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Electron Beam Lithography for Nano-Antenna Fabrication

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Electron Beam Lithography for Nano-Antenna Fabrication ELECTRON BEAM LITHOGRAPHY FOR NANO-ANTENNA FABRICATION A Thesis presented to the Faculty of the Graduate School at the University of Missouri-Columbia In Partial Fulfillment of the Requirements for the Degree Master of Science by PARINAZ EMAMI Dr. Patrick J. Pinhero, Thesis Supervisor JULY 2015 1 The undersigned, appointed by the dean of the Graduate School, have examined the thesis entitled ELECTRON BEAM LITHOGRAPHY FOR NANO- ANTENNA FABRICATION Presented by Parinaz Emami a candidate for the degree of Master of Science and here by certify that in their opinion it is worthy of acceptance. Professor Patrick J. Pinhero Professor Matthew Bernards Professor Sheila Baker 2 I want to dedicate my dissertation to my parents, Mehri Hekmatnavaz and Aliakbar Emami because of their endless support, kindness, and encouragements, I will always appreciate all they have done for me and wish someday, I would be able to pay back a small part of their sacrifices. I also dedicate this work to my sisters, Parnian and Parisa who have always encouraged me to believe in myself and truly supported me in all steps of my life. 3 ACKNOWLEDGMENTS First, I would like to sincerely thank my advisor Dr. Patrick Pinhero, for all of his supports, helps, and wonderful ideas, which cause this thesis to be successful. And also I want to thank Dr. Sheila Baker and Dr. Matthew Bernards who accepted to be in my thesis committee. I also want to thank Zach Thacker who helped me a lot during this process with his thoughtful suggestions, and many thanks to Dr. Tommi White and Thomas Lam for their support and helps during my experiments. Also thank to the undergraduate student, Josef Brown who worked hard beside me on the experiments for this project. Thanks to Dr. Pinhero’s research group for providing me with the financial means to complete this project. At last, I want to say an especial thanks to Amin Makarem, because of his unconditional support during this journey; he had my back in all ups and downs. This thesis would not become successful without his guidance and encouragements. ii TABLE OF CONTENTS ACKNOWLEDGMENTS ............................................................................................................... ii LIST OF FIGURES ......................................................................................................................... v ABSTRACT .................................................................................................................................. vii 1 INTRODUCTION .................................................................................................................. 1 1.1 NANOTECHNOLOGY ..................................................................................................................... 1 1.1.1 Historical Background ......................................................................................................... 1 1.1.2 Nanoscience ............................................................................................................................... 1 1.1.3 Nanofabrication ...................................................................................................................... 2 1.1.4 Nanodevices .............................................................................................................................. 3 1.2 PATTERNING METHODS .............................................................................................................. 5 1.2.1 Patterning Based on Using Force .................................................................................... 5 1.2.2 Patterning Based on Work of Adhesion ....................................................................... 5 1.2.3 Writing Patterns ..................................................................................................................... 8 1.3 DIFFERENT LITHOGRAPHY METHODS ...................................................................................... 9 1.3.1 Photolithography .................................................................................................................... 9 1.3.2 Nanosphere Lithography ................................................................................................. 13 1.3.3 X-Ray Lithography .............................................................................................................. 17 1.3.4 Focused Ion Beam (FIB) lithography ......................................................................... 17 2 ELECTRON BEAM LITHOGRAPHY .............................................................................. 19 2.1 TECHNIQUES AND CONCEPTS ................................................................................................... 19 2.2 SOFTWARE AND INSTRUMENTS ............................................................................................... 21 2.2.1 Designing Software ............................................................................................................. 21 2.2.2 E-Beam Patterning Software ......................................................................................... 23 2.2.3 Scanning Electron Microscope (SEM) ........................................................................ 27 2.3 MATERIALS AND STEPS............................................................................................................. 30 2.3.1 Resists ........................................................................................................................................ 30 2.3.2 Metal Deposition .................................................................................................................. 32 iii 2.3.3 Lift-off Process ....................................................................................................................... 33 3 RESULT AND DISCUSSION ............................................................................................ 34 3.1 EXPERIMENT ............................................................................................................................... 34 3.1.1 Sample Preparation ............................................................................................................ 35 3.2 USING PMMA AS A PHOTORESIST .......................................................................................... 35 3.3 USING MMA (8.5) MAA AS A PHOTORESIST ....................................................................... 41 3.4 USING SU-8 AS A PHOTORESIST .............................................................................................. 45 3.5 DIFFERENT DEPOSITION METHODS AND DIFFERENT METALS ......................................... 51 3.5.1 Different Metals .................................................................................................................... 51 3.5.2 Different Deposition Methods ........................................................................................ 53 3.6 LIFT-OFF TIME ........................................................................................................................... 54 3.7 MULTI LAYER PATTERNING ..................................................................................................... 57 4 CONCLUSION AND FUTURE WORKS ......................................................................... 59 4.1 CONCLUSION ............................................................................................................................... 59 4.2 FUTURE WORKS ......................................................................................................................... 60 5 REFERENCES ..................................................................................................................... 61 iv LIST OF FIGURES Figure 1-1 Schematic illustration of the procedure for patterning based on work of adhesion ..................... 7 Figure 1-2 Photolithography Process ................................................................................................................................... 12 Figure 1-3 Nanosphere Lithography..................................................................................................................................... 15 Figure 2-1 DesignCAD Software ............................................................................................................................................. 23 Figure 2-2 NPGS Run file editor .............................................................................................................................................. 24 Figure 2-3 Center-to-center and Line spacing .................................................................................................................. 26 Figure 2-4 SEM Quanta 600 ..................................................................................................................................................... 28 Figure 2-5 Different signal types in SEM ............................................................................................................................. 29 Figure 2-6 Spot size’s relation to probe current in different voltages ..................................................................... 30 Figure 3-1 DesignCAD pattern of nano-antenna ............................................................................................................. 34 Figure 3-2 Exposed antennas with doses 4-20 nC/cm ..................................................................................................
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