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α-cyano-4-hydroxycinnamic acid (CHCA) delayed extraction 70, 80 68 delocalization 31, 48, 64 2,5-dihydroxybenzoic acid (DHB) 68, 92 delocalized 2, 13, 16, 32, 34–37, 48, 51, 57, 2D electron gas 25, 27, 29 60, 64 delocalized phonon 52 ABC 132, 133, 135, 155 desorption/ionization on silicon (DIOS) 69 absorbing force 117, 130, 143, 145, 147, dilute nitride semiconductor 31 148, 150, 163 dipole-forbidden 41 absorption cross-section 143, 145, 147–150 discrete dipole approximation 119 additional boundary condition 132 dissipative force 119, 130, 131, 143 adiabatic approximation 42, 46 dressed 55, 56, 63, 64 alkali metals attachment 68 angiotensin I 84 effective interaction 42, 43 anodic oxidation 74, 77, 78 electro-deposition 73, 77, 78 anodization voltage 74, 77, 78 electrochemical etching 67, 74 anti-Hermitian operator 54, 55 electromagnetic field enhancement 71, 95 –NSOM probe 3, 4 electronic excitation 42, 45, 47, 52, 53, 63, argon ion sputtering 67, 73–75 64 argon 90 EPP model 44, 46 etching time 76, 85, 86, 105 biexciton 13, 16, 17, 22–26 excitation probability 57 bilayer resist process 100, 104 excitation transfer 41 bradykinin 82, 83, 89, 90, 93, 94 exciton 1, 13, 14, 16–26, 33–36, 46, 47, 121, 116, 121, 158 132–135, 147, 149, 155, 156, 160 carrier localization 31, 32 exciton excited state 22, 25 chemical etching 4, 78, 85, 86 exciton pooling 69, 90 chlorauric acid 77 excitonic center-of-mass motion 132 citric acid 82, 88, 89, 94 extinction cross-section 143, 145, 147–150 coarse-grained 43, 48 coherent state 56, 57, 61, 63, 64 far-field excitation 19, 20 commutation relation 50, 54, 55 FDTD 119 continuity equation 126 field induced quantum dot 26 coupling constant 48, 53, 54, 57 finite-difference time-domain method 6, 107, CuCl 134, 136, 155, 160–164 119 Franck–Condon principle 42 Davydov transformation 52, 54, 56, 61, 64 frequency-doubled Nd:YAG laser 67, 79, 80, DDA 119 91 defect 48, 51 frequency-tripled Nd:YAG laser 68, 82 170 Index

GaInNAs 31, 32 matrix-assisted laser desorption/ionization GaNAs 31, 32, 34 (MALDI) 67, 68 gas phase interaction 69 matrix-to-analyte mixing ratio 69 glycerol 69, 88, 89, 94 matter field 41, 43, 56 gold-coated porous silicon 67, 73–76, 83, Maxwell boundary condition 134, 135 86–88, 94 Maxwell stress tensor 117–119, 122, 123, gold 69, 71, 72, 90–95 145 gold nanorod 67, 73, 77–80, 82, 84–91, 95 mean field approximation 47, 58 gold nanostructure 67, 73, 80, 83, 88 melittin 82, 85, 86 gold thin film 84, 91, 92 Mie resonance 128, 135–137, 150 gradient force 118–120, 131, 132, 135, 138, Mie-extinction 70 141, 143, 163 half-wave plate 82, 84 nano object 121, 130, 153, 162, 163 Heisenberg equation 119, 131 nanofabrication 1, 12, 41, 42, 44, 48, 113 high aspect ratio 100–102, 106 nanomaterial 42, 43, 69 hopping 43, 53, 55–64 nano-optical chromatography 153, 155, 159, hydrofluoric acid 74 164 hydroxyl group 89 nanoparticle 67, 69–71, 77, 79, 91, 92, 94, 95, 118, 121, 131, 132, 149, 152, 155, impurity 32, 48, 51, 52, 57, 61–63 157–165 insulin 82, 89, 90 nanophotonic device 1, 2, 41, 42 interface fluctuation QD 1, 20 nanostructure 3, 18, 41, 42, 67, 69, 73, 75, 77, 89, 94, 95, 120, 152, 164 Kubo formula 123 nanostructure fabrication 42 naturally occurring quantum dot 33, 34 large band-gap bowing 31 near-field optical interaction 43, 44 91, 92, 164 near-field optical lithography 100, 101, 106, 116 113 laser desorption/ionization (LDI) 67–69, 73, near-field scanning optical microscope 2, 25, 80, 88–90, 93 36 laser fluence 68, 69, 82–84, 87, 88, 91, 92 NFOL 100, 101, 107, 110, 111 local density of state 2, 12, 13, 25, 28, 31 nicotinic acid (NA) 68 localization 31, 41, 47, 48, 51, 53, 56, 58, nitrogen laser 68, 90 60, 61, 63, 64 nonadiabatic 42, 46 localized 2, 11, 13, 19, 25, 27, 32, 36, 37, nonlocal response theory 121 41–43, 46, 51, 57, 60, 67, 79, 94, 107 nonradiative decay 120 localized phonon 48, 52, 57, 58, 60, 63 nonthermal desorption 72 localized photon 42, 43, 64 localized vibration mode 48, 51, 64 long- approximation 120, 131 optical manipulation 115, 116, 120, 121, 117, 122, 123, 126, 162 132, 147, 150, 151, 153, 154, 159, LT splitting energy 133 160, 162–166 optical near field 41–44, 46, 47, 53, 56, 63, mass spectrometry 67–69, 73, 91 64, 67, 72, 73, 95 mass spectrum 68, 77, 82–94 optical near-field chemical vapor deposition mass-to-charge ratio (m/z)68 44 matrix 16, 17, 24, 48, 49, 51, 58, 59, 67–69, optical polarization 79, 84, 86 87–95 116, 118 Index 171 periodically polled crystal 110 random alloy state 34 phonon 3, 19, 33, 42, 46–48, 50–61, 63, 64 Rayleigh particle 118, 119, 141 phosphoric acid 77, 78 reactive force 119, 131 photochemical 42, 45 reflection 70, 72, 100, 108, 112 photodissociation 41, 42, 44, 63, 64 reflectivity 75, 76, 79, 80 photolithography 99–102, 106, 112, 113 resonant radiation force 115, 119–122, 129, photon 14, 27, 30, 41–43, 45–48, 51–61, 63, 130, 132, 143, 159, 160, 162 64, 67, 68, 90, 91, 94, 95 rhodamine 6G 89–91, 95 photon ionization 69, 90 photon–phonon coupling 56, 60, 61, 63, 64 photon–phonon interaction 42, 52–54, 58, 59 scanning electron microscopy 4, 5, 7, 75, 78, photonic crystal 116, 152 92, 160 plasmon induced desorption 72 scattering cross-section 143, 147–150 platinum electrode 74, 77 scattering force 117, 119, 130, 143, 145, point dipole approximation 119 147, 148, 163 polariton 44, 46–48, 52, 53, 59, 133, 134, selection rule 2, 12, 19, 20, 26, 37 149 self-consistency 17, 41, 48 polaritonic whispering gallery mode 149, SEM 76, 79, 86, 92, 160, 162 154 SHG 6, 8, 110 polarization field 24–26, 41, 46 single imaging 5, 6 porous alumina 67, 69, 73, 74, 77–79 single photon source 165 porous silicon 67, 69, 73–76, 79, 83, 84, 94 single QD 12, 18 123, 143, 146 SNOM 116 probe tip 8, 14, 32, 35, 43, 46–49, 63 spatial distribution 18, 23–26, 28, 30, 31, 36, projection operator 43 53, 58, 61 propagating light 45, 46 spherical surface harmonics 133 propagating plane wave 131, 135–138, 145, 147, 152–154 standing wave 130, 131, 137, 140–143, proton source 88, 89, 94 152–154, 165 protonated ion 68, 83 sulfuric acid 77, 78 4 protonation 88 superfluid He 121, 133, 153, 154, 157, 158, pseudo one-dimensional 48, 49, 51, 58, 64 160–166 pulsed laser 68, 69 surface plasmon 70, 72, 95 PWGM 149, 152, 154 surface plasmon resonance 70, 72, 79, 85, 95 surface plasmon–polariton 67, 70, 71, 76 quantization 42, 50 surface-enhanced quantum dot 1, 11–13, 21, 25, 26, 41, 44, (SERS) 72, 89 165 surface-mode 149 quasiparticle 46, 47, 52, 55, 56, 58, 61 susceptibility 19, 123, 124, 132

Rabi frequency 119, 132 radiation force 115–122, 127, 128, 130–132, tartaric acid 89, 94 135–143, 145–150, 152–158, 160, Teflon etching 74 162–164 temporal evolution 57, 60 115–117 time-of-flight mass spectrometer (TOF-MS) radiative correction 125, 131 67, 69, 80, 81 radiative shift 128, 138, 140, 163 transmission efficiency 3, 4 radiative width 128, 147, 148, 156 transverse plasmon resonance 80 radical ion 69, 90, 91 two-exciton 16–18 172 Index two-exciton state 13, 16 wavefunction 1, 2, 12, 13, 16, 18–20, 22, 25, type II quantum dot 13 31, 42 WGM 149 ultraviolet 68, 69, 72, 110 whispering gallery mode 149 visible laser desorption/ionization 73