Reactions of Some Ammonium Fluorometalates with Xef2
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Nitrogen Trifluoride Hazard Summary Identification
Common Name: NITROGEN TRIFLUORIDE CAS Number: 7783-54-2 RTK Substance number: 1380 DOT Number: UN 2451 Date: March 2001 ------------------------------------------------------------------------- ------------------------------------------------------------------------- HAZARD SUMMARY * Nitrogen Trifluoride can affect you when breathed in. * Exposure to hazardous substances should be routinely * Contact may irritate the skin and eyes. evaluated. This may include collecting personal and area * High levels can interfere with the ability of the blood to air samples. You can obtain copies of sampling results carry Oxygen causing headache, fatigue, dizziness, and a from your employer. You have a legal right to this blue color to the skin and lips (methemoglobinemia). information under OSHA 1910.1020. Higher levels can cause trouble breathing, collapse and * If you think you are experiencing any work-related health even death. problems, see a doctor trained to recognize occupational * Repeated high exposure can cause weakness, muscle diseases. Take this Fact Sheet with you. twitching, seizures and convulsions. * Nitrogen Trifluoride may damage the liver and kidneys. WORKPLACE EXPOSURE LIMITS * Repeated high exposure can cause deposits of Fluorides in OSHA: The legal airborne permissible exposure limit the bones and teeth, a condition called "Fluorosis." This (PEL) is 10 ppm averaged over an 8-hour can cause pain, disability and mottling of the teeth. workshift. * The above health effects do NOT occur at the level of Fluoride used in water for preventing cavities in teeth. NIOSH: The recommended airborne exposure limit is 10 ppm averaged over a 10-hour workshift. IDENTIFICATION Nitrogen Trifluoride is a colorless gas with a moldy odor. It ACGIH: The recommended airborne exposure limit is is used as a Fluorine source in the electronics industry and in 10 ppm averaged over an 8-hour workshift. -
Nitrogen Trifluoride
Nitrogen trifluoride (CAS No: 7783-54-2) Health-based Reassessment of Administrative Occupational Exposure Limits Committee on Updating of Occupational Exposure Limits, a committee of the Health Council of the Netherlands No. 2000/15OSH/125, The Hague, June 8, 2004 Preferred citation: Health Council of the Netherlands: Committee on Updating of Occupational Exposure Limits. Nitrogen trifluoride; Health-based Reassessment of Administrative Occupational Exposure Limits. The Hague: Health Council of the Netherlands, 2004; 2000/15OSH/125. all rights reserved 1 Introduction The present document contains the assessment of the health hazard of nitrogen trifluoride by the Committee on Updating of Occupational Exposure Limits, a committee of the Health Council of the Netherlands. The first draft of this document was prepared by MA Maclaine Pont, M.Sc. (Wageningen University and Research Centre, Wageningen, the Netherlands). In November 1999, literature was searched in the databases Toxline, Medline, and Chemical Abstracts, starting from 1981, 1966, and 1937, respectively, and using the following key words: nitrogen trifluoride, nitrogen fluoride (NF3), and 7783-54-2. In February 2001, the President of the Health Council released a draft of the document for public review. No comments were received. An additional search in Toxline and Medline in January 2004 did not result in information changing the committee’s conclusions. 2Identity name : nitrogen trifluoride synonyms : nitrogen fluoride; trifluoroamine; trifluoroammonia; perfluoroammonia molecular formula : NF3 CAS number : 7783-54-2 3 Physical and chemical properties molecular weight : 71.0 boiling point : -129oC melting point : -208.5oC flash point : - vapour pressure : at 20°C: >100 kPa solubility in water : very slightly soluble log Poctanol/water : -1.60 conversion factors : at 20°C, 101.3 kPa: 1 mg/m3 = 0.34 ppm 1 ppm = 2.96 mg/m3 Data from ACG91, NLM04, http://esc.syrres.com. -
Problems for Chapter 17
Molecular Modeling Problems Chapter 17 1. Argon Compounds? One of the major advantages of calculation over experiment is that “reality does not get in the way”. It is no harder to investigate the properties of labile compounds that may be difficult to isolate and characterize experimentally than it is to investigate those of stable compounds. In fact, it is possible to say whether experimental characterization can ever be achieved, that is, if the molecule of interest is actually an energy minimum. Noble gas compounds illustrate this. While xenon compounds are now numerous and a few compounds of krypton have now been reported, no argon compounds have been isolated or characterized. Do argon analogues of known xenon and krypton compounds actually exist (in the sense that they represent energy minima)? If so, do they exhibit similar geometries and charge distribution as their analogues? Obtain equilibrium geometries for argon difluoride, krypton difluoride and xenon difluoride using the Hartree-Fock 3-21G model. Start from bent structures even though. KrF2 and XeF2 are known to be linear (and ArF2 might very well be assumed to be linear as well). While the geometry optimization is able to move from a non-linear to a linear structure, it cannot do the reverse. Follow each optimization by an infrared spectrum calculation to tell you whether or not the structure is actually an energy minimum. Are KrF2 and XeF2 linear molecules? Is the calculated Kr-F bond distance in reasonable accord with the experimental value of 1.89Ǻ (the bond distance in XeF2 linear is not known)? Is ArF2 an energy minimum? Is it linear? If ArF2 is an energy minimum, is dissociation to Ar and F2 endothermic or exothermic? Are the corresponding dissociations of KrF2 and XeF2 endothermic or exothermic? Obtain electrostatic potential maps for the three compounds and display side by side on screen (and on the same scale). -
Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides
molecules Review Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides Antonio Frontera Department of Chemistry, Universitat de les Illes Balears, Crta de valldemossa km 7.5, 07122 Palma de Mallorca (Baleares), Spain; [email protected] Academic Editor: Felice Grandinetti Received: 17 July 2020; Accepted: 27 July 2020; Published: 28 July 2020 Abstract: Noble gas (or aerogen) bond (NgB) can be outlined as the attractive interaction between an electron-rich atom or group of atoms and any element of Group-18 acting as an electron acceptor. The IUPAC already recommended systematic nomenclature for the interactions of groups 17 and 16 (halogen and chalcogen bonds, respectively). Investigations dealing with noncovalent interactions involving main group elements (acting as Lewis acids) have rapidly grown in recent years. They are becoming acting players in essential fields such as crystal engineering, supramolecular chemistry, and catalysis. For obvious reasons, the works devoted to the study of noncovalent Ng-bonding interactions are significantly less abundant than halogen, chalcogen, pnictogen, and tetrel bonding. Nevertheless, in this short review, relevant theoretical and experimental investigations on noncovalent interactions involving Xenon are emphasized. Several theoretical works have described the physical nature of NgB and their interplay with other noncovalent interactions, which are discussed herein. Moreover, exploring the Cambridge Structural Database (CSD) and Inorganic Crystal Structure Database (ICSD), it is demonstrated that NgB interactions are crucial in governing the X-ray packing of xenon derivatives. Concretely, special attention is given to xenon fluorides and xenon oxides, since they exhibit a strong tendency to establish NgBs. Keywords: noble gas interactions; noncovalent interactions; crystal packing; xenon 1. -
Chemistry of the Noble Gases*
CHEMISTRY OF THE NOBLE GASES* By Professor K. K. GREE~woon , :.\I.Sc., sc.D .. r".lU.C. University of N ewca.stle 1tpon Tyne The inert gases, or noble gases as they are elements were unsuccessful, and for over now more appropriately called, are a remark 60 years they epitomized chemical inertness. able group of elements. The lightest, helium, Indeed, their electron configuration, s2p6, was recognized in the gases of the sun before became known as 'the stable octet,' and this it was isolated on ea.rth as its name (i]A.tos) fotmed the basis of the fit·st electronic theory implies. The first inert gas was isolated in of valency in 1916. Despite this, many 1895 by Ramsay and Rayleigh; it was named people felt that it should be possible to induce argon (apy6s, inert) and occurs to the extent the inert gases to form compounds, and many of 0·93% in the earth's atmosphere. The of the early experiments directed to this end other gases were all isolated before the turn have recently been reviewed.l of the century and were named neon (v€ov, There were several reasons why chemists new), krypton (KpVn'TOV, hidden), xenon believed that the inert gases might form ~€vov, stmnger) and radon (radioactive chemical compounds under the correct con emanation). Though they occur much less ditions. For example, the ionization poten abundantly than argon they cannot strictly tial of xenon is actually lower than those of be called rare gases; this can be illustrated hydrogen, nitrogen, oxygen, fl uorine and by calculating the volumes occupied a.t s.t.p. -
5.157 TABLE 5.29 Van Der Waals' Constants for Gases the Van Der
DEAN #37261 (McGHP) RIGHT INTERACTIVE top of rh PHYSICAL PROPERTIES 5.157 base of rh cap height TABLE 5.29 Van der Waals’ Constants for Gases base of text The van der Waals’ equation of state for a real gas is: na2 ͩͪP ϩ (V Ϫ nb) ϭ nRT for n moles V2 where P is the pressure, V the volume (in liters per mole ϭ 0.001 m3 per mole in the SI system), T the temperature (in degrees Kelvin), n the amount of substance (in moles), and R the gas constant. To use the values of a and b in the table, P must be expressed in the same units as in the gas constant. Thus, the pressure of a standard atmosphere may be expressed in the SI system as follows: 1 atm ϭ 101,325 N · mϪ2 ϭ 101,325 Pa ϭ 1.01325 bar The appropriate value for the gas constant is: 0.083 144 1 L · bar · KϪ1 · molϪ1 or 0.082 056 L · atm · KϪ1 · molϪ1 The van der Waals’ constants are related to the critical temperature and pressure, tc and Pc, in Table 6.5 by: 27 RT22 RT a ϭ ccand b ϭ 64 Pcc8 P Substance a,L2 · bar · molϪ2 b,L·molϪ1 Acetaldehyde 11.37 0.08695 Acetic acid 17.71 0.1065 Acetic anhydride 26.8 0.157 Acetone 16.02 0.1124 Acetonitrile 17.89 0.1169 Acetyl chloride 12.80 0.08979 Acetylene 4.516 0.05218 Acrylic acid 19.45 0.1127 Acrylonitrile 18.37 0.1222 Allene 8.235 0.07467 Allyl alcohol 15.17 0.1036 Aluminum trichloride 42.63 0.2450 2-Aminoethanol 7.616 0.0431 Ammonia 4.225 0.03713 Ammonium chloride 2.380 0.00734 Aniline 29.14 0.1486 Antimony tribromide 42.08 0.1658 Argon 1.355 0.03201 Arsenic trichloride 17.23 0.1039 Arsine 6.327 0.06048 Benzaldehyde 30.30 0.1553 Benzene 18.82 -
The Noble Gases
INTERCHAPTER K The Noble Gases When an electric discharge is passed through a noble gas, light is emitted as electronically excited noble-gas atoms decay to lower energy levels. The tubes contain helium, neon, argon, krypton, and xenon. University Science Books, ©2011. All rights reserved. www.uscibooks.com Title General Chemistry - 4th ed Author McQuarrie/Gallogy Artist George Kelvin Figure # fig. K2 (965) Date 09/02/09 Check if revision Approved K. THE NOBLE GASES K1 2 0 Nitrogen and He Air P Mg(ClO ) NaOH 4 4 2 noble gases 4.002602 1s2 O removal H O removal CO removal 10 0 2 2 2 Ne Figure K.1 A schematic illustration of the removal of O2(g), H2O(g), and CO2(g) from air. First the oxygen is removed by allowing the air to pass over phosphorus, P (s) + 5 O (g) → P O (s). 20.1797 4 2 4 10 2s22p6 The residual air is passed through anhydrous magnesium perchlorate to remove the water vapor, Mg(ClO ) (s) + 6 H O(g) → Mg(ClO ) ∙6 H O(s), and then through sodium hydroxide to remove 18 0 4 2 2 4 2 2 the carbon dioxide, NaOH(s) + CO2(g) → NaHCO3(s). The gas that remains is primarily nitrogen Ar with about 1% noble gases. 39.948 3s23p6 36 0 The Group 18 elements—helium, K-1. The Noble Gases Were Kr neon, argon, krypton, xenon, and Not Discovered until 1893 83.798 radon—are called the noble gases 2 6 4s 4p and are noteworthy for their rela- In 1893, the English physicist Lord Rayleigh noticed 54 0 tive lack of chemical reactivity. -
Safety Data Sheet Nitrogen Trifluoride
Safety Data Sheet Nitrogen Trifluoride Section 1: Product and Company Identification Middlesex Gases & Technologies 292 Second Street P.O. Box 490249 Everett, MA 02149 (617) 387-5050 (800) 649-6704 Fax (617) 387-3537 http://www.middlesexgases.com/ Product Code: Nitrogen Trifluoride Section 2: Hazards Identification Warning Hazard Classification: Gases Under Pressure Hazard Statements: Contains gas under pressure; may explode if heated Precautionary Statements Storage: Protect from sunlight. Store in well-ventilated place. Section 3: Composition/Information on Ingredients CAS # 7783-54-2 Middlesex Gases & Technologies page 1 of 4 Generated by the SDS Manager from AsteRisk, LLC. All Rights Reserved Generated: 06/01/2015 Chemical Chemical Trade Names Substance Family Nitrogen Trifluoride inorganic halide Nitrogen fluoride, trifluoroamine, trifluoroammonia, Perfluoroammonia; NF3; UN 2451; N,N,N- Trifluoroamine Section 4: First Aid Measures Skin Contact Eye Contact Ingestion Inhalation Note to Physicians Flush skin with plenty of water for 15 Flush eyes with plenty of Not likely Remove victim to fresh air. Provide Consider minutes. Remove contaminated clothing water for 15 minutes. Get route of artificial respiration if breathing is oxygen. and shoes, wash before reuse. Get medical attention exposure. difficult. Consider oxygen. Contact medical attention immediately. immediately. medical personnel immediately. Section 5: Fire Fighting Measures Suitable Extinguishing Media Products of Protection of Firefighters Combustion Non-flammable. Use extinguishing media suitable for Non-flammable § Wear self-contained breathing apparatus. surrounding fire. Section 6: Accidental Release Measures Personal Precautions Environmental Precautions Methods for Containment Isolate area. Contact emergency personnel. Eliminate ignition Avoid contact with soil, waterways, drains Shut off flow if possible sources if it is safe to do so. -
Safety Data Sheet Material Name: Autoclean SDS ID: 00231763 (SINGAPORE)
Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) SECTION 1: Identification Product identifier Material Name AutoClean Synonyms XENON DIFLUORIDE; XENON FLUORIDE (XeF2); XENON(II) FLUORIDE (F2Xe); F2Xe Chemical Family fluoride, inorganic Product Use semiconductor manufacture, general synthetic chemical Restrictions on Use None known. Details of the supplier of the safety data sheet Entegris, Inc. 129 Concord Road Building 2 Billerica, MA 01821 USA Telephone Number: +1-952-556-4181 Telephone Number: +1-800-394-4083 (toll free within North America) Supplier Entegris Singapore Pte. Ltd. 30A Kallang Place, #13-01 Singapore 339213 Telephone: +65-6745-2422 Fax: +65-6745-4477 Emergency # 800-101-2201 (CHEMTREC Toll Free in country) +(65)-31581349 (CHEMTREC local in country) 1-703-527-3887 (CHEMTREC International) E-mail: [email protected] SECTION 2: Hazards identification Singapore Standard SS 586-2:2014 Oxidizing Solids - Category 2 Acute Toxicity - Oral - Category 3 Acute Toxicity - Inhalation - Dust/Mist - Category 2 Skin Corrosion/Irritation - Category 1 Serious Eye Damage/Eye Irritation - Category 1 Specific Target Organ Toxicity - Single Exposure - Category 3 ( respiratory system ) Label elements ____________________________________________________________ Page 1 of 11 Issue date: 2020-05-13 Revision 3.3 Print date: 2020-05-13 Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) Hazard symbols Signal word Danger Hazard statements H272 May intensify fire; oxidizer. H330 Fatal if inhaled. H301 Toxic if swallowed. H314 Causes severe skin burns and eye damage. H335 May cause respiratory irritation. Precautionary statements Prevention P210 Keep away from heat. P220 Keep/Store away from clothing/combustible materials. P221 Take any precaution to avoid mixing with combustibles. -
Lawrence Berkeley National Laboratory Recent Work
Lawrence Berkeley National Laboratory Recent Work Title TAUTOMERISM IN XENON HEXAFLUORIDE: AN INVESTIGATION OF XENON HEXAFLUORIDE AND ITS COMPLEXES BY RAMAN SPECTROSCOPY Permalink https://escholarship.org/uc/item/4t37825s Authors Adams, Chris J. Bartlett, Neil. Publication Date 1977-12-01 eScholarship.org Powered by the California Digital Library University of California · Submitted to Israel Journal of Chemistry (In Press) LBL-3136 }- Preprint .. · U!:-'::: i!\1-lY A"'l.J i.JOCUl·tiZ.l'-:.TS £2CTION TAUI'OMERI~ IN XENON HEXAFLUORIDE: AN INVESTIGATION OF XENON HEXAFLUORIDE AND ITS C(M>LEXES BY RAM\N SPECTROSCOPY Chris J. Adams and Neil Bartlett December 1977 Prepared for the U. S. Department of Energy under Contract W-7405-ENG-48 TWO-WEEK LOAN COPY This is a Library Circulating Copy which may be borrowed for two weeks. For a personal retention copy, call Tech. Info. Dioision, Ext. 5716 DISCLAIMER This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain correct information, neither the United States Government nor any agency thereof, nor the Regents of the University of · California, nor any of their employees, makes any warranty, express or implied, or assumes any legal responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by its trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof, or the Regents of the University of California. -
New Approaches to the Nitrogen Fluoride Synthesis
Journal contents New approaches to the nitrogen fluoride synthesis Message 2. Fluorination of some hydroxylamines. V..M. Andrushin In the monograph [1] the hydroxylamines fluorination process is not mentioned at all as nitrogen fluorides obtaining method, that’s why we have made an attempt to study the opportunity of nitrogen fluoride and oxyfluoride using the example of interaction of fluorine with sulfuric hydroxylamine and hydroxylamine-o-sulpho-acid (HASA). Hydroxylamine-o-sulpho-acid in our opinion is a convenient model reagent, which is able to delocalize the charge in molecule and thus is more resistant to different destructive processes. In other literature the works regarding the obtaining of nitrogen fluorides and oxyfluorides by fluorination of hydroxylamines are absent. In the work [2] it is informed that at fluorination of hydroxylamine hydrochlorides and o-methylhydroxylamine the interaction products were only nitrous oxide (yield up to 60%) and anhydrous hydrogen fluoride. At fluorination of o- methylhydroxylamine the formation of some nitrogen fluoride is also noted. In the article [2] the reaction has been studied only in heterogeneous conditions and its results indicate the fact that heterogeneuos fluorination of hydroxylamines passes according to the scheme of cross-linking fluorination with formation of intermediate unstable derivatives of hydrazine and azo-compounds like it takes place at heterogeneous fluorination of urea and other amines and imines [3]. Heterogeneous fluorination of hydroxylamine-o-sulpho-acid was carried out in nickel autoclave or in stainless steel flow reactor separately as well as in mixtures with sodium fluoride. The carrying out conditions of the experiments and the combination of reaction gaseous products are listed in the table. -
United States Patent Office Patented June 29, 1965
3,192,016 United States Patent Office Patented June 29, 1965 2 3,192,016 used before for the processing of uranium compounds, XENON HEXAFLUORDE AND METHOD and its pipe lines contained some lower uranium fluorides. OF MAKING After the xenon hexafluoride had been stored in the ap John G. Maim, Naperville, Irving Sheft, Oak Park, paratus for about an hour, all uranium had disappeared Howard H. Claassen, Wheaton, and Cedric L. Chernick, from the pipelines. It had been converted to the volatile River Forest, E., assignors to the United States of uranium hexafluoride by the Xenon hexafluoride. America as represented by the United States Atomic In the following, an example is given to illustrate the Energy Commission No Drawing. Fied Dec. 18, 1962, Ser. No. 245,951 process of producing xenon hexafluoride. 7 Claims. (C. 23-205) O Example This invention deals with xenon hexafluoride, a method of making this novel compound, and it also deals with 5.25 millinoles of xenon and 110 millimoles of fluorine fluorination processes using Xenon hexafluoride. gas were introduced into and sealed in an 87-cc. nickel It has been found that a mixture containing Xenon and container. The gas mixture was heated in this container an excess of fluorine over the amount required for the pro 5 at about 300° C. for 16 hours, whereby a pressure of duction of xenon hexafluoride, when heated in a her about 60 atmospheres built up. After this heating period, metically sealed container, reacts to form xenon hexa the nickel container was cooled to room temperature, fluoride.