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Characterization of Iii-Nitride Thin Films

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Characterization of Iii-Nitride Thin Films ABSTRACT PARK, JI-SOO. Growth and Characterization of GaN and AlGaN Thin Films and Heterostructures and the Associated Development and Evaluation of Ultraviolet Light Emitting Diodes. (Under the direction of Professor Robert F. Davis) AlGaN-based thin film heterostructures have been grown and fabricated into ultraviolet light emitting diodes with and without p-type and/or n-type AlGaN carrier- blocking layers at the top and the bottom of the quantum wells, respectively, and having the principal emission at 353 nm. The highest values of this peak intensity and light output power were measured in the devices containing p-type carrier-blocking layers. Growth of an n-type carrier-blocking layer had an adverse effect on these device characteristics. A broad peak centered at ~540nm exhibited yellow luminescence and was present in the spectra acquired from all the devices. This peak is attributed to absorption of the ultraviolet emission by and re-emission from the p-GaN and/or to the luminescence from the AlGaN within quantum wells by current injection. Individual AlxGa1-xN films (x<0≤1) have been grown on Si- and C-terminated 6H-SiC{0001} substrates and characterized for electron emission applications. The large range in the values of x was achieved by changing the fraction of Al in the gas phase from 0 to 0.45. The ionized donor concentration in the n-type, Si-doped AlxGa1-xN films decreased as the mole fraction of Al was increased due to the reduction in the donor energy level and compensation. The use of the SiH4 flow rate, which yields a Si concentration of ~1 x 1019 cm-3 in GaN, established the upper limit of the mole fraction of Al wherein n-type doping could be achieved at ~0.61. The electron affinity of the Si- doped Al0.61Ga0.39N films was as low as 0.1 eV. Increasing the Si doping concentration in AlN films to as high as 1 x 1021cm-3 caused slight degradation in crystal perfection. No difference was found in the Al core level binding energies between undoped and Si- doped AlN films. The results of XPS and UPS experiments showed that the work function of N-polar AlN films was 0.6 eV lower than that of Al-polar films. GROWTH AND CHARACTERIZATION OF GaN AND AlGaN THIN FILMS AND HETEROSTRUCTURES AND THE ASSOCIATED DEVELOPMENT AND EVALUATION OF ULTRAVIOLET LIGHT EMITTING DIODES by JI-SOO PARK A dissertation submitted to the Graduate Faculty of North Carolina State University in partial fulfillment of the requirements for the Degree of Doctor of Philosophy DEPARTMENT OF MATERIALS SCIENCE AND ENGINEERING Raleigh 2005 APPROVED BY: _________________________________ _______________________________ Dr. Robert F. Davis Dr. Robert Nemanich Chair of Advisory Committee _________________________________ _______________________________ Dr. Mark Johnson Dr. John Muth BIOGRAPHY Ji-Soo Park received BS and MS degrees in Materials Science and Engineering from Seoul National University, Seoul, South Korea, in 1994 and 1996, respectively. He conducted research on Si oxidation using N2O for thin gate dielectrics and its electrical characterization for his MS thesis. In 1996, he joined R&D Division of Hynix Semiconductor Inc. (formerly, LG Semicon. Co). During his research career as a process engineering in Hynix, he worked on advanced process development for Logic and DRAM technology, especially low resistivity gate electrode, self-aligned silicide process and thin gate dielectrics. He began his doctoral work in Materials Science and Engineering at North Carolina State University in July of 2001 under the direction of Dr. Robert F. Davis. ii ACKNOWLEDGEMENTS Preserve me, O God, for in You I put my trust. O my soul, you have said to the LORD, "You are my Lord, My goodness is nothing apart from You." As for the saints who are on the earth, "They are the excellent ones, in whom is all my delight." Their sorrows shall be multiplied who hasten after another god; Their drink offerings of blood I will not offer, Nor take up their names on my lips. O LORD, You are the portion of my inheritance and my cup; You maintain my lot. The lines have fallen to me in pleasant places; Yes, I have a good inheritance. I will bless the LORD who has given me counsel; My heart also instructs me in the night seasons. I have set the LORD always before me; Because He is at my right hand I shall not be moved. Therefore my heart is glad, and my glory rejoices; My flesh also will rest in hope. For You will not leave my soul in Sheol, Nor will You allow Your Holy One to see corruption. You will show me the path of life; In Your presence is fullness of joy; At Your right hand are pleasures forevermore. (Psalm 16) I’d like to give all my gratitude to my God, who has provided me everything to make this dissertation possible. iii TABLE OF CONTENTS List of Figures................................................................................................................ vi List of Tables.................................................................................................................. x 1. AlxGa1-xN Thin Films and Ultraviolet Light Emitting Diodes: Introduction and Literature Review ........................................................................................................ 1 Abstract ................................................................................................................... 2 1.1 Introduction........................................................................................................ 4 1.2 AlxGa1-xN Alloys ............................................................................................... 4 1.2.1 MOVPE Growth of AlxGa1-xN Alloys...................................................... 5 1.2.2 Doping of AlxGa1-xN Alloys ..................................................................... 7 1.3 Light Emitting Diodes........................................................................................ 11 1.3.1 InGaN-based Visible Light Emitting Diodes............................................ 11 1.3.2 Al(In)GaN-based Ultraviolet Light Emitting Diodes ............................... 15 1.4 Outline of Dissertation....................................................................................... 19 1.5 Summary............................................................................................................ 20 1.6 References.......................................................................................................... 22 2. Comparison of the Microstructure and Chemistry of GaN(0001) Films grown Using Trimethylgallium and Triethylgallium on AlN/SiC Substrates.................... 40 Abstract ................................................................................................................... 41 2.1 Introduction........................................................................................................ 42 2.2 Experimental ..................................................................................................... 42 2.3 Results and Discussion ...................................................................................... 43 2.4 Conclusions........................................................................................................ 46 2.5 References.......................................................................................................... 47 3. Growth, Doping and characterization of AlxGa1-xN (0< x ≤ 1) Alloys on Si- and C-terminated 6H-SiC{0001} Substrates for Electron Emission Applications........ 53 Abstract ................................................................................................................... 54 3.1 Introduction........................................................................................................ 55 3.2 Experimental Procedures ................................................................................... 56 3.3 Results and Discussion ...................................................................................... 58 3.3.1 AlxGa1-xN Films........................................................................................ 58 3.3.2 AlN Films.................................................................................................. 60 3.4 Summary............................................................................................................ 63 3.5 References.......................................................................................................... 63 iv 4. Growth and Fabrication of AlGaN-based Ultraviolet Light Emitting Diodes on 6H-SiC(0001) Substrates ............................................................................................. 75 Abstract ................................................................................................................... 76 4.1 Introduction........................................................................................................ 77 4.2 Experimental Procedures ................................................................................... 78 4.2.1 Growth of AlxGa1-xN Films ...................................................................... 78 4.2.2 Growth of LED Heterostructures.............................................................. 80 4.2.3 Contacts on P-type GaN Films and N-type SiC Substrates and Design of LED Mask ................................................................................................ 82 4.2.4 Fabrication and Electrical and Optical Characterization of UV LEDs..... 84 4.3 Results and Discussion .....................................................................................
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