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Salicide
Study of Nickel Silicide Processes for Advanced CMOS Applications
Microfabrication and Microfluidics for 3D Brain-On-Chip
Electrical Characterization of Ni Silicide Formed by Ni Reaction with Scaled Si Nanowires
Stress Modeling of Nanoscale Mosfet
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CMOS Fabrication
Integration of Metallic Source/Drain Contacts in MOSFET Technology
DIRECT OBSERVATIONS of NICKEL SILICIDE FORMATION on (100) Si and Si0.75Ge0.25 SUBSTRATES USING IN-SITU TRANSMISSION ELECTRON MICROSCOPY
Final Report and Periodic Project Report (Year 3 - 2003)
Development of Nickel Silicide for Integrated Circuit Technology
Silicides and Local Interconnections for High- Performance Vlsl Applications
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