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Fab-Finder W. Size Build Code Module Manufacturer Model (mm) Serial No. Year Status Description / Comments LE240 DCVD Advanced Energy RS94A 200 TiCl4 supply unit LE241 DCVD Advanced Energy RS94A 200 TiCl4 supply unit LV110 Test Advantest Corporation M6751AD 200 EDS LV111 Test Advantest Corporation M6751AD 200 EDS LV112 Test Advantest Corporation M6751AD 200 EDS LV114 Test Advantest Corporation T5382A1 200 EDS LW115 Test Advantest Corporation T5371 2001 Memory type prober - 2 station LV115 Test Advantest Corporation T5585 - 2002 High-Speed Memory Test System LV113 Test Agilent 16702A 200 EDS LF104 Reclaim Akrion 200 Reclaim (Used Tool) LH105 Cleaning AOC Techno Co AOC 200/300 FK11102 2013 In Crates 4 quartz tanks for chemicals - 2 rinse tanks LF108 Thin Film Applied Materials CENTURA 200 Sub-atmosphereTool never ran. Brand TREOS new. BPSG CVD LJ107 Thin Film Applied Materials P5000 200 4666 1996 Warehouse 2 BPSG Chambers LJ108 Thin Film Applied Materials P5000 200 50014 1996 Warehouse 3 USG + 1 Sputter chambers LJ109 Thin Film Applied Materials P5000 200 A0035 1996 Cleanroom 3 USG Chambers LJ110 Thin Film Applied Materials P5000 200 7347 1997 Warehouse 1 ch. MXP+ / 1 MkII LJ111 Thin Film Applied Materials P5000 200 7348 1997 Warehouse 1 ch. MkII LJ112 Thin Film Applied Materials CENTURA 5200 IPS 200 EA58 1999 Warehouse IPS (oxide etch) - Silicon dome missing LV104 Thin Film Applied Materials ULTIMA 5200 200 2006 CVD LV105 Thin Film Applied Materials CENTURA DxZ 200 1997 SMIF CVD LV106 Thin Film Applied Materials ENDURA 5500 200 1995 PVD LV107 Thin Film Applied Materials ENDURA 200 1993 AlCu/ TiN/Ti LT100 CVD Applied Materials P5000 200 1105150 2002 PEOX , 3chamber , DPS+ POLY, CENTURA LV108 Etch Applied Materials I-PH.2 200 1999 POLY ETCH 1997 Centura 1 Body, Flat type, Ph 1, Narrow L/L, HP LT102 Etch Applied Materials SUPER-E (Centura 1) 200 9085 Robot, 3Chamber, ENI OEM-12B 1999 Centura 1 Body, Flat type, Ph 2, Narrow L/L, HP LT103 Etch Applied Materials SUPER-E (Centura 1) 200 EB76 Robot, 3Chamber, ENI OEM-12B LT104 Etch Applied Materials SUPER-E (Centura 1) 200 9957 1998 Centura 1Body. LJ106 Implant Applied Materials PI 9500 200 M123 1993 Cleanroom Implanter Particule Wafer Inspection - PDI / CCD installed LW113 Metrology Applied Materials WF-736XS 200 2001 50 / 60Hz common defaults inspection laser Particule Wafer Inspection - PDI / CCD installed LW114 Metrology Applied Materials WF-736XS 200 2001 50 / 60Hz common defaults inspection laser LE261 DIFF ASM UHV-A600 200 HSG Growth (3 units available) LE274 DCVD ASM EAGLE-10 200 Plasma SiO2 CVD (3 units available) LM150 PHOTO ASML ASML100 200 STEPPER ASM 5500/100 LM151 PHOTO ASML ASML200 200 ASML/200 LV101 Litho ASML PAS5500/300C 200 1997 PHOTO LV100 Litho ASML PAS5500/300C 200 1997 Stepper LT112 PHOTO ASML ASML100 200 3420 1996 LT113 PHOTO ASML ASML250 200 4161 2002 LF111 Bonding ASM- Pacific Tech AB559 200 Wire & Die Bonder LE 200 DCVD Aviza Technology WJ1500TFv1.0 200 Atmosphere TEOS BPSG CVD LM110 Diffusion AVIZA-SPTS AVP8000 200 AVP8000 Oxide Furnace (2 units available) LJ113 Strip AXCELIS Fusion MCU 200 200 MU5J331C 1996 Cleanroom Stripper/Asher - HV module not functional (2 units LJ114 Strip AXCELIS Fusion MCU 200 MU5J3228B 1996 Warehouse each available) LE265 PVD Beckman Coulter DU-650 200 Surface reflection measurement LG110 Metrology BRUCKER Nano defectivity 200/300 120 2003 Discon'ed Not operational, need to change parts LM115 Metrology CAMITEK FALCON 200 200 Thelma inspection camitek LS101 Litho Canon FPA-2500 i2 200 309144 1993 Lithography - stepper (4 units available) LS105 Litho Canon MPA600 super 200 9105131 Lithography - Aligner LT114 Litho Canon ES3 200 1046247 2001 Cymer Laser (good Condition) LE246 ETCH Canon-ANELVA ILD-4100SR & SD II 200 W Dry Etcher (14 units available) LE207 PVD Canon-ANELVA I-1060SV2+1 200 PVD (5 units available LE257 DIFF Canon Marketing Japan HeatPulse8108 200 Std RTA (3 units available) LE258 DIFF Canon Marketing Japan HeatPulse8800 200 Std RTA LW111 Thermal CELTU (Youtec) HPK03Z 2003 4'' PMC3 groups - 600°C Hi Temp substrate LE110 TF Dainippon Screen SP-W813-AS 200 Scrubber for CMP (4 units available) LJ120 Cleaning Dainippon Screen AS 2000 200 57530-5044 1998 Cleanroom Cleaning Equipment LJ121 Cleaning Dainippon Screen AS 2000 200 59530-5230 1998 Cleanroom Cleaning Equipment LJ122 CMP Clean Dainippon Screen SPW813-AS 200 53530-4003 1993 Warehouse Single Wafer Processing (3 units available) LE115 Litho Dainippon Screen SD-W80A-AVQ 200 Polyimide Coater LE116 Litho Dainippon Screen SD-W80A-AVQ 200 Polyimide Developper LE205 Litho Dainippon Screen SC-W80A-AG 200 SOG Coater (2 units available) LE225 ETCH Dainippon Screen DP-W80 A-AV (UV） 200 UV/O3 treatment LE239 WET Dainippon Screen - 200 IPA Recycle unit LE269 CMP Dainippon Screen VM-8200 200 Thickness Measurement (2 units available) LE271 CMP Dainippon Screen VM-2010 200 Thickness Measurement ILU124 Metrology Dainippon Screen VM1210 100~200 2013 Warehouse FILM THICKNESS MEASUREMENT LJ125 CMP EBARA EPO222 200 PTC00706EX 2000 Cleanroom Polishing LV117 Back End ESI M9275 200 1998 Laser Memory Fuser (4 units available) LG111 Grinding EMTEC WBM210 100~200 800 2003 Running 2 load & 2 unload ports. Use Tokyo diamond LJ126 Bake FUSION M200PC 200 2063.96 1995 Cleanroom UVwheels. HARD M200PC February 2016 - Fab-Finder Confidential - Page !1 /!4 LJ127 Fuser GSI M40 200 1139 2003 Cleanroom Fuser LJ128 Bake HERAEUS TUF-50/60-230 200 4970-00 1992 Warehouse Oven LF122 Metrology Hilevel Dragon 200/300 For low-end logic device probing (6 units avail.) LR121 Metrology Hitachi S-4800+EDX 200 9043-06 2008 FE SEM LR122 Metrology Hitachi S-5000 200 - - FE SEM LR125 Metrology Hitachi S-9220 200 9722-05 2000. 04 CD Measure LR126 Metrology Hitachi S-5200 200 0632-04 2005 FE SEM LS106 Metrology Hitachi S-8820S 200 8323-07 1995 Metrology - CD-SEM LS107 Metrology Hitachi S-8840 200 8352-09 1997 Metrology - CD-SEM LT107 Metrology Hitachi S9200SA 200 Apr-18 2000 Working condition LS108 Metrology Hitachi S-9220 200 9724-04 2000 Metrology - CD-SEM (4 units available) LT109 Metrology Hitachi S9360 200 0107-03 2003 LS131 Metrology Hitachi S5200 with EDAX - CD-SEM LS126 Metrology Hitachi S-4500 - CD-SEM LS110 Metrology Hitachi S-6000 200 5333884 1993 Metrology - CD-SEM LR123 Implant Hitachi E-1030 200 0429-001 1996 Ion Sputter LR124 Implant Hitachi E-1045 200 0614-07 2008 Ion Sputter LE250 ETCH Hitachi M-501A 200 AL Dry Etcher (2 units available) LE252 ETCH Hitachi M-602A 200 AL Dry Etcher LE229 PVD JAPAN PIONICS URT-3-S （ SPU-A-3B） 200 Ar Purifier LE230 DIFF JAPAN PIONICS WGC-200B-1-S 200 CLF3 absorb unit (5 units available) LE235 DIFF JAPAN PIONICS JIP-100E-S 200 N2 Purifier (2 units available) LE236 DIFF JAPAN PIONICS MANN-07N-S 200 NH3 Purifier (8 units available) LE237 DIFF JAPAN PIONICS JOP-50E-S 200 O2 Purifier (2 units available) LR118 Litho KE DD-853V H2 Anneal 200 DD3-00028-1 1997 H2 Anneal . Ball bonder - Sheartester LW120 Metrology Keller Technology (KTC) BT-30 - " Bausch & Lomb Lens (Zoom: 0,8x ~ 4,0x) LE233 TF KEYENC GR-3500 200 Data-Logger (3 units available) LV121 Metrology KLA-Tencor 2131 200 1995 Wafer Defect Inspection System LJ137 Metrology KLA Tencor CRS 1010 1010A 092 1996 Cleanroom Wafer Confocal Review Station LJ138 Metrology KLA Tencor CRS 1010 1010A 094 1997 Warehouse Wafer Confocal Review Station LS124 Metrology KLA Tencor P-20H 200 1996 Profiler LJ136 Metrology KLA Tencor eS20 XP 200 ES2XX159 2001 Cleanroom Scanning Electron Beam LE264 PVD KLA-Tencor M-gage300 200 Al Thickness measurement LE266 ETCH KLA-Tencor P-20H 200 Step hight measurement LG115 Metrology KLA Tencor ALERIS HX 200 & 300 200612120018 2005 idle, conn'ted 2 load ports (1 x 300mm & 1x 200mm) LJ130 Metrology KLA Tencor AIT Model 200 0996 8036 1996 Cleanroom PatternModes: WaferBBSE InspectionUV, UVR, Patternsystem Recognition(no UV cap.) LL155 Metrology KLA-Tencor KLA5200 200 In Fab MEASUREMENT (2 units available) LJ131 Metrology KLA Tencor KLA 5200 XP 200 2022 1997 Cleanroom Overlay Measurement System - Has KLAOUT Option. Maintained by KLA LJ132 Metrology KLA Tencor KLA 5200 XP 200 2258 2000 Warehouse Overlay Measurement System - Has KLAOUT LJ134 Metrology KLA Tencor KLA 5200 XP 200 2253 2000 Warehouse OverlayOption. MaintainedMeasurement & disassembled System - Has by KLAOUT KLA LJ135 Metrology KLA Tencor KLA 5200 XP 200 2267 2000 Cleanroom OverlayOption. MaintainedMeasurement & disassembled System - Has by KLAOUT KLA LE117 Metrology KLA-Tencor UV-1250SE 200 ReflectionOption. Maintained rate Measurement by KLA LV122 Metrology KLA-Tencor UV-1280SE 200 2001 Thin Film Measurement System (3 units available) LV125 Metrology KLA-Tencor KLA-2139 200 2000 In-Line Wafer Optical Inspection System LV126 Metrology KLA-Tencor UV-1280SE 200 2001 Thin Film Measurement System LR128 Diffusion Kokusai SEC DD-823V 200 T1DD1-50903-6 1996 H2 Anneal LR129 Diffusion Kokusai SEC DJ-823V-8BL 200 DC1-01024 1996 HTO (5 units available) LR131 Diffusion Kokusai SEC DJ-823V-8BL 200 DC1-01012 1996 NITRIDE LR148 Thin Film Kokusai SEC DD-823V-8BL 200 DD1-15109-4 1995. 05 N2 Anneal LR149 Diffusion Kokusai SEC DD-823V-8BL 200 DD1-50757-2 1995. 06 PYRO LW107 LP-CVD Kokusai SEC DJ-833V 200 1997 LP-CVD - D-Poly LW108 LP-CVD Kokusai SEC DJ-833V 200 1997 LP-CVD - D-Poly LR135 Diffusion Kokusai SEC DJ-853V-8BL 200 DC3-00269-1 1998. 08 Dopped-Poly LR136 Diffusion Kokusai SEC DD-853V-8BL 200 DD3-15267-2 1996 PYRO (TLC). Totaly refurbished LR137 Diffusion Kokusai SEC DJ-853V-8BL 200 1C853G0089 1997. 09 Dopped-Poly LR138 Thin Film Kokusai SEC DJ-853V-8BL 200 DD1-15248-2
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    TOBAM Maximum Diversification Japan JPY 30/12/2019 Instrument Weight COSMO ENERGY HOLDINGS CO LTD 0.05% IDEMITSU KOSAN CO LTD 0.46% INPEX HOLDINGS INC 0.47% JX HOLDINGS INC 0.35% DAICEL CHEMICAL INDUSTRIES 0.07% DOWA HOLDINGS CO LTD 0.05% HITACHI CHEMICAL CO LTD 0.38% HITACHI METALS LTD 0.05% JSR CORP 0.09% KANSAI PAINT CO LTD 0.14% KOBE STEEL LTD 0.05% MITSUBISHI MATERIALS CORP 0.08% NIPPON KAYAKU CO LTD 0.05% NIPPON PAINT CO LTD 0.23% NIPPON PAPER INDUSTRIES CO L 0.24% NIPPON SHOKUBAI CO LTD 0.18% NISSAN CHEMICAL INDUSTRIES 0.12% NITTO DENKO CORP 0.05% OJI PAPER CO LTD 0.13% SHOWA DENKO K K 0.10% SUMITOMO METAL MINING CO LTD 0.20% TAIHEIYO CEMENT CORP 0.05% TAIYO NIPPON SANSO CORP 0.30% TOKAI CARBON CO LTD 0.93% TORAY INDUSTRIES INC 0.26% TOYO SEIKAN KAISHA LTD 0.07% ALL NIPPON AIRWAYS CO LTD 0.27% CENTRAL JAPAN RAILWAY CO 0.02% COMSYS HOLDINGS CORP 0.09% FANUC LTD 0.38% HINO MOTORS LTD 0.07% HOSHIZAKI CORP 1.50% IHI CORP 0.08% ITOCHU CORP 0.16% TOBAM Maximum Diversification Japan JPY 30/12/2019 Instrument Weight JAPAN AIRLINES CO LTD 0.49% JGC HOLDINGS CORP 0.09% JS GROUP CORP 0.85% KEIHAN ELECTRIC RAILWAY CO 0.13% KEIO CORP 0.18% KINTETSU CORP 0.26% KOMATSU LTD 0.07% KYOWA EXEO CORP 0.06% KYUSHU RAILWAY COMPANY 0.13% MAKITA CORP 0.22% MITSUBISHI CORP 0.69% MITSUBISHI HEAVY INDUSTRIES 0.31% NAGOYA RAILROAD CO LTD 0.14% NANKAI ELECTRIC RAILWAY CO 0.08% OBAYASHI CORP 0.13% ODAKYU ELECTRIC RAILWAY CO 0.20% PARK24 CO LTD 1.15% RECRUIT HOLDINGS CO LTD 0.10% SANKYU INC 0.07% SECOM CO LTD 0.06% SEIBU HOLDINGS INC 0.09% SEINO HOLDINGS CO LTD
  • ICC Heritage

    ICC Heritage

    International Color Consortium June 19, 2007 Chiba University William Li Kodak Graphic Communications Group ICC Chair What is the ICC? “Making Color Seamless Between Devices and Documents” • Founded 1993 • Mission: —To create, promote, and encourage the standardization and evolution of an open, vendor-neutral, cross-platform color management system architecture and components. 6/19/2007 International Color Consortium Overview 2 Who is the ICC? • 69 active members, including 4 founding members • Vendors & Users, including companies such as: Adobe Hewlett Packard R.R. Donnelly Agfa Kikuze Solutions Samsung Apple Konica Minolta Seiko EPSON Canon Kyocera Mita Sharp Dainippon Screen Lexmark Sony Kodak Matsushita Sun Chemical Fogra NEC Toppan Printing Fujifilm Nikon Toshiba Fujitsu Onyx Graphics Xerox Heidelberg Quark X-Rite 6/19/2007 International Color Consortium Overview 3 Purpose of ICC • Consortium of companies: — Not just a standards organization, but also a force for promoting color standardization. — Goal: Create, promote and encourage evolution of an open, vendor- neutral, cross-platform colour management system architecture and components. • Published ICC.1:2004-10 profile specification, also available as ISO 15076-1:2005. • ICC v4 implementation — Improved perceptual & colorimetric rendering intent interoperability. — Less ambiguity in specification. — Improved display profiles via chromatic adaptation. 6/19/2007 International Color Consortium Overview 4 ICC Heritage • Several profile-like formats appeared in early 1990s —Kodak (Precision