Production of HF from H2sif6
Total Page:16
File Type:pdf, Size:1020Kb
Load more
Recommended publications
-
United States Patent (10) Patent No.: US 7,190,052 B2 Lindgren (45) Date of Patent: Mar
US0071900.52B2 (12) United States Patent (10) Patent No.: US 7,190,052 B2 Lindgren (45) Date of Patent: Mar. 13, 2007 (54) SEMICONDUCTOR DEVICES WITH OXIDE 5,516,721 A 5/1996 Galli et al. COATINGS SELECTIVELY POSITONED 5,683,946 A 1 1/1997 Lu et al. OVER EXPOSED FEATURES INCLUDING 5,776,829 A 7/1998 Homma et al. SEMCONDUCTOR MATERAL 6,022,814 A 2/2000 Mikoshiba et al. 6,045,877 A 4/2000 Gleason et al. (75) Inventor: Joseph T. Lindgren, Boise, ID (US) 6,174,8246,130,116 AB1 10/20001/2001 MichaelSmith et etal. al. 6, 197,110 B1 3/2001 Lee et al. (73) Assignee: Micron Technology, Inc., Boise, ID 6,251,753 B1 6/2001 Yeh et al. (US) (*) Notice: Subject to any disclaimer, the term of this (Continued) patent is extended or adjusted under 35 OTHER PUBLICATIONS U.S.C. 154(b) by 0 days. Schreiber, S.J. et al., “Low Temperature Deposition of Microcrystal line Silicon For Thin Film Transistors,' CUED Electronic Devices (21) Appl. No.: 10/454.256 and Materials Group, http://www2.eng.cam.ac.uk/~www-edm/ (22) Filed: Jun. 3, 2003 projects/lowtempdepf1.htm, prior to Sep. 2000, 2 pages. e as (Continued) (65) Prior Publication Data Primary Examiner T. N. Quach US 2004/OO33682 A1 Feb. 19, 2004 (74) Attorney, Agent, or Firm TraskBritt Related U.S. Application Data (57) ABSTRACT (62) Division of application No. 10/218.268, filed on Aug. 13, 2002, now Pat. No. 6,593,221. A semiconductor device structure includes a passivation layer through which only non-silicon-comprising structures (51) Int. -
Hydrofluoric Acid Reduction Project – TURI Grant 2017
Hydrofluoric Acid Reduction Project – TURI Grant 2017 Sponsored by: Toxics Use Reduction Institute 126 John St Lowell, MA 01854 TURI Report 2018-001 Authors: Tyler DeFosse David Demarey Supervisor: Paul Watson Special Thanks to: Joy Onasch – Toxics Use Reduction Institute John Raschko – Massachusetts Office of Technical Assistance and Technology 1 Table of Contents 1.0 Executive Summary .......................................................................................................................... 3 2.0 Background ....................................................................................................................................... 5 2.1 Introduction ......................................................................................................................................... 5 2.2 Literature Searches .......................................................................................................................... 6 2.2.1 Diffusion Dialysis ...................................................................................................................... 6 2.2.2 Reverse Osmosis ....................................................................................................................... 7 2.2.3 Hydrofluoric Acid Wastewater Recycling Method ............................................................... 7 2.2.4 Issues Regarding the Etching of Silicon Dioxide ................................................................. 8 2.3 Alternative Strategies ..................................................................................................................... -
Fluorosilicic Acid CAS No
Product Safety Summary Fluorosilicic Acid CAS No. 16961-83-4 This Product Safety Summary is intended to provide a general overview of the chemical substance. The information in the summary is basic information and is not intended to provide emergency response information, medical information or treatment information. The summary should not be used to provide in-depth safety and health information. In-depth safety and health information can be found in the Safety Data Sheet (SDS) for the chemical substance. Names Fluorosilicic acid (FSA) Hexafluorosilicic acid (HFA or HFS) Sand acid Silicate(2-), hexafluoro- hydrogen (1:2) Silicofluoride Fluosilicic acid Hydroflurosilicic acid Silicofluoric acid Silicon hexafluoride dihydride Silicate(2-), hexafluoro-, dihydrogen Product Overview Solvay Fluorides, LLC does not sell fluorosilicic acid solutions directly to consumers. Most fluorosilicic acid is used in industrial or municipal applications/processes. Concentrated fluorosilicic acid solution (FSA) is used for water fluoridation, as a metal surface treatment and cleaner and for pH adjustment in industrial textile processing or laundries. It can also be used in the processing of hides, for hardening masonry and ceramics and in the manufacture of other chemicals. FSA can only exist as a liquid. There is no solid form. Fluorosilicic acid solutions are corrosive and contact can severely irritate and burn the skin and eyes causing possible permanent eye damage. Breathing concentrated fluorosilicic acid solutions can severely irritate and burn the nose, throat, and lungs, causing nosebleeds, cough, wheezing and shortness of breath. Many of the symptoms described are due to the hydrogen fluoride present as an impurity. Page 1 of 7 Copyright 2010-2013, Solvay America, Inc. -
PRODUCTION of ELECTRONIC GRADE LUNAR SILICON by DISPROPORTIONATION of SILICON DIFLUORIDE, William N
PRODUCTION OF ELECTRONIC GRADE LUNAR SILICON BY DISPROPORTIONATION OF SILICON DIFLUORIDE, William N. Agosto, Lunar Industries, P.O. Box 590004, Houston, TX 77259-0004 Waldron (1) has proposed to extract lunar silicon by sodium reduction of sodium fluorosilicate derived from reacting sodium fluoride with lunar silicon tetrafluoride. Silicon tetrafluoride is obtained by the action of hydrofluoric acid on lunar silicates. While these reactions are well understood, the resulting lunar silicon is not likely to meet electronic specifications of 5 nines purity. Dale and Margrave (2) have shown that silicon difluoride can be obtained by the action of silicon tetrafluoride on elemental silicon at elevated temperatures (1100-1200 C) and low pressures (1-2 torr). The resulting silicon difluoride will then spontaneously disproportionate into hyperpure silicon and silicon tetrafluoride in vacuum at approximately 400 C. On its own merits, silicon difluoride polymerizes into a tough waxy solid in the temperature range from liquid nitrogen to about 100 C. It is the silicon analog of teflon. Silicon difluoride ignites in moist air but is stable under lunar surface conditions and may prove to be a valuable industrial material that is largely lunar derived for lunar surface applications. The most effective driver for lunar industrialization may be the prospects for industrial space solar power systems in orbit or on the moon that are built with lunar materials. Such systems would require large quantities of electronic grade silicon or compound semiconductors for photovoltaics and electronic controls. Since silicon is the most abundant semimetal in the silicate portion of any solar system rock (approximately 20 wt%), lunar silicon production is bound to be an important process in such a solar power project. -
Hexafluorosilicic Acid
Sodium Hexafluorosilicate [CASRN 16893-85-9] and Fluorosilicic Acid [CASRN 16961-83-4] Review of Toxicological Literature October 2001 Sodium Hexafluorosilicate [CASRN 16893-85-9] and Fluorosilicic Acid [CASRN 16961-83-4] Review of Toxicological Literature Prepared for Scott Masten, Ph.D. National Institute of Environmental Health Sciences P.O. Box 12233 Research Triangle Park, North Carolina 27709 Contract No. N01-ES-65402 Submitted by Karen E. Haneke, M.S. (Principal Investigator) Bonnie L. Carson, M.S. (Co-Principal Investigator) Integrated Laboratory Systems P.O. Box 13501 Research Triangle Park, North Carolina 27709 October 2001 Toxicological Summary for Sodium Hexafluorosilicate [16893-85-9] and Fluorosilicic Acid [16961-83-4] 10/01 Executive Summary Nomination Sodium hexafluorosilicate and fluorosilicic acid were nominated for toxicological testing based on their widespread use in water fluoridation and concerns that if they are not completely dissociated to silica and fluoride in water that persons drinking fluoridated water may be exposed to compounds that have not been thoroughly tested for toxicity. Nontoxicological Data Analysis and Physical-Chemical Properties Analytical methods for sodium hexafluorosilicate include the lead chlorofluoride method (for total fluorine) and an ion-specific electrode procedure. The percentage of fluorosilicic acid content for water supply service application can be determined by the specific-gravity method and the hydrogen titration method. The American Water Works Association (AWWA) has specified that fluorosilicic acid contain 20 to 30% active ingredient, a maximum of 1% hydrofluoric acid, a maximum of 200 mg/kg heavy metals (as lead), and no amounts of soluble mineral or organic substance capable of causing health effects. -
United States Patent Office Patented Apr
3,128,297 United States Patent Office Patented Apr. 7, 1964 1. 2 The various operable organo-silicon compounds, operable 3,128,297 catalysts and reaction conditions will now be defined in PROCESS FOR SELICON-HALOGEN BOND more detail. The term "halogen' as used herein includes RED STRIBUTION the elements fluorine, chlorine, bromine and iodine. Bernard Kanner, Tonawanda, and Donald L. Bailey, Sny Monomeric silanes which can be employed as reactants der, N.Y., assignors to Union Carbide Corporation, a in the process of this invention may be represented by corporation of New York No Drawing. Filed Mar. 31, 1961, Ser. No. 99,667 the formula: 20 Claims. (C. 260-448.2) (B) R (Y-R-) six This invention relates to a process for the redistribution 10 wherein R is a divalent hydrocarbon group, the Y group of silicon-halogen chemical bonds. More particularly, is hydrogen, fluoro, chloro, bromo, iodo, cyano, the invention is directed to a process for the redistribution O of silicon-fluorine and other silicon-halogen bonds, pref -COO G, -NG, G -O G, erably silicon-chlorine bonds, in organo-silicon com -V-va, pounds. This application is a continuation-in-part of our 5 or nitro, the R' group is hydrogen, the vinyl group or an copending application Serial No. 15,841, filed March 18, Y-R- group, X is a halogen, G is a monovalent hy 1960, now abandoned. drocarbon group, e is an integer having a value from 0 We have discovered that an efficient and rapid redis to 3, f is an integer having a value from 0 to 1 and the tribution of silicon-fluorine and other silicon-halogen sum of e and f is never greater than 3. -
Silicon Tetrafluoride on Io
Icarus, in press Silicon Tetrafluoride on Io Laura Schaefer and Bruce Fegley, Jr. Planetary Chemistry Laboratory, Department of Earth and Planetary Sciences, Washington University, St. Louis, MO 63130-4899 [email protected] [email protected] ABSTRACT Silicon tetrafluoride (SiF4) is observed in terrestrial volcanic gases and is predicted to be the major F – bearing species in low temperature volcanic gases on Io (Schaefer and Fegley, 2005b). SiF4 gas is also a potential indicator of silica – rich crust on Io. We used F/S ratios in terrestrial and extraterrestrial basalts, and gas/lava enrichment factors for F and S measured at terrestrial volcanoes to calculate equilibrium SiF4/SO2 ratios in volcanic gases on Io. We conclude that SiF4 can be produced at levels comparable to the observed NaCl/SO2 gas ratio. We also considered potential loss processes for SiF4 in volcanic plumes and in Io’s atmosphere including ion-molecule reactions, electron chemistry, photochemistry, reactions with the major atmospheric constituents, and condensation. Photochemical destruction (tchem ~266 days) and/or condensation as Na2SiF6 (s) appear to be the major sinks for SiF4. We recommend searching for SiF4 with infrared spectroscopy using its 9.7 µm band as done on Earth. KEYWORDS: Io, volcanic gases, silicon, fluorine, silicon tetrafluoride, condensates, geochemistry, atmospheric chemistry INTRODUCTION During our previous work on alkali halide chemistry on Io (Schaefer and Fegley, 2005b), we learned that silicon tetrafluoride is observed at several terrestrial volcanoes including Mount Iwodake, Vulcano, Mount Etna, and Popocatépetl (Francis et al., 1996; Love et al., 1998; Mori et al., 2002). Gaseous SiF4 is detected on Earth by observing its 9.7 µm band with infrared (IR) absorption spectroscopy, which is used to measure SiF4/SO2 molar ratios. -
(12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham Et Al
USOO7030260B2 (12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham et al. (45) Date of Patent: Apr. 18, 2006 (54) PREPARATION OF MIXED-HALOGEN Uhlig, W., Synthesis of Functional Substituted Oligosilanes HALO-SILANES Based on Sillyltriflate Derivatives, Organosilicon Chemistry: From Molecules to Materials, Eds. N. Auner, J. Weiss (75) Inventors: Edward Asirvatham, Chatham, NJ Federal Republic of Germany, (1994), pp. 21-26. (US); Jeff Czarnecki, Branchburg, NJ Katzenbeisser, U. Si-Si-Coupling Constants of Bromo (US); Matthew H. Luly, Hamburg, NY and Iododislanes and -trisilanes XSi-H and XSi-Hs. (US); Lawrence F. Mullan, (X= Br, I), Organosilicon Chemistry: From Molecules to Williamsville, NY (US); Alagappan Materials, Eds. N. Auner, J. Weiss, Federal Republic of Then appan, Wilmington, DE (US) Germany, (1994), pp. 37-38. (73) Assignee: Honeywell International Inc., Pátzold, U. Synthesis of Heavily Halogenated Vinylsilanes, Morristown, NJ (US) Organosilicon Chemistry IV: From Molecules to Materials, Eds. N. Auner, J. Weiss, Federal Republic of Germany, *) Notice: Subject to anyy disclaimer, the term of this (1996), pp. 226-228. patent is extended or adjusted under 35 Hassler, K., Köll, W., Synthesis and Spectroscopy of U.S.C. 154(b) by 214 days. Phenylated and Halogenated Trisilanes and Disilanes, Organosilicon Chemistry II: From Molecules to Materials, (21) Appl. No.: 10/377,367 Eds. N. Auner, J. Weiss, Federal Republic of Germany, (1996), pp. 81-88. (22) Filed: Feb. 27, 2003 Hassler, K. Schenzel, K., Syntheses, Si NMR Spectra, and (65) Prior Publication Data Vibrational Spectra of Methylated Trisilanes, Organosilicon Chemistry II: From Molecules to Materials, Eds. N. -
5.157 TABLE 5.29 Van Der Waals' Constants for Gases the Van Der
DEAN #37261 (McGHP) RIGHT INTERACTIVE top of rh PHYSICAL PROPERTIES 5.157 base of rh cap height TABLE 5.29 Van der Waals’ Constants for Gases base of text The van der Waals’ equation of state for a real gas is: na2 ͩͪP ϩ (V Ϫ nb) ϭ nRT for n moles V2 where P is the pressure, V the volume (in liters per mole ϭ 0.001 m3 per mole in the SI system), T the temperature (in degrees Kelvin), n the amount of substance (in moles), and R the gas constant. To use the values of a and b in the table, P must be expressed in the same units as in the gas constant. Thus, the pressure of a standard atmosphere may be expressed in the SI system as follows: 1 atm ϭ 101,325 N · mϪ2 ϭ 101,325 Pa ϭ 1.01325 bar The appropriate value for the gas constant is: 0.083 144 1 L · bar · KϪ1 · molϪ1 or 0.082 056 L · atm · KϪ1 · molϪ1 The van der Waals’ constants are related to the critical temperature and pressure, tc and Pc, in Table 6.5 by: 27 RT22 RT a ϭ ccand b ϭ 64 Pcc8 P Substance a,L2 · bar · molϪ2 b,L·molϪ1 Acetaldehyde 11.37 0.08695 Acetic acid 17.71 0.1065 Acetic anhydride 26.8 0.157 Acetone 16.02 0.1124 Acetonitrile 17.89 0.1169 Acetyl chloride 12.80 0.08979 Acetylene 4.516 0.05218 Acrylic acid 19.45 0.1127 Acrylonitrile 18.37 0.1222 Allene 8.235 0.07467 Allyl alcohol 15.17 0.1036 Aluminum trichloride 42.63 0.2450 2-Aminoethanol 7.616 0.0431 Ammonia 4.225 0.03713 Ammonium chloride 2.380 0.00734 Aniline 29.14 0.1486 Antimony tribromide 42.08 0.1658 Argon 1.355 0.03201 Arsenic trichloride 17.23 0.1039 Arsine 6.327 0.06048 Benzaldehyde 30.30 0.1553 Benzene 18.82 -
Chemifloc Ltd. SAFETY DATA SHEET Fluorosilicic Acid 10.9%
Chemifloc Ltd. SAFETY DATA SHEET Fluorosilicic Acid 10.9% Conforms to Regulation (EC) No. 1907/2006 (REACH), Annex II Section 1: Identification of the substance and of the company/undertaking Identification of the substance or mixture Product Name: Fluorosilicic Acid 10.9% Chemical Name: Hexafluorosilicic acid Registration Number: 01-2119488906-19 Synonyms: Hydrofluorosilicic Acid, Fluosilicic Acid Date of first issue: 17 January 2011 Version number 04 Revision date: 24-03-2016 Supersedes date: 04-03-2016 Relevant identified uses of the substance or mixture and uses advised against: Identified uses Use in the treatment of raw water in the supply of either potable water or industrial process water Uses advised against None Details of the supplier of the safety data sheet Manufacturer: Chemifloc Ltd Smithstown, Shannon, Co. Clare, Rep. of Ireland. Tel: 00353 61 708699 Fax: 00353 61 708698 e-mail: [email protected] Emergency Telephone Number: National Poison Information Centre, 00353 1 8379964 Section 2: Hazards Identification Classification of the substance The substance has been assessed and/or tested for its physical, health and environmental hazards and the following classificatory applies. Classification according to Regulation (EC) no 1272/2008 as amended Health hazards Serious eye damage/eye irritation Category 1B H314 – Causes severe skin burns and eye damage. Hazard summary Physical hazards Not classified for physical hazards. Health hazards Causes burns. Environmental hazards Not classified for hazards to the environment. Specific hazards Not available Main symptoms Not available. Page 1of 8 Label elements Label according to Regulation (EC) No. 1272/2008 as amended Contains: Hexafluorsilicic Acid Signal word Danger Hazard statements H314 - Causes severe skin burns and eye damage. -
Silicon Tetrafluoride Interim AEGL Document
Silicon Tetrafluoride INTERIM: 06-2008 1 2 3 4 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 5 FOR 6 Silicon Tetrafluoride 7 (CAS Reg. No. 7783-61-1) 8 9 Si-F4 10 11 12 13 14 INTERIM 15 16 17 18 19 20 21 22 Silicon Tetrafluoride INTERIM: 06-2008/ Page 2 of 26 1 2 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 3 FOR 4 SILICON TETRAFLUORIDE 5 (CAS Reg. No. 7783-61-1) 6 7 8 INTERIM 9 10 Silicon Tetrafluoride INTERIM: 06-2008/ Page 3 of 26 1 2 PREFACE 3 4 Under the authority of the Federal Advisory Committee Act (FACA) P. L. 92-463 of 5 1972, the National Advisory Committee for Acute Exposure Guideline Levels for Hazardous 6 Substances (NAC/AEGL Committee) has been established to identify, review and interpret 7 relevant toxicologic and other scientific data and develop AEGLs for high priority, acutely toxic 8 chemicals. 9 10 AEGLs represent threshold exposure limits for the general public and are applicable to 11 emergency exposure periods ranging from 10 minutes to 8 hours. Three levels C AEGL-1, 12 AEGL-2 and AEGL-3 C are developed for each of five exposure periods (10 and 30 minutes, 1 13 hour, 4 hours, and 8 hours) and are distinguished by varying degrees of severity of toxic effects. 14 The three AEGLs are defined as follows: 15 16 AEGL-1 is the airborne concentration (expressed as parts per million or milligrams per 17 cubic meter [ppm or mg/m3]) of a substance above which it is predicted that the general 18 population, including susceptible individuals, could experience notable discomfort, irritation, or 19 certain asymptomatic, non-sensory effects. -
4. Chemical and Physical Information
FLUORIDES, HYDROGEN FLUORIDE, AND FLUORINE 187 4. CHEMICAL AND PHYSICAL INFORMATION 4.1 CHEMICAL IDENTITY The common synonyms and other information for fluorine, hydrogen fluoride, sodium fluoride, fluorosilicic acid, and sodium fluorosilicate are listed in Table 4-1. The terms “fluorine” and “fluoride” are often used interchangeably in the literature as generic terms. In this document, we will use “fluoride” as a general term to refer to all combined forms of fluorine unless the particular compound or form is known and there is a reason for referring to it. The term “fluorine gas” will sometimes be used to emphasize the fact that we are referring to the elemental form of fluorine rather than a combined form. In general, the differentiation between different ionic and molecular or gaseous and particulate forms of fluorine-containing substances is uncertain and may also be unnecessary. 4.2 PHYSICAL AND CHEMICAL PROPERTIES Fluorine is the lightest member of Group 17 (VIIA) of the periodic table. This group, the halogens, also includes chloride, bromine, and iodine. As with the other halogens, fluorine occurs as a diatomic molecule, F2, in its elemental form. It has only one stable isotope and its valence in all compounds is -1. Fluorine is the most reactive of all the elements, which may be attributed to its large electronegativity (estimated standard potential +2.85 V). It reacts at room temperature or elevated temperatures with all elements other than nitrogen, oxygen, and the lighter noble gases. Fluorine is also notable for its small size; large numbers of fluorine atoms fit around atoms of another element.