Ryoichi Hashimoto, Wakayama (LP): a . C. S
USOO7604751B2 (12) United States Patent (10) Patent No.: US 7,604,751 B2 Yoneda et al. (45) Date of Patent: Oct. 20, 2009 (54) POLISHING LIQUID COMPOSITION 5,741,765 A 4/1998 Leach ........................ 510,123 5,783,489 A * 7/1998 Kaufman et al. ............ 438,692 (75) Inventors: Yasuhiro Yoneda, Wakayama (JP); 5,916,855 A 6/1999 Avanzino et al. Ryoichi Hashimoto, Wakayama (LP): WW - A . C. S.allal Gal. m........... Toshiya Hagihara, Wakayama (JP) 6,136,711 A * 10/2000 Grumbine et al. ........... 438,692 6,383,240 B1 5, 2002 Nishimoto et al. (73) Assignee: Kao Corporation, Tokyo (JP) 6,447,563 B1* 9/2002 Mahulikar ................... 51.309 (*) Notice: Subject to any disclaimer, the term of this FOREIGN PATENT DOCUMENTS patent is extended or adjusted under 35 EP O 811 665 12/1997 U.S.C. 154(b) by 142 days. JP 11 116942 4f1999 JP 11-116948 A 4f1999 (21) Appl. No.: 11/434,074 JP 2000-252243 A 9, 2000 JP 2001-187877 T 2001 (22) Filed: May 16, 2006 WO WOOOOO561 A1 1, 2000 WO WOOO,398.44 T 2000 (65) Prior Publication Data OTHER PUBLICATIONS US 2006/024O672 A1 Oct. 26, 2006 U.S. Appl. No. 60/105.366, filed Oct. 23, 1998, by Malulikar, priority Related U.S. Application Data filing for USPN 6447,563, noted above.* Chemindustry.com; Synonyms for CAS Registry 6419-19-8; May 8, (62) Division of application No. 10/030,424, filed as appli 2005.* cation No. PCT/JP00/04571 on Jul. 7, 2000, now Pat.
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