DOCSLIB.ORG

Unit 4 – Bonding and Nomenclature Homework Formulas Practice How Many of Each Type of Atom Are in the Each of the Following Formulas? 1

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text
Unit 4 – Bonding and Nomenclature Homework Formulas Practice How Many of Each Type of Atom Are in the Each of the Following Formulas? 1 Unit 4 – Bonding and Nomenclature Homework Formulas Practice How many of each type of atom are in the each of the following formulas? 1. CH 4O - C-1, H-4, O-1 3. (NH 4)2S – N-2, H-8, S-1 5. Hg 2(NO 3)2 – Hg-2, N-2, O-6 2. Ba(OH) 2 – Ba-1, O-2, H-2 4. NH 4C2H3O2 – N-1, H-7, 6. Mg 3(PO 4)2 – Mg-3, P-2, C-2, O-2 O-8 What is the formula for the neutral ionic compound created with the following atoms or ions? 2+ 7. Ba and Cl – BaCl 2 10. Zn and sulfate - ZnSO 4 13. Al and chlorate – 8. Ca and P – Ca 3P2 11. ammonium and Cl – Al(CLO 3)3 3+ 8+ 9. Fe and O – Fe 2O3 NH 4Cl 14. Os and S – OsS 4 4+ 12. Na and carbonate – 15. Hf and Te – HfTe 2 Na 2CO 3 Ionic Nomenclature Practice Write the name of the compound: Write the formula of the compound: 1. NaBr – sodium bromide 11. Sodium hydrogen carbonate – NaHCO 3 2. MgF 2 – magnesium fluoride 12. Strontium chloride – SrCl 2 3. BaCO 3 – barium carbonate 13. Copper(II) sulfate – CuSO 4 4. Al 2(SO 4)3 – aluminum sulfate 14. Ammonium dichromate – (NH 4)2Cr 2O7 5. ZnCr 2O7 – zinc dichromate 15. Gallium(III) iodide – GaI 3 6. PtCl 4 – platinum(IV) chloride 16. Silver oxide – Ag 2O 7. V2O5 – vanadium(V) oxide 17. Calcium hydroxide – Ca(OH) 2 8. FeS – iron(II) sulfide 18. Rubidium nitride – Rb 3N 9. Zr(SO 3)2 – zirconium(IV) sulfite 19. Lead(II) nitrate – Pb(NO 3)2 10. CaCrO 4 – calcium chromate 20. Chromium(VI) oxide – CrO 3 Covalent Nomenclature Practice Write the name of the compound: Write the formula of the compound: 1. P2O5 – diphosphorus pentoxide 11. Carbon monosulfide - CS 2. NH 3 - ammonia 12. Triphosphorus pentoxide – P3O5 3. PO2 – phosphorus dioxide 13. Dinitrogen monoxide – N2O 4. H2O - water 14. Phosphorus pentachloride – PCl 5 5. CO – carbon monoxide 15. Xenon difluoride – XeF 2 6. CCl 4 – carbon tetrachloride 16. Silicon tetrabromide – SiBr 4 7. HCl – hydrogen chloride 17. Nitrogen dioxide – NO 2 8. P2O3 – diophosphorus trioxide 18. Difluorine monoxide – F2O 9. SF 6 – sulfur hexafluoride 19. Selenium triiodide – SeI 3 10. SO 3 – sulfur trioxide 20. Carbon dioxide – CO 2 Nomenclature Review Write the name of the compound: 16. Ba(IO 3)2 – barium iodate 1. P2O5 – diphosphorus pentoxide 17. GaF 3 – gallium(III) fluoride 2. NH 4Br – ammonium bromide 18. ZnSO 3 – zinc sulfite 3. NH 3 – ammonia 19. CH 4 - methane 4. SnCl 4 – tin(IV) chloride 20. Cu 2Se – copper(I) selenide 5. NO 2 – nitrogen dioxide 6. Cr 2S3 – chromium(III) sulfide 7. Cu(ClO 2)2 – copper(II) chlorite 8. PbO 2 – lead(IV) oxide 9. H2O - water 10. CO – carbon monoxide 11. AgNO 3 – silver nitrate 12. Ca 3(PO 4)2 – calcium phosphate 13. UF 6 – uranium(VI) fluoride 14. Ba(CN) 2 – barium cyanide 15. SF 6 – sulfur hexafluoride Write the formula of the compound 31. Diarsenic pentoxide – As 2O5 21. Sodium hydrogen carbonate – NaHCO 3 32. Carbon dioxide – CO 2 22. Carbon monosulfide - CS 33. Cobalt(II) nitride – Co 3N2 23. Aluminum nitrate – Al(NO 3)3 34. Arsenic(III) fluoride – AsF 3 24. Magnesium sulfate – MgSO 4 35. Lithium phosphate – Li 3PO 4 25. Dinitrogen monoxide – N2O 36. Chromium(IV) perchlorate – Cr(CLO 4)4 26. Barium sulfite - BaSO 3 37. Zinc permanganate – Zn(MnO 4)2 27. Sodium dichromate – Na 2Cr 2O7 38. Rubidium phosphide – Rb 3P 28. Iron(III) iodide – FeI 3 39. Silicon tetrachloride – SiCl 4 29. Phosphorus pentachloride PCl 5 40. Lead(IV) sulfide – PbS 2 30. Iron(II) acetate – Fe(C 2H3O2)2 .
Load more

Recommended publications
  • BGA244 Binary Gas Analyzer User Manual
    BGA244 Binary Gas Analyzer User Manual Revision 1.10 Certification Stanford Research Systems certifies that this product met its published specification at the time of shipment. Warranty This Stanford Research Systems product is warranted against defects in materials and workmanship for a period of one (1) year from the date of shipment. Service For warranty service or repair, this product must be returned to a Stanford Research Systems authorized service facility. Contact Stanford Research Systems or an authorized representative for a RMA (Return Material Authorization) Number before returning this product for repair. These are available at www.thinksrs.com under Support, Repair/Calibration. All users returning a BGA244 back to the factory for repair and/or service must submit a correctly completed “Declaration of Contamination of Equipment” form, available as part of the RMA process. The SRS personnel carrying out repair and service of the BGA244 must be informed of the condition of the components prior to any work being performed. Warning All returns to SRS must be free of harmful, corrosive, radioactive or toxic materials. Dedication In memory of Jim Williams, 1948 - 2011: Legendary Author and Analog Design Guru Information in this document is subject to change without notice. Copyright © Stanford Research Systems, Inc., 2016-2018. All rights reserved. Stanford Research Systems, Inc. 1290-C Reamwood Avenue Sunnyvale, California 94089 Phone: (408) 744-9040 Fax: (408) 744-9049 Email: [email protected] www.thinksrs.com Printed in the
    [Show full text]
  • WO 2013/089962 Al 20 June 2013 (20.06.2013) W P O P C T
    (12) INTERNATIONAL APPLICATION PUBLISHED UNDER THE PATENT COOPERATION TREATY (PCT) (19) World Intellectual Property Organization International Bureau (10) International Publication Number (43) International Publication Date WO 2013/089962 Al 20 June 2013 (20.06.2013) W P O P C T (51) International Patent Classification: (81) Designated States (unless otherwise indicated, for every B01J 31/04 (2006.01) B01J 31/18 (2006.01) kind of national protection available): AE, AG, AL, AM, B01J 31/14 (2006.01) B01J 31/22 (2006.01) AO, AT, AU, AZ, BA, BB, BG, BH, BN, BR, BW, BY, BZ, CA, CH, CL, CN, CO, CR, CU, CZ, DE, DK, DM, (21) Number: International Application DO, DZ, EC, EE, EG, ES, FI, GB, GD, GE, GH, GM, GT, PCT/US20 12/065285 HN, HR, HU, ID, IL, IN, IS, JP, KE, KG, KM, KN, KP, (22) International Filing Date: KR, KZ, LA, LC, LK, LR, LS, LT, LU, LY, MA, MD, 15 November 2012 (15.1 1.2012) ME, MG, MK, MN, MW, MX, MY, MZ, NA, NG, NI, NO, NZ, OM, PA, PE, PG, PH, PL, PT, QA, RO, RS, RU, (25) Filing Language: English RW, SC, SD, SE, SG, SK, SL, SM, ST, SV, SY, TH, TJ, (26) Publication Language: English TM, TN, TR, TT, TZ, UA, UG, US, UZ, VC, VN, ZA, ZM, ZW. (30) Priority Data: 13/323,328 12 December 201 1 (12. 12.201 1) US (84) Designated States (unless otherwise indicated, for every kind of regional protection available): ARIPO (BW, GH, (71) Applicant (for all designated States except US): CHEV¬ GM, KE, LR, LS, MW, MZ, NA, RW, SD, SL, SZ, TZ, RON PHILLIPS CHEMICAL COMPANY LP UG, ZM, ZW), Eurasian (AM, AZ, BY, KG, KZ, RU, TJ, [US/US]; 10001 Six Pines Drive, The Woodlands, Texas TM), European (AL, AT, BE, BG, CH, CY, CZ, DE, DK, 77380 (US).
    [Show full text]
  • Studies on the Use of Supercritical Ammonia for Ceramic Nitride Synthesis and Fabrication
    NASA Technical Memorandum 102570 Studies on the Use of Supercritical Ammonia for Ceramic Nitride Synthesis and Fabrication Linda Cornell and Y.C. Lin Case Western Reserve University Cleveland, Ohio Warren H. Philipp Lewis Research Center Cleveland, Ohio April 1990 (_A5 A- l'M-3 025-rt)) 5T_Jr_i r 3 .JU F, -r_,C C, II-ICAL Am_C_NIA r:_n_ C F¢A,'4 IC NIl_ Ir'__ SYNTH=_I$ A_I_; FAjR_ICATI_N CSCt 0 l_ G3125 STUDIES ON THE USE OF SUPERCRITICAL AMMONIA FOR CERAMIC NITRIDE SYNTHESIS AND FABRICATION Linda Cornell* and Y.C. Lin* Case Western Reserve Unlversity Cleveland, Ohio 44106 and Warren H. Phillpp National Aeronautics and Space Administration Lewis Research Center Cleveland, Ohio 44135 ABSTRACT The extractablIity of ammonium halldes (Including ammonium thiocyanate) formed as byproducts from the synthesis of Si(NH) 2 via ammonolysis of the cor- respondlng sillcon tetrahalldes using supercritical NH 3 as the extraction medium has been investigated. It was found that the NH4SCN byproduct of ammo- noIysls of SI(SCN) 4 can be almost completely extracted with SC ammonia from the insoluble SI(NH) 2 forming a promlslng system for the synthesis of pure Si(NH) 2, one of the best precursors to SI3N 4. In addltion, it was found that Si3N 4, AIN, BN, and Si(NH) 2 are insoluble in SC ammonla. Also discussed are design consideratlons for a supercritical ammonia extraction unit. INTRODUCTION Supercritical flulds (fluids above their crltical temperature and pres- sure) are used as solvents and extraction media because of their near zero sur- face tension and good solvent properties.
    [Show full text]
  • Nitrogen Tribromide Polar Or Nonpolar
    Nitrogen tribromide polar or nonpolar Continue Nitrogen Tribromid Names IUPAC Name Nitrogen Tribromid Identifiers CAS Number 15162-90-0 3D Model (JSmol) Interactive Image ChemSpider 20480821 PubChem CID 3082084 CompTox Dashboard (EPA) DTXSID901648 In22 InChI InChIBrH.N/h3'1H;/p-3 SMILES N(Br)(Br)Br Properties Chemical Formula NBr3 Molar Mass 253.7187 g/mol Appearance Deep-red solid melting point explodes at -100 degrees Celsius, except when otherwise noted, the data is given for materials in their standard state (at 25 degrees Celsius), 100 kPa). Infobox links nitrogen tribromid is a chemical compound with the NBr3 formula. It is extremely explosive in its purest form, even at 100 degrees Celsius, and was not isolated until 1975. It's deep-red and volatile solid. The drug NBr3 was first prepared by the reaction of bistrimetligrilbramamin (bis (trimethylsil)amin bromide) with bromine monochloride (with trimethylylyl chloride as a by-product) at 87 degrees on the following equations: (Me3Si)2NBr2 BrCl → NBr3 and 2 Me3SiCl, Where Me is He instantly reacts with ammonia in a dichloromethane solution at 87 degrees Celsius to give NBrH2. Links - Lide, David R. (1998), Handbook on Chemistry and Physics (87 Ed.), Boca-Raton, Florida: CRC Press, p. 4-73, ISBN 0-8493-0594-2 Greenwood, Norman N.; Earnshaw, Alan (1997). Chemistry of elements (2nd st. Butterworth-Keinmann. page 439. ISBN 978-0-08-037941-8. vteSalts and covalent derivatives of nitrid ion NH3N2H4 He (N2)11 Li3N Be3N2 BN β-C3N4g- C3N4CxNy N2 NxOy NF3 Ne Na3N Mg3 NN2 AlN Si3N4 PNP3N5 SxNySNS4N4 NCl3 Ar K3N Ca3N2 ScN VN CrNCr2N MnxNy FexNy Ni3N CuN n3N2 GaN Ge3N4 as Se NBr3 Kr Rb3 Yn Sr3N2 yn srn NbN β-Mo2N Tc Ru Rh PdN AgN CdN InN Sb Te NI3 Xe Cs3N Ba3N2 Hf3N4 TaN WN Re Os Au Hg3N2 TlN Pb BiN Po At At Rn Fr3N Ra3N2 Rf Db Sg Bh Hs Mt D rg Cn Nh Fl Mc Lv Ts Og s La CeN Pr Nd Pm Sm Eu GdN Tb Dy Er Tm Yb Lu Ac Th Pa UN Np Pu Am Cm Bk Cf Es Fm No Lr Lr Extracted from the Is NBr3 (Nitrogen Tribromid) polar or non-polar? NBr3 (Nitrogen Tribromid) is a polar I'll tell you the polar or nonpolar list below.
    [Show full text]
  • Chapter 7: Search for New Fire Suppressant Chemicals
    Chapter 7: SEARCH FOR NEW FIRE J. Douglas Mather, Ph.D. SUPPRESSANT CHEMICALS Chemical Development Studies, Inc. Robert E. Tapscott, Ph.D. GlobeTech, Inc. TABLE OF CONTENTS 7.1 Fire Suppressant Replacement Knowledge Prior to the NGP .........................................612 7.1.1 Overview of Early Halon Replacement Efforts ....................................................612 7.1.2 Fire Suppressant Research – 1974 Through 1993.................................................613 7.1.3 DoD Technology Development Plan (1993 to 1997)............................................615 7.1.4 Advanced Agent Working Group (AAWG) .........................................................616 7.1.5 Summary: Alternative Agents and Selection Criteria Prior to the NGP ...............622 7.2 The NGP Approach to New Chemicals Screening..........................................................612 7.3 NGP Surveys of Inorganic Chemical Families................................................................612 7.3.1 Main Group Elements - Group I............................................................................626 7.3.2 Main Group Elements - Group II ..........................................................................627 7.3.3 Main Group Elements - Group III.........................................................................627 7.3.4 Main Group Elements - Group IV.........................................................................628 7.3.5 Main Group Elements - Group V..........................................................................634
    [Show full text]
  • Precursors for Synthesis of the First Compounds with Metal-Silicon Triple Bonds
    Novel Molecular Si(II) Precursors for Synthesis of the First Compounds with Metal-Silicon Triple Bonds Dissertation Submitted in fulfillment of the degree doctor rerum naturalium (Dr. rer. nat) of The Faculty of Mathematics and Natural Sciences of The Rheinische Friedrich-Wilhelms-University of Bonn by Dipl.-Chem. Oleg Chernov born in Belgorod, Russia Bonn, April 2012 Angefertigt mit Genehmigung der Mathematisch-Naturwissenschaftlichen Fakultät der Rheinischen Friedrich-Wilhelms-Universität Bonn 1st Examiner: Prof. Dr. A. C. Filippou 2nd Examiner: Prof. Dr. J. Beck 3rd Examiner: Prof. Dr. A. Gansäuer 4th Examiner: Prof. Dr. M. Wagner Date of dissertation defense: 21. September 2012 Publication year: 2012 2 Acknowledgements First, I would like to thank Prof. Dr. Alexander C. Filippou for giving me the opportunity to work in his research group, for his guidance, helpful advices and the thorough evaluation of my thesis including various suggestions for amendments. I am obliged to many of my colleagues, without their help this dissertation would not have been possible: Dr. Gregor Schnakenburg for the X-ray diffraction measurements, quantum chemical calculations and of course for correcting the draft of the disertation. Gabriele Hofer, Katrin Puffler, Kerstin Kühnel-Lysek, Bernhard Beile and Dietmar Kühlmorgen for the synthesis of starting materials and everyday help. Dr. Jürgen Tirée for his great help in organization of the experimental work. All of my students, who contributed to my research: Volker Adam, Martin Speer, Jana Haag, Klaas Remmerssen. Dr. Nils Weidemann for his useful advices and some of precious starting materials. Dr. Sebastian Schwieger for solving some of my X-ray structures The NMR department: Karin Prochnicki, Claus Schmidt, Hannelore Spitz and Dr.
    [Show full text]
  • Reference Number IUPAC Name CAS Number Molecular Formula MW Melting Point EINECS
    Sarchem Laboratories, Inc. 1041 State Highway 36, Atlantic Highlands, NJ 07716 www.sarchemlabs.com Reference Number IUPAC Name CAS Number Molecular Formula MW Melting Point EINECS S1001 4-Acetamidobenzenesulfonyl azide 2158-14-7 C8H8N4O3S 240.24 107-111 ºC S1002 2-Acetamido-2-deoxy-beta-D-glucopyranose-1,3,4,6-tetraacetate 7772-79-4 C16H23NO10 389.35 188 °C S1003 Acetohydroxamic acid 546-88-3 C2H5NO2 75.07 86-90 ºC 208-913-8 S1004 4-Acetoxy-2-azetidinone 28562-53-0 C5H7NO3 129.11 38-40 ºC 249-083-7 S1005 (S)-(-)-2-Acetoxypropionic Acid 6034-46-4 C5H8O4 132.11 S1006 α–Acetylbutyrolactone 517-23-7 C6H8O3 128.13 208-235-2 S1007 4-Acetyl-N-methyl aniline 17687-47-7 C9H11NO 149.19 S1008 2-Acetyl-4-methyl pyridine 59576-26-0 C8H9NO 135.16 30-34 ºC S1009 N-Acetylprocainamide 32795-44-1 (CH3CONH)C6H4CONHCH2CH2N(C2H5)2277.37 S1010 1-Acetylpiperazine 13889-98-0 C6H12N2O 128.17 31-34 ºC 237-659-0 S2129 2-Acetyl-2-thiazoline 29926-41-8 C5H7NOS 129.18 26-30 ºC S1011 1-Adamantamine(1-Aminoadamantane) 768-94-5 C10H17N 151.25 206-208 ºC 212-201-2 S1012 2-Adamantanol 700-57-2 C10H16O 152.23 260-265 ºC 211-846-7 S1013 (R)-Alaninol 35320-23-1 C3H9NO 75.11 S1014 L-(+)Alaninol 2749-11-3 C3H9NO 75.11 220-388-7 S1015 Alizarin, Tech 72-48-0 C14H8O4 240.21 287-289 ºC 200-782-5 S1016 All-trans retinoic acid 302-79-4 C20H28O2 300.44 179-184 ºC 206-129-0 S1017 Alpha-D-Glucose, Anhydrous 492-62-6 C6H12O6 180.15768 156-158 ºC S1018 Alpha-ter-butoxycarbonyl-D-tryptophan (Boc-D-Trp-OH) 5241-64-5 C16H20N2O4 304.34 131-136 ºC 226-042-1 S1019 Aluminium Nitride,Nanopowder,<100Nm 24304-00-5 AlN 40.99 246-140-8 S1020 N-Alpha-Acetylglycinamide 2620-63-5 C4H8N2O2 116.12 220-058-2 S1021 Alpha, Alpha, Alpha-trichlorotoluene 98-07-7 C7H5Cl3 195.47 -7.5 ºC 202-634-5 S1022 Alpha Bromo-O-tolunitrile 22115-41-9 C8H6BrN 196.05 70-74 ºC S1023 Alpha-Fluorocinnamic Acid 350-90-3 C9H7FO2 166.16 S1024 Alpha methyl cinnamic acid 1199-77-5 C10H10O2 162.19 79-81 ºC 214-847-0 .
    [Show full text]
  • Développement De Substrat Compliant À Base De Nanocomposite Graphene –Silicium Poreux Pour L’Hétéroépitaxie
    UNIVERSITÉ DE SHERBROOKE Faculté de génie Département de génie mécanique Développement de substrat compliant à base de nanocomposite graphene –silicium poreux pour l’hétéroépitaxie Thèse de doctorat Spécialité : génie mécanique Abderrahim BOUCHERIF Sherbrooke (Québec) Canada Aout 2018 MEMBRES DU JURY Richard ARÈS Directeur Serge CHARLEBOIS Rapporteur Maxime DARNON Évaluateur Denis MACHON Évaluateur externe "Discipline weighs ounces. Regret weighs tons." Jim Rohn iii RÉSUMÉ Cette thèse évalue le potentiel d’une nouvelle gamme de substrats virtuels compliants à base de matériaux nanocomposites flexible ralliant le graphène et silicium poreux (GPSNC) pour l’hétéroépitaxie des semiconducteurs. En effet, les propriétés mécaniques améliorées du matériau nanocomposite GPSNC permettent au substrat virtuel de se déformer sous l’effet des contraintes mécaniques et d’accommoder les contraintes mécaniques liées au désaccord en paramètre de maille et/ou de coefficient de dilatation thermique lors de la croissance hétéroépitaxiale de semiconducteurs. Dans ces travaux, le substrat virtuel est développé puis évalué pour la croissance de nitrure de Gallium (GaN). La croissance de GaN de base est calibrée sur un nouveau réacteur épitaxial basé sur la technique d’épitaxie à jet chimique munit d’un concept d’injecteur focalisé permettant une utilisation haute efficacité des précurseurs. La mise en œuvre du procédé de carbonisation permet la croissance de graphène sur l’ensemble de la grande surface spécifique du Si poreux et a permis de débloquer un verrou majeur dans la fabrication du substrat virtuel compliant et de l’utilisation du silicium poreux comme substrat pour l’hétéroépitaxie en lui octroyant une stabilité thermique jusqu’à des températures de plus de 1050°C tout en conservant une grande flexibilité.
    [Show full text]
  • N5 Chemistry Unit 1: Chemical Changes & Structure Homework
    N5 Chemistry Unit 1: Chemical Changes & Structure Homework 1.7 1. Which oxide, when shaken with water, 5. The chemical formula for dinitrogen tetroxide is would leave the pH unchanged? A NO A Carbon dioxide B N2O B Calcium oxide C N2O3 C Sulfur dioxide D N2O4. D Zinc oxide Answer ______ Answer ______ 6. The formula for potassium sulfate is 2. An atom has atomic number 23 and mass A P2SO3 number 51. The number of electrons in the B K2SO4 atom is C P2SO4 D K2S. A 23 B 28 Answer ______ C 51 D 74. 7. Which of the following pairs of elements combine to form an ionic compound? Answer ______ A Lead and fluorine 3. The formula for magnesium sulfite is B Sulfur and oxygen C Carbon and nitrogen A MgS D Phosphorus and chlorine B MgSO3 C MgSO4 Answer ______ D MgS2O3. 8. Which of the following compounds exists as Answer ______ diatomic molecules? 4. Which of the following particles contains a A Carbon monoxide different number of electrons from the B Sulfur dioxide others? (Refer to data booklet for help.) C Nitrogen trihydride D Carbon tetrachloride - A Cl 2- B S Answer ______ C Ar + D Na 9. Which of the following numbers is the same for lithium and oxygen? Answer ______ A Mass number B Atomic number C Number of outer electrons D Number of occupied energy levels Answer ______ 9 N5 Chemistry: Unit 1 HW 1.7 10. Glass is made from the chemical silica, SiO2, which is covalently bonded and has a melting point of 1700°C.
    [Show full text]
  • An Introduction to Basic Silicone Chemistry By
    [ 01 ft< 58449 > OU_1 [g ^ CD ^ C/) LI ' Call No. - ~L> Accession No. Author fidCJi*lO. Tak CL^v betew. This book should be re/Urned on or before the date last marked An Introduction to the CHEMISTRY of the SILICONES An Introduction to the CHEMISTRY of the SILICONES By EUGENE G. ROCHOW Research Laboratory, General Electric Company NEW YORK: JOHN WILEY & SONS, INC. LONDON: CHAPMAN & HALL, LIMITED COPYRIGHT, 1946 BY EUGENE G. ROCHOW AU Rights Reserved This book or any part thereof must not be reproduced in any form without the written permission of the publisher. SECOND PRINTING, MARCH, 1947 PRINTED IN THE UNITED STATES OF AMERICA To P. G. F. PREFACE The organic compounds of silicon, which have been the subject of many scholarly researches during the past 80 years, at last show promise of emerging from the laboratory and finding a place in industry. An understanding of the behavior of organosilicon materials is necessary to their intelligent use and, inasmuch as the chemistry of these substances ordinarily is not treated in our textbooks, it is possible that a compact yet comprehensive survey of our present knowledge in this field would be of service to chemists, engineers, and industrial designers. This volume has just such a purpose. The first few chapters review the silanes and their derivatives in some detail, in order to provide an understanding of the fundamental chemistry of the nonsilicate com- pounds of silicon. The later chapters emphasize the silicone polymers which have achieved commercial importance and deal with the methods for their preparation, their chemical and physical properties, and their possible usas.
    [Show full text]
  • Trapping of Organometallic and Organometalloidal Radicals Donald John Peterson Iowa State University
    Iowa State University Capstones, Theses and Retrospective Theses and Dissertations Dissertations 1962 Trapping of organometallic and organometalloidal radicals Donald John Peterson Iowa State University Follow this and additional works at: https://lib.dr.iastate.edu/rtd Part of the Organic Chemistry Commons Recommended Citation Peterson, Donald John, "Trapping of organometallic and organometalloidal radicals " (1962). Retrospective Theses and Dissertations. 2019. https://lib.dr.iastate.edu/rtd/2019 This Dissertation is brought to you for free and open access by the Iowa State University Capstones, Theses and Dissertations at Iowa State University Digital Repository. It has been accepted for inclusion in Retrospective Theses and Dissertations by an authorized administrator of Iowa State University Digital Repository. For more information, please contact [email protected]. This dissertation has been 62-3025 microfilmed exactly as received PETERSON, Donald John, 1935- TRAPPING OF ORGANOMETALLIC AND ORGANOMETALLOIDAL RADICALS. Iowa State University of Science and Technology Ph.D., 1962 Chemistry, organic University Microfilms, Inc., Ann Arbor, Michigan TRAPPING OF ORGANOMETALLIC AND ORGANOMETALLOIDAL RADICALS . "by Donald John Peterson A Dissertation Submitted to the Graduate Faculty in Partial Fulfillment of The Requirements for the Degree of DOCTOR OF PHILOSOPHY. Major Subject: Organic Chemistry Approved: Signature was redacted for privacy. In Charge of Major Work Signature was redacted for privacy. Headof Major Depart nt Signature was
    [Show full text]
  • Table of Contents
    TABLE OF CONTENTS 1. Introduction 1 A. Organization 1 B. Goals 1 C. Key Responsibilities 1 D. Facilities 2 2. Objectives 2 3. General Safety Information 3 A. Lab Protocol 3 B. Recommended Lab Techniques 4 4. Emergency Procedures and Equipment 9 Primary Emergency Procedures 10 Special Procedures for Radioactive Hazards 11 C. Special Procedures for Biological Hazards 11 D. Building Evacuation Procedures 12 E. Emergency Equipment 13 5. Hazard Communication Act 15 A. Requirements 15 B. Material Safety Data Sheets 15 6. Chemical Hazards and Control 19 A. Chemical Categories and Use and Storage 19 Flammables 20 Oxidizers 23 Corrosives 25 Reactives 27 Compressed Gas Cylinders 32 B. Personal Protective Clothing 32 C. Chemical Safety Equipment 35 7. Biological Hazards and Control 39 A. Recommended Laboratory Practices 40 B. Laboratory Equipment 37 C. Personal Protective Clothing 43 D. Waste Disposal 43 E. Bloodborne Pathogens 43 F. Laboratory Animals 44 G. Biosafety Levels 45 Biosafety Level 1 45 Biosafety Level 2 47 Biosafety Level 3 49 H. Emergency Procedures 52 8. Radiation Hazards and Control 54 9. Controlled Substances, Precursor Chemicals and Chemical Laboratory Apparatus 55 A. List of Precursor Items 55 B. Responsibility 56 C. Purchase Orders 56 D. Surplus Property 56 E. Security Procedures Governing Use of Controlled Items 56 F. Site Security 56 G. Operational Security 57 H. Inventory and Reporting of Loss 57 I. Designation of a University Liaison 57 10. Chemical Waste 58 A. Hazardous Wastes 58 B. Regulated Wastes 58 C. Gas Cylinders 58 D. Containers 59 E. Broken Glassware 59 F. PCB Light Ballasts 59 G.
    [Show full text]