Wide Band-Gap Semiconductor Based Power Electronics for Energy Efficiency
Total Page:16
File Type:pdf, Size:1020Kb
Load more
Recommended publications
-
The Gyrotrons As Promising Radiation Sources for Thz Sensing and Imaging
applied sciences Review The Gyrotrons as Promising Radiation Sources for THz Sensing and Imaging Toshitaka Idehara 1,2, Svilen Petrov Sabchevski 1,3,* , Mikhail Glyavin 4 and Seitaro Mitsudo 1 1 Research Center for Development of Far-Infrared Region, University of Fukui, Fukui 910-8507, Japan; idehara@fir.u-fukui.ac.jp or [email protected] (T.I.); mitsudo@fir.u-fukui.ac.jp (S.M.) 2 Gyro Tech Co., Ltd., Fukui 910-8507, Japan 3 Institute of Electronics of the Bulgarian Academy of Science, 1784 Sofia, Bulgaria 4 Institute of Applied Physics, Russian Academy of Sciences, 603950 N. Novgorod, Russia; [email protected] * Correspondence: [email protected] Received: 14 January 2020; Accepted: 28 January 2020; Published: 3 February 2020 Abstract: The gyrotrons are powerful sources of coherent radiation that can operate in both pulsed and CW (continuous wave) regimes. Their recent advancement toward higher frequencies reached the terahertz (THz) region and opened the road to many new applications in the broad fields of high-power terahertz science and technologies. Among them are advanced spectroscopic techniques, most notably NMR-DNP (nuclear magnetic resonance with signal enhancement through dynamic nuclear polarization, ESR (electron spin resonance) spectroscopy, precise spectroscopy for measuring the HFS (hyperfine splitting) of positronium, etc. Other prominent applications include materials processing (e.g., thermal treatment as well as the sintering of advanced ceramics), remote detection of concealed radioactive materials, radars, and biological and medical research, just to name a few. Among prospective and emerging applications that utilize the gyrotrons as radiation sources are imaging and sensing for inspection and control in various technological processes (for example, food production, security, etc). -
Wide Band Gap Materials: Revolution in Automotive Power Electronics
20169052 16mm Wide Band Gap Materials: Revolution in Automotive Power Electronics Luca Bartolomeo 1) Luigi Abbatelli 2) Michele Macauda 2) Filippo Di Giovanni 2) Giuseppe Catalisano 2) Miroslav Ryzek 3) Daniel Kohout 3) 1) STMicroelectronics Japan, Shinagawa INTERCITY Tower A, 2-15-1, Konan, Minato-ku, 108-6017 Tokyo, Japan (E-mail: [email protected]) 2) STMicroelectronics , Italy 3) STMicroelectronics , Czech Republic ④④④ ④④④ Presented at the EVTeC and APE Japan on May 26, 2016 ABSTRACT : The number of Electric and Hybrid vehicles on the roads is increasing year over year. The role of power electronics is of paramount importance to improve their efficiency, keeping lighter and smaller systems. In this paper, the authors will specifically cover the use of Wide Band Gap (WBG) materials in Electric and Hybrid vehicles. It will be shown how SiC MOSFETs bring significant benefits compared to standard IGBTs silicon technology, in both efficiency and form factor. Comparison of the main electrical characteristics, between SiC-based and IGBT module, were simulated and validated by experimental tests in a real automotive environment. KEY WORDS : SiC, Wide Band Gap, IGBT, Power Module 1. INTRODUCTION When considering power transistors in the high voltage range Nowadays, an increased efficiency demand is required in (above 600V), SiC MOSFETs are an excellent alternative to the power electronics applications to have lighter and smaller standard silicon devices: they guarantee lower RON*Area values systems and to improve the range of new Electric (EV) and compared to the latest silicon-based Super-Junction MOSFETs, Hybrid vehicles (HEV). There is an on-going revolution in the especially in high temperature environment (1). -
Towards Direct-Gap Silicon Phases by the Inverse Band Structure Design Approach
Towards Direct-Gap Silicon Phases by the Inverse Band Structure Design Approach H. J. Xiang1,2*, Bing Huang2, Erjun Kan3, Su-Huai Wei2, X. G. Gong1 1 Key Laboratory of Computational Physical Sciences (Ministry of Education), State Key Laboratory of Surface Physics, and Department of Physics, Fudan University, Shanghai 200433, P. R. China 2National Renewable Energy Laboratory, Golden, Colorado 80401, USA 3Department of Applied Physics, Nanjing University of Science and Technology, Nanjing, Jiangsu 210094, People’s Republic of China e-mail: [email protected] Abstract Diamond silicon (Si) is the leading material in current solar cell market. However, diamond Si is an indirect band gap semiconductor with a large energy difference (2.4 eV) between the direct gap and the indirect gap, which makes it an inefficient absorber of light. In this work, we develop a novel inverse-band structure design approach based on the particle swarming optimization algorithm to predict the metastable Si phases with better optical properties than diamond Si. Using our new method, we predict a cubic Si20 phase with quasi- direct gaps of 1.55 eV, which is a promising candidate for making thin-film solar cells. PACS: 71.20.-b,42.79.Ek,78.20.Ci,88.40.jj 1 Due to the high stability, high abundance, and the existence of an excellent compatible oxide (SiO2), Si is the leading material of microelectronic devices. Currently, the majority of solar cells fabricated to date have also been based on diamond Si in monocrystalline or large- grained polycrystalline form [1]. There are mainly two reasons for this: First, Si is the second most abundant element in the earth's crust; Second, the Si based photovoltaics (PV) industry could benefit from the successful Si based microelectronics industry. -
The Husir W-Band Transmitter
THE HUSIR W-BAND TRANSMITTER The HUSIR W-Band Transmitter Michael E. MacDonald, James P. Anderson, Roy K. Lee, David A. Gordon, and G. Neal McGrew The HUSIR transmitter leverages technologies The Haystack Ultrawideband Satellite » Imaging Radar (HUSIR) operates at a developed for diverse applications, such as frequency three times higher than and plasma fusion, space instrumentation, and at a bandwidth twice as wide as those of materials science, and combines them to create any other radar contributing to the U.S. Space Surveil- what is, to our knowledge, the most advanced lance Network. Novel transmitter techniques employed to achieve HUSIR’s 92–100 GHz bandwidth include a millimeter-wave radar transmitter in the world. gallium arsenide amplifier, a first-of-its-kind gyrotron Overall, the design goals of the HUSIR transmitter traveling-wave tube (gyro-TWT), the high-power com- were met in terms of power and bandwidth, and bination of gyro-TWT/klystron hybrids, and overmoded waveguide transmission lines in a multiplexed deep- the images collected by HUSIR have validated space test bed. the performance of the transmitter system regarding phase characteristics. At the time of Transmitter Technology this publication, the transmitter has logged more A radar transmitter is simply a high-power microwave amplifier. Nevertheless, as part of a radar system, it is than 4500 hours of trouble-free operation, second only to the antenna in terms of its cost and com- demonstrating the robustness of its design. plexity [1]. The HUSIR transmitter was developed on two complementary paths. The first, funded by the U.S. Air Force, involved the development of a novel vacuum elec- tron device (VED) or “tube”; the second, funded by the Defense Advanced Research Projects Agency (DARPA), leveraged an existing VED design to implement a novel multiplexed transmitter architecture. -
Small-Signal Amplifier Based on Single-Layer Mos2 Branimir Radisavljevic, Michael B
Small-signal amplifier based on single-layer MoS2 Branimir Radisavljevic, Michael B. Whitwick, and Andras Kis Citation: Appl. Phys. Lett. 101, 043103 (2012); doi: 10.1063/1.4738986 View online: http://dx.doi.org/10.1063/1.4738986 View Table of Contents: http://apl.aip.org/resource/1/APPLAB/v101/i4 Published by the American Institute of Physics. Related Articles Possible origins of a time-resolved frequency shift in Raman plasma amplifiers Phys. Plasmas 19, 073103 (2012) Note: Cryogenic low-noise dc-coupled wideband differential amplifier based on SiGe heterojunction bipolar transistors Rev. Sci. Instrum. 83, 066107 (2012) Mesoscopic resistor as a self-calibrating quantum noise source Appl. Phys. Lett. 100, 203507 (2012) High-power, stable Ka/V dual-band gyrotron traveling-wave tube amplifier Appl. Phys. Lett. 100, 203502 (2012) Microstrip direct current superconducting quantum interference device radio frequency amplifier: Noise data Appl. Phys. Lett. 100, 152601 (2012) Additional information on Appl. Phys. Lett. Journal Homepage: http://apl.aip.org/ Journal Information: http://apl.aip.org/about/about_the_journal Top downloads: http://apl.aip.org/features/most_downloaded Information for Authors: http://apl.aip.org/authors Downloaded 24 Jul 2012 to 128.178.195.24. Redistribution subject to AIP license or copyright; see http://apl.aip.org/about/rights_and_permissions APPLIED PHYSICS LETTERS 101, 043103 (2012) Small-signal amplifier based on single-layer MoS2 Branimir Radisavljevic, Michael B. Whitwick, and Andras Kisa) Electrical Engineering Institute, Ecole Polytechnique Federale de Lausanne (EPFL), CH-1015 Lausanne, Switzerland (Received 16 April 2012; accepted 6 July 2012; published online 23 July 2012) In this letter we demonstrate the operation of an analog small-signal amplifier based on single-layer MoS2, a semiconducting analogue of graphene. -
CSE- Module-3: SEMICONDUCTOR LIGHT EMITTING DIODE :LED (5Lectures)
CSE-Module- 3:LED PHYSICS CSE- Module-3: SEMICONDUCTOR LIGHT EMITTING DIODE :LED (5Lectures) Light Emitting Diodes (LEDs) Light Emitting Diodes (LEDs) are semiconductors p-n junction operating under proper forward biased conditions and are capable of emitting external spontaneous radiations in the visible range (370 nm to 770 nm) or the nearby ultraviolet and infrared regions of the electromagnetic spectrum General Structure LEDs are special diodes that emit light when connected in a circuit. They are frequently used as “pilot light” in electronic appliances in to indicate whether the circuit is closed or not. The structure and circuit symbol is shown in Fig.1. The two wires extending below the LED epoxy enclose or the “bulb” indicate how the LED should be connected into a circuit or not. The negative side of the LED is indicated in two ways (1) by the flat side of the bulb and (2) by the shorter of the two wires extending from the LED. The negative lead should be connected to the negative terminal of a battery. LEDs operate at relative low voltage between 1 and 4 volts, and draw current between 10 and 40 milliamperes. Voltages and Fig.-1 : Structure of LED current substantially above these values can melt a LED chip. The most important part of a light emitting diode (LED) is the semiconductor chip located in the centre of the bulb and is attached to the 1 CSE-Module- 3:LED top of the anvil. The chip has two regions separated by a junction. The p- region is dominated by positive electric charges, and the n-region is dominated by negative electric charges. -
Development of 50-Kv 100-Kw Three-Phase Resonant Converter for 95-Ghz Gyrotron Sung-Roc Jang, Jung-Ho Seo, and Hong-Je Ryoo
6674 IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS, VOL. 63, NO. 11, NOVEMBER 2016 Development of 50-kV 100-kW Three-Phase Resonant Converter for 95-GHz Gyrotron Sung-Roc Jang, Jung-Ho Seo, and Hong-Je Ryoo Abstract—This paper describes the development of a and high power density, the operation of high-power vacuum 50-kV 100-kW cathode power supply (CPS) for the operation devices requires low output voltage ripple with low arc energy. of a 30-kW 95-GHz gyrotron. For stable operation of the gy- This is because the output voltage ripple and the arc energy rotron, the requirements of CPS include low output voltage ripple and low arc energy less than 1% and 10 J, respec- are closely related to the stability of the output power of the tively. Depending on required specifications, a three-phase electron beam and the safety of the device, respectively. It is series-parallel resonant converter (SPRC) is proposed for clear that a higher value of the output filter capacitor allows designing CPS. In addition to high-efficiency performance a lower value of the output voltage ripple. On the other hand, of SPRC, three-phase operation provides the reduction of the energy stored in the power supply output, which may in- the output voltage ripple through a minimized output filter component that is closely related to the arc energy. For al- stantaneously be discharged to vacuum devices because of the lowing symmetrical resonant current from three-phase res- arc, is proportional to the value of the output filter capacitor. In onant inverter, the high-voltage transformers are configured order to achieve low output voltage ripple with low arc energy, as star connection with floated neutral node. -
The Band Gap of Silicon
Norton 0 The Band Gap of Silicon Matthew Norton, Erin Stefanik, Ryan Allured, and Drew Sulski Norton 1 Abstract This experiment was designed to find the band gap of silicon as well as the charge of an electron. A transistor was heated to various temperatures using a hot plate. The resistance was measured over the resistor and transistor in the circuit. In performing this experiment, it was found that the band gap of silicon was (1.10 ± 0.08) eV. In performing this experiment, it was also found that the charge of an electron was (1.77 ± 0.20) × 10 −19 C. Introduction When a substance is placed under the influence of an electric field, it can portray insulating, semi-conducting, semi-metallic, or metallic properties. Every crystalline structure has electrons that occupy energy bands. In a semiconductor, there is a gap in energy between valence band and the bottom of the conduction band. There are no allowed energy states for the electron within the energy gap. At absolute zero, all the electrons have energies within the valence band and the material it is insulating. As the temperature increases electrons gain enough energy to occupy the energy levels in the conduction band. The current through a transistor is given by the equation, qV I= I e kT − 1 0 (1) where I0 is the maximum current for a large reverse bias voltage, q is the charge of the electron, k is the Boltzmann constant, and T is the temperature in Kelvin. As long as V is not too large, the current depends only on the number of minority carriers in the conduction band and the rate at which they diffuse. -
Ampleon Company Presentation
Microwave Journal Educational Webinar Ampleon Brings RF Power Innovations towards Industrial Heating Market Gerrit Huisman Robin Wesson Klaus Werner Nov, 17, 2016 Amplify the future | 1 Ampleon at a Glance Our Company Our Businesses • European Company / Headquarters in • Building transistors and other RF Power products Nijmegen/Netherlands for over 50 years • 1,250 employees globally in 18 sites • Industry Leader for 35 years, addressing • Worldwide Sales, Application and R&D – Mobile Broadband – Broadcast • Own manufacturing facility – Aerospace & Defense • Partnering with leading external manufacturers – ISM – RF Energy Technologies & Products Customers • Broad LDMOSTaco and GaN technology portfolio Reinier Zwemstra Beltman • Comprehensive package line-up • Chief Operations Head of Sales OutstandingOfficer product consistency Amplify the future | 2 Ampleon and RF Energy • Recognized as thought leader • Co-founder of RF Energy Alliance • Working with the leaders in new application domains Amplify the future | 3 RF Power Industrial market dominated by vacuum tubes • Current solutions mainly based on ‘old’ vacuum tube principles • Somewhat fragmented market with large and many small vendors – TWT (Traveling Wave Tubes) – Klystron – Magnetrons – CFA (Crossed Field Amplifiers) – Gyrotrons Amplify the future | 4 2020 TAM VED’s about ~$1B $1.2B in 2014 TAM VEDS Source ABI research TWT 63% Klystron 17% Gyrotron 3% magnetron Cross Field 15% 2% Not included: domestic magnetrons, Aerospace market Amplify the future | 5 Solid state penetrates the -
Radio Frequency Solid State Amplifiers
Published by CERN in the Proceedings of the CAS-CERN Accelerator School: Power Converters, Baden, Switzerland, 7–14 May 2014, edited by R. Bailey, CERN-2015-003 (CERN, Geneva, 2015) Radio Frequency Solid State Amplifiers J. Jacob ESRF, Grenoble, France Abstract Solid state amplifiers are being increasingly used instead of electronic vacuum tubes to feed accelerating cavities with radio frequency power in the 100 kW range. Power is obtained from the combination of hundreds of transistor amplifier modules. This paper summarizes a one hour lecture on solid state amplifiers for accelerator applications. Keywords Radio-frequency; RF power; RF amplifier; solid state amplifier; RF power combiner, cavity combiner. 1 Introduction The aim of this lecture was to introduce some important developments made in the generation of high radio frequency (RF) power by combining the power from hundreds of transistor amplifier modules. Such RF solid state amplifiers (SSA) were developed and implemented at a large scale at SOLEIL to feed the booster and storage ring cavities [1, 2]. At ELBE FEL four 1.3 GHz–10 kW klystrons have been replaced with four pairs of 10 kW SSAs from Bruker Corporation (now Sigmaphi Electronics, Haguenau/France), thereby doubling the available power [3]. The company Cryolectra GmbH (Wuppertal/Germany) delivers SSA solutions at various frequencies and power levels, such as a 72 MHz–150 kW SSA for a medical cyclotron [4]. Following a transfer of technology from SOLEIL, the company ELTA (Blagnac/France), a subsidiary of the French group AREVA, has delivered seven 352.2 MHz–150 kW RF SSAs to ESRF [5, 6]. -
IC Fabrication Technology for Highly Scaled Thz Dhbts
UNIVERSITY of CALIFORNIA Santa Barbara IC Fabrication Technology for Highly Scaled THz DHBTs A Dissertation submitted in partial satisfaction of the requirements for the degree Doctor of Philosophy in Electrical and Computer Engineering by Johann Christian Rode Committee in Charge: Professor Mark J. W. Rodwell, Chair Professor Umesh K. Mishra Professor Christopher Palmstrøm Professor Robert York Doctor Miguel Urteaga March 2015 The Dissertation of Johann Christian Rode is approved. Professor Umesh K. Mishra Professor Christopher Palmstrøm Professor Robert York Doctor Miguel Urteaga Professor Mark J. W. Rodwell, Committee Chair March 2015 IC Fabrication Technology for Highly Scaled THz DHBTs Copyright c 2015 by Johann Christian Rode iii Abstract IC Fabrication Technology for Highly Scaled THz DHBTs by Johann Christian Rode This work examines the efforts pursued to extend the bandwidth of InP-based DHBTs above 1 THz. Epitaxial and lithographic scaling of key device dimensions and reduction of contact resistances have enabled increased RF bandwidths by re- duction of RC and transit delays. A new process for forming base electrodes and base/collector mesas has been developed that exploits superior resolution (10 nm and alignment (sub-30 nm) of electron beam lithography for highly scaled devices. A novel dual-deposition base metalization technique enables fabrication of low resistiv- ity contacts (4 Ω µm2) to ultra-thin base layers (20 nm). The composite metal stack exploits an ultra-thin layer of platinum that controllably reacts with base, yielding low contact resistivity, as well as a thick refractory diffusion barrier which permits stable operation at high current densities and elevated temperatures. Reduction in emitter-base surface leakage and subsequent increase of current gain was achieved by passivating emitter-base semiconductor surfaces with conformally grown ALD Al2O3 . -
The Field-Effect Transistor (FET) in a Field-Effect Transistor, an Applied Voltage Is Used to Change the Conductivity of an Electron Or “Hole” Channel
The Field-Effect Transistor (FET) In a field-effect transistor, an applied voltage is used to change the conductivity of an electron or “hole” channel. To understand the operation of a FET, we first should understand just a little about the chemistry and physics of semiconductor devices. Let us consider, for simplicity, only silicon devices. Some Background (this section is Explore More!...will not be tested) Silicon (Si) is an element of the periodic table that contains 4 electrons in its “outer shell”. Pure silicon can arrange itself in a diamond cubic crystal structure (ref: http://en.wikipedia.org/wiki/Band_gap) where it shares its electrons with other Si atoms. The valance band is nominally full and the conduction band is nominally empty, thus resulting in an insulating material. Within this structure, Si forms an insulating material with a band gap energy of 1.11 electron volts (1.6e-19J, the amount of energy needed to move one electron across a one volt potential) separating the valance band from the conduction band. Figure 1: Electron band gap of an undoped (intrinsic) semiconductor. When doped (or infused) with an element that contains 5 electrons in its outer shell (say, for instance, nitrogen, N), this element will displace one silicon atom. Only using 4 of its 5 outer-shell electrons to form tight bonds with the neighboring Si atoms, nitrogen has one electron that is only loosely bound to the lattice. An electron may be more easily excited into the conduction band (the dopant provides a smaller band gap). With enough dopants (often 1 doping atom per 1 thousand to 1 billion Si atoms) and energy to excite electrons into the conduction band, the material becomes less like an insulator and more like a conductor.