DOCSLIB.ORG

Friction-Induced Nanofabrication

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text
Friction-Induced Nanofabrication Yu and Qian Chin. J. Mech. Eng. (2021) 34:32 https://doi.org/10.1186/s10033-021-00550-x Chinese Journal of Mechanical Engineering REVIEW Open Access Friction-Induced Nanofabrication: A Review Bingjun Yu and Linmao Qian* Abstract As the bridge between basic principles and applications of nanotechnology, nanofabrication methods play signifcant role in supporting the development of nanoscale science and engineering, which is changing and improving the production and lifestyle of the human. Photo lithography and other alternative technologies, such as nanoimprinting, electron beam lithography, focused ion beam cutting, and scanning probe lithography, have brought great progress of semiconductor industry, IC manufacturing and micro/nanoelectromechanical system (MEMS/NEMS) devices. However, there remains a lot of challenges, relating to the resolution, cost, speed, and so on, in realizing high-quality products with further development of nanotechnology. None of the existing techniques can satisfy all the needs in nanoscience and nanotechnology at the same time, and it is essential to explore new nanofabrication methods. As a newly developed scanning probe microscope (SPM)-based lithography, friction-induced nanofabrication provides opportunities for maskless, fexible, low-damage, low-cost and environment-friendly processing on a wide variety of materials, including silicon, quartz, glass surfaces, and so on. It has been proved that this fabrication route provides with a broad application prospect in the fabrication of nanoimprint templates, microfuidic devices, and micro/nano optical structures. This paper hereby involved the principals and operations of friction-induced nanofabrication, including friction-induced selective etching, and the applications were reviewed as well for looking ahead at oppor- tunities and challenges with nanotechnology development. The present review will not only enrich the knowledge in nanotribology, but also plays a positive role in promoting SPM-based nanofabrication. Keywords: Scanning probe microscope, Tip-based lithography, Friction-induced nanofabrication, Friction-induced selective etching 1 Introduction fabrication in emerging nanoscale science and engineer- Nanoscience and nanotechnology have brought signif- ing [1]. Depending on whether the template is used or cant improvement of our live quality in wide feld from not, nanolithography techniques are divided into two electronic gadgets to healthcare and medical devices. As types, i.e., masked and maskless lithography. Te masked an important part in triggering the development of nano- lithography is suitable for large-area manufacturing technology, nanofabrication plays a key role in realizing by transferring patterns from templates or molds, and micro/nano-scale structures and device with novel prop- includes photolithography [2], soft lithography [3], and erties in optical, electronic, magnetic or other behaviors. nanoimprint [4]. In contrast, maskless lithography can be Not only micro- and nanolithography has been the main more fexible in fabricating arbitrary patterns by directly driving technology in semiconductor and integrated cir- writing or scanning without any mask, including electron cuit (IC) industry, it also plays an increasingly important beam lithography (EBL) [5], focused ion beam lithogra- role in manufacturing of commercial microelectrome- phy (FIBL) [6, 7], and scanning probe lithography (SPL) chanical system (MEMS) devices as well as prototype [8, 9]. However, none of the existing techniques can sat- isfy all the needs at the same time with the nanotechnol- ogy developing towards diversifcation and depth [10]. *Correspondence: [email protected] With high resolution and fexibility, scanning probe Tribology Research Institute, State Key Laboratory of Traction Power, lithography has attracted great attention worldwide. In Southwest Jiaotong University, Chengdu 610031, China © The Author(s) 2021. This article is licensed under a Creative Commons Attribution 4.0 International License, which permits use, sharing, adaptation, distribution and reproduction in any medium or format, as long as you give appropriate credit to the original author(s) and the source, provide a link to the Creative Commons licence, and indicate if changes were made. The images or other third party material in this article are included in the article’s Creative Commons licence, unless indicated otherwise in a credit line to the material. If material is not included in the article’s Creative Commons licence and your intended use is not permitted by statutory regulation or exceeds the permitted use, you will need to obtain permission directly from the copyright holder. To view a copy of this licence, visit http:// creat iveco mmons. org/ licen ses/ by/4. 0/. Yu and Qian Chin. J. Mech. Eng. (2021) 34:32 Page 2 of 26 1982, Dr. Binnig of IBM Zurich Research Laboratory greatly to the fnal formation of low-damage nanostruc- and his colleagues jointly invented the world’s frst scan- tures either by direct scratching or by post selective ning tunneling microscope (STM) [11]. Tis invention etching, the processes of friction-induced hillock and makes it possible for human beings to observe atoms in friction-induced selective etching can be hereby viewed the atmosphere and at room temperature for the frst as friction-induced nanofabrication. Figure 1 presents the time. STM and subsequent atomic force microscopy development of friction-induced nanofabrication with (AFM) have become powerful tools for nanotechnology some representative events. Compared to the traditional research, and promoting an important enabling technol- nanofabrication methods such as photolithography and ogy, i.e., scanning probe-based nanolithography (SPL) or nanoimprinting, friction-induced nanofabrication has tip-based nanofabrication (TBN). SPL can perform wide excellent properties of low cost, fexibility, and low dam- types of manufacturing activities, from material removal age. During the tip scanning, the trace for tip scanning and modifcation to material deposition and manipula- can be programmed in terms of a demanded pattern, and tion, all in the nanoscale [12]. hence it has no challenges in producing diferent patterns Some pioneering works were realized by scanning at specifed locations without templates [24]. Large-scale probe microscopy (SPM), including STM and AFM. and high-resolution fabrication can be realized through According to diferent processing principles, SPM lithog- multi-probe scanning technology. raphy mainly involves single atom manipulation, mechan- Tis paper will review the principals and operations ical removal, local anodizing, dip-pen printing, thermal of friction-induced nanofabrication, including friction- probe machining, etc [12, 13]. With a SPM tip, surface induced selective etching. Aside from direct nano- atoms could be manipulated controllably via adjusting fabrication with AFM tip scratching, mechanical or the tunneling current or interfacial force between the tip tribochemical mechanisms of material deformation or and the sample [14–18]. Tip-induced local anodic oxida- damages stemming from tip scratching, and the roles of tion (LAO) process can be performed under a given bias diferent structures or phases in selective etching were voltage, and the contact area of a conductive surface is address for fully intercepting the low-damage structure oxidized, forming oxide patterns corresponding to the formation. Some examples for the applications of the designed tip traces [19, 20]. Dip-pen nanolithography fabrication were presented as well for looking ahead at (DPN), a nanofabrication method proposed by Mirkin opportunities and challenges for this nanofabrication et al. in the 1990s, can transfer “ink” molecules to sub- method. strate surface to write specifc nanostructures using AFM tip as a pen, and has promising applications in the felds 2 Direct Nanofabrication with AFM Tip Scratching of physics, chemistry, biology and medical treatment 2.1 Direct Nanofabrication by Mechanical Removal [21, 22]. A SPL method based on the local desorption of Mechanical SPL technique presents high resolution and a glassy organic resist by a heatable probe was proposed low cost for directly fabricating various surface nano- for fabricating nonpatterns at a half pitch down to 15 structures (e.g., nanodots, nanogrooves, and 2D/3D nm without proximity corrections, and complex three- nanostructures) through surface material removal. dimensional structures can be duplicated from a pho- Te lithography is provided with two modes, i.e., static tograph [23]. SPL was also used for fabricating micro/ and dynamic plowing lithography (DPL), which were nanostructures on a fat surface by mechanical removal, respectively operated with contact and tapping modes. but the tip can sufer wear and become blunt. Despite With static plowing lithography, so-called scratching, much progress in AFM nanolithography, there are still various nanostructures can be realized on sample sur- a lot of problems related to the resolution, speed, cost, faces by applying a preset normal load on an AFM tip. smear, and so on, yet to be solved [10]. For instance, using a closed-loop nanoscale precision In the past decade, friction-induced nanofabrication stage integrated with an AFM, 3D nanostructures with was proposed to produce nanostructures on surfaces of complex geometry (e.g., 3D human face shape, nano- wide types of materials, including silicon, gallium arse- line arrays of sine-wave and triangular profles,
Load more

Recommended publications
  • Maskless Lithography Using Silicon Oxide Etch- Stop Layer Induced by Megahertz Repetition Femtosecond Laser Pulses
    Maskless lithography using silicon oxide etch- stop layer induced by megahertz repetition femtosecond laser pulses Amirkianoosh Kiani,1 Krishnan Venkatakrishnan,1 Bo Tan,2,* and Venkat Venkataramanan3 1Department of Mechanical and Industrial Engineering, Ryerson University, 350 Victoria Street, Toronto, Ontario M5B 2K3, Canada 2Department of Aerospace Engineering, Ryerson University, 350 Victoria Street, Toronto, Ontario M5B 2K3, Canada 3Institute for Optical Sciences, University of Toronto, 60, St. George Street, Suite 331, Toronto, Ontario M5S 1A7, Canada *[email protected] Abstract: In this study we report a new method for maskless lithography fabrication process by a combination of direct silicon oxide etch-stop layer patterning and wet alkaline etching. A thin layer of etch-stop silicon oxide of predetermined pattern was first generated by irradiation with high repetition (MHz) ultrafast (femtosecond) laser pulses in air and at atmospheric pressure. The induced thin layer of silicon oxide is used as an etch stop during etching process in alkaline etchants such as KOH. Our proposed method has the potential to enable low-cost, flexible, high quality patterning for a wide variety of application in the field of micro- and nanotechnology, this technique can be leading to a promising solution for maskless lithography technique. A Scanning Electron Microscope (SEM), optical microscopy, Micro-Raman, Energy Dispersive X-ray (EDX) and X- ray diffraction spectroscopy were used to analyze the silicon oxide layer induced by laser pulses. ©2011 Optical Society of America OCIS codes: (220.3740) Lithography; (220.4000) Microstructure fabrication; (320.7090) Ultrafast lasers; (350.3850) Materials processing; (350.5340) Photothermal effects. References and links 1.
    [Show full text]
  • Maskless Laser-Write Lithography of A-Si:H TFT Passive Pixel Sensor for Hemispherical Imager By
    Maskless Laser-Write Lithography of a-Si:H TFT Passive Pixel Sensor for Hemispherical Imager by Geonwook Yoo A dissertation submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy (Electrical Engineering) in The University of Michigan 2011 Doctoral Committee: Professor Jerzy Kanicki, Chair Professor Peter F. Green Professor Kensall D. Wise Associate Professor Jamie D. Phillips © Geonwook Yoo 2011 Acknowledgements I sincerely appreciate Prof. Jerzy Kanicki, my research advisor and doctoral committee chair, for his support and guidance throughout my graduate study. It was a great and precious opportunity for me to work with him on this exciting project. I am deeply grateful for my doctoral committee members, Prof. Kensall D. Wise, Prof. Peter F. Green, and Prof. Jamie D. Phillips for their help in completing my thesis. I also truly thank Daniela Radtke at Fraunhofer Institute for Applied Optics and Precision Engineering in Germany, Tae-Kyung Won at AKT America, Inc., Sandro Tedde at Siemens AG TC, and Werner Salewski at Heidelberg Instrument. A large portion of the success of this work is attributed to their collaboration and advice. My special thanks belong to Daniela for her help on laser-write lithography. I express my gratitude to all LNF staffs, especially to Brian VanDerElzen. I thank my current and previous group members: Gwanghyeon Baek, Dr. Hojin Lee, Dr. Alex Kuo, Dr. Tze-ching Fung, Dr. Charlene Chen, and Dennis Feng. It was their support and friendship that helped me to get through the course of graduate study. In addition I am very grateful to all my seniors and friends both in U.S and Korea for their belief and support.
    [Show full text]
  • Maskless Exposure Device for Photolithography
    International Master’s Degree Programme In Biomedical Engineering DHANESH KATTIPPARAMBIL RAJAN MASKLESS EXPOSURE DEVICE FOR PHOTOLITHOGRAPHY MASTER OF SCIENCE THESIS Examiners: Professor Jukka Lekkala, Professor Jari Hyttinen Subject approved by the Faculty Council on 5th March 2008 by the Faculty of Science and Environmental Engineering II ABSTRACT TAMPERE UNIVERSITY OF TECHNOLOGY International Master’s Degree Programme in Biomedical Engineering KATTIPPARAMBIL RAJAN, DHANESH: Maskless Exposure Device for Photolithography Master of Science Thesis, 96 Pages. May 2008 Major: Medical Physics Examiners: Professor Jukka Lekkala, Professor Jari Hyttinen Keywords: lithography, maskless lithography, MEMS production Photolithography plays a consequential role in transferring patterns from photomasks to substrates and thereby is an important tool in semiconductor, IC, MEMS and many microstructures’ production. The photomasks are preprinted prior to the photolithographic procedure with certain layouts, and these layouts are transferred to surfaces of materials like silicon during the lithography and finally these surfaces undergo chemical processes by which three dimensional micro features are formed. Therefore photomasks containing specific layouts are the inevitable components in the entire procedure, but unfortunately those are expensive in its nature together with time consuming production formalities. Some of the successful attempts to remove these difficulties are cost effective photomasks and maskless lithography. A system named ‘Maskless Exposure Device’ (MED) is introduced here as my thesis related research and it is intended to replace the expensive photomasks. The device transfers images and layouts created on a computer, easily and effortlessly to different substrate surfaces and can be repeatedly used in photolithography by introducing new drawings on the computer screen and thereby, MED is nothing but a maskless lithographic technique.
    [Show full text]
  • High-Throughput Plasmonic Nanolithography
    UC Berkeley UC Berkeley Electronic Theses and Dissertations Title High-Throughput Plasmonic Nanolithography Permalink https://escholarship.org/uc/item/93c7w34j Author Pan, Liang Publication Date 2010 Peer reviewed|Thesis/dissertation eScholarship.org Powered by the California Digital Library University of California High-Throughput Plasmonic Nanolithography by Liang Pan A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering-Mechanical Engineering in the Graduate Division of the University of California, Berkeley Committee in charge: Professor David B. Bogy, Co-Chair Professor Xiang Zhang, Co-Chair Professor Roberto Horowitz Professor Ming Wu Fall 2010 High-Throughput Plasmonic Nanolithography ©2010 by Liang Pan Abstract High-Throughput Plasmonic Nanolithography by Liang Pan Doctor of Philosophy in Engineering-Mechanical Engineering University of California, Berkeley Professor David B. Bogy, Co-Chair Professor Xiang Zhang, Co-Chair The conventional projection-type photolithography approach to nanoscale manufacturing is facing possibly insurmountable challenges, especially to invent novel technical solutions that remain economical for the next generation of semi-conductor integrated circuits. Although extreme ultra violet (EUV) lithography with the next generation photo-masks and 193-nm immersion lithography with double patterning are expected to deliver 22 nm and smaller nodes, it still cannot effectively address the reliability and cost issues required for mass production. Maskless nanolithography is a potentially agile and cost effective approach, but most of the current solutions have throughputs that are too low for manufacturing purposes. This dissertation reports a new low-cost high-throughput approach to maskless nanolithography that uses an array of plasmonic lenses (PL) that "fly" above the rotating surface to be patterned, concentrating short wavelength surface plasmons into sub-100 nm spots.
    [Show full text]
  • 2020 EUVL Workshop – Abstracts
    2020 EUVL Workshop June 7-11, 2020 Held Online Workshop Abstracts 2020 EUVL Workshop 2020 EUVL Workshop Sponsors Organized by Vivek Bakshi (EUV Litho, Inc.), Chair Patrick Naulleau (CXRO), Co-Chair www.euvlitho.com 1 2020 EUVL Workshop Contents Abstracts by Paper Numbers ________________________________________ 4 www.euvlitho.com 2 2020 EUVL Workshop Abstracts (Listed by Paper number) www.euvlitho.com 3 2020 EUVL Workshop P1 Lithographic Performance of The First Entirely Dry Process for EUV Lithography Mohammed Alvi1, Dictus Dries1, Richard Gottscho1, Kevin Gu1, Benjamin Kam1, Siva Kanakasabapathy1, Da Li1, Jeffrey Marks1, Katie Nardi1, Thad Nicholson1, Yang Pan1, Daniel Peters1, Al Schoepp1, Nader Shamma1, Easwar Srinivasan1, Samantha Tan1, Clint Thomas1, Boris Volosskiy1, Tim Weidman1*, Rich Wise1, William Wu1, Jun Xue1, Jengyi Yu1, Christophe Fouqu2, Rolf Custers2, Jara Garcia Santaclara2, Michael Kubis2, Gijsbert Rispens2, Lidia van Lent-Protasova2, Mircea Dusa3, Patrick Jaenen3, and Abhinav Pathak3 1LAM Reserach 2ASML 3IMEC The lithographic performance of a new entirely dry EUV photoresist platform will be described. Photoresist films are applied using reactive organometallic precursors in a vapor phase process that provides uniform, homogeneous films stable to air and visible light. EUV exposure and subsequent bake steps induce crosslinking and densification, while unexposed areas remain hydrophobic and freely soluble in common organic solvents. This has facilitated the extensive characterization of lithographic patterning performance using NXE-3400 tools at both IMEC and ASML – initially employing conventional (solvent based) negative tone development (NTD). In contrast to typical spin-on processes, dry deposited film thickness appears insensitive to substrate surface chemistry, making applied film thickness easily controlled/proportional to deposition time.
    [Show full text]
  • And Nanolithography Techniques and Their Applications
    Review on Micro- and Nanolithography Techniques and their Applications Alongkorn Pimpin* and Werayut Srituravanich** Department of Mechanical Engineering, Faculty of Engineering, Chulalongkorn University, Pathumwan, Bangkok 10330, Thailand E-mail: [email protected]*, [email protected]** Abstract. This article reviews major micro- and nanolithography techniques and their applications from commercial micro devices to emerging applications in nanoscale science and engineering. Micro- and nanolithography has been the key technology in manufacturing of integrated circuits and microchips in the semiconductor industry. Such a technology is also sparking revolutionizing advancements in nanotechnology. The lithography techniques including photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography and scanning probe lithography are discussed. Furthermore, their applications are summarized into four major areas: electronics and microsystems, medical and biotech, optics and photonics, and environment and energy harvesting. Keywords: Nanolithography, photolithography, electron beam lithography, focused ion beam lithography, soft lithography, nanoimprint lithography, scanning probe lithography, dip-pen lithography, microsystems, MEMS, nanoscience, nanotechnology, nano-engineering. ENGINEERING JOURNAL Volume 16 Issue 1 Received 18 August 2011 Accepted 8 November Published 1 January 2012 Online at http://www.engj.org DOI:10.4186/ej.2012.16.1.37 DOI:10.4186/ej.2012.16.1.37 1. Introduction For decades, micro- and nanolithography technology has been contributed to the manufacturing of integrated circuits (ICs) and microchips. This advance in the semiconductor and IC industry has led to a new paradigm of the information revolution via computers and the internet. Micro- and nanolithography is the technology that is used to create patterns with a feature size ranging from a few nanometers up to tens of millimeters.
    [Show full text]
  • Laser-Plasma Sources for Extreme-Ultraviolet Lithography
    Laser-Plasma Sources for Extreme-Ultraviolet Lithography BJÖRN A. M. HANSSON Doctoral Thesis Stockholm, Sweden 2003 TRITA FYS 2003-56 ISSN 0280-316X KTH ISRN KTH/FYS/--03:56--SE SE-100 44 Stockholm ISBN 91-7283-658-X SWEDEN Akademisk avhandling som med tillstånd av Kungl Tekniska högskolan framlägges till offentlig granskning för avläggande av teknologie doktorsexamen fredagen den 19 december 2003 kl. 10.00 i Kollegiesalen, Administrationsbyggnaden, Kungl Tekniska högskolan, Valhallavägen 79, Stockholm. °c Björn A. M. Hansson, november 2003 Tryck: Universitetsservice US AB iii Abstract This thesis describes the development and characterization of a liquid- xenon-jet laser-plasma source for extreme-ultraviolet (EUV) radiation. It is shown how this source may be suitable for production-scale EUV lithography (EUVL). EUVL is one of the main candidates to succeed deep-ultraviolet (DUV) lithography for large-scale manufacturing of integrated circuits (IC). However, a major obstacle towards the realization of EUVL is the current unavailability of a source meeting the tough requirements on especially power and clean- liness for operation in an EUVL stepper. The liquid-xenon-jet laser-plasma concept has key advantages that may make it suitable for EUVL since, e.g., its plasma consists only of the inert noble gas xenon and since the liquid- jet target technology enables plasma operation at large distances from the source-hardware thereby reducing sputtering and to allowing for high-power operation. At the beginning of the work described in this thesis, a spatial insta- bility of the liquid-xenon-jet made stable operation of a plasma at practical distances from the nozzle orifice difficult.
    [Show full text]
  • Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles
    micromachines Article Fabrication of Micro-Optics Elements with Arbitrary Surface Profiles Based on One-Step Maskless Grayscale Lithography Qinyuan Deng 1,2 ID , Yong Yang 1,*, Hongtao Gao 1, Yi Zhou 1,2, Yu He 1 and Song Hu 1 1 State Key Laboratory of Optical Technologies for Microfabrication, Institute of Optics and Electronics, Chinese Academy of Sciences, Chengdu 610209, China; [email protected] (Q.D.); [email protected] (H.G.); [email protected] (Y.Z.); [email protected] (Y.H.); [email protected] (S.H.) 2 University of Chinese Academy of Sciences, Beijing 100049, China * Correspondence: [email protected]; Tel.: +86-028-8510-0167 Received: 1 September 2017; Accepted: 17 October 2017; Published: 23 October 2017 Abstract: A maskless lithography method to realize the rapid and cost-effective fabrication of micro-optics elements with arbitrary surface profiles is reported. A digital micro-mirror device (DMD) is applied to flexibly modulate that the exposure dose according to the surface profile of the structure to be fabricated. Due to the fact that not only the relationship between the grayscale levels of the DMD and the exposure dose on the surface of the photoresist, but also the dependence of the exposure depth on the exposure dose, deviate from a linear relationship arising from the DMD and photoresist, respectively, and cannot be systemically eliminated, complicated fabrication art and large fabrication error will results. A method of compensating the two nonlinear effects is proposed that can be used to accurately design the digital grayscale mask and ensure a precise control of the surface profile of the structure to be fabricated.
    [Show full text]
  • A Versatile Diffractive Maskless Lithography for Single-Shot and Serial Microfabrication
    A versatile diffractive maskless lithography for single-shot and serial microfabrication Nathan J. Jenness,1,2,* Ryan T. Hill,1 Angus Hucknall,1 Ashutosh Chilkoti,1 and Robert L. Clark2 1Center for Biologically Inspired Materials and Material Systems, Duke University, Durham, NC 27708, USA 2Hajim School of Engineering and Applied Sciences, University of Rochester, Rochester, NY 14627, USA *[email protected] Abstract: We demonstrate a diffractive maskless lithographic system that is capable of rapidly performing both serial and single-shot micropatterning. Utilizing the diffractive properties of phase holograms displayed on a spatial light modulator, arbitrary intensity distributions were produced to form two and three dimensional micropatterns/structures in a variety of substrates. A straightforward graphical user interface was implemented to allow users to load templates and change patterning modes within the span of a few minutes. A minimum resolution of ~700 nm is demonstrated for both patterning modes, which compares favorably to the 232 nm resolution limit predicted by the Rayleigh criterion. The presented method is rapid and adaptable, allowing for the parallel fabrication of microstructures in photoresist as well as the fabrication of protein microstructures that retain functional activity. ©2010 Optical Society of America OCIS codes: (140.3390) Laser materials processing; (350.3450) Laser-induced chemistry; (230.6120) Spatial light modulators; (050.6875) Three-dimensional fabrication. References and Links 1. R. M. Guijt, and M. C. Breadmore, “Maskless photolithography using UV LEDs,” Lab Chip 8(8), 1402–1404 (2008). 2. S. A. Lee, S. E. Chung, W. Park, S. H. Lee, and S. Kwon, “Three-dimensional fabrication of heterogeneous microstructures using soft membrane deformation and optofluidic maskless lithography,” Lab Chip 9(12), 1670– 1675 (2009).
    [Show full text]
  • Desktop Nanofabrication with Massively Multiplexed Beam Pen Lithography
    ARTICLE Received 21 May 2013 | Accepted 4 Jun 2013 | Published 19 Jul 2013 DOI: 10.1038/ncomms3103 Desktop nanofabrication with massively multiplexed beam pen lithography Xing Liao1,2,*, Keith A. Brown2,3,*, Abrin L. Schmucker2,3, Guoliang Liu2,3, Shu He2,3, Wooyoung Shim1,2 & Chad A. Mirkin1,2,3 The development of a lithographic method that can rapidly define nanoscale features across centimetre-scale surfaces has been a long-standing goal for the nanotechnology community. If such a ‘desktop nanofab’ could be implemented in a low-cost format, it would bring the possibility of point-of-use nanofabrication for rapidly prototyping diverse functional structures. Here we report the development of a new tool that is capable of writing arbitrary patterns composed of diffraction-unlimited features over square centimetre areas that are in registry with existing patterns and nanostructures. Importantly, this instrument is based on components that are inexpensive compared with the combination of state-of-the-art nanofabrication tools that approach its capabilities. This tool can be used to prototype functional electronic devices in a mask-free fashion in addition to providing a unique platform for performing high-throughput nano- to macroscale photochemistry with relevance to biology and medicine. 1 Department of Materials Science and Engineering, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA. 2 International Institute for Nanotechnology, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA. 3 Department of Chemistry, Northwestern University, 2145 Sheridan Road, Evanston, Illinois 60208, USA. * These authors contributed equally to this work. Correspondence and requests for materials should be addressed to C.A.M.
    [Show full text]
  • Tip-Based Nanofabrication for Scalable Manufacturing
    micromachines Review Tip-Based Nanofabrication for Scalable Manufacturing Huan Hu 1,*, Hoe Joon Kim 2 and Suhas Somnath 3 1 Department of Science and Solutions, IBM T.J. Watson Research Center, Yorktown Heights, NY 10598, USA 2 Department of Robotics Engineering, Daegu Gyeongbuk Institute of Science and Technology (DGIST), Daegu 42988, Korea; [email protected] 3 The Center for Nanophase Materials Sciences and The Institute for Functional Imaging of Materials, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA; [email protected] * Correspondence: [email protected]; Tel.: +1-914-945-3125 Academic Editors: Chang-Hwan Choi, Ishan Wathuthanthri and Ke Du Received: 13 December 2016; Accepted: 5 March 2017; Published: 16 March 2017 Abstract: Tip-based nanofabrication (TBN) is a family of emerging nanofabrication techniques that use a nanometer scale tip to fabricate nanostructures. In this review, we first introduce the history of the TBN and the technology development. We then briefly review various TBN techniques that use different physical or chemical mechanisms to fabricate features and discuss some of the state-of-the-art techniques. Subsequently, we focus on those TBN methods that have demonstrated potential to scale up the manufacturing throughput. Finally, we discuss several research directions that are essential for making TBN a scalable nano-manufacturing technology. Keywords: tip-based nanofabrication; scanning probe lithography; scalable nanomanufacturing; atomic force microscope; scanning tunneling microscope 1. Introduction Since its inception, the ability to fabricate structures and devices at the nanoscale has been the cornerstone of nanotechnology. Nanofabrication can generally be categorized into top-down and bottom-up approaches, although some emerging fabrication techniques are a combination of the two approaches.
    [Show full text]
  • Optimization Methods for 3D Lithography Process Utilizing DMD-Based Maskless Grayscale Photolithography System
    Delft University of Technology Optimization methods for 3D lithography process utilizing DMD-based maskless grayscale photolithography system Ma, X; Kato, Y; Hirai, Y; van Kempen, Floris; van Keulen, Fred; Tsuchiya, T; Tabata, O DOI 10.1117/12.2084486 Publication date 2015 Document Version Final published version Published in Optical Microlithography XXVIII Citation (APA) Ma, X., Kato, Y., Hirai, Y., van Kempen, F., van Keulen, F., Tsuchiya, T., & Tabata, O. (2015). Optimization methods for 3D lithography process utilizing DMD-based maskless grayscale photolithography system. In K. Lai, & A. Erdmann (Eds.), Optical Microlithography XXVIII (Vol. 9426, pp. 1-10). [94260F] (Proceedings of SPIE; Vol. 9426). Bellingham, WA, USA: SPIE. https://doi.org/10.1117/12.2084486 Important note To cite this publication, please use the final published version (if applicable). Please check the document version above. Copyright Other than for strictly personal use, it is not permitted to download, forward or distribute the text or part of it, without the consent of the author(s) and/or copyright holder(s), unless the work is under an open content license such as Creative Commons. Takedown policy Please contact us and provide details if you believe this document breaches copyrights. We will remove access to the work immediately and investigate your claim. This work is downloaded from Delft University of Technology. For technical reasons the number of authors shown on this cover page is limited to a maximum of 10. Optimization methods for 3D lithography process utilizing DMD-based maskless grayscale photolithography system Xiaoxu Ma*a, Yoshiki Katoa, Yoshikazu Hiraia, Floris van Kempenb, Fred van Keulenb, Toshiyuki Tsuchiyaa, Osamu Tabataa aDept.
    [Show full text]