2019 Corporate Responsibility Report
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High-End EUV Photomask Repairs for Advanced Nodes
High-end EUV Photomask Repairs for advanced nodes Dr. Michael Waldow Product Manager vZTech - Virtual SMS Tech Conference, 18.05.2021 Agenda 1 Introduction 2 High-end EUV photomask repairs 3 Summary Carl ZEISS SMT GmbH, Dr. Michael Waldow, Semiconductor Mask Solutions 18.05.2021 2 Agenda 1 Introduction 2 High-end EUV photomask repairs 3 Summary Carl ZEISS SMT GmbH, Dr. Michael Waldow, Semiconductor Mask Solutions 18.05.2021 3 Introduction EUV High-Volume manufacturing ramping up SAMSUNG newsroom C. C. Wei – TSMC - CEO & Vice Chairman* MAY 21, 2021 JULY 16, 2020 “…new production line in Pyeongtaek, Korea…will produce 14- ‚Next, let me talk about our N5 ramp up and N4 introduction. N5 is the foundry nanometer DRAM and 5-nanometer logic, …based on EUV...” industry's most advanced solution with best PPA. N5 is already in volume Anandtech.com - APRIL 02, 2021 production with good yield, while we continue to improve the “… South Korea authorities this week gave SK Hynix a green light to build We are seeing robust productivity and performance of the EUV tools. a new, 120 trillion won ($106.35 billion) fab complex…. using demand for N5 and expect a strong ramp of N5 in the second half of this year, driven by both 5G smartphones and HPC applications.‘ process technologies that rely on extreme ultraviolet lithography (EUV)…’ ▪ EUV is becoming more and more important and Intel: The Empire Strikes Back** MAY 21, 2021 amount of EUV lithographic layers is rising ‚while the outlook on EUV was still quite uncertain. Hence, Intel's initial 7nm ▪ First consumer products based on EUV seems to have used EUV quite conservatively, in relatively few layers. -
Advanced Packaging Solutions
Advanced Packaging Solutions Highlights Providing silicon-scaling • Advanced packaging capabilities in solutions for tomorrow’s applications 2.5D, 3D, WLP and Silicon Photonics GLOBALFOUNDRIES post-fab services provide complementary and extended • Power, performance, cost and solutions with complete supply chain management including bump, probe, form-factor optimized solutions packaging and final test. The flexible supply chain model is tailored to your • Industry leader in smart interposers needs with services ranging from bump and probe only to a more comprehen- sive spectrum of services including package design, assembly and test. • In-house bump and wafer probe capabilities In addition to in-house bump and probe capabilities, we provide packaging • Advanced memory integration services in collaboration with a network of established OSAT partners, includ- with stacked memories ing 2D packages as well as 2.5D and 3D advanced package technologies. Test development and capabilities include RF, analog, embedded memory, • Ownership and process maturity for HVM and mmWave applications, with wide array of tester platforms for wafer sort operations. • Advanced silicon node CPI and qualification Packaging Requirements • RF system-in-package and Package types are selected based on performance requirements and optimized mmWave packaging capability for market segments including IoT, RF, Automotive, Mobile, High-end • Partnerships and strong relationships Computing, Networking and Storage. with leading-edge OSATs • Flexible supply chain and Mobile IoT RF Automotive Computing Networking Storage collaborative business models QFN FBGA WLCSP FOWLP SiP fcCSP FCBGA 2.5D 3D Si-PH Advanced Packaging Solutions Packaging Technologies TSV Si Interposer Availability GF Si nodes are qualified in a wide range of package Full Reticle 26x33mm2 technologies including 2D wirebond designs, flip Stitched Interposer >1300 mm2 chip, WLCSP and FOWLP configurations, as well 10:1 Aspect Ratio TSV 10um Dia./ 100um Depth as 2.5D, 3D and Si-Photonics. -
(NASDAQ: ASML) Recommendation: Long I Current Stock Price
ASML Holding NV (NASDAQ: ASML) Recommendation: Long I Current stock price: $651 I 5-year target price: $245 / $1,039 / $1,371 (Bear / Base / Bull) All financial and valuation information is presented in Euro Shradha Mani I sm4843 I [email protected] I April 22, 2021 ASML is a market leader (almost a monopoly) in lithography equipment, an advanced, precision technology which is essential to the manufacture of semiconductor chips. In turn, semiconductors power our phones, computers, automobiles and are basically the foundation of technology as we know it today. Thus, the semiconductor industry (customers of ASML) is poised for strong secular growth. “We provide our customers with everything they need – hardware, software and services – to mass produce patterns on silicon, allowing them to increase the value and lower the cost of a chip.” ASML’s essential position in the semiconductor ecosystem, and its product lines are described below1: . Lithography systems that print the tiny features that form the basis of a microchip with precision. These systems can be new or refurbished. o Extreme Ultraviolet Lithography Systems o Deep Ultraviolet Lithography Systems . Metrology and Inspection Systems measure the quality of patterns on chips and help locate and analyze chip defects . Computational Lithography algorithms optimize the manufacturing process to minimize defects . Customer Support and Service What does ASML do i.e. how does it earn revenue and who are the company’s customers ? Revenue disaggregation 2018 2019 2020 Extreme UV lithography -
Product Engineer Program Apply Now the Product/Test Engineers at Texas Instruments Are Powered by a Passion for Continual Improvement
Product Engineer Program Apply Now The Product/Test Engineers at Texas Instruments are powered by a passion for continual improvement. Our solutions make a real difference, and yours will, too. We make the semiconductor product design process easier and faster, which helps our customers succeed in today's fast-paced marketplace. Opportunities are available in North America and Asia. About the job In this role, you will work on the development and implementation of strategies that achieve profitability targets on assigned TI product lines through a variety of new product development, cost reduction, capacity expansion and yield enhancement projects. You will serve as the primary point of contact for all operational aspects related to your assigned product portfolio, resolve customer quality and application issues, and facilitate cross- functional teams for problem solving. You will also take a leadership role to establish relationships with key contacts in TI wafer fabrication and assembly manufacturing sites to ensure strong communication and effective problem solving. About the program In this empowering, two-year rotation program, you will be on an accelerated development track that’s focused on the product development cycle. As a program participant, you will rotate through four six-month assignments centered on improving product efficiency and quality, which contributes directly to the company’s bottom line. Here, you will have the opportunity to establish solid customer relationships and make deep and meaningful connections. You will also have the chance to be mentored and develop strong collaboration skills through cross-functional group interaction and international travel. Program participants begin with a two-week orientation. -
From Sand to Circuits
From sand to circuits By continually advancing silicon technology and moving the industry forward, we help empower people to do more. To enhance their knowledge. To strengthen their connections. To change the world. How Intel makes integrated circuit chips www.intel.com www.intel.com/museum Copyright © 2005Intel Corporation. All rights reserved. Intel, the Intel logo, Celeron, i386, i486, Intel Xeon, Itanium, and Pentium are trademarks or registered trademarks of Intel Corporation or its subsidiaries in the United States and other countries. *Other names and brands may be claimed as the property of others. 0605/TSM/LAI/HP/XK 308301-001US From sand to circuits Revolutionary They are small, about the size of a fingernail. Yet tiny silicon chips like the Intel® Pentium® 4 processor that you see here are changing the way people live, work, and play. This Intel® Pentium® 4 processor contains more than 50 million transistors. Today, silicon chips are everywhere — powering the Internet, enabling a revolution in mobile computing, automating factories, enhancing cell phones, and enriching home entertainment. Silicon is at the heart of an ever expanding, increasingly connected digital world. The task of making chips like these is no small feat. Intel’s manufacturing technology — the most advanced in the world — builds individual circuit lines 1,000 times thinner than a human hair on these slivers of silicon. The most sophisticated chip, a microprocessor, can contain hundreds of millions or even billions of transistors interconnected by fine wires made of copper. Each transistor acts as an on/off switch, controlling the flow of electricity through the chip to send, receive, and process information in a fraction of a second. -
Spring 2017 Industry Study Industry Report Electronics
Spring 2017 Industry Study Industry Report Electronics The Dwight D. Eisenhower School for National Security and Resource Strategy National Defense University Fort McNair, Washington, DC 20319-5062 i ELECTRONICS 2017 ABSTRACT: While currently assessed as mature and healthy, the global semiconductor industry is facing a strategic inflection point. This inflection will shape a future for the industry that is significantly different than the past. Although outlook for that future remains favorable, numerous challenges place that future at risk. Challenges found in Chinese competition, skilled workforce shortages, commercial semiconductor market shifts, unique DoD electronics needs, and ongoing requirements for rapid innovation threaten the stability of the market, the U.S. competitive advantage, and U.S. economic and national security. Future success in the industry hinges upon policies which address these challenges and enable U.S. companies to embrace future opportunities. LTC Khalid Alothman, Saudi Arabian Army CDR Terri L. Gabriel, U.S. Navy LTC Kevin F. Hanrahan, U.S. Army COL Jeffrey Howell, U.S. Army Mr. Benjamin Lam, U.S. Dept. of State Mr. Steven Mapes, Office of the Secretary of Defense Lt Col Adrian Meyer, Air National Guard COL Michael Samson, Philippine Army Col James E. Smith, U.S. Air Force Mr. Keith Smithson, Dept. of Energy COL William Smoot, U.S. Army Mr. Sim Walker, Dept. of the Army Lt Col Aaron Weiner, U.S. Air Force Ms. Denise L. Williams, Office of the Secretary of Defense Dr. Stephen Basile, Faculty Mr. Michael Dixon, Department of State, Faculty Col Thomas A. Santoro, Jr., U.S. Air Force, Faculty ii Industry Study Outreach and Field Studies On Campus Presenters BAE Systems, Inc., Arlington, VA Bureau of East Asian and Pacific Affairs, U.S. -
Heading Towards Big Data Building a Better Data Warehouse for More Data, More Speed, and More Users
Heading Towards Big Data Building A Better Data Warehouse For More Data, More Speed, And More Users Raymond Gardiner Goss [email protected] Kousikan Veeramuthu [email protected] Manufacturing Technology GLOBALFOUNDRIES Malta, NY, USA Abstract—As a new company, GLOBALFOUNDRIES is determine the caller’s income level and specify to which agent aggressively agile and looking at ways to not just mimic existing to route the call or the switch would timeout. When switches semiconductor manufacturing data management but to leverage were overwhelmed with data, they would drop packets and new technologies and advances in data management without algorithms had to infer states based on most probable current sacrificing performance or scalability. Being a global technology state. Other industries, such as social media, are challenged company that relies on the understanding of data, it is important to centralize the visibility and control of this information, bringing more by unstructured data and need tools to help turn text it to the engineers and customers as they need it. messages and photos into useful information for search engines and marketing purposes. The challenge in the semiconductor Currently, the factories are employing the best practices and world is with the size of the data. Speed becomes a secondary data architectures combined with business intelligence analysis problem because so many sources are needed to be joined and reporting tools. However, the expected growth in data over together in a timely manner. Large recipes, complex output the next several years and the need to deliver more complex data integration for analysis will easily stress the traditional tools from the test floor combined now with more Interface-A trace beyond the limits of the traditional data infrastructure. -
Gray-Scale Photolithography Using Microfluidic Photomasks
Gray-scale photolithography using microfluidic photomasks Chihchen Chen, Danny Hirdes, and Albert Folch* Department of Bioengineering, University of Washington, Seattle, WA 98195 Edited by George M. Whitesides, Harvard University, Cambridge, MA, and approved December 23, 2002 (received for review September 23, 2002) The ability to produce three-dimensional (3D) microstructures is of Here we demonstrate a type of gray-scale photomasks that increasing importance in the miniaturization of mechanical or allow for patterning large areas (Ͼ3 inches in diameter) using fluidic devices, optical elements, self-assembling components, and standard photolithographic equipment (i.e., a contact mask tissue-engineering scaffolds, among others. Traditional photoli- aligner with a collimated UV source). Our photomasks contain thography, the most widely used process for microdevice fabrica- light-absorbing features that are liquid (i.e., dyes) and can be tion, is ill-suited for 3D fabrication, because it is based on the addressed (i.e., altered) by means of microfluidic channels. We illumination of a photosensitive layer through a ‘‘photomask’’ term them ‘‘microfluidic photomasks’’ (FPMs). The FPMs (a transparent plate that contains opaque, unalterable solid-state are advantageous in that (i) they contain a virtually unlimited features), which inevitably results in features of uniform height. number of gray scales as given by variations in dye concentration, We have devised photomasks in which the light-absorbing fea- (ii) they can be manufactured rapidly and inexpensively, and tures are made of fluids. Unlike in conventional photomasks, the (iii) the fluidic patterns can be changed in the time scale of a opacity of the photomask features can be tailored to an arbitrary few seconds, thus allowing for rapid reconfiguration of the number of gray-scale levels, and their spatial pattern can be photomask. -
Integrated Circuit (Ic) and Photomask Images Processing Technology
INTEGRATED CIRCUIT (IC) AND PHOTOMASK IMAGES PROCESSING TECHNOLOGY A. Doudkin, D. Vershok Laboratory of System Identification of United Institute of Informatics Problems of NASB, 6, Surganova str., BY-220012, Minsk, Belarus e-mails: doudkin{vershok}@newman.bas-net.by Abstract. The integrated circuit and photomask images processing technology is proposed. This technology allows to perform the restoration of the integrated-circuit metallization layout and the mask artwork from the images of IC metallization layers or photomask set correspondingly. It can be applied for the tasks of integrated circuits redesign and automated visual inspection of integrated circuits and photomask production. 1. Introduction The modern semiconductor manufacturing needs to control all of the critical process modules that drive IC manufacturing success. Several factors inherent in the semiconductor industry drive the critical need for comprehensive yield management and process control solutions. Among the most significant of these are: increasing device complexity; shrinking geometries; reduced product life cycles. The visual or optical inspec- tion is the important part of such control solutions. It implies the presence of some operative analysis system [1] providing image registration, visual information processing and analysis. In this paper the main attention is paid to image processing technology which was developed for this sort of the systems. 2. Problem formulation The proposed technology has the following objectives: 1 restoration of the integrated-circuit metalli- zation layout from the images of IC metallization layers; 2 restoration of the mask artwork from the images of photomask set. Thus, the objects of processing are raster patterns of IC metallization layers and IC pho- tomasks, represented as the collection of partially overlapping images (frames) without any reference marks (Fig 1.). -
Boa Motion to Dismiss
Case 21-10036-CSS Doc 211-4 Filed 02/15/21 Page 425 of 891 Disposition of the Stapled Securities Gain on sale of Stapled Securities by a Non-U.S. Stapled Securityholder will not be subject to U.S. federal income taxation unless (i) the Non-U.S. Stapled Securityholder’s investment in the Stapled Securities is effectively connected with its conduct of a trade or business in the United States (and, if provided by an applicable income tax treaty, is attributable to a permanent establishment or fixed base the Non-U.S. Stapled Securityholder maintains in the United States) and a properly completed Form W-8ECI has not been provided, (ii) the Non-U.S. Stapled Securityholder is present in the United State for 183 days or more in the taxable year of the sale and other specified conditions are met, or (iii) the Non-U.S. Stapled Securityholder is subject to U.S. federal income tax pursuant to the provisions of the U.S. tax law applicable to U.S. expatriates. If gain on the sale of Stapled Securities would be subject to U.S. federal income taxation, the Stapled Securityholder would generally recognise any gain or loss equal to the difference between the amount realised and the Stapled Securityholder’s adjusted basis in its Stapled Securities that are sold or exchanged. This gain or loss would be capital gain or loss, and would be long-term capital gain or loss if the Stapled Securityholder’s holding period in its Stapled Securities exceeds one year. In addition, a corporate Non-U.S. -
Wafer Fabrication: Factory Performance and Analysis Series: the Springer International Series in Engineering and Computer Science, Vol
L.F. Atherton, R.W. Atherton Wafer Fabrication: Factory Performance and Analysis Series: The Springer International Series in Engineering and Computer Science, Vol. 339 This book is concerned with wafer fabrication and the factories that manufacture microprocessors and other integrated circuits. With the invention of the transistor in 1947, the world as we knew it changed. The transistor led to the microprocessor, and the microprocessor, the guts of the modern computer, has created an epoch of virtually unlimited information processing. The electronics and computer revolution has brought about, for better or worse, a new way of life. This revolution could not have occurred without wafer fabrication, and its associated processing technologies. A microprocessor is fabricated via a lengthy, highly-complex sequence of chemical processes. The success of modern chip manufacturing is a miracle of technology and a tribute to the hundreds of engineers who have contributed to its development. This book will delineate the magnitude of the accomplishment, and present methods to analyze and predict the performance of the factories that make the chips. The set of topics covered juxtaposes several disciplines of engineering. A primary subject is the chemical engineering aspects of the electronics industry, an industry typically thought to be strictly 1996, XX, 468 p. an electrical engineer's playground. The book also delves into issues of manufacturing, operations performance, economics, and the dynamics of material movement, topics often considered the domain of industrial engineering and operations research. Hopefully, Printed book we have provided in this work a comprehensive treatment of both the technology and the factories of wafer fabrication. -
RF CMOS: Integrated on a Chip FE ANALOG Modules: ANALOG
TowerJazz (TSEM) Investor and Analyst Day November 16, 2016 | New York Safe Harbor This presentation contains forward-looking statements within the meaning of the “safe harbor” provisions of the Private Securities Litigation Reform Act of 1995. These statements are based on management’s current expectations and beliefs and are subject to a number of risks, uncertainties and assumptions that could cause actual results to differ materially from those described in the forward-looking statements. All statements other than statements of historical fact are statements that could be deemed forward-looking statements. For example, statements regarding expected (i) customer demand, (ii) utilization and cross utilization of our Fabs, (iii) growth in our end markets, (iv) market and technology trends, and (v) growth in revenues, cash flow, margins and net profits are all forward-looking statements. Actual results may differ materially from those projected or implied by such forward-looking statements due to various risks and uncertainties applicable to TowerJazz’s business as described in the reports filed by Tower Semiconductor Ltd. (“Tower”) with the Securities and Exchange Commission (the “SEC”) and the Israel Securities Authority (“ISA”), including the risks identified under the heading "Risk Factors" in Tower’s most recent filings on Forms 20-F and 6-K. No assurances can be given that any of the events anticipated by the forward-looking statements will transpire or occur, or if any of them do, what impact they will have on the results of operations or financial condition of TowerJazz. TowerJazz is providing this information as of the date of this presentation and expressly disclaims any obligation to update any of the forward-looking statements or other information contained in this document as a result of new information, future events or otherwise.