Nanolithography Toolbox
NIST Handbook 160 Nanolithography Toolbox Krishna C. Balram, Daron A. Westly, Marcelo Davanco, Karen E. Grutter, Qing Li, Thomas Michels, Christopher H. Ray, Liya Yu, Richard J. Kasica, Christopher B. Wallin, Ian J. Gilbert, Brian A. Bryce, Gregory Simelgor, Juraj Topolancik, Nicolae Lobontiu, Yuxiang Liu, Pavel Neuzil, Vojtech Svatos, Kristen A. Dill, Neal A. Bertrand, Meredith G. Metzler, Gerald Lopez, David A. Czaplewski, Leonidas Ocola, Kartik A. Srinivasan, Samuel M. Stavis, Vladimir A. Aksyuk, J. Alexander Liddle, Slava Krylov, and B. Robert Ilic This publication is available free of charge from: http://dx.doi.org/10.6028/NIST.HB.160 NIST Handbook 160 Nanolithography Toolbox Krishna C. Balram, Daron A. Westly, Marcelo Pavel Neuzil Davanco, Karen E. Grutter, Qing Li, Thomas Brno University of Technology (BUT), Central Michels, Christopher H. Ray, Liya Yu, Richard J. European Institute of Technology (CEITEC), Kasica, Christopher B. Wallin, Ian J. Gilbert, Kristen Technicka 3058/10, CZ-616 00 Brno, Czech Republic A. Dill, Neal A. Bertrand, Kartik A. Srinivasan, Department of Microsystems, Northwestern Samuel M. Stavis, Vladimir A. Aksyuk, J. Alexander Polytechnical University, Xi’an, P.R. China Liddle, Slava Krylov, and B. Robert Ilic Vojtech Svatos Center for Nanoscale Science and Technology Brno University of Technology (BUT), Central Brian A. Bryce European Institute of Technology (CEITEC), Harvey Mudd College, Claremont, CA 91711 USA Technicka 3058/10, CZ-616 00 Brno, Czech Republic Gregory Simelgor, Meredith G. Metzler and Gerald Lopez Edico Genome, La Jolla, CA 92037 USA Quattrone Nanofabrication Facility, University of Pennsylvania, Philadelphia, PA 19104 USA Juraj Topolancik Roche Sequencing Solutions, Pleasanton, CA 94588 David A.
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