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Sessiontitle PROGRAM 2014 SID INTERNATIONAL SYMPOSIUM June 3-6, 2014 (Tuesday – Friday) San Diego Convention Center San Diego, California, USA Session 1: Annual SID Business Meeting Tuesday, June 3 / 8:00 – 8:20 am / Room 6A Session 2: Opening Remarks / Keynote Addresses Tuesday, June 3 / 8:20 – 10:20 am / Room 6B 2.1: Keynote 1: Trends in China’s Display Industry and BOE’s Role Mr. Dongsheng Wang, Chairman, BOE Technology Group Co., Beijing, China 2:2: Keynote 2: The Role of Materials in New Display Technology Developments Dr. Michael Heckmeier, Senior VP, Liquid Crystals Research and Development, Merck, Darmstadt, Germany 2.3: Keynote 3: Toward an Immersive Image Experience Dr. Kazumasa Nomoto, Senior GM, Display Device Development Division, R&D Platform, Sony Corp., Kanagawa, Japan Session 3: Oxide TFTs vs. LTPS I (Oxide vs. LTPS/Active-Matrix Devices) Tuesday, June 3 / 10:50 am – 12:10 pm / Room 6A Chair: Arokia Nathan, University of Cambridge Co-Chair: Yoshitaka Yamamoto, Semiconductor Energy Laboratory Co., Ltd. 3.1: Invited Paper: Oxide versus LTPS TFTs for Active-Matrix Displays Jin Jang, Kyung Hee University, Seoul, South Korea 3.2: Invited Paper: Application of Rotation Magnet Sputtering Technology to a-IGZO Film Depositions Tetsuya Goto, Tohoku University, Sendai, Japan 3.3: Invited Paper: Future Possibility of C-Axis-Aligned Crystalline Oxide Semiconductor: Comparison with Low-Temperature Polysilicon Shunpei Yamazaki, Semiconductor Energy Laboratory Co., Ltd., Kanagawa, Japan 3.4L: Late-News Paper: Advanced ELA for Large-Sized AMOLED Displays Minhwan Choi, Samsung Display Co., Ltd., Kyunggi-do, South Korea Session 4: Display Manufacturing: LCD Materials (Display Manufacturing) Tuesday, June 3 / 10:50 am – 12:10 pm / Room 6B Chair: Chiwoo Kim, Samsung Display Co., Ltd. Co-Chair: Dawei Wang, BOE Technology Group Co., Ltd. 4.1: Distinguished Paper: Cavity-Shape Control of the Roll-to-Roll Fabricated Novel Microstructure Film for Improving the Viewing-Angle Characteristics of LCDs Yasushi Asaoka, Sharp Corp., Chiba, Japan 4.2: Vertical Electrode Fabrication Using Conventional LCD Processes Kang-il Kim, LG Display Co., Ltd., Kyunggi-do, South Korea 4.3: Novel Photosensitive Organic Insulator for High-Definition FPD Applications Hideyuki Nakamura, FUJIFILM Corp., Shizuoka, Japan 4.4: Vacuumless Lamination of Printable LOCA Christopher Campbell, 3M Co., St. Paul, MN, USA Session 5: OLED Devices I (OLEDs) Tuesday, June 3 / 10:50 am – 12:10 pm / Room 1 Chair: Denis Kondakov, DuPont Co-Chair: Franky So, University of Florida 5.1: Invited Paper: Degradation Analysis of OLEDs by Time-Resolved Photoluminescence Measurements Hideyuki Murata, Japan Advanced Institute of Science and Technology, Ishikawa, Japan 5.2: Evidence for the Involvement of Water in the Long-Term Degradation of Green Phosphorescent OLEDs Tetsuo Tsutsui, Chemical Materials Evaluation and Research Base (CEREBA), Tsukuba, Japan 5.3: Highly Efficient OLEDs Fabricated on Corrugated High-Index Substrates Franky So, University of Florida, Gainesville, FL, USA 5.4L: Late-News Paper: ALA Mediated Metronomic Photodynamic Therapy in Mouse Gliomas Model Using OLEDs Meng-Huan Ho, AU Optronics Corp., Hsinchu, Taiwan, ROC Session 6: Display Manufacturing: Flexible Substrates (Display Manufacturing / e-Paper and Flexible Displays) Tuesday, June 3 / 10:50 am – 12:10 pm / Room 2 Chair: Tian Xiao, CBRITE, Inc. Co-Chair: Ryoichi Ishihara, Delft University 6.1: Invited Paper: Handling Technology of Plastic Substrates in Flexible Display Manufacturing Min-Feng Chiang, AU Optronics Corp., Hsinchu, Taiwan, ROC 6.2: Invited Paper: A New Automated Manufacturing Line of All-Printed TFT-Array Flexible Film Toshihide Kamata, Japan Advanced Printed Electronics Technology Research Association (JAPERA), Tsukuba, Japan 6.3: Application of Nanocoposite Materials in the Backplane Technology of Flexible Displays Kun-Lung Hsieh, AU Optronics Corp., Hsinchu, Taiwan, ROC 6.4: Ultra-High Gas-Barrier Films Based on a Layered Stack Having a Few Barrier Layers Fabricated by a Wet-Coating Process and Plasma-Assisted Surface Modification Yuta Suzuki, LINTEC Corp., Saitama, Japan Session 7: Electroluminescent Quantum Dots (Emissive Displays) Tuesday, June 3 / 10:50 am – 12:20 pm / Room 5 Chair: Seth Coe-Sullivan, QD Vision, Inc. Co-Chair: Qun Yan, Sichuan COC Display Devices Co. Ltd. 7.1: Invited Paper: Quantum Dot and Other Nano-Technologies as Extremely Thin Displays and Active Surfaces Vladimir Bulovic, MIT, Cambridge, MA, USA 7.2: Red Quantum Dots under the Electron Microscope George Fern, Brunel University, Uxbridge, UK 7.3: Influence of Layer Thickness on the Performance of Quantum-Dot Light-Emitting Devices Jing Chen, Southeast University, Nanjing, China 7.4: Invited Paper: High-Efficiency Quantum-Dot LEDs for Displays Jin Jang, Kyung Hee University, Seoul, South Korea 7.5L: Late-News Paper: Cathodoluminescence Quantum Efficiency of Quantum-Dot Thin Films Heayoung Yoon, National Institute of Standards and Technology, Gaithersburg, MD, USA Session 8: Oxide TFTs vs. LTPS II (Oxide TFTs vs. LTPS / Active-Matrix Devices) Tuesday, June 3 / 2:00 – 3:20 pm / Room 6A Chair: James Chang, Apple, Inc. Co-Chair: Hyun Jae Kim, Yonsei University 8.1: Invited Paper: Value of LTPS: Present and Future Hiroyuki Ohshima, Japan Display, Inc., Tokyo, Japan 8.2: Invited Paper: Current Status and Future Promise of Excimer-Laser Annealing for LTPS on Large Glass Substrates Rainer Paetzel, Coherent LaserSystems GmbH & Co. KG, Gottingen, Germany 8.3: Invited Paper: Advantages of IGZO Oxide Semiconductors Shigeyasu Mori, Sharp Corp., Nara, Japan 8.4L: Late-News Paper: Electrical Properties of a-IGZO Films Depending on Trap States Ju-Yeon Kim, Hoseo University, Chungnam-do, South Korea Session 9: High-Resolution LCDs (Liquid-Crystal Technology) Tuesday, June 3 / 2:00 – 3:00 pm / Room 6B Chair: Cheng Chen, Apple, Inc. Co-Chair: Takahiro Ishinabe, Tohoku University 9.1: Invited Paper: Fast High-Resolution Ferroelectric LCDs Vladimir G. Chigrinov, Hong Kong University of Science and Technology, Kowloon, Hong Kong 9.2: High-Image-Quality Reflective Color LCD Using Novel RGBW Technology Masashi Mitsui, Japan Display, Inc., Kanagawa, Japan 9.3: Analysis of Liquid-Crystal Drop Mura in High-Resolution Mobile TFT-LCDs Hongpeng Lee, BOE Optoelectronics Technology Co., Ltd., Beijing, China 9.4: Invited Paper: Highly Birefringence Nematic Liquid Crystals and Mixtures Przemyslaw Kula, Military University of Technology, Warsaw, Poland Session 10: Flexible OLEDs I (OLEDs) Tuesday, June 3 / 2:00 – 3:20 pm / Room 1 Chair: Tariq Ali, eMagin Corp. Co-Chair: Yasunori Kijima, Sony Corp. 10.1: Invited Paper: OLED Lighting Commercialization on Flexible Barrier Film Substrates Takatoshi Tsujimura, Konica Minolta, Inc., Tokyo, Japan 10.2: Strategic Approach to the Reliable Evaluation of the Water Vapor Barrier Properties for Flexible OLED Displays Akira Suzuki, Chemical Materials Evaluation and Research Base (CEREBA), Tsukuba, Japan 10.3: Predicting the Lifetime of Flexible Permeation Barrier Layers for OLED Displays Bhadri Visweswaran, Princeton University, Princeton, NJ, USA 10.4: A Delamination Method for Flexible OLED Displays Chia-Hsun Tu, AU Optronics Corp., Hsinchu, Taiwan, ROC Session 11: Flexible Interactive Displays (Touch and Interactivity / e-Paper and Flexible Displays) Tuesday, June 3 / 2:00 – 3:00 pm / Room 2 Chair: Steven Bathiche, Microsoft Research Co-Chair: Chao-Yuan Chen, Jiangsu Hecheng Display Technology 11.1: A 4-mm-Radius Curved Display with a Touch Screen Takayuki Ikeda, Semiconductor Energy Laboratory Co., Ltd., Kanagawa, Japan 11.2: Invited Paper: Imperceptible Electronic Skin Tsuyoshi Sekitani, University of Tokyo, Tokyo, Japan 11.3: A Curvature Sensing Circuit for Flexible Displays Po-Yang Lin, AU Optronics Corp., Hsinchu, Taiwan, ROC Session 12: Photoluminescent Quantum Dots (Emissive Displays) Tuesday, June 3 / 2:00 – 3:40 pm / Room 5 Chair: Masayuki Nakamoto, Shizuoka University Co-Chair: Yong-Seog Kim, Hong-ik University 12.1: Invited Paper: Quantum Dots: The Ultimate Down-Conversion Material for LCDs Jonathan Steckel, QD Vision, Inc., Lexington, MA, USA 12.2: Invited Paper: Colloidal Quantum Rods and Wells for Lighting and Lasing Applications Dmitri Talapin, University of Chicago, Chicago, IL, USA 12.3: Core-Shell Quantum Dots Synthesized by Using Tri-n-Octylphosphine-Assisted Method for High-Color-Saturation Displays Kai Wang, South University of Science and Technology of China, Shenzhen, China 12.4: Surface Exciton Properties of MgO in ZnO-MgO Core-Shell Quantum Dots Wen-Jian Kuang, Southeast University, Nanjing, China 12.5L: Late-News Paper: Quantum Dots for High-Color-Gamut LCDs Using an On-Chip LED Solution Julian Osinski, Pacific Light Technologies, Portland, OR, USA Session 13: Oxide vs. LTPS TFTs III (Oxide vs. LTPS / Active-Matrix Devices) Tuesday, June 3 / 3:40 – 5:00 pm / Room 6A Chair: Man Wong, Hong Kong University of Science & Technology Co-Chair: Takatoshi Tsujimura, Konica Minolta, Inc. 13.1: Invited Paper: Excimer-Laser Annealing: Microstructure Evolution and a Novel Characterization Technique Paul Christian van der Wilt, Coherent Laser Systems GmbH & Co. KG, Goettingen, Germany 13.2: Invited Paper: LTPS vs Oxide Backplanes for AMOLED Displays: System Design Considerations and Compensation Techniques Reza Chaji, IGNIS Innovation, Waterloo, Ontario, Canada 13.3L: Late-News Paper: Roll-to-Roll Processed and Top-Gate-Structured a-InGaZnO TFTs with Large Source/Drain Offsets Kyung Min Kim, LG Display Co.,
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