Design and Process Developments Towards an Optimal 6.5 Kv Sic Power MOSFET

Total Page:16

File Type:pdf, Size:1020Kb

Design and Process Developments Towards an Optimal 6.5 Kv Sic Power MOSFET Design and process developments towards an optimal 6.5 kV SiC power MOSFET Victor Soler ADVERTIMENT La consulta d’aquesta tesi queda condicionada a l’acceptació de les següents condicions d'ús: La difusió d’aquesta tesi per mitjà del r e p o s i t o r i i n s t i t u c i o n a l UPCommons (http://upcommons.upc.edu/tesis) i el repositori cooperatiu TDX ( h t t p : / / w w w . t d x . c a t / ) ha estat autoritzada pels titulars dels drets de propietat intel·lectual únicament per a usos privats emmarcats en activitats d’investigació i docència. No s’autoritza la seva reproducció amb finalitats de lucre ni la seva difusió i posada a disposició des d’un lloc aliè al servei UPCommons o TDX. No s’autoritza la presentació del seu contingut en una finestra o marc aliè a UPCommons (framing). Aquesta reserva de drets afecta tant al resum de presentació de la tesi com als seus continguts. En la utilització o cita de parts de la tesi és obligat indicar el nom de la persona autora. ADVERTENCIA La consulta de esta tesis queda condicionada a la aceptación de las siguientes condiciones de uso: La difusión de esta tesis por medio del repositorio institucional UPCommons (http://upcommons.upc.edu/tesis) y el repositorio cooperativo TDR (http://www.tdx.cat/?locale- attribute=es) ha sido autorizada por los titulares de los derechos de propiedad intelectual únicamente para usos privados enmarcados en actividades de investigación y docencia. No se autoriza su reproducción con finalidades de lucro ni su difusión y puesta a disposición desde un sitio ajeno al servicio UPCommons No se autoriza la presentación de su contenido en una ventana o marco ajeno a UPCommons (framing). Esta reserva de derechos afecta tanto al resumen de presentación de la tesis como a sus contenidos. En la utilización o cita de partes de la tesis es obligado indicar el nombre de la persona autora. WARNING On having consulted this thesis you’re accepting the following use conditions: Spreading this thesis by the i n s t i t u t i o n a l r e p o s i t o r y UPCommons (http://upcommons.upc.edu/tesis) and the cooperative repository TDX (http://www.tdx.cat/?locale- attribute=en) has been authorized by the titular of the intellectual property rights only for private uses placed in investigation and teaching activities. Reproduction with lucrative aims is not authorized neither its spreading nor availability from a site foreign to the UPCommons service. Introducing its content in a window or frame foreign to the UPCommons service is not authorized (framing). These rights affect to the presentation summary of the thesis as well as to its contents. In the using or citation of parts of the thesis it’s obliged to indicate the name of the author. Design and Process Developments towards an Optimal 6.5 kV SiC Power MOSFET Victor Soler PhD in Electronic Engineering Barcelona, 2019 PhD program in electronic engineering Department of electronic engineering Design and process developments towards an optimal 6.5 kV SiC power MOSFET Doctoral thesis by: Victor Soler 0000-0001-8341-8549 Thesis advisors: Director Prof. Philippe Godignon Co-director Dr. José Rebollo Institut de microelectròncia de Barcelona IMB-CNM (CSIC) 2019 ABSTRACT Keywords: Silicon Carbide; High-voltage; Power MOSFET; Wide Bandgap Semiconductors; Edge Termination; Cell Design. A sustainable future requires efficient power electronic converters at any stage of the electrical energy consumption. Silicon carbide (SiC) is one of the most technologically advanced wide bandgap semiconductors that can outperform silicon limits for power devices. SiC power MOSFETs are of the greatest interest since they are unipolar gate-controlled switches with high blocking voltage capability and reasonably low specific on-resistance. The focus of this thesis is on the design optimisation and process technology refinement towards the improvement of high-voltage SiC MOSFETs. Previous developments in our group were taken as a reference for this work. The results of this research allowed the fabrication of large-area SiC power MOSFETs with voltage ranges targeting 1.7 kV up to 6.5 kV. The inherent properties of SiC entail challenging technological solutions to successfully integrate a power MOSFET of such high-voltage capability. To ensure suitable blocking capability, different planar edge termination structures have been designed, optimised by TCAD simulation and implemented on PiN diodes. The termination schemes considered are single- zone JTE, FGRs and a novel RA-JTE structure combining JTE with rings. RA-JTE design, with the lowest sensitivity to fabrication process deviations and a lower consumed area, achieved more than 90% of the ideal breakdown voltage and suitable blocking capability up to 6.5 kV. The optimisations performed on the unit-cell of the SiC power MOSFET target both the layout design and the fabrication process. The optimisation has been performed by TCAD modelling and experimental evaluation of specific test structures. Several techniques to improve the performance of the fabricated devices have been considered: i) the use of an offset retrograde p-body profile to provide an adequate Vth value while preventing p-body punch-through, ii) a submicronic self-aligned channel definition, iii) a boron treatment to the gate oxide to improve channel mobility, iv) a discrete location of the p-contact to reduce cell-pitch, v) the use of a lower-doped-source (LDS) to improve i Design and process developments towards an optimal 6.5 kV SiC power MOSFET reliability, vi) the optimisation of the JFET area, and vii) the integration of gate runners to improve the switching performance. As a result of these investigations, a full mask-set were designed and used for processing wafers of several voltage-class in different batches. All the fabrication steps have been carried out at IMB-CNM cleanroom. The electrical characterisation of large-area devices has evidenced an optimal Vth in the range of 5 V, a proper gate control, and a good blocking capability. We obtained relatively high specific on-resistance due to the large cell pitch dimensions required by IMB-CNM cleanroom design rules as well as a still low channel mobility. Fabricated SiC MOSFETs are capable of switching at high bus voltages (tested up to 80% of the rated voltage). Although, their switching performance is limited by internal gate resistance. Fabricated devices have shown better short- devices, mainly due to the circuitcell design capability considerations. (>15 μs) than existing commercial The evaluation of electrical performance evidenced the successful functionality of the fabricated VDMOS up to 6.5 kV and validates our new RA- JTE termination design. On the other hand, the novel boron doping treatment to the gate oxide clearly demonstrated to improve the on-resistance of our devices in all voltage classes without affecting breakdown and short-circuit capabilities. Nevertheless, it strongly compromises stability and reliability at temperatures above 100 °C. These results show that the MOS interface quality is still the major issue for the development of reliable SiC power MOSFETs. Finally, alternative SiC structures have also been investigated to take advantage of the SiC superior material properties. These include a SiC IGBT showing conductivity modulation, and a preliminary SiC CMOS cell able to operate at high temperatures. ii PREFACE The improvement of power electronics devices has a direct impact on numerous industry sectors such as electric distribution, traction and electric vehicles (EV). Focusing on electric distribution, the development of higher- efficient, high-voltage power devices is crucial for the construction of future smart-grids, easing the integration of distributed resources such as energy storage, mixed power supply, and plug-in EV. It is widely accepted that a new generation of semiconductor power devices, able to operate in the range of kilovolts, will be crucial in the future for driving down the cost of generation, transmission and distribution of power electronics systems. Nevertheless, silicon (Si) power device technology is currently reaching its limits with respect to its fundamental material properties, impacting the capability and efficiency of novel power semiconductor systems. On the other hand, the properties of wide bandgap (WBG) semiconductors, clearly superior to those of Si, will lead to enhanced power devices with much better performances than conventional Si devices. WBG-based devices, being capable to operate at higher voltages and frequencies, will increase the efficiency of high-voltage converters. Aside this, silicon carbide (SiC) power devices provide an additional advantage by requiring smaller cooling systems, which is crucial in some applications. Today, WBG are crucial parts in numerous industrial applications. For instance, the recent implantation of the 5G mobile network rely on high speed switching GaN devices. Over the last few years, SiC devices have provided a technology alternative to silicon power modules in various low voltage (600 V to 1.7 kV) applications, in which the SiC power MOSFET is the preferred option among the different other switch architectures (BJT, JFET). Today, large part of the development and production of SiC power MOSFETs is destined to the hybrid and full electric vehicle market, providing better efficiency and a considerable reduction of the total volume, weight and cost of the full system. Furthermore, SiC devices will also lead the next generation of power devices in higher voltage ratings ( 3.3 kV) to achieve a more rational use of the energy ≥ iii Design and process developments towards an optimal 6.5 kV SiC power MOSFET by increasing the efficiency of the power converters at any stage of the energy generation-distribution-storage cycle. In this sense, the main motivation of this thesis is to develop and improve the SiC power devices technology in terms of static and dynamic performance, as well as reliability, towards their future adoption in higher voltage applications.
Recommended publications
  • UCC27531 35-V Gate Driver for Sic MOSFET Applications (Rev. A)
    (1) Application Report SLUA770A–March 2016–Revised May 2018 UCC27531 35-V Gate Driver for SiC MOSFET Applications Richard Herring........................................................................................... High Power Driver Solutions ABSTRACT SiC MOSFETs are gaining popularity in many high-power applications due to their significant switching performance advantages. SiC MOSFETs are also available with attractive voltage ratings and current capabilities. However, the characteristics of SiC MOSFETs require consideration of the gate-driver circuit to optimize the switching performance of the SiC device. Although SiC MOSFETs are not difficult to drive properly, many typical MOSFET drivers may result in compromised switching speed performance. The UCC27531 gate driver includes features and has operating parameters that allow for driving SiC power MOSFETs within the recommended optimum drive configuration. This application note reviews the characteristics of SiC MOSFETs and how to drive them to achieve the performance improvement that SiC can bring at the system level. The features of UCC27531 to achieve optimal performance of SiC are explained and results from a demonstration circuit are provided. 1 Introduction In the past, the majority of applications such as uninterruptible power supplies (UPS), photovoltaic (PV) inverters, and motor drive have utilized IGBTs for the power devices due to the combination of high- voltage ratings exceeding 1 kV and high current capability. Usable switching frequency of IGBTs has typically been limited to 20–30 kHz, due to the high turnoff losses caused by the long turnoff current tail. Design comparisons have shown that SiC MOSFET designs can operate at considerably higher switching frequency and achieve the same or better efficiency. Although the device cost of the SiC MOSFETs are higher than the equivalent IGBTs, the significant savings in transformer, capacitor, and enclosure size results in a lower system cost.
    [Show full text]
  • Design, Implementation, Modeling, and Optimization of Next Generation Low-Voltage Power Mosfets
    Design, Implementation, Modeling, and Optimization of Next Generation Low-Voltage Power MOSFETs by Abraham Yoo A thesis submitted in conformity with the requirements for the degree of Doctor of Philosophy Department of Materials Science and Engineering University of Toronto © Copyright by Abraham Yoo 2010 Design, Implementation, Modeling, and Optimization of Next Generation Low-Voltage Power MOSFETs Abraham Yoo Doctor of Philosophy Department of Materials Science and Engineering University of Toronto 2010 Abstract In this thesis, next generation low-voltage integrated power semiconductor devices are proposed and analyzed in terms of device structure and layout optimization techniques. Both approaches strive to minimize the power consumption of the output stage in DC-DC converters. In the first part of this thesis, we present a low-voltage CMOS power transistor layout technique, implemented in a 0.25µm, 5 metal layer standard CMOS process. The hybrid waffle (HW) layout was designed to provide an effective trade-off between the width of diagonal source/drain metal and the active device area, allowing more effective optimization between switching and conduction losses. In comparison with conventional layout schemes, the HW layout exhibited a 30% reduction in overall on-resistance with 3.6 times smaller total gate charge for CMOS devices with a current rating of 1A. Integrated DC-DC buck converters using HW output stages were found to have higher efficiencies at switching frequencies beyond multi-MHz. ii In the second part of the thesis, we present a CMOS-compatible lateral superjunction FINFET (SJ-FINFET) on a SOI platform. One drawback associated with low-voltage SJ devices is that the on-resistance is not only strongly dependent on the drift doping concentration but also on the channel resistance as well.
    [Show full text]
  • Driving Egantm Transistors for Maximum Performance
    Driving eGaNTM Transistors for Maximum Performance Johan Strydom: Director of Applications, Efficient Power Conversion Corporation Alex Lidow: CEO, Efficient Power Conversion Corporation The recent introduction of enhancement mode MOSFET development, silicon has approached GaN transistors (eGaN™) as power MOSFET/ its theoretical limits. In contrast, GaN is young in IGBT replacements in power management its life cycle, and will see significant improvement applications enables many new products that in the years to come. promise to add great system value. In general, an eGaN transistor behaves much like a power MOSFET with a quantum leap in performance, but to extract all of the newly-available eGaN transistor performance requires designers to understand the differences in drive requirements. eGaN Power Transistor Characteristics As with silicon power MOSFETs, applying a positive bias to the gate relative to the source of an eGaN power transistor causes a field effect, which attracts electrons that complete a Figure 1. Theoretical resistance times die area limits of GaN, silicon, and silicon carbide versus voltage. bidirectional channel between the drain and the source. When the bias is removed from the gate, the electrons under it are dispersed into the GaN, Figure of Merit (FOM) recreating the depletion region and, once again, giving it the capability to block voltage. The FOM is a useful method for comparing power devices and has been used by MOSFET To obtain a higher-voltage device, the distance manufactures to show both generational between the drain and gate is increased. Doing improvements and to compare their parts to so increases the on-resistance of the transistor.
    [Show full text]
  • Work Function and Process Integration Issues of Metal
    WORK FUNCTION AND PROCESS INTEGRATION ISSUES OF METAL GATE MATERIALS IN CMOS TECHNOLOGY REN CHI NATIONAL UNIVERSITY OF SINGAPORE 2006 WORK FUNCTION AND PROCESS INTEGRATION ISSUES OF METAL GATE MATERIALS IN CMOS TECHNOLOGY REN CHI B. Sci. (Peking University, P. R. China) 2002 A THESIS SUBMITTED FOR THE DEGREE OF DOCTOR OF PHILOSOPHY DEPARTMENT OF ELECTRICAL AND COMPUTER ENGINEERING NATIONAL UNIVERSITY OF SINGAPORE OCTOBER 2006 _____________________________________________________________________ ACKNOWLEGEMENTS First of all, I would like to express my sincere thanks to my advisors, Prof. Chan Siu Hung and Prof. Kwong Dim-Lee, who provided me with invaluable guidance, encouragement, knowledge, freedom and all kinds of support during my graduate study at NUS. I am extremely grateful to Prof. Chan not only for his patience and painstaking efforts in helping me in my research but also for his kindness and understanding personally, which has accompanied me over the past four years. He is not only an experienced advisor for me but also an elder who makes me feel peaceful and blessed. I also greatly appreciate Prof. Kwong from the bottom of my heart for his knowledge, expertise and foresight in the field of semiconductor technology, which has helped me to avoid many detours in my research work. I do believe that I will be immeasurably benefited from his wisdom and professional advice throughout my career and my life. I would also like to thank Prof. Kwong for all the opportunities provided in developing my potential and personality, especially the opportunity to join the Institute of Microelectronics, Singapore to work with and learn from so many experts in a much wider stage.
    [Show full text]
  • 1Q 2013Issue Analog Applications Journal
    Texas Instruments Incorporated High-Performance Analog Products Analog Applications Journal First Quarter, 2013 © Copyright 2013 Texas Instruments Texas Instruments Incorporated IMPORTANT NOTICE Texas Instruments Incorporated and its subsidiaries (TI) reserve the right to make corrections, enhancements, improvements and other changes to its semiconductor products and services per JESD46, latest issue, and to discontinue any product or service per JESD48, latest issue. Buyers should obtain the latest relevant information before placing orders and should verify that such information is current and complete. All semiconductor products (also referred to herein as “components”) are sold subject to TI’s terms and conditions of sale supplied at the time of order acknowledgment. TI warrants performance of its components to the specifications applicable at the time of sale, in accordance with the warranty in TI’s terms and conditions of sale of semiconductor products. Testing and other quality control techniques are used to the extent TI deems necessary to support this warranty. Except where mandated by applicable law, testing of all parameters of each component is not necessarily performed. TI assumes no liability for applications assistance or the design of Buyers’ products. Buyers are responsible for their products and applications using TI components. To minimize the risks associated with Buyers’ products and applications, Buyers should provide adequate design and operating safeguards. TI does not warrant or represent that any license, either express or implied, is granted under any patent right, copyright, mask work right, or other intellectual property right relating to any combination, machine, or process in which TI components or services are used. Information published by TI regarding third-party products or services does not constitute a license to use such products or services or a warranty or endorsement thereof.
    [Show full text]
  • LV MOSFET Applications High Power, High Quality Discrete Class D Amplifi Er
    LV MOSFET applications High power, high quality discrete Class D amplifi er A range of Philips LV MOSFET devices Effi cient and cost-effective Discrete 200W UcD is specifi cally targeted at demanding, The Class D concept allows effi cient demonstration module and cost-effective high output power audio To demonstrate the UcD concept and high frequency switching applications amplifi ers to be created. The Universal Class the enabling MOSFETs, a 200W demo Class like high power Class D D (UcD) principle enables PWM amplifi ers D amplifi er board is available for Philips audio amplifi ers. to perform at an excellent sonic level customers. The demo board will require while making use of a relatively simple an external power supply, a signal source closed-loop topology. (e.g. CD player) and a loudspeaker for initial evaluation. Contact your local Philips sales UcD concept representative for additional information. Class D amplifi ers consist of at least one comparator and one power stage (see fi gure 1). Environmental aspects At the end of the power stage the PWM Compared to conventional high power high output signal is fi ltered using a second order quality amplifi ers, the UcD amplifi er consumes LC fi lter. The UcD concept (developed 20% less power at maximum output power by Philips Digital System Laboratories level. The reduction in dissipated power allows in Leuven, Belgium) includes the LC fi lter for a much smaller and lighter heatsink. in the feedback loop, thus allowing active When disposed of, the UcD amplifi er control over the fi lter behavior.
    [Show full text]
  • Click Here to Download Vlsi Syllabus
    Course Curriculum for Master of Technology Programme in Electronics and Communication Engineering Department National Institute of Technology Goa Farmagudi, Ponda, Goa - 403 401 Semester-wise Credit Distribution Semester Total Credits I 19 II 17 III 14 IV 14 Total Credits 64 1 M.Tech. Program Name: VLSI Semester-wise Distribution of the Courses Semester I Total Credits Credits SI. No. Course Code Course Name (L-T-P) 1 EC600 Digital IC Design (3-0-0) 3 2 EC601 Analog IC Design (3-0-0) 3 3 EC602 Semiconductor Device Theory and Modelling (3-0-0) 3 4 EC603 Digital Signal Processing (3-0-0) 3 5 EC604 IC Design Laboratory (0-0-6) 3 6 EC605 Semiconductor Device Simulation Laboratory (0-0-3) 2 7 EC606 Seminar (0-0-3) 2 Total Credits 19 Semester II Total Credits Credits SI. No. Course Code Course Name (L-T-P) 1 EC650 VLSI Testing and Testability (3-0-0) 3 2 EC651 VLSI Technology (3-0-0) 3 3 Elective I (3-0-0) 3 4 Elective II (3-0-0) 3 5 EC652 System Design Laboratory (0-0-6) 3 6 EC653 VIVA-VOCE - 2 7 HU650* Communication Skills and Technical Writing (1-0-2) - Total Credits 17 Semester III Total Credits Credits SI. No. Course Code Course Name (L-T-P) 1 Elective III (3-0-0) 3 2 Elective IV (3-0-0) 3 3 EC700 Major Project-I (0-0-12) 8 Total Credits 14 Semester IV Total Credits Credits SI. No. Course Code Course Name (L-T-P) 1 EC750 Major Project-II (0-0-21) 14 Total Credits 14 2 List of Electives Electives Total SI.
    [Show full text]
  • IGBT & Sic Gate Driver Fundamentals
    IGBT & SiC Gate Driver Fundamentals Enabling the world to do more with less power ti.com/sic I 3Q 2019 IGBT and SiC power switch fundamentals Outline • IGBT and SiC Power Switch Fundamentals • Isolated Gate Driver Features • IGBT and SiC Protection Basics IGBT & SiC Gate Driver Fundamentals 2 3Q 2019 I Texas Instruments IGBT and SiC power switch fundamentals • What are the markets and applications for insulated gate bipolar transistors (IGBTs) and silicon carbide (SiC) power switches? • What are the advantages of SiC metal-oxide semiconductor field-effect transistors (MOSFETs) over IGBTs and silicon (Si) MOSFET power switches? • What are the differences between Si MOSFET, IGBT and SiC power switches? IGBT & SiC Gate Driver Fundamentals 3 3Q 2019 I Texas Instruments IGBT and SiC applications What are the markets and applications Specifically, applications with bus voltages >400 V SiC MOSFETs are becoming common in power for IGBT and SiC power switches? require device voltage ratings >650 V to leave factor correction power supplies, solar inverters, sufficient margin for safe operation. Applications DC/DC for EVs/HEVs, traction inverters for EVs, Efficient power conversion is heavily dependent including industrial motor drives, electric vehicles/ motor drives and railway, while IGBTs are common on the power semiconductor devices used in the hybrid electric vehicles (EVs/HEVs), traction inverters in motor drives (AC machines), uninterruptible power system. High-power applications are becoming and solar inverters for renewable energy are at the supplies (UPSs), solar central- and string-type more efficient and smaller in size because of power level of a few kilowatts (kW) to a megawatt power inverters <3 kW, and traction inverters improvements in power device technology.
    [Show full text]
  • Application of Jfet and Mosfet
    Application Of Jfet And Mosfet Unconsecrated and showier Abner exemplify some minstrel so irrepressibly! Ron is rodlike: she dusks wordily and muddles her macaroni. When Bud primps his miscegenation whoop not exuberantly enough, is Reed conscience-smitten? When handling mosfet of application jfet mosfet and applications and hence it is to flow between jfet Mosfets is a pn junction reverse bias, its gate and of jfet begins to flow through the fig. MOS the negatively applied gate potential increases the channel resistance thus reducing the drain current. But could potentially useful. Mosfets and of application jfet for automatic brightness cannot be. Array biosensor for the time, copy and switches of dengue virus detecting compatible with that does not always guaranteed to focus on purchases made of jfet current. The LDMOSFET has one lateral channel structure and nourish a state of enhancement MOSFET designed for power applications. We approach a channel formed between its applications such as compared with synthetically encoded properties. The gate electrode is a host of metal whose posture is oxidized. Fets and of application jfet mosfet is brought to the file can conclude that mosfet is needed after a dielectric oxide semiconductor diode across the fet formed between collector. Jfet has an insulator between jfets operate by many circuits from a variable resistor, thus requiring high frequency amplifiers. This region is called as ohmic region. To a sufficient amount and. What is the huge advantage of FET which makes it any useful in industrial applications a Voltage controlled operation b Less cost c Small size d. MOSFETs are the basis for smartphones, each typically containing billions of MOSFETs.
    [Show full text]
  • Semiconductors PCIM 2017 Highlights
    Semiconductors PCIM 2017 Highlights D G S IGBT & MOSFET G ATE D RIVERS • LOW -S IDE G ATE D RIVERS Part Output I Output Available Enable Under-voltage Package Type PEAK Number Type T =25ºC Resistance Logic Function Lockout C (A ) ( ) Confi gurations (V) P : • IXD_630 SINGLE 30 0.4 I, N, D VCC < 12.5 57, 58 • IXD_630M SINGLE 30 0.4 I, N, D VCC < 9 57, 58 IXD_614 SINGLE 14 0.8 I, N, D • - 20, 53, 57, 58 IXD_609 SINGLE 9 1 I, N, D • - 20, 53, 54, 56, 57, 58 IXD_604 DUAL 4 2.5 F, I, N, D • - 20, 53, 54, 56 IX4423N DUAL 3 4 I - - 54 IX4424N DUAL 3 4 N - - 54 IX4424G DUAL 3 4 N - - 20 IX4425N DUAL 3 4 F - - 54 IXD_602 DUAL 2 4 F, I, N - - 20, 53, 54, 56 IX4426 DUAL 1.5 8 I - - 54, 56 IX4427 DUAL 1.5 8 N - - 54, 56 IX4428 DUAL 1.5 8 F - - 54, 56 * AEC-Q100 Qualifi ed Low-Side Gate Drivers Part Output I Output Available Enable Package PEAK Number Type T =25ºC Resistance Logic Function Type C (A ) ( ) Confi gurations P : IXD_614SI SINGLE 14 0.8 I, N, D • 53 IXD_609SI SINGLE 9 1 I, N, D • 53 IXD_604SI DUAL 4 2.5 F, I, N, D • 53 IXD_604SIA DUAL 4 2.5 F, I, N, D • 54 Features: Applications: • AEC-Q100 qualifi ed parts * • Effi cient power MOSFET and IGBT switching • 1.5A to 30A peak source/sink drive current • Switch mode power supplies • Wide operating voltage range: 4.5V to 35V • Motor controls • -40°C to +125°C extended operating temperature range • DC to DC converters • Logic input withstands negative swing of up to -5V • Class-D switching amplifi ers • Matched rise and fall times • Pulse transformer driver • Low propagation delay time • Low 10 PA
    [Show full text]
  • AND9083 Application Note
    ON Semiconductor Is Now To learn more about onsemi™, please visit our website at www.onsemi.com onsemi and and other names, marks, and brands are registered and/or common law trademarks of Semiconductor Components Industries, LLC dba “onsemi” or its affiliates and/or subsidiaries in the United States and/or other countries. onsemi owns the rights to a number of patents, trademarks, copyrights, trade secrets, and other intellectual property. A listing of onsemi product/patent coverage may be accessed at www.onsemi.com/site/pdf/Patent-Marking.pdf. onsemi reserves the right to make changes at any time to any products or information herein, without notice. The information herein is provided “as-is” and onsemi makes no warranty, representation or guarantee regarding the accuracy of the information, product features, availability, functionality, or suitability of its products for any particular purpose, nor does onsemi assume any liability arising out of the application or use of any product or circuit, and specifically disclaims any and all liability, including without limitation special, consequential or incidental damages. Buyer is responsible for its products and applications using onsemi products, including compliance with all laws, regulations and safety requirements or standards, regardless of any support or applications information provided by onsemi. “Typical” parameters which may be provided in onsemi data sheets and/ or specifications can and do vary in different applications and actual performance may vary over time. All operating parameters, including “Typicals” must be validated for each customer application by customer’s technical experts. onsemi does not convey any license under any of its intellectual property rights nor the rights of others.
    [Show full text]
  • Advanced Source/Drain and Contact Design for Nanoscale CMOS
    Advanced Source/Drain and Contact Design for Nanoscale CMOS Reinaldo Vega Electrical Engineering and Computer Sciences University of California at Berkeley Technical Report No. UCB/EECS-2010-84 http://www.eecs.berkeley.edu/Pubs/TechRpts/2010/EECS-2010-84.html May 20, 2010 Copyright © 2010, by the author(s). All rights reserved. Permission to make digital or hard copies of all or part of this work for personal or classroom use is granted without fee provided that copies are not made or distributed for profit or commercial advantage and that copies bear this notice and the full citation on the first page. To copy otherwise, to republish, to post on servers or to redistribute to lists, requires prior specific permission. Advanced Source/Drain and Contact Design for Nanoscale CMOS by Reinaldo Vega A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering-Electrical Engineering and Computer Sciences in the Graduate Division of the University of California, Berkeley Committee in charge: Professor Tsu-Jae King Liu, Chair Professor Chenming Hu Professor Junqiao Wu Spring 2010 Advanced Source/Drain and Contact Design for Nanoscale CMOS Copyright © 2010 by Reinaldo Vega Abstract Advanced Source/Drain and Contact Design for Nanoscale CMOS by Reinaldo Vega Doctor of Philosophy in Engineering – Electrical Engineering and Computer Sciences University of California, Berkeley Professor Tsu-Jae King Liu, Chair The development of nanoscale MOSFETs has given rise to increased attention paid to the role of parasitic source/drain and contact resistance as a performance-limiting factor. Dopant-segregated Schottky (DSS) source/drain MOSFETs have become popular in recent years to address this series resistance issue, since DSS source/drain regions comprise primarily of metal or metal silicide.
    [Show full text]