Interactive Booklet
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INTERACTIVE BOOKLET TABLE OF CONTENT PROGRAMME OVERVIEW AUTHOR INDEX CONFERENCE MAPS Electron Beam Technology 41ST | MICRO AND NANO ENGINEERING | THE HAGUE New 41ST MICRO AND NANO ENGINEERING Select First-choice Evolutionary Technology Optimized for all direct write applications based on a 155 mm by 155 mm stage, from small piece parts up to full 150 mm substrates 200 nm • 20, 50 and 100 kV PROGRAMME • Pattern generator speeds to 100 MHz • Automated system operation • High resolution at large fi eld size capability • Sub-10 nm lithography (1 mm fi eld size) Visit us at the Raith booth no. 6/7 Automatic 10 holder operation DEDICATED ELECTRON BEAM LITHOGRAPHY THE HAGUE THE NETHERLANDS www.raith.com 21– 24 SEPTEMBER 2015 WWW.MNE2015.ORG Anz EBPG MNE 95x210 Raith 15-08 RZ.indd 1 28.08.15 14:45 MNE2015programmaboekje-Cover in delen.indd 1-2 10-09-15 09:37 Electron Beam Technology 41ST | MICRO AND NANO ENGINEERING | THE HAGUE New 41ST MICRO AND NANO ENGINEERING Select First-choice Evolutionary Technology Optimized for all direct write applications based on a 155 mm by 155 mm stage, from small piece parts up to full 150 mm substrates 200 nm • 20, 50 and 100 kV PROGRAMME • Pattern generator speeds to 100 MHz • Automated system operation • High resolution at large fi eld size capability • Sub-10 nm lithography (1 mm fi eld size) Visit us at the Raith booth no. 6/7 Automatic 10 holder operation DEDICATED ELECTRON BEAM LITHOGRAPHY THE HAGUE THE NETHERLANDS www.raith.com 21– 24 SEPTEMBER 2015 WWW.MNE2015.ORG Anz EBPG MNE 95x210 Raith 15-08 RZ.indd 1 28.08.15 14:45 MNE2015programmaboekje-Cover in delen.indd 1-2 10-09-15 09:37 Silver Sponsors: Gold Sponsors: Micro-nanotech Cluster of Western Switzerland MNE2015programmaboekje-Cover in delen.indd 3-4 10-09-15 09:37 Silver Sponsors: Gold Sponsors: Micro-nanotech Cluster of Western Switzerland MNE2015programmaboekje-Cover in delen.indd 3-4 10-09-15 09:37 ProgrammeProgramme overview overview MNE2015programmaboekje-Cover in delen.indd 5-6 10-09-15 09:37 The 41st International Conference on Micro-and Nano-Engineering MNE2015 World Forum The Hague, The Netherlands September 21-24, 2015 Organising Partners DISCLAIMER: Although care has been taken to ensure the accuracy, completeness and reliability of the information provided in this programme booklet, The MNE2015 organisation assumes no responsibility therefore. 1 Content Content 2 Conference organisation and committees 4 Welcome 8 Information 9 Conference location. 9 Registration hours 9 Conference schedule 9 Sponsors – Exhibitors 9 Internet/Wifi 9 Speaker-Ready Room (Volga1) 9 Posters, best poster competition 10 Special sessions 10 Awards 10 Coffee/Lunch 10 Dinner and social events 10 Micro-& Nano-graph contest 11 Publications 11 MNE2015 on the web – book of abstracts 11 MNE Conference App 11 Oral Programme: clusters and sessions 11 Key to sessions/paper numbers 12 Oral Programme Overview 13 Tuesday Morning 22 September 2015 30 Plenary Session 1 30 A3 - Electron and Ion Beam Lithography 30 B4 - 3D Micro Manufacturing and Micro Printing 32 C1.1 - MEMS/NEMS Sensing 1 34 D5 - System Design and Fabrication 36 Tuesday Afternoon 22 September 2015 38 A5 - Materials for lithography, resists and resist processing 38 B3 -Electron/Ion Beam deposition, related technologies, applications 39 C1.2 - MEMS/NEMS Fabrication and Reliability 41 D6 - Applications 43 Tuesday Poster Session and Exhibition 45 Special Sessions 81 Single Nanometer Manufacturing (SNM) 81 Chemistry for ELectron Induced NAnofabrication (CELINA) 82 Wednesday Morning 23 September 2015 85 Plenary Session 2 85 A6 - Directed Self Assembly 85 A7 - Stencil and Tip Based Patterning 87 B7 - Metrology 89 B8 - Self Aligned Processes 91 C5.1 - Micro and Nano devices for Physical Science - Computing 92 C5.2 - Micro and Nano devices for Physical Science - Nano Tubes and Nano Wires 93 D3 - Organ on a Chip 95 D2 - Lab on Chip 96 Wednesday Afternoon 23 September 2015 99 A1 - Photo Lithography 99 C3 - Meta Materials and their Fabrication 100 C5.3 - Micro and Nano devices for Physical Science - Instrumentation and Imaging 101 D4 - Micro and Nanofluidics for Biology and Life Sciences 102 Plenary Session 3 103 Wednesday Poster Session and Exhibition 104 Thursday Morning 24 September 2015 141 Award Ceremony 141 A4.1 - Soft Lithography 1 141 A9 - Novel Techniques 142 MEE Young Investigator Award Lecture - Late and Hot News Session 144 B1 - Pattern Transfer 144 C1.3 -MEMS/NEMS for Energy Harvesting 146 C1.4 -MEMS/NEMS graphene devices 147 D1.1 - Mechanical Sensing Elements 149 D1.2 - Sensing Systems 150 Thursday Afternoon 24 September 2015 153 A4.2 - Soft Lithography 2 153 B2 - Plasma Etching 154 C2 - Micro and Nano Fluidic Systems 155 D1.3 - Optical Sensing Elements 156 Plenary Session 5 157 List of Authors 159 Micro-Nano-graph contest ballot 189 World Forum ground floor map 191 Sponsors booth list 193 World Forum first floor map 193 3 Conference organisation and committees Conference Chair Kees Hagen, Delft University of Technology Programme Chair Urs Staufer, Delft University of Technology MNE2015 Organizing Committee Frank Dirne, Delft University of Technology Paul Alkemade, Delft University of Technology Remco Wiegerink, University of Twente Luigi Sasso, Delft University of Technology Ageeth Bol, Eindhoven University of Technology Harm Knoops, Oxford Instruments plasma Technology Marko Blom, Micronit Microfluidics B.V. Patrick de Jager, ASML Hans Mulders,FEI Company Lucienne Dado, Ab-Initio, PCO Inge van Marion, Ab-Initio, PCO MNE International Steering Committee Anja Boisen, Technical University of Denmark – Denmark Hubert Brückl, Danube University Krems – Austria Michel Despont, CSEM – Switzerland Zahid Durrani, Imperial College London – United Kingdom Massimo Gentili (Chair), Centre for Materials and Microsystems – Italy Evangelos Gogolides, NCSR Demokritos Athens – Greece Gabi Grützner, micro resist technology GmbH – Germany Jean-Francois de Marneffe, IMEC Leuven – Belgium J. Alexander Liddle, NIST Gaithersburg – USA Shinji Matsui, University of Hyogo – Japan Francesc Pérez-Murano, CNM-CSIC Barcelona – Spain Urs Staufer, Delft University of Technology – Netherlands Christophe Vieu, LAAS-CNRS Toulouse – France MNE International Programme Committee Gabriel Abadal Universitat Autònoma de Barcelona Maan Alkaisi University of Canterbury, NZ Paul Alkemade Delft University of Technology Sternberg Andris University of Latvia Panagiotis Argitis NCSR Demokritos Gonçal Badenes ICFO Joan Bausells CSIC Uwe Behringer UBC Microelectronics Gérard Benassayag CEMES/CNRS Max Planck Institute for Polymer Ruediger Berger Research Iris Bergmair Sony DADC Austria AG Marko Blom Micronit Microfluidics BV Ageeth Bol TU-Eindhoven Martin Brandl Danube University Krems Hubert Brückl EPFL Juergen Brugger Danube University Krems Claus J. Burkhardt NMI Stefano Cabrini Lawrence Berkeley National Laboratory Victor J. Cadarso Paul Scherrer Institut Christophe Cardinaud CNRS Aline Cerf LAAS-CNRS Wen-Huei Chang National Pingtung University Hsuen-Li Chen National Taiwan University Lei Chen NIST Rebecca Cheung University of Edinburgh Jin-Woo Choi Louisiana State University Vieu Christophe University of Toulouse Vassilios Constantoudis National Center for Scientific Research Demokritos Bo Cui University of Waterloo Neil Curson UCL Stefan De Gendt IMEC / KU-Leuven JF de Marneffe IMEC Massimo De Vittorio University of Salento Emiliano Descrovi Politecnico di Torino Panagiotis Dimitrakis NCSR Demokritos Zoran Djuric Institute of Technical Sciences of SASA Klaus Stefan Drese Fraunhofer ICT-IMM Andreas Erdmann Fraunhofer IISB Theodore H. Fedynyshyn MIT Lincoln Laboratory César Fernández-Sánchez CSIC Monika Fleischer University of Tuebingen Kristel Fobelets Imperial College London Hiroshi Fukuda Hitachi High-Technologies Corporation Sebastian Gautsch EPFL Massimo Gentili FBK Annamaria Gerardino CNR Gerald Gerlach TU Dresden Jacques Gierak LPN-CNRS Ioanna Giouroudi Vienna University of Technology Jens Gobrecht Paul Scherrer Institute Evangelos Gogolides NCSR Demokritos Markus Graf Sensirion Brian J. Grenon Grenon Consulting, Inc. Vitaliy Guzenko Paul Scherrer Institute Cornelis W. Hagen Delft University of Technology Peter Hahmann Vistec Electron Beam GmbH Lloyd Harriott University of Virginia Harry Heinzelmann CSEM Laura Heyderman ETH Zurich - Paul Scherrer Institute Bart Hoogenboom University College London Toshiro Itani EUVL Infrastructure Development Center, Inc. Shi Jian Ecole Normale Supérieure de Paris Mervyn Jones Imperial College London Grigoris Kaltsas Technological Educational Institute of Athens Songphol Kanjanachuchai Chulalongkorn University Dieter Kern Tübingen University Gyu Man Kim Kyungpook National University Beomjoon Kim The University of Tokyo Robert Kirchner Paul Scherrer Institut Eugenie Kirk Paul Scherrer Institut Harm Knoops Oxford Instruments Plasma Technology Fu-Hsiang Ko National Chiao Tung Uni Manfred Kohl KIT Richard Koops VSL Dutch Metrology Institute Anders Kristensen Technical University of Denmark Pieter Kruit TUDelft Josiane P. Lafleur University of Copenhagen Laura Lechuga ICN2 JaeJong Lee Korea Institute of Machinery and Materials J. Alexander Liddle NIST Chun-Hung Lin National Cheng Kung University Ran Liu Fudan Universty Andreu Llobera Institut de Microelectronica de Barcelona Hans Loeschner IMS Nanofabrication AG Leandro Lorenzelli Fondazione Bruno Kessler Regina Luttge Eindhoven University of Technology Eleni Makarona NCSR Demokritos Laurent Malaquin LAAS CNRS Adrian Martinez-Rivas Instituto Politécnico Nacional