3 units available) LE258 DIFF Canon Marketing Japan HeatPulse8800 200 Std RTA LW111 Thermal CELTU (Youtec) HPK03Z 2003 4'' PMC3 groups - 600°C Hi Temp substrate LE110 TF Dainippon Screen SP-W813-AS 200 Scrubber for CMP (4 units available) LJ120 Cleaning Dainippon Screen AS 2000 200 57530-5044 1998 Cleanroom Cleaning Equipment LJ121 Cleaning Dainippon Screen AS 2000 200 59530-5230 1998 Cleanroom Cleaning Equipment LJ122 CMP Clean Dainippon Screen SPW813-AS 200 53530-4003 1993 Warehouse Single Wafer Processing (3 units available) LE115 Litho Dainippon Screen SD-W80A-AVQ 200 Polyimide Coater LE116 Litho Dainippon Screen SD-W80A-AVQ 200 Polyimide Developper LE205 Litho Dainippon Screen SC-W80A-AG 200 SOG Coater (2 units available) LE225 ETCH Dainippon Screen DP-W80 A-AV (UV） 200 UV/O3 treatment LE239 WET Dainippon Screen - 200 IPA Recycle unit LE269 CMP Dainippon Screen VM-8200 200 Thickness Measurement (2 units available) LE271 CMP Dainippon Screen VM-2010 200 Thickness Measurement ILU124 Metrology Dainippon Screen VM1210 100~200 2013 Warehouse FILM THICKNESS MEASUREMENT LJ125 CMP EBARA EPO222 200 PTC00706EX 2000 Cleanroom Polishing LV117 Back End ESI M9275 200 1998 Laser Memory Fuser (4 units available) LG111 Grinding EMTEC WBM210 100~200 800 2003 Running 2 load & 2 unload ports. Use Tokyo diamond LJ126 Bake FUSION M200PC 200 2063.96 1995 Cleanroom UVwheels. HARD M200PC

February 2016 - Fab-Finder Confidential - Page 1 /4 LJ127 Fuser GSI M40 200 1139 2003 Cleanroom Fuser LJ128 Bake HERAEUS TUF-50/60-230 200 4970-00 1992 Warehouse Oven LF122 Metrology Hilevel Dragon 200/300 For low-end logic device probing (6 units avail.) LR121 Metrology Hitachi S-4800+EDX 200 9043-06 2008 FE SEM LR122 Metrology Hitachi S-5000 200 - - FE SEM LR125 Metrology Hitachi S-9220 200 9722-05 2000. 04 CD Measure LR126 Metrology Hitachi S-5200 200 0632-04 2005 FE SEM LS106 Metrology Hitachi S-8820S 200 8323-07 1995 Metrology - CD-SEM LS107 Metrology Hitachi S-8840 200 8352-09 1997 Metrology - CD-SEM LT107 Metrology Hitachi S9200SA 200 Apr-18 2000 Working condition LS108 Metrology Hitachi S-9220 200 9724-04 2000 Metrology - CD-SEM (4 units available) LT109 Metrology Hitachi S9360 200 0107-03 2003 LS131 Metrology Hitachi S5200 with EDAX - CD-SEM LS126 Metrology Hitachi S-4500 - CD-SEM LS110 Metrology Hitachi S-6000 200 5333884 1993 Metrology - CD-SEM LR123 Implant Hitachi E-1030 200 0429-001 1996 Ion Sputter LR124 Implant Hitachi E-1045 200 0614-07 2008 Ion Sputter LE250 ETCH Hitachi M-501A 200 AL Dry Etcher (2 units available) LE252 ETCH Hitachi M-602A 200 AL Dry Etcher LE229 PVD JAPAN PIONICS URT-3-S （ SPU-A-3B） 200 Ar Purifier LE230 DIFF JAPAN PIONICS WGC-200B-1-S 200 CLF3 absorb unit (5 units available) LE235 DIFF JAPAN PIONICS JIP-100E-S 200 N2 Purifier (2 units available) LE236 DIFF JAPAN PIONICS MANN-07N-S 200 NH3 Purifier (8 units available) LE237 DIFF JAPAN PIONICS JOP-50E-S 200 O2 Purifier (2 units available) LR118 Litho KE DD-853V H2 Anneal 200 DD3-00028-1 1997 H2 Anneal . Ball bonder - Sheartester LW120 Metrology Keller Technology (KTC) BT-30 - · Bausch & Lomb Lens (Zoom: 0,8x ~ 4,0x) LE233 TF KEYENC GR-3500 200 Data-Logger (3 units available) LV121 Metrology KLA-Tencor 2131 200 1995 Wafer Defect Inspection System LJ137 Metrology KLA Tencor CRS 1010 1010A 092 1996 Cleanroom Wafer Confocal Review Station LJ138 Metrology KLA Tencor CRS 1010 1010A 094 1997 Warehouse Wafer Confocal Review Station LS124 Metrology KLA Tencor P-20H 200 1996 Profiler LJ136 Metrology KLA Tencor eS20 XP 200 ES2XX159 2001 Cleanroom Scanning Electron Beam LE264 PVD KLA-Tencor M-gage300 200 Al Thickness measurement LE266 ETCH KLA-Tencor P-20H 200 Step hight measurement LG115 Metrology KLA Tencor ALERIS HX 200 & 300 200612120018 2005 idle, conn'ted 2 load ports (1 x 300mm & 1x 200mm) LJ130 Metrology KLA Tencor AIT Model 200 0996 8036 1996 Cleanroom PatternModes: WaferBBSE InspectionUV, UVR, Patternsystem Recognition(no UV cap.) LL155 Metrology KLA-Tencor KLA5200 200 In Fab MEASUREMENT (2 units available) LJ131 Metrology KLA Tencor KLA 5200 XP 200 2022 1997 Cleanroom Overlay Measurement System - Has KLAOUT Option. Maintained by KLA LJ132 Metrology KLA Tencor KLA 5200 XP 200 2258 2000 Warehouse Overlay Measurement System - Has KLAOUT LJ134 Metrology KLA Tencor KLA 5200 XP 200 2253 2000 Warehouse OverlayOption. MaintainedMeasurement & disassembled System - Has by KLAOUT KLA LJ135 Metrology KLA Tencor KLA 5200 XP 200 2267 2000 Cleanroom OverlayOption. MaintainedMeasurement & disassembled System - Has by KLAOUT KLA LE117 Metrology KLA-Tencor UV-1250SE 200 ReflectionOption. Maintained rate Measurement by KLA LV122 Metrology KLA-Tencor UV-1280SE 200 2001 Thin Film Measurement System (3 units available) LV125 Metrology KLA-Tencor KLA-2139 200 2000 In-Line Wafer Optical Inspection System LV126 Metrology KLA-Tencor UV-1280SE 200 2001 Thin Film Measurement System LR128 Diffusion Kokusai SEC DD-823V 200 T1DD1-50903-6 1996 H2 Anneal LR129 Diffusion Kokusai SEC DJ-823V-8BL 200 DC1-01024 1996 HTO (5 units available) LR131 Diffusion Kokusai SEC DJ-823V-8BL 200 DC1-01012 1996 NITRIDE LR148 Thin Film Kokusai SEC DD-823V-8BL 200 DD1-15109-4 1995. 05 N2 Anneal LR149 Diffusion Kokusai SEC DD-823V-8BL 200 DD1-50757-2 1995. 06 PYRO LW107 LP-CVD Kokusai SEC DJ-833V 200 1997 LP-CVD - D-Poly LW108 LP-CVD Kokusai SEC DJ-833V 200 1997 LP-CVD - D-Poly LR135 Diffusion Kokusai SEC DJ-853V-8BL 200 DC3-00269-1 1998. 08 Dopped-Poly LR136 Diffusion Kokusai SEC DD-853V-8BL 200 DD3-15267-2 1996 PYRO (TLC). Totaly refurbished LR137 Diffusion Kokusai SEC DJ-853V-8BL 200 1C853G0089 1997. 09 Dopped-Poly LR138 Thin Film Kokusai SEC DJ-853V-8BL 200 DD1-15248-2 1996 NITRIDE (3 units available) LR141 Diffusion Kokusai SEC DJ-853V-8BL 200 DC1-10635-3 1996 SOG Curing LR142 Thin Film Kokusai SEC DJ-853V-8BL 200 DC1-10634-6 1996 TEOS CVD (6 units available) LE232 Diffusion Kokusai Electric-Hitachi CX-9620 200 Block Controller (3 units available) LE120 Diffusion Koyo Thermo Systems VF-5300B V35X 200 Polyimide Bake Furnace LE121 Diffusion Koyo Thermo Systems VF-5300B V35X 200 Polyimide Bake Furnace LJ140 Strip Lam Research 2300 200 23TM0041 2001 Warehouse Mainframe + Strip chamber LN 100 Etch Lam Research LAM4400 200 2000 Warehouse Etcher (3 units available) LM116 Etch Lam Research LAM4520 200 Warehouse 200mm Oxide Aniso Clamp (3 units available) LW112 Etch Lam Research R-4400 200 - Poly Etcher LL160 Etch LAM LAM4520 XL 200 Warehouse Rainbow 4520xl oxide LL161 Etch LAM LAM4520 XL 200 Warehouse Rainbow 4520xl oxide LR127 Etch Lam Research Alliance 9400 ICP 200 M8188 1996 POLY/NITRIDE Etch LV127 Metrology Leica INS3300 200 2004 REVIEW STATION LF145 Cleaning Lumax VTC201P-T2 200 Vertical Tube Clean LL162 DIFF Mattson Technology RTP/AST2800 200 Warehouse SHS2800 LW100 Machinery Makino V-99 2007 Treatment size 1800 × 1000 LV116 Back End Micromanipulator Probe station 1 200 EDS LE238 Litho NEC Machinery DF-484 200 Reticle Casette Washer LS127 Metrology Nikon / Nidix OPTIPHOT-88-AC IN with IM-14200 Microscope LS128 Metrology Nikon OPTIPHOT-200BD 200 Microscope LS132 Metrology Nikon Optiphot 300 - Microscope

February 2016 - Fab-Finder Confidential - Page 2 /4 LJ141 Litho Nikon S306C 200 5252024 2003 Cleanroom 193nm Scanner LJ142 Litho Nikon S203B 200 7776066 1999 Cleanroom Scanner DUV LR119 Litho Nikon model i8 200 NIKON-Stepper - NIKON-Stepper LE202 Litho Nikon NSR-S204B 200 Scan Stepper (4 units available) LE212 Litho Nikon NSR-2205EX12B 200 KrF Stepper (3 units available) LJ143 Laminator NITTO DR8500-11 200 N022G96 1996 Warehouse Laminator LR120 Thin Film Novellus Novellus Concept C1 200 580 1992 SiO2/TEOS LE201 Thin Film Novellus Novellus Concept C1 200 Plasma CVD(SiON) LJ144 Thin Film Novellus Speed 200 2000 Warehouse 2 Speed chambers non shrink, no frame LJ145 Thin Film Novellus SABRE CLASSIC 200 00-03CU0026 1998 Cleanroom Electro Chemical Deposition LJ146 Thin Film Novellus Altus 200 1998 Warehouse 2 W deposition, non shrink · PVD Barrier / Damascene Cu seeds LW110 Thin Film Novellus Concept III Inova xT 200 2005 · 4 chambers: Cu, Ta, TaN & PC LW101 Machinery NTC (Komatsu ?) TLV-40B 2007 Laser treatment - size 1,220 × 2,440 LW102 Machinery Okamoto PSG125 Polishing -Table size 20 "× 48" - 7,5kw motor LG116 Grinding Okamoto VG202MKII-8 200/300 10717 2007 running 2 spindles - 1 chuck - centering station and spinner Substance- 4 stations Microscope（ Package Appearance LE122 Others Olympus SZH-ILLC-2 200 Observation） KLU145 Metrology Olympus MX50, AL110 Microscope 150/200 Warehouse Deinst'ed/wrapped & moved in clean w/house LJ150 Litho PRI 7000 200 xx 1993 to 1996Cleanroom Several wafer Stocker from 58 to 112 positions LJ151 Litho PRI GUARDIAN 200 3260 2001 Cleanroom Reticle Stocker Aerotrack, 1/4'', model ~500 meters of tracks, turntables, curves,loading LJ152 Fab. PRI Brooks AT200 N/A stations… LT111 Metrology RIGAKU XRF3630 200 RR42026 1995 LE270 DIFF Rudolph FE-IV 200 Thickness Measurement LE272 DIFF Rudolph FE-VII 200 Thickness Measurement LK164 Metrology SEMILAB MCV 200 In Fab MCV LJ155 Litho SemiTool MAGNUM HF/EG 200 M96264 1997 Warehouse Batch Wafer Processing LJ156 Litho SemiTool MAGNUM HF/EG 200 M95688 1997 Warehouse Batch Wafer Processing LW103 Deposition Showa CGT-10SA - Vacuum evaporation - 10'' diffusion pump AUTOWAFER SCANNING ACOUSTIC LL165 Metrology Sonix AutoWafer 200 Warehouse MICROSCOPE LK167 METROLOGY SUSS DSM 200 OVERLAY DOUBLE SIDE MEAS LK168 WET SVG SVG90 200 TRACK LJ158 Diffusion SVG VTR 7000 200 V7-237 1994 Warehouse Vertical Hot Pr. Furnace (3 units available) LJ162 Diffusion SVG VTR 7000+ 200 V7B-602 Warehouse Vertical LPCVD Furnace - TEOS capability (6 1996 units available) LE125 TF Strausbaugh MODEL-6DS-SP 200 SiO2 CMP (4 units available) LG120 Polishing Strausbaugh 6DSSP 200 29 00 200 2003 running 2 load , 2 load/unload stations, 2 polish tables, 2 LJ167 TAKATORI ATRM-2100 200 1048 1996 Warehouse Tapepolish remover heads, 2 slurry lines & tanks LL169 MEMS TECHNOVEN TECHNOVEN 200TC 200 Warehouse TECHNOVEN 200TC (3 units available) · 1st analog test LW116 Metrology Teradyne A563-HS 1997 . Camera module measurement LE263 Implant Therma-Wave ThermaProbe-420 200 Lattice Defects measurement LE253 Litho TKK 5033 200 Microscope LE254 Litho TKK MAC-92MV1 200 Overlay Measurement (4 units available) LE255 Litho TKK MAC-110MV1 200 Overlay Measurement (2 units available) LE256 Litho TKK MAC-110MV1 200 Overlay Measurement LJ168 Litho Tokyo Electron Ltd. MARK7 200 7161028 1996 Cleanroom Resist track system LJ169 Litho Tokyo Electron Ltd. MARK7 200 7161049 1996 Warehouse POLYIMIDE POLYIMIDE - Has Hi viscosity pump & polyimide LJ170 Litho Tokyo Electron Ltd. MARK7 200 713140 1994 Warehouse cureheated cover LJ171 Litho Tokyo Electron Ltd. ALPHA 8S CVF 200 A00009835229 1998 Warehouse Vertical LPCVD Furnace, Nitride LE216 Litho Tokyo Electron Ltd. Clean Track MARK-8 200 Inline Developper (15 units available) LE292 Litho Tokyo Electron Ltd. CLEAN TRACK MARK-8 200 Resist Coater LR102 Litho Tokyo Electron Ltd. Clean Track MARK-8 200 8171224 1997 Litho-Coater-Developer LR103 Litho Tokyo Electron Ltd. Clean Track MARK-8 200 8171342 1997 Litho-Coater-Developer LR104 Litho Tokyo Electron Ltd. Clean Track MARK-8 200 814158 1997 Litho-Coater-Developer LS116 Litho Tokyo Electron Ltd. Mark8 SMIF 1C2D 200 8181580 2000 Lithography - Coater/Developer LV102 Litho Tokyo Electron Ltd. Mark8 1C1ARC C 200 TRACK 2005 200mm, 5Road port, 5Coater, 5 Develop, EFEM, LT115 Litho Tokyo Electron Ltd. LITHIUS 200 G250234 IRAS Robot LR100 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 1999 NO-GATE LR101 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M00000175458 2001 High Temp Pyro LR105 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M00000395126 2003 FURNACE-LP CVD LR106 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M00000395110 2005 FURNACE-LP CVD LR107 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M0000994005 1999 FURNACE-LP CVD LR108 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M0000085422 - FURNACE-LP CVD LR109 Diffusion Tokyo Electron Ltd. TEL Alpha 8 SE 200 M00000645044 2006 FURNACE-LP CVD LW104 Diffusion Tokyo Electron Ltd. Alpha 801D 200 - High temperature - VDF diffusion LW105 Diffusion Tokyo Electron Ltd. Alpha 801D 200 - High temperature - VDF diffusion LR113 Diffusion Tokyo Electron Ltd. Alpha 805 SCN 200 1994 NITRIDE LR114 Diffusion Tokyo Electron Ltd. Alpha 808 SC 200 1995 NITRIDE LR115 Diffusion Tokyo Electron Ltd. Alpha 808 SC 200 A00009550081 1994 TEOS LR116 Diffusion Tokyo Electron Ltd. Alpha 808 SC 200 A00009610053 1995 TEOS LR117 Diffusion Tokyo Electron Ltd. Alpha 808 SCN 200 1996 D-POLY LW106 Diffusion Tokyo Electron Ltd. MB2-730 200 1996 Metal CVD LE231 DIFF Tokyo Electron Ltd. (Ask for details) 200 Bank Controller (4 units available) LE243 PVD Tokyo Electron Ltd. UNITY-EP 200 TiN/Ti-CVD (3 units available) LE247 ETCH Tokyo Electron Ltd. UNITY-IEM 200 OX Dry Etcher (5 units available) LE248 ETCH Tokyo Electron Ltd. TE-8500P ESC 200 OX Dry Etcher (6 units available)

February 2016 - Fab-Finder Confidential - Page 3 /4 LE249 ETCH Tokyo Electron Ltd. TE-8401 200 Si Dry Etcher (4 units available) LE262 DIFF Tokyo Electron Ltd. α-808SC 200 LP-DOPOS (7 units available) LE267 CMP TOKYO SEIMITSU Surfcom 590A-64 200 Wafer Surface measurement LE268 CMP TOKYO SEIMITSU Surfcom 578A 200 Wafer Surface measurement LE273 CMP TOKYO SEIMITSU E-MF1000-100 200 Wafer Thickness measurement LE234 IMPLA Ulvac EVTT-500D 200 I/S degas unit LF175 Metrology Veeco VX 200 Depth Measurement 1996 Implanter - No PP Plus option - Missing many LJ175 Implant VARIAN E500 HP 200 37381 Cleanroom parts LT105 Implant VARIAN E500HP 200 VKL6005 1995 Medium Current Implanter LT106 Implant VARIAN Varian Vista80 200 137052 2001 Medium Current Implanter LL172 Metrology Viscom IR Ctrl System 200 Warehouse IR Ctrl System LK110 Diffusion Wafermasters SAO200-LP 200 Copper Annealing Oven - Used for R&D LE260 Diffusion Wafermasters SRTF200-LP 200 Single wafer low temp. RTA (2 units available) LE226 Diffusion Wafermasters SBAO-200 200 5 wafer RTA LT101 CVD Watkins-Johnson WJ-TEOS (999-3.2) 200 4953 1993 3-Chamber/ENI Generator/Wide body LJ180 CMP Westech 372M 200 57 1993 Warehouse Polishing LJ181 CMP Westech 372M 200 137 1994 Warehouse Polishing LJ182 CMP Westech 372M 200 174 1997 Warehouse Polishing LV103 Thin Film Wonik IPS Helios 8500 200 Thin film, PV applications LE242 Laboratory Yamato DP32 200 Vacuum Oven · Boards LW117 Tester parts Yokogawa 2005 . Cables - Calibration & tester diagnostic box (TS1000) LW118 Metrology Yokogawa TS1000 1995 - Add'al boards & cables avail. (ref.LW117) LE222 Litho YUASA SR-8075 200 inline Developper LS125 Metrology Zeiss Axiotron 200 Microscope LM126 Metrology Zeiss AXIOSPRINT 200 Warehouse Axiosprint Inspection System LM127 Metrology Zeiss AXIOSPRINT 200 Warehouse Axiosprint Inspection System LM128 Metrology Zeiss AXIOSPRINT 200 Warehouse Axiosprint Inspection System LM163 R&D OEM Thermal Evaporation 200 Warehouse THERMAL EVAPORATION

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