Review article Atomically flat single terminated oxide substrate surfaces Abhijit Biswasa, Chan–Ho Yang b, Ramamoorthy Rameshc,d,e, and Yoon H. Jeonga* a Department of Physics, Pohang University of Science and Technology, Pohang 790-784, South Korea b Department of Physics and Institute for the NanoCentury, KAIST, Daejeon 305-701, South Korea c Department of Materials Science and Engineering, University of California, Berkeley, CA 94720, USA d Department of Physics, University of California, Berkeley, CA 94720, USA e Materials Science Division, Lawrence Berkeley National Laboratory, Berkeley, CA 94720, USA Keywords: Transition metal oxides, single crystal substrates, surface treatment, atomic flatness, chemical homogeneity, atomically controlled thin films *Corresponding author. E-mail addresses:
[email protected] (Abhijit Biswas),
[email protected] (Chan-Ho Yang),
[email protected] (Ramamoorthy Ramesh),
[email protected] (Yoon H. Jeong) 1 ABSTRACT Scientific interest in atomically controlled layer-by-layer fabrication of transition metal oxide thin films and heterostructures has increased intensely in recent decades for basic physics reasons as well as for technological applications. This trend has to do, in part, with the coming post-Moore era, and functional oxide electronics could be regarded as a viable alternative for the current semiconductor electronics. Furthermore, the interface of transition metal oxides is exposing many new emergent phenomena and is increasingly becoming a playground for testing new ideas in condensed matter physics. To achieve high quality epitaxial thin films and heterostructures of transition metal oxides with atomically controlled interfaces, one critical requirement is the use of atomically flat single terminated oxide substrates since the atomic arrangements and the reaction chemistry of the topmost surface layer of substrates determine the growth and consequent properties of the overlying films.