Production of Hydrogen Fluoride by Processing Fluorine-Containing Wastes and By-Products of Modern Industries
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United States Patent Office Patented Sept
3,000,702 United States Patent Office Patented Sept. 19, 196 2 since potassium fluoride is very soluble. In this case, a 3,000,702 MANUEFACTURE OF SODIUM FLUOR DE double or complex salt is formed in the melt between George L. Cunningham, Burtonsville, Md., assignor to potassium fluoride and the calcium salt and that is slowly W. R. Grace & Co., New York, N.Y., a corporation extracted with water in spite of the great solubility of of Connecticut potassium fluoride in water. The corrosion of the molten No Drawing. Filed May 23, 1958, Ser. No. 737,196 melt is also a considerable problem although suitable 4. Claims. (CI. 23-88) ceramic materials have been discovered for constructing the fusion vessel. This invention relates to a process for the manufac Processes have been devised for the production of so ture of sodium fluoride relatively low in silica content. 10 dium fluoride based on the thermal decomposition of More particularly, this invention relates to a cyclic proc sodium silicofluoride to sodium fluoride and silicon tetra ess whereby sodium fluoride, relatively low in silica con fluoride (U.S. 1,896,697, U.S. 2,588,786, 1,730,915, tent and ammonium chloride, may be manufactured from 2,602,726, and U.S. 1,664,348). These processes are cheap and readily available raw materials. faulty in that relatively high temperatures are required to As manufactured at the present time, technical sodium 15 decompose the sodium silicofluoride and thus it is very fluoride contains 94% to 97% NaF and 1.5% to 5.0% difficult to carry the reaction to completion. -
Vibrationally Excited Hydrogen Halides : a Bibliography On
VI NBS SPECIAL PUBLICATION 392 J U.S. DEPARTMENT OF COMMERCE / National Bureau of Standards National Bureau of Standards Bldg. Library, _ E-01 Admin. OCT 1 1981 191023 / oO Vibrationally Excited Hydrogen Halides: A Bibliography on Chemical Kinetics of Chemiexcitation and Energy Transfer Processes (1958 through 1973) QC 100 • 1X57 no. 2te c l !14 c '- — | NATIONAL BUREAU OF STANDARDS The National Bureau of Standards' was established by an act of Congress March 3, 1901. The Bureau's overall goal is to strengthen and advance the Nation's science and technology and facilitate their effective application for public benefit. To this end, the Bureau conducts research and provides: (1) a basis for the Nation's physical measurement system, (2) scientific and technological services for industry and government, (3) a technical basis for equity in trade, and (4) technical services to promote public safety. The Bureau consists of the Institute for Basic Standards, the Institute for Materials Research, the Institute for Applied Technology, the Institute for Computer Sciences and Technology, and the Office for Information Programs. THE INSTITUTE FOR BASIC STANDARDS provides the central basis within the United States of a complete and consistent system of physical measurement; coordinates that system with measurement systems of other nations; and furnishes essential services leading to accurate and uniform physical measurements throughout the Nation's scientific community, industry, and commerce. The Institute consists of a Center for Radiation Research, an Office of Meas- urement Services and the following divisions: Applied Mathematics — Electricity — Mechanics — Heat — Optical Physics — Nuclear Sciences" — Applied Radiation 2 — Quantum Electronics 1 — Electromagnetics 3 — Time 3 1 1 and Frequency — Laboratory Astrophysics — Cryogenics . -
United States Patent (10) Patent No.: US 7,190,052 B2 Lindgren (45) Date of Patent: Mar
US0071900.52B2 (12) United States Patent (10) Patent No.: US 7,190,052 B2 Lindgren (45) Date of Patent: Mar. 13, 2007 (54) SEMICONDUCTOR DEVICES WITH OXIDE 5,516,721 A 5/1996 Galli et al. COATINGS SELECTIVELY POSITONED 5,683,946 A 1 1/1997 Lu et al. OVER EXPOSED FEATURES INCLUDING 5,776,829 A 7/1998 Homma et al. SEMCONDUCTOR MATERAL 6,022,814 A 2/2000 Mikoshiba et al. 6,045,877 A 4/2000 Gleason et al. (75) Inventor: Joseph T. Lindgren, Boise, ID (US) 6,174,8246,130,116 AB1 10/20001/2001 MichaelSmith et etal. al. 6, 197,110 B1 3/2001 Lee et al. (73) Assignee: Micron Technology, Inc., Boise, ID 6,251,753 B1 6/2001 Yeh et al. (US) (*) Notice: Subject to any disclaimer, the term of this (Continued) patent is extended or adjusted under 35 OTHER PUBLICATIONS U.S.C. 154(b) by 0 days. Schreiber, S.J. et al., “Low Temperature Deposition of Microcrystal line Silicon For Thin Film Transistors,' CUED Electronic Devices (21) Appl. No.: 10/454.256 and Materials Group, http://www2.eng.cam.ac.uk/~www-edm/ (22) Filed: Jun. 3, 2003 projects/lowtempdepf1.htm, prior to Sep. 2000, 2 pages. e as (Continued) (65) Prior Publication Data Primary Examiner T. N. Quach US 2004/OO33682 A1 Feb. 19, 2004 (74) Attorney, Agent, or Firm TraskBritt Related U.S. Application Data (57) ABSTRACT (62) Division of application No. 10/218.268, filed on Aug. 13, 2002, now Pat. No. 6,593,221. A semiconductor device structure includes a passivation layer through which only non-silicon-comprising structures (51) Int. -
Clinical and Microbiological Study
J Clin Exp Dent. 2015;7(5):e569-75. Combined mouthrinse in orthodontics Journal section: Oral Medicine and Pathology doi:10.4317/jced.51979 Publication Types: Research http://dx.doi.org/10.4317/jced.51979 Combined chlorhexidine-sodiumfluoride mouthrinse for orthodontic patients: Clinical and microbiological study Mahboobe Dehghani 1, Mostafa Abtahi 2, Hamed Sadeghian 3, Hooman Shafaee 1, Behrad Tanbakuchi 4 1 Assistant professor of orthodontics, Dental research center, School of Dentistry, Mashhad University of Medical Sciences, Mashhad, Iran 2 Associate professor of orthodontics, Dental research center, School of Dentistry, Mashhad University of Medical Sciences, Mashhad, Iran 3 Pathologist, Department of general Pathology, Faculty of Medicine, Mashhad University of Medical Sciences, Mashhad, Iran 4 Assistant professor of orthodontics, Department of orthodontics, School of Dentistry, Tehran University of Medical Sciences, Tehran, Iran Correspondence: Mostafa Abtahi Dental Research Center School of Dentistry Dehghani M, Abtahi M, Sadeghian H, Shafaee H, Tanbakuchi B. Com-Com- Mashhad University of Medical Sciences bined chlorhexidine-sodiumfluoride mouthrinse for orthodontic patients: Park Square, Vakilabad Blvd., Mashhad, Iran Clinical and microbiological study. J Clin Exp Dent. 2015;7(5):e569-75. [email protected] http://www.medicinaoral.com/odo/volumenes/v7i5/jcedv7i5p569.pdf Article Number: 51979 http://www.medicinaoral.com/odo/indice.htm © Medicina Oral S. L. C.I.F. B 96689336 - eISSN: 1989-5488 Received: 24/08/2014 eMail: [email protected] Accepted: 11/12/2014 Indexed in: Pubmed Pubmed Central® (PMC) Scopus DOI® System Abstract Background: Orthodontic appliances impede good dental plaque control by brushing. Antimicrobial mouth rinses were suggested to improve this performance. We therefore aimed to investigate the effects of combined mouthrinse containing chlorhexidine (CHX) and sodium fluoride (NaF) on clinical oral hygiene parameters,and plaque bacte- rial level. -
Co-Operative Effect of Exogenous Dextranase and Sodium Fluoride On
Journal of Dental Sciences (2016) 11,41e47 Available online at www.sciencedirect.com ScienceDirect journal homepage: www.e-jds.com ORIGINAL ARTICLE Co-operative effect of exogenous dextranase and sodium fluoride on multispecies biofilms Yuan-xin Qiu a,b,cy, Meng-ying Mao a,by, Dan Jiang d, Xiao Hong a,b, Ying-ming Yang a,b, Tao Hu a,b* a Department of Preventive Dentistry, State Key Laboratory of Oral Diseases, West China Hospital of Stomatology, Sichuan University, Chengdu, Sichuan, China b Department of Operative Dentistry and Endodontics, State Key Laboratory of Oral Diseases, West China Hospital of Stomatology, Sichuan University, Chengdu, Sichuan, China c Department of Operative Dentistry and Endodontics, Tianjin Stomatological Hospital, Tianjin, China d Department of Operative Dentistry and Endodontics, The Affiliated Hospital of Stomatology, Chongqing Medical University, Chongqing, China Received 22 June 2015; Final revision received 4 August 2015 Available online 21 November 2015 KEYWORDS Abstract Background/purpose: The co-operative effect of exogenous dextranase (Dex) and confocal laser sodium fluoride (NaF) on Streptococcus mutans monospecies biofilms is impressive. Here we scanning investigated the effects of the combination on a mature cariogenic multispecies biofilm and microscopy; analyzed the potential mechanism. dextranase; Materials and methods: A multispecies biofilm of S. mutans, Lactobacillus acidophilus,and multispecies Actinomyces viscosus was established in vitro. Dex and NaF were added separately or cariogenic biofilm; together. The effects of the agents on the biomass were measured. The exopolysaccharide sodium fluoride; production was determined with the scintillation counting method. The viability and viability value morphology were evaluated using colony forming unit and confocal laser scanning micro- scopy, respectively. -
Retention of Long-Term Interim Restorations with Sodium Fluoride Enriched Interim Cement Carolyn Strash Marquette University
Marquette University e-Publications@Marquette Master's Theses (2009 -) Dissertations, Theses, and Professional Projects Retention Of Long-Term Interim Restorations With Sodium Fluoride Enriched Interim Cement Carolyn Strash Marquette University Recommended Citation Strash, Carolyn, "Retention Of Long-Term Interim Restorations With Sodium Fluoride Enriched Interim Cement" (2013). Master's Theses (2009 -). Paper 201. http://epublications.marquette.edu/theses_open/201 RETENTION OF LONG-TERM INTERIM RESTORATIONS WITH SODIUM FLUORIDE ENRICHED INTERIM CEMENT by Carolyn Strash, D.D.S. A Thesis submitted to the Faculty of the Graduate School, Marquette University, in Partial Fulfillment of the Requirements for the Degree of Master of Science Milwaukee, Wisconsin May 2013 ABSTRACT RETENTION OF LONG-TERM INTERIM RESTORATIONS WITH SODIUM FLUORIDE ENRICHED INTERIM CEMENT Carolyn Strash, DDS Marquette University, 2013 Purpose: Interim fixed dental prostheses, or “provisional restorations”, are fabricated to restore teeth when definitive prostheses are made indirectly. Patients undergoing extensive prosthodontic treatment frequently require provisionalization for several months or years. The ideal interim cement would retain the restoration for as long as needed and still allow for ease of removal. It would also avoid recurrent caries by preventing demineralization of tooth structure. This study aims to determine if adding sodium fluoride varnish to interim cement may assist in the retention of interim restorations. Materials and methods: stainless steel dies representing a crown preparation were fabricated. Provisional crowns were milled for the dies using CAD/CAM technology. Crowns were provisionally cemented onto the dies using TempBond NE and NexTemp provisional cements as well as a mixture of TempBond NE and Duraphat fluoride varnish. Samples were stored for 24h then tested or thermocycled for 2500 or 5000 cycles before being tested. -
Hydrofluoric Acid Reduction Project – TURI Grant 2017
Hydrofluoric Acid Reduction Project – TURI Grant 2017 Sponsored by: Toxics Use Reduction Institute 126 John St Lowell, MA 01854 TURI Report 2018-001 Authors: Tyler DeFosse David Demarey Supervisor: Paul Watson Special Thanks to: Joy Onasch – Toxics Use Reduction Institute John Raschko – Massachusetts Office of Technical Assistance and Technology 1 Table of Contents 1.0 Executive Summary .......................................................................................................................... 3 2.0 Background ....................................................................................................................................... 5 2.1 Introduction ......................................................................................................................................... 5 2.2 Literature Searches .......................................................................................................................... 6 2.2.1 Diffusion Dialysis ...................................................................................................................... 6 2.2.2 Reverse Osmosis ....................................................................................................................... 7 2.2.3 Hydrofluoric Acid Wastewater Recycling Method ............................................................... 7 2.2.4 Issues Regarding the Etching of Silicon Dioxide ................................................................. 8 2.3 Alternative Strategies ..................................................................................................................... -
UNITED STATES PATENT of FICE 2,640,086 PROCESS for SEPARATING HYDROGEN FLUORIDE from CHLORODFLUORO METHANE Robert H
Patented May 26, 1953 2,640,086 UNITED STATES PATENT of FICE 2,640,086 PROCESS FOR SEPARATING HYDROGEN FLUORIDE FROM CHLORODFLUORO METHANE Robert H. Baldwin, Chadds Ford, Pa., assignor to E. H. du Pont de Nemours and Company, Wi inington, Del, a corporation of Delaware No Drawing. Application December 15, 1951, Serial No. 261,929 9 Claims. (C. 260-653) 2 This invention relates to a process for Sep These objects are accomplished essentially by arating hydrogen fluoride from monochlorodi Subjecting a mixture of hydrogen fluoride and fluoronethane, and more particularly, separat Inonochlorodifluoromethane in the liquid phase ing these components from the reaction mixture to temperatures below 0° C., preferably at about obtained in the fluorination of chloroform with -30° C. to -50° C., at either atmospheric or hydrogen fluoride, Super-atmospheric pressures, together with from In the fluorination of chloroform in the prest about 0.25 mol to about 2.5 mols of chloroform ence Of a Catalyst, a reaction mixture is pro per mol of chlorodifluoronethane contained in duced which consists essentially of HCl, HF, the mixture and separating an upper layer rich CHCIF2, CHCl2F, CHCls, and CHF3. A method O in HF from a lower organic layer. The proceSS of Separating these components is disclosed in is operative with mixtures containing up to 77% U. S. Patent No. 2,450,414 which involves sep by weight of HF. arating the components by a special fractional It has been found that chloroform is substan distillation under appropriate temperatures and tially immiscible With EIF at temperatures be pressures. -
Cylinder Valve Selection Quick Reference for Valve Abbreviations
SHERWOOD VALVE COMPRESSED GAS PRODUCTS Appendix Cylinder Valve Selection Quick Reference for Valve Abbreviations Use the Sherwood Cylinder Valve Series Abbreviation Chart on this page with the Sherwood Cylinder Valve Selection Charts found on pages 73–80. The Sherwood Cylinder Valve Selection Chart are for reference only and list: • The most commonly used gases • The Compressed Gas Association primary outlet to be used with each gas • The Sherwood valves designated for use with this gas • The Pressure Relief Device styles that are authorized by the DOT for use with these gases PLEASE NOTE: The Sherwood Cylinder Valve Selection Charts are partial lists extracted from the CGA V-1 and S-1.1 pamphlets. They can change without notice as the CGA V-1 and S-1.1 pamphlets are amended. Sherwood will issue periodic changes to the catalog. If there is any discrepancy or question between these lists and the CGA V-1 and S-1.1 pamphlets, the CGA V-1 and S-1.1 pamphlets take precedence. Sherwood Cylinder Valve Series Abbreviation Chart Abbreviation Sherwood Valve Series AVB Small Cylinder Acetylene Wrench-Operated Valves AVBHW Small Cylinder Acetylene Handwheel-Operated Valves AVMC Small Cylinder Acetylene Wrench-Operated Valves AVMCHW Small Cylinder Acetylene Handwheel-Operated Valves AVWB Small Cylinder Acetylene Wrench-Operated Valves — WB Style BV Hi/Lo Valves with Built-in Regulator DF* Alternative Energy Valves GRPV Residual Pressure Valves GV Large Cylinder Acetylene Valves GVT** Vertical Outlet Acetylene Valves KVAB Post Medical Valves KVMB Post Medical Valves NGV Industrial and Chrome-Plated Valves YVB† Vertical Outlet Oxygen Valves 1 * DF Valves can be used with all gases; however, the outlet will always be ⁄4"–18 NPT female. -
CA004600 SDS.Pdf
Safety Data Sheet SECTION 1: Identification 1.1. Product Identifier Trade Name or Designation: Ammonium Bifluoride, 15.5 g/L, Aqueous Product Number: A-0046 Other Identifying Product Numbers: A-0046-4L 1.2. Recommended Use and Restrictions on Use General Laboratory Reagent 1.3. Details of the Supplier of the Safety Data Sheet Company: Reagents Inc. Address: 4746 Sweden Road Charlotte, NC 28224 USA Telephone: 800-732-8484 1.4. Emergency Telephone Number (24 hr) CHEMTREC (USA) 800-424-9300 CHEMTREC (International) 1+ 703-527-3887 SECTION 2: Hazard(s) Identification 2.1. Classification of the Substance or Mixture (in accordance with OSHA HCS 29 CFR 1910.1200) For the full text of the Hazard and Precautionary Statements listed below, see Section 16. Hazard Hazard Class Category Statement Precautionary Statements Skin Corrosion / Irritation Category 1 H314 P260, P264, P280, P301+P330+P331, P303+P361+P353, P363, P304+P340, P310, P321, P305+P351+P338, P405, P501 Eye Damage / Irritation Category 1 H318 P280, P305+P351+P338, P310 Specific Target Organs/Systemic Toxicity Following Single Category 1 H370 P260, P264, P270, P307+P311, P321, P405, Exposure P501 Specific Target Organs/Systemic Toxicity Following Repeated Category 2 H373 P260, P314, P501 Exposure Corrosive to Metals Category 1 H290 P234, P390, P406 Product Number: A-0046 Page 1 of 10 Safety Data Sheet 2.2. GHS Label Elements Pictograms: Signal Word: Danger Hazard Statements: Hazard Number Hazard Statement H290 May be corrosive to metals. H314 Causes severe skin burns and eye damage. H318 Causes serious eye damage. H370 Causes damage to organs. H373 May cause damage to organs through prolonged or repeated exposure. -
Fluorosilicic Acid CAS No
Product Safety Summary Fluorosilicic Acid CAS No. 16961-83-4 This Product Safety Summary is intended to provide a general overview of the chemical substance. The information in the summary is basic information and is not intended to provide emergency response information, medical information or treatment information. The summary should not be used to provide in-depth safety and health information. In-depth safety and health information can be found in the Safety Data Sheet (SDS) for the chemical substance. Names Fluorosilicic acid (FSA) Hexafluorosilicic acid (HFA or HFS) Sand acid Silicate(2-), hexafluoro- hydrogen (1:2) Silicofluoride Fluosilicic acid Hydroflurosilicic acid Silicofluoric acid Silicon hexafluoride dihydride Silicate(2-), hexafluoro-, dihydrogen Product Overview Solvay Fluorides, LLC does not sell fluorosilicic acid solutions directly to consumers. Most fluorosilicic acid is used in industrial or municipal applications/processes. Concentrated fluorosilicic acid solution (FSA) is used for water fluoridation, as a metal surface treatment and cleaner and for pH adjustment in industrial textile processing or laundries. It can also be used in the processing of hides, for hardening masonry and ceramics and in the manufacture of other chemicals. FSA can only exist as a liquid. There is no solid form. Fluorosilicic acid solutions are corrosive and contact can severely irritate and burn the skin and eyes causing possible permanent eye damage. Breathing concentrated fluorosilicic acid solutions can severely irritate and burn the nose, throat, and lungs, causing nosebleeds, cough, wheezing and shortness of breath. Many of the symptoms described are due to the hydrogen fluoride present as an impurity. Page 1 of 7 Copyright 2010-2013, Solvay America, Inc. -
Ammonium Bifluoride CAS No
Product Safety Summary Ammonium Bifluoride CAS No. 1341-49-7 This Product Safety Summary is intended to provide a general overview of the chemical substance. The information on the summary is basic information and is not intended to provide emergency response information, medical information or treatment information. The summary should not be used to provide in-depth safety and health information. In-depth safety and health information can be found in the Safety Data Sheet (SDS) for the chemical substance. Names • Ammonium bifluoride (ABF) • Ammonium difluoride • Ammonium acid fluoride • Ammonium hydrogen difluoride • Ammonium fluoride compound with hydrogen fluoride (1:1) Product Overview Solvay Fluorides, LLC does not sell ammonium bifluoride directly to consumers. Ammonium bifluoride is used in industrial applications and in other processes where workplace exposures can occur. Ammonium bifluoride (ABF) is used for cleaning and etching of metals before they are further processed. It is used as an oil well acidifier and in the etching of glass or cleaning of brick and ceramics. It may also be used for pH adjustment in industrial textile processing or laundries. ABF is available as a solid or liquid solution (in water). Ammonium bifluoride is a corrosive chemical and contact can severely irritate and burn the skin and eyes causing possible permanent eye damage. Breathing ammonium bifluoride can severely irritate and burn the nose, throat, and lungs, causing nosebleeds, cough, wheezing and shortness of breath. On contact with water or moist skin, ABF can release hydrofluoric acid, a very dangerous acid. Inhalation or ingestion of large amounts of ammonium bifluoride can cause nausea, vomiting and loss of appetite.