5.157 TABLE 5.29 Van Der Waals' Constants for Gases the Van Der
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Fluorosilicic Acid CAS No
Product Safety Summary Fluorosilicic Acid CAS No. 16961-83-4 This Product Safety Summary is intended to provide a general overview of the chemical substance. The information in the summary is basic information and is not intended to provide emergency response information, medical information or treatment information. The summary should not be used to provide in-depth safety and health information. In-depth safety and health information can be found in the Safety Data Sheet (SDS) for the chemical substance. Names Fluorosilicic acid (FSA) Hexafluorosilicic acid (HFA or HFS) Sand acid Silicate(2-), hexafluoro- hydrogen (1:2) Silicofluoride Fluosilicic acid Hydroflurosilicic acid Silicofluoric acid Silicon hexafluoride dihydride Silicate(2-), hexafluoro-, dihydrogen Product Overview Solvay Fluorides, LLC does not sell fluorosilicic acid solutions directly to consumers. Most fluorosilicic acid is used in industrial or municipal applications/processes. Concentrated fluorosilicic acid solution (FSA) is used for water fluoridation, as a metal surface treatment and cleaner and for pH adjustment in industrial textile processing or laundries. It can also be used in the processing of hides, for hardening masonry and ceramics and in the manufacture of other chemicals. FSA can only exist as a liquid. There is no solid form. Fluorosilicic acid solutions are corrosive and contact can severely irritate and burn the skin and eyes causing possible permanent eye damage. Breathing concentrated fluorosilicic acid solutions can severely irritate and burn the nose, throat, and lungs, causing nosebleeds, cough, wheezing and shortness of breath. Many of the symptoms described are due to the hydrogen fluoride present as an impurity. Page 1 of 7 Copyright 2010-2013, Solvay America, Inc. -
PRODUCTION of ELECTRONIC GRADE LUNAR SILICON by DISPROPORTIONATION of SILICON DIFLUORIDE, William N
PRODUCTION OF ELECTRONIC GRADE LUNAR SILICON BY DISPROPORTIONATION OF SILICON DIFLUORIDE, William N. Agosto, Lunar Industries, P.O. Box 590004, Houston, TX 77259-0004 Waldron (1) has proposed to extract lunar silicon by sodium reduction of sodium fluorosilicate derived from reacting sodium fluoride with lunar silicon tetrafluoride. Silicon tetrafluoride is obtained by the action of hydrofluoric acid on lunar silicates. While these reactions are well understood, the resulting lunar silicon is not likely to meet electronic specifications of 5 nines purity. Dale and Margrave (2) have shown that silicon difluoride can be obtained by the action of silicon tetrafluoride on elemental silicon at elevated temperatures (1100-1200 C) and low pressures (1-2 torr). The resulting silicon difluoride will then spontaneously disproportionate into hyperpure silicon and silicon tetrafluoride in vacuum at approximately 400 C. On its own merits, silicon difluoride polymerizes into a tough waxy solid in the temperature range from liquid nitrogen to about 100 C. It is the silicon analog of teflon. Silicon difluoride ignites in moist air but is stable under lunar surface conditions and may prove to be a valuable industrial material that is largely lunar derived for lunar surface applications. The most effective driver for lunar industrialization may be the prospects for industrial space solar power systems in orbit or on the moon that are built with lunar materials. Such systems would require large quantities of electronic grade silicon or compound semiconductors for photovoltaics and electronic controls. Since silicon is the most abundant semimetal in the silicate portion of any solar system rock (approximately 20 wt%), lunar silicon production is bound to be an important process in such a solar power project. -
Reactions of Some Ammonium Fluorometalates with Xef2
Reactions of Some Ammonium Fluorometalates with XeF2 Jože Slivnik+*, Branko Družina, and Boris Žemva Jozef Stefan Institute and+Faculty for Natural Sciences and Technology, Edvard Kardelj University, Ljubljana, Yugoslavia Dedicated to Prof. Dr. Drs. h. c. Oskar Glemser on the occasion of his 70th birthday Z. Naturforsch. 36b, 1457-1460 (1981); received May 7, 1981 Xenon Difluoride Reactions, Ammonium Fluorometalates, Hydrazinium Fluorometalates The reactions between (NH^TiFe, (NH^ZrFe, (NfL^HfFe, (NELtfeVFe, (NH4)3CrF6, NH4MnF3, (NH4)3FeFe and excess xenon difluoride were investigated. The listed am- monium fluorometalates react with xenon difluoride to form corresponding xenon(II) fluorometalates, monoammonium fluorometalates with metal in the same oxidation state, and ammonium fluorometalates with metal in higher oxidation state, respectively. The reactions between binary fluorides and xenon following new compounds, not accessible by other difluoride or xenon hexafluoride, respectively, yield conventional methods, were isolated and charac- a series of xenon(II) or xenon(VI) fluorometalates. terized: XeFe • FeF3 [3], XeF6 • ZrF4, XeF6 • HfF4 We have investigated these reactions in detail [11], XeF6 • 2 AlFs and XeF6 • GaF3 [12]. This study succeeded to isolate and identify seven xenon(II) is still being continued. and thirteen xenon(VI) fluorometalates [1]. Following the same basic approach we extended Since in some cases the reaction between binary the investigations recently onto reactions between fluoride and xenon hexafluoride did not proceed at xenon difluoride or xenon hexafluoride and am- all under the applied reaction conditions, we monium fluorometalates. supposed that the binary fluoride is not reactive enough and that the reaction might proceed if the Experimental binary fluoride would be available in a more Materials reactive form. -
Problems for Chapter 17
Molecular Modeling Problems Chapter 17 1. Argon Compounds? One of the major advantages of calculation over experiment is that “reality does not get in the way”. It is no harder to investigate the properties of labile compounds that may be difficult to isolate and characterize experimentally than it is to investigate those of stable compounds. In fact, it is possible to say whether experimental characterization can ever be achieved, that is, if the molecule of interest is actually an energy minimum. Noble gas compounds illustrate this. While xenon compounds are now numerous and a few compounds of krypton have now been reported, no argon compounds have been isolated or characterized. Do argon analogues of known xenon and krypton compounds actually exist (in the sense that they represent energy minima)? If so, do they exhibit similar geometries and charge distribution as their analogues? Obtain equilibrium geometries for argon difluoride, krypton difluoride and xenon difluoride using the Hartree-Fock 3-21G model. Start from bent structures even though. KrF2 and XeF2 are known to be linear (and ArF2 might very well be assumed to be linear as well). While the geometry optimization is able to move from a non-linear to a linear structure, it cannot do the reverse. Follow each optimization by an infrared spectrum calculation to tell you whether or not the structure is actually an energy minimum. Are KrF2 and XeF2 linear molecules? Is the calculated Kr-F bond distance in reasonable accord with the experimental value of 1.89Ǻ (the bond distance in XeF2 linear is not known)? Is ArF2 an energy minimum? Is it linear? If ArF2 is an energy minimum, is dissociation to Ar and F2 endothermic or exothermic? Are the corresponding dissociations of KrF2 and XeF2 endothermic or exothermic? Obtain electrostatic potential maps for the three compounds and display side by side on screen (and on the same scale). -
Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides
molecules Review Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides Antonio Frontera Department of Chemistry, Universitat de les Illes Balears, Crta de valldemossa km 7.5, 07122 Palma de Mallorca (Baleares), Spain; [email protected] Academic Editor: Felice Grandinetti Received: 17 July 2020; Accepted: 27 July 2020; Published: 28 July 2020 Abstract: Noble gas (or aerogen) bond (NgB) can be outlined as the attractive interaction between an electron-rich atom or group of atoms and any element of Group-18 acting as an electron acceptor. The IUPAC already recommended systematic nomenclature for the interactions of groups 17 and 16 (halogen and chalcogen bonds, respectively). Investigations dealing with noncovalent interactions involving main group elements (acting as Lewis acids) have rapidly grown in recent years. They are becoming acting players in essential fields such as crystal engineering, supramolecular chemistry, and catalysis. For obvious reasons, the works devoted to the study of noncovalent Ng-bonding interactions are significantly less abundant than halogen, chalcogen, pnictogen, and tetrel bonding. Nevertheless, in this short review, relevant theoretical and experimental investigations on noncovalent interactions involving Xenon are emphasized. Several theoretical works have described the physical nature of NgB and their interplay with other noncovalent interactions, which are discussed herein. Moreover, exploring the Cambridge Structural Database (CSD) and Inorganic Crystal Structure Database (ICSD), it is demonstrated that NgB interactions are crucial in governing the X-ray packing of xenon derivatives. Concretely, special attention is given to xenon fluorides and xenon oxides, since they exhibit a strong tendency to establish NgBs. Keywords: noble gas interactions; noncovalent interactions; crystal packing; xenon 1. -
Chemistry of the Noble Gases*
CHEMISTRY OF THE NOBLE GASES* By Professor K. K. GREE~woon , :.\I.Sc., sc.D .. r".lU.C. University of N ewca.stle 1tpon Tyne The inert gases, or noble gases as they are elements were unsuccessful, and for over now more appropriately called, are a remark 60 years they epitomized chemical inertness. able group of elements. The lightest, helium, Indeed, their electron configuration, s2p6, was recognized in the gases of the sun before became known as 'the stable octet,' and this it was isolated on ea.rth as its name (i]A.tos) fotmed the basis of the fit·st electronic theory implies. The first inert gas was isolated in of valency in 1916. Despite this, many 1895 by Ramsay and Rayleigh; it was named people felt that it should be possible to induce argon (apy6s, inert) and occurs to the extent the inert gases to form compounds, and many of 0·93% in the earth's atmosphere. The of the early experiments directed to this end other gases were all isolated before the turn have recently been reviewed.l of the century and were named neon (v€ov, There were several reasons why chemists new), krypton (KpVn'TOV, hidden), xenon believed that the inert gases might form ~€vov, stmnger) and radon (radioactive chemical compounds under the correct con emanation). Though they occur much less ditions. For example, the ionization poten abundantly than argon they cannot strictly tial of xenon is actually lower than those of be called rare gases; this can be illustrated hydrogen, nitrogen, oxygen, fl uorine and by calculating the volumes occupied a.t s.t.p. -
United States Patent Office Patented Apr
3,128,297 United States Patent Office Patented Apr. 7, 1964 1. 2 The various operable organo-silicon compounds, operable 3,128,297 catalysts and reaction conditions will now be defined in PROCESS FOR SELICON-HALOGEN BOND more detail. The term "halogen' as used herein includes RED STRIBUTION the elements fluorine, chlorine, bromine and iodine. Bernard Kanner, Tonawanda, and Donald L. Bailey, Sny Monomeric silanes which can be employed as reactants der, N.Y., assignors to Union Carbide Corporation, a in the process of this invention may be represented by corporation of New York No Drawing. Filed Mar. 31, 1961, Ser. No. 99,667 the formula: 20 Claims. (C. 260-448.2) (B) R (Y-R-) six This invention relates to a process for the redistribution 10 wherein R is a divalent hydrocarbon group, the Y group of silicon-halogen chemical bonds. More particularly, is hydrogen, fluoro, chloro, bromo, iodo, cyano, the invention is directed to a process for the redistribution O of silicon-fluorine and other silicon-halogen bonds, pref -COO G, -NG, G -O G, erably silicon-chlorine bonds, in organo-silicon com -V-va, pounds. This application is a continuation-in-part of our 5 or nitro, the R' group is hydrogen, the vinyl group or an copending application Serial No. 15,841, filed March 18, Y-R- group, X is a halogen, G is a monovalent hy 1960, now abandoned. drocarbon group, e is an integer having a value from 0 We have discovered that an efficient and rapid redis to 3, f is an integer having a value from 0 to 1 and the tribution of silicon-fluorine and other silicon-halogen sum of e and f is never greater than 3. -
Silicon Tetrafluoride on Io
Icarus, in press Silicon Tetrafluoride on Io Laura Schaefer and Bruce Fegley, Jr. Planetary Chemistry Laboratory, Department of Earth and Planetary Sciences, Washington University, St. Louis, MO 63130-4899 [email protected] [email protected] ABSTRACT Silicon tetrafluoride (SiF4) is observed in terrestrial volcanic gases and is predicted to be the major F – bearing species in low temperature volcanic gases on Io (Schaefer and Fegley, 2005b). SiF4 gas is also a potential indicator of silica – rich crust on Io. We used F/S ratios in terrestrial and extraterrestrial basalts, and gas/lava enrichment factors for F and S measured at terrestrial volcanoes to calculate equilibrium SiF4/SO2 ratios in volcanic gases on Io. We conclude that SiF4 can be produced at levels comparable to the observed NaCl/SO2 gas ratio. We also considered potential loss processes for SiF4 in volcanic plumes and in Io’s atmosphere including ion-molecule reactions, electron chemistry, photochemistry, reactions with the major atmospheric constituents, and condensation. Photochemical destruction (tchem ~266 days) and/or condensation as Na2SiF6 (s) appear to be the major sinks for SiF4. We recommend searching for SiF4 with infrared spectroscopy using its 9.7 µm band as done on Earth. KEYWORDS: Io, volcanic gases, silicon, fluorine, silicon tetrafluoride, condensates, geochemistry, atmospheric chemistry INTRODUCTION During our previous work on alkali halide chemistry on Io (Schaefer and Fegley, 2005b), we learned that silicon tetrafluoride is observed at several terrestrial volcanoes including Mount Iwodake, Vulcano, Mount Etna, and Popocatépetl (Francis et al., 1996; Love et al., 1998; Mori et al., 2002). Gaseous SiF4 is detected on Earth by observing its 9.7 µm band with infrared (IR) absorption spectroscopy, which is used to measure SiF4/SO2 molar ratios. -
(12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham Et Al
USOO7030260B2 (12) United States Patent (10) Patent No.: US 7,030,260 B2 Asirvatham et al. (45) Date of Patent: Apr. 18, 2006 (54) PREPARATION OF MIXED-HALOGEN Uhlig, W., Synthesis of Functional Substituted Oligosilanes HALO-SILANES Based on Sillyltriflate Derivatives, Organosilicon Chemistry: From Molecules to Materials, Eds. N. Auner, J. Weiss (75) Inventors: Edward Asirvatham, Chatham, NJ Federal Republic of Germany, (1994), pp. 21-26. (US); Jeff Czarnecki, Branchburg, NJ Katzenbeisser, U. Si-Si-Coupling Constants of Bromo (US); Matthew H. Luly, Hamburg, NY and Iododislanes and -trisilanes XSi-H and XSi-Hs. (US); Lawrence F. Mullan, (X= Br, I), Organosilicon Chemistry: From Molecules to Williamsville, NY (US); Alagappan Materials, Eds. N. Auner, J. Weiss, Federal Republic of Then appan, Wilmington, DE (US) Germany, (1994), pp. 37-38. (73) Assignee: Honeywell International Inc., Pátzold, U. Synthesis of Heavily Halogenated Vinylsilanes, Morristown, NJ (US) Organosilicon Chemistry IV: From Molecules to Materials, Eds. N. Auner, J. Weiss, Federal Republic of Germany, *) Notice: Subject to anyy disclaimer, the term of this (1996), pp. 226-228. patent is extended or adjusted under 35 Hassler, K., Köll, W., Synthesis and Spectroscopy of U.S.C. 154(b) by 214 days. Phenylated and Halogenated Trisilanes and Disilanes, Organosilicon Chemistry II: From Molecules to Materials, (21) Appl. No.: 10/377,367 Eds. N. Auner, J. Weiss, Federal Republic of Germany, (1996), pp. 81-88. (22) Filed: Feb. 27, 2003 Hassler, K. Schenzel, K., Syntheses, Si NMR Spectra, and (65) Prior Publication Data Vibrational Spectra of Methylated Trisilanes, Organosilicon Chemistry II: From Molecules to Materials, Eds. N. -
(12) United States Patent (10) Patent No.: US 6,596,206 B2 Lee (45) Date of Patent: *Jul
USOO6596206B2 (12) United States Patent (10) Patent No.: US 6,596,206 B2 Lee (45) Date of Patent: *Jul. 22, 2003 (54) GENERATION OF PHARMACEUTICAL FOREIGN PATENT DOCUMENTS AENESSING FOCUSED WO WO OO/37169O542314 6/20007/1998 (75) Inventor: partson-Hui Lee, Mountain View, W W s: 2: OTHER PUBLICATIONS (73) Assignee: Picoliter Inc., Sunnyvale, CA (US) Debenedetti et al. (1993), “Application of Supercritical Fluids for the Production of Sustained Delivery Devices.” (*) Notice: Subject to any disclaimer, the term of this Journal of Controlled Release 24:27–44. patent is extended or adjusted under 35 Tom et al. (1991), “Formation of Bioerodible Polymeric U.S.C. 154(b) by 14 days. Microspheres and Microparticles by Rapid Expansion of Supercritical Solutions,” Biotechnol. Prog. 7(5):403-411. This patent is Subject to a terminal dis- Chattopadhyay et al. (2001), “Production of Griseofulvin claimer. Nanoparticles Using Supercritical CO2 Antisolvent with Enhanced Mass Transfer.” International Journal of Phar (21) Appl. No.: 09/823,899 maceutics 228:19-31. (22) Filed: Mar 30, 2001 Jung et al. (2001), “Particle Design Using Supercritical e a Vs Fluids: Literature and Patent Survey,” Journal of Supercriti (65) Prior Publication Data cal Fluids 20:179-219. Primary Examiner Mary Lynn Theisen US 2002/0142049 A1 Oct. 3, 2002 (74) Attorney, Agent, or Firm-Dianne E. Reed; Reed & (51) Int. Cl." .................................................. B29C 9/00 Eberle LLP (52) U.S. Cl. ....................... 264/9; 264/5; 2647. (57) ABSTRACT (58) Field of Search ......................... 264/9, 7, 5; 425/6, A method and device for generating pharmaceutical agent 425/10 particles using focused acoustic energy are provided. -
Safety Data Sheet Material Name: Autoclean SDS ID: 00231763 (SINGAPORE)
Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) SECTION 1: Identification Product identifier Material Name AutoClean Synonyms XENON DIFLUORIDE; XENON FLUORIDE (XeF2); XENON(II) FLUORIDE (F2Xe); F2Xe Chemical Family fluoride, inorganic Product Use semiconductor manufacture, general synthetic chemical Restrictions on Use None known. Details of the supplier of the safety data sheet Entegris, Inc. 129 Concord Road Building 2 Billerica, MA 01821 USA Telephone Number: +1-952-556-4181 Telephone Number: +1-800-394-4083 (toll free within North America) Supplier Entegris Singapore Pte. Ltd. 30A Kallang Place, #13-01 Singapore 339213 Telephone: +65-6745-2422 Fax: +65-6745-4477 Emergency # 800-101-2201 (CHEMTREC Toll Free in country) +(65)-31581349 (CHEMTREC local in country) 1-703-527-3887 (CHEMTREC International) E-mail: [email protected] SECTION 2: Hazards identification Singapore Standard SS 586-2:2014 Oxidizing Solids - Category 2 Acute Toxicity - Oral - Category 3 Acute Toxicity - Inhalation - Dust/Mist - Category 2 Skin Corrosion/Irritation - Category 1 Serious Eye Damage/Eye Irritation - Category 1 Specific Target Organ Toxicity - Single Exposure - Category 3 ( respiratory system ) Label elements ____________________________________________________________ Page 1 of 11 Issue date: 2020-05-13 Revision 3.3 Print date: 2020-05-13 Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) Hazard symbols Signal word Danger Hazard statements H272 May intensify fire; oxidizer. H330 Fatal if inhaled. H301 Toxic if swallowed. H314 Causes severe skin burns and eye damage. H335 May cause respiratory irritation. Precautionary statements Prevention P210 Keep away from heat. P220 Keep/Store away from clothing/combustible materials. P221 Take any precaution to avoid mixing with combustibles. -
Silicon Tetrafluoride Interim AEGL Document
Silicon Tetrafluoride INTERIM: 06-2008 1 2 3 4 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 5 FOR 6 Silicon Tetrafluoride 7 (CAS Reg. No. 7783-61-1) 8 9 Si-F4 10 11 12 13 14 INTERIM 15 16 17 18 19 20 21 22 Silicon Tetrafluoride INTERIM: 06-2008/ Page 2 of 26 1 2 ACUTE EXPOSURE GUIDELINE LEVELS (AEGLs) 3 FOR 4 SILICON TETRAFLUORIDE 5 (CAS Reg. No. 7783-61-1) 6 7 8 INTERIM 9 10 Silicon Tetrafluoride INTERIM: 06-2008/ Page 3 of 26 1 2 PREFACE 3 4 Under the authority of the Federal Advisory Committee Act (FACA) P. L. 92-463 of 5 1972, the National Advisory Committee for Acute Exposure Guideline Levels for Hazardous 6 Substances (NAC/AEGL Committee) has been established to identify, review and interpret 7 relevant toxicologic and other scientific data and develop AEGLs for high priority, acutely toxic 8 chemicals. 9 10 AEGLs represent threshold exposure limits for the general public and are applicable to 11 emergency exposure periods ranging from 10 minutes to 8 hours. Three levels C AEGL-1, 12 AEGL-2 and AEGL-3 C are developed for each of five exposure periods (10 and 30 minutes, 1 13 hour, 4 hours, and 8 hours) and are distinguished by varying degrees of severity of toxic effects. 14 The three AEGLs are defined as follows: 15 16 AEGL-1 is the airborne concentration (expressed as parts per million or milligrams per 17 cubic meter [ppm or mg/m3]) of a substance above which it is predicted that the general 18 population, including susceptible individuals, could experience notable discomfort, irritation, or 19 certain asymptomatic, non-sensory effects.