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Custom Design of Monolithic Microwave Integrated Circuits

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Custom Design of Monolithic Microwave Integrated Circuits CRAIG R. MOORE and JOHN E. PENN CUSTOM DESIGN OF MONOLITHIC MICROWAVE INTEGRATED CIRCUITS Monolithic microwave integrated circuits (MMIC'S) have been designed at the Applied Physics Laboratory and fabricated at several gallium arsenide foundries since 1989. The design tools and methods for designing MMIC'S have evolved to the present use of integrated computer-aided engineering software with programmable design components. Software elements that can be customized create multilayer mask descriptions of components for transistors, resistors, capacitors, inductors, microstrip connections, and other structures to improve the quality and productivity of MMIC's designed at the Laboratory. The schematic, physical layout, and simulation models are integrated into a single software tool, eliminating much potential for error. Experience with various foundries and various MMIC design techniques have increased our ability to design at higher and higher frequencies with confidence in achieving first-time success. The design improvements have been accompanied by improvements in measurement techniques for higher frequencies using microwave probe stations. This article summarizes MMIC designs at the Laboratory over the past few years and the progress shown and lessons learned. COMPUTER-AIDED ENGINEERING DESIGN OF MMIC'S Software computer-aided engineering tools from and custom electrical models. Today, EEsof has a new EEsof, Inc., are the predominant means of designing TriQuint Smart Library containing physical and electrical monolithic microwave integrated circuits (MMIC'S) at APL. macros, which is being used in the MMIC design course A key feature of EEsof's Academy software for MMIC at JHU taught by both authors of this article. layout is the ease of adding both layout macros and A group of people including Dale Dawson of Westing­ custom electrical models. Another feature is the ability to house teamed together to teach a power MMIC design use a particular fixed or macro layout with any available course at JHU that uses a custom physical and electrical electrical model, as long as they have the same number library for Westinghouse's power GaAs process. Employ­ of nodal connections. ees of APL have used Westinghouse's library through the JHU course and for MMIC design on APL programs. In 1992, Macros several power amplifiers were designed and fabricated A macro is a software subroutine that creates the using the Westinghouse library and foundry process. physical mask-layer descriptions for an element that can Some were 2-W amplifiers at 6 GHz, and some were contain variable parameters (Fig. 1). The mask-layer O.S-W designs at 13 GHz. Another 200- to 2S0-mW descriptions are used to generate photo masks for each step in the foundries' integrated circuit processing. An example of a useful macro is a metal semiconductor field­ A B Resistor Metal 1 effect transistor (MESFET), which consists of many mask Metal 2 layers but can usually be described as a given MESFET type with N parallel gate fingers each of width w. One of the first macro libraries used with the Academy \ software was for the TriQuint foundry. It originated at EEsof but was modified by one of the authors of this article, John E. Penn, to create components having no design rule violations. Its first use was in a graduate MMIC Layers(s) defining (JHU) I. .1 ~ design course at The Johns Hopkins University in Length Metal 1 capacitor area the summer of 1989. Since those initial student designs, the TriQuint library was modified by Penn; a graduate Resistance = (length/width). RPA Capacitance = area· CPA student at JHU later provided additional physical macros Figure 1. Example of typical macro elements for monolithic micro­ and custom electrical models. By late 1990, an entire wave integrated circuits. A. Thin-film resistor. RPA = resistance/ multichip wafer was designed by using physical macros area. B. Capacitor. CPA = capacitance/area. 300 Johns Hopkins APL Technical Digest, Volume 14, Number 4 (1993) amplifier at 30 GHz was designed (but has not yet been Plotting fabricated) using Westinghouse high-electron-mobility Calma is the most widely used standard for integrated transistors (HEMT'S). circuit mask descriptions. Using this format, one can The Applied Physics Laboratory created a third MMIC easily transfer integrated circuit designs between tools for library for the GaAs pseudomorphic HEMT (PHEMT) pro­ additional modifications or design checking. This feature cess used by Martin Marietta Laboratories. A fixed set of has been advantageous for obtaining large color plots PHEMT transistors and diodes was used with programma­ from a 36-in. Versatec plotter on the computer-aided en­ ble macros for resistors, capacitors, and microstrip ele­ gineering network. Calma descriptions of MMIC'S are ments. We used the library to design several low-noise transferred to the Mentor Graphics network and then amplifiers and some Schottky diode mixers at 37 GHz for translated into the Chip graph integrated circuit layout a radiometer design for the Geosat advanced technology software for plotting. Large color plots are very useful for model. The library was also used to design a 200- to 250- locating subtle design flaws through visual verification m W amplifier at 29 to 33 GHz for the ultra-smaIl-aper­ and for improving layouts. ture terminal (USAT) program. Measurement Linear and Nonlinear Simulation An essential part of design is measurement of the The simulation engine in EEsof's software is known fabricated MMIC' S to verify that the devices operate cor­ as Libra and is accessible within the Academy frame­ rectly and that the simulation models and design meth­ work. Both linear and nonlinear simulations can be per­ odology are correct. Extra effort to isolate differences formed within Libra with some minor constraints to the between the simulation and measurements will ensure simulation file. Simulations in the linear region generally that future designs can be improved to guarantee first­ use transistors as the active elements where one is con­ pass success. Differences can result from variations in cerned with small signal gain, phase, impedance match, device processing, which can be simulated statistically or and so on. Amplifiers, phase shifters, switching devices, by using best-/worst-case values before sending the de­ couplers, and the like undergo linear analysis, whereas signs to the foundry for fabrication. Measurements of nonlinear analysis is used for RF power, transients, har­ MMIC components (e.g., transistors, capacitors) for resim­ monic response, power efficiency, mixers, oscillators, ulation of the fabricated designs can determine whether transistor current-vs.-voltage curves, and the like. A high­ differences are due to processing changes. Limitations in level simulation at the system level could be considered certain simulation models or the use of models beyond as a third level of simulation where both linear and non­ their specified range can also explain some differences. linear devices are simulated at a basic building-block Omitting parasitic capacitances or coupling from ele­ level. An example of a system-level simulator is EEsof's ments spaced closely on the MMIC should be explored, Omnisys program, which can use data derived from linear or nonlinear simulations or measurements. Ideally, a single integrated simulation tool would perform linear, nonlinear, or system simulations. Microwave ~------J measurement 1----------, equipment Electromagnetic Analysis Another useful analytical tool is the high-frequency structure simulator, which is a three-dimensional electro­ magnetic simulator. Reference 1 describes this tool using Needle design examples. * probe Design-Rule Checking Design-rule checking is needed for any type of inte­ Wafer grated circuit design, including MMIC' S. The DRACULA L----J probe program is the industry standard for design-rule checking MMIC APL. and has been used for verifying designs at Die (chip) Design rules were written by using DRACULA'S program­ ming language and are based on TriQuint's guidelines for the process. In recent years, design-rule checking has been added to the relatively inexpensive pc-based Inte­ grated Circuit Editor layout tool, which can check rela­ /water tively small designs such as most MMIC'S. Design rules for TriQuint's process were created for the Integrated Circuit Editor and tested on APL designs and on student designs at JHU. *Further description and examples will be given in an article by Jablon, Moore, and Penn to be published in the next Digest, which Figure 2. Wafer probing of monolithic microwave integrated cir­ continues the advanced microwave technology theme. cuits. f ohns Hopkins APL Technical Digest, Vo lume 14, Number 4 (1993) 301 C. R. Moore and J. E. Penn although parasitics have been found to cause only minor ous calibration schemes to understand measurement ac­ effects on several past APL MMIC designs up to 37 GHz. curacies and the benefits and limitations of the different Being able to resimulate a design to obtain a correct calibration techniques. On-chip and off-chip wafer cal­ simulation file that correlates with the measurement is an ibrations have been compared and shown good agreement important learning experience that ensures future success up to 26 GHZ. 2 Off-chip standards are known high-qual­ and yields confidence in the design tools and methods. ity impedance standards usually purchased from a micro­ MMIc 's are fabricated in large quantities on thin cir­ wave probe manufacturer. On-chip
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