Lecture 20: Packaging MEMS

ME 645: MEMS: Design, Fabrication and Characterization

P.S. Gandhi Mechanical Engineering IIT Bombay Acknowledgements: Mukul Tikekar, Dr Anandroop Bhattacharya PRASANNA S GANDHI [email protected]

What is packaging?

Service and art of providing a suitable environment to the electronic/ MEMS product as a whole to perform reliably over a period of time To protect delicate components from structural damage and/or malfunctions

No addition to functionalityPRASANNA S GANDHI [email protected]

1 Motivation

„ MEMS packaging is a field of great importance to anyone using or manufacturing sensors, consumer products, or military applications

„ Packaging is avery a verylarge percentage of the total cost of MEMS devices

„ MEMS packikaging iiissaaltlmost alllways app licati on specific and greatly affected by its environment and packaging techniques „ We will first have a look at electronic packaging and then MEMS PRASANNA S GANDHI [email protected]

Electronic Packaging Levels of Packaging Edge connector Wafer

Chip Printed circuit board

Chip Carrier

Back panel

Chassis

PRASANNA S GANDHI [email protected]

2 Level –I Packaging: Chip to Chip Carrier

„ Chip carrier – Housing for the thin and fragile chip

„ Purpose – Protects the chip from environment and abusive handling – Facilitates interconnections from the chip to the pads/holes on the circuit board – Provides pins/pads for that serve as bases for solder joints – Also involved in the heat transfer process as the first step in the heat flow path from source to sink

PRASANNA S GANDHI [email protected]

Chip carrier Lid Bond wires

Case Leads Chip

Pins Bond Lead frame

„ Parts of Chip Carrier – Chip Many different chip carriers exist today ––CaseCase but they all more or less conform to this – Leads and lead frame parent structure – Chip to package bond ––BondingBonding wires ––LidLid PRASANNA S GANDHI [email protected]

3 Key design features of a chip carrier

„ I/O count – Modern VLSI or ULSI chips have thousands of gates thereby requiring large number of I/Os – MEMS may or may not have (ex micromirror device vs pressure sensor device) „ Hermeticity – Ensures reliable operation – Entry of moisture is avoided - can cause corrosion of pins, wires – Organic materials that outout--gasgas (release volatiles) with time are not used „ Heat Dissipation – Modern circuitry result in very high heat fluxes

„ Additional MEMS devicePRASANNA S specificGANDHI [email protected] requirements may be there

Types of chip carriers „ Based on materials „ Based on I/O – Plastic ––PeripheralPeripheral ––CeramicCeramic – Area Array – Flip chip „ Based on connections – Through hole – Surface Mount PRASANNA S GANDHI [email protected]

4 Types of leads

Chip carri er Chip carri er Leads Printed circuit Leads Printed circuit board board

Pin-in-hole Gull wing type leads

Chip carrier Leads Printed circuit board

PRASANNA S GANDHI [email protected] J type leads

Plastic vs. Ceramic chip carriers

Ceramic cases Plastic cases „ High Cost „ Low Cost „ Usedfd for pro ducts with „ UUdfsed for prod dtucts with – Higher I/O count ––LowLow powers ––StringentStringent hermeticity – Moderate I/O count requirements ––LenientLenient hermeticity requirements „ Bonding material –Eutectic– Eutectic „ may lead to solder of gold and silicon severe thermothermo--mechanicalmechanical ––InorganicInorganic ––doesdoes not release stresses volatiles – CTE mismatch between Si – Melting point is 390390ººCC (4 ppm/K)ppm/K) and plastic (80 – Thermal conductivity is 296 ppmppm/K)/K) W/mW/m--KK – Problem circumvented by – Aids in heat transfer from introduction of lead frame made of copper chip to case PRASANNA S GANDHI [email protected]

5 Dual Inline Package (DIP)

.280 .325 .240 .300 „ First package (invented in 1 1960s) 1.020 .925 .060 – Both plastic and ceramic .015

.210 MAX – Fully encapsulated .015 MIN 0.1 .022 – Pins inserted in holes .014 .015 „ Attached to the underside of .006 the board by wave soldering .3

‰ Advantages ‰ Disadvantages ¾ Robust pins and connections ¾ Poor area efficiency ¾ Automated assembly – pick ¾ Limited wireability and place machines ¾ Limited I/O count (100 ¾ Width of pins is increased mil pitch) near the body –provides a shoulder PRASANNA S GANDHI [email protected]

Other Peripheral Packages -SMT- SMT

„ Small Outline Package (SOP) – WellWell--suitedsuited to 24 –48 pin memory with space constraints – Similar to DIP with copper lead frames

„ Quad Flat Pack (QFP) – Plastic and ceramic – Lead frames go around the entire periphery – Higher pin counts (up to 300) – Ther e is a p ush fo r thin QFPs o r TQFP fo r po rtable PCs – Ceramic QFPs are used for higher temperature or humid applications – Handling problems – only connections on one side are made simultaneously

PRASANNA S GANDHI [email protected]

6 Peripheral packages

Dual in Line Package (DIP) Small Outline Package (SO)

PRASANNA S GANDHI [email protected] Quad Flat Pack (QFP)

Area Array Packages

„ Utilizes the entire bottom side of the carrier for interconnections instead of only the perimeter. „ Since area available is higher, it is possible to have – Higher I/O count – Increased lead pitch

Ball Grid Array Land Grid Array Pin Grid Array PRASANNA S GANDHI [email protected] (BGA) (LGA) (PGA)

7 Packaging Efficiency

„ Packaging efficiency is defined as Effici Type Area IC size ency Efficiency= 30 mm Package size QFP 900 mm2 11%

20 mm TAB 400 mm2 13% „ Examples:

– DIP: 2% 15 mm ––QFP:QFP: 5% COB 225 mm2 25% ––BGA:BGA: 3030--80%80% CSP 115 mm2 44% – Bare chip: 100% 10 mm Flip chip 100 mm2 100%

PRASANNA S GANDHI [email protected]

1st level connections

„ Automated – Thermo compression ––UltraUltra sonic – Thermo sonic „ Tape automated bonding „ Flip chip bonding

PRASANNA S GANDHI [email protected]

8 Scanner Sensor

Think Whats inside this Chip

Wire Bonding inside chip

Lens

Wire bonding

„ Wirebonding is an electrical interconnection technique using thin wire and a combination of heat, pressure and/or ultrasonic energy. Wireb ondi ng is a solid ph ase weldi ng process, wh ere th e t wo metallic materials (wire and pad surface) are brought into intimate contact. Once the surfaces are in intimate contact, electron sharing or interdiffusion of atoms takes place, resulting in the formation of wirebondwirebond..

Process Pressure Temperature (C) Ultrasonic Energy Wire Pad

Thermo-compression High 300-500 No AuAl, Au

Ultrasonic Low 25 Yes Au, Al Al, Au

Thermosonic Low 100-150 No Au Al, Au

‰ Two basic wirebonding methods: ‰ PRASANNA S GANDHI [email protected] ‰

9 Ball Bonding

„ Components Connection pad ––WireWire – Capillary Bonding pad – Electronic Flame Off (EFO) Chip system

¾ Temperature range is 100-500°C Clamp ¾ Fine gold wire (75μ) normally used ¾ used where the pad pitch is greater than 100μ PRASANNA S GANDHI [email protected]

Flip Chip Technology

„ Bare semiconductor chips are turned upside down and bonded directly into the motherboard or chip carrier „ First introduced by IBM in 1962. – Path breaking technology invention – Introduced for ceramic substrates – Converted in 1970 to C4 (Controlled Collapse Chip Connection) for ICs – Initially used for peripheral packpackagesages but quickly progressed to area array „ Why use Flip Chip? – Small size „ Reduced board area,,g,g less height, lesser weight – Improved performance –high speed „ Eliminating bond wires reduces the delaying inductance and capacitance „ Shortens the path by a factor of 25 to 100 – Great I/O flexibility – Rugged „ With ““underfillunderfill”,”, flip chips behave like small blocks of cured epoxy ––LowLow cost PRASANNA S GANDHI [email protected]

10 Flip Chip: Solder Bumps and Underfill Heat transfer „ Solder bumps – Electrical connections Underfill ––ThermalThermal path L Chip – Holds chip/die and substrate together Pa y α

x Pi Pa h „ Underfill SubstrateSubstrate – needle- needle-dispenseddispensed along the edges of each chip S – drawn into the underunder--chipchip space by capillary action Solder bump ––heatheat--curedcured to form a permanent bond

„ Why is underfill required? – compensate for any thermal expansion difference between the chip and the substrate - mechanically "locks together" chip and substrate so that differences in thermal expansion do not break or damage the electrical connection of the bumps. – protects the bumps from moisture or other environmental hazards – provides additional mechanical strength to the assembly PRASANNA S GANDHI [email protected]

UnderfillUnderfill:: Various Ways

Underfill L Reservoir Chip Pa y α

x Pi Pa h SubstrateSubstrate S Capillary Flow L Chip y injectio n Pi x Pa h Chip Placement Motion Substrate S

Solder or Adhesive Bumps Injection Flow Area Array Format Chip Polymer Underfill Flow Front Circuit Traces Substrate Compression Flow

PRASANNA S GANDHI [email protected]

11 COMPARISON ––MEMSMEMS & IC Packaging

z The goal of IC ppggackaging is to

z Provide physical support for the chip z Provide an electrical interface to active chips in the system supply signal, power, and ground interconnections z Provide Heat dissipation z Effectively isolate the chip physically from its environment.

z MEMS devices on the other hand are application specific and often are intimately interfaced with their environment for sensing, interconnection, and/or actuation.

PRASANNA S GANDHI [email protected]

COMPARISON – MEMS & IC Packaging

Packaging of MEMS Pressure sensor

Lid Bond wires

Lead s Chip

Bond Lead frame

shows a comparison between a typical DIP IC package and a MEMS pressure sensor package, which has an opening to sense pressure variation.

PRASANNA S GANDHI [email protected]

12 COMPARISON – MEMS & IC Packaging

Items MEMS package IC package Standardization NO YES Process Flow Application Standardization driven Packaging & 20 ~95% 10 ~25% Testing cost Environmental Needed Isolation compatibility Packaging Type Diverse Similar

PRASANNA S GANDHI [email protected] Wun-Yan Chen ,Industrial Technology Research Institute

CHALLENGES IN MEMS PACKAGING

Issues: „ Release and Stiction:Stiction: when to release devices? Dicing may lead to contamination „ Dicing „ Die Handling „ Stress „ Outgassing „ Testing „ Operation in harsh environments: vibrations, chemicals, salt water etc.

PRASANNA S GANDHI [email protected]

13 DICING

„ Dicing the wafer into individual dice is amajor a major chllhallenge iiin MEMS packikaging. It iiis tilltypically done with adiamond a diamond sawsaw.. ––RequiresRequirescoolant flow along with silicon and diamond particles – Contaminants can get into the crevices of the features, causing the devices to fail

„ Alternati ve Sol utions : – Wafer cleaving. ––LaserLaser Sawing. – Wafer Level encapsulation before separating devices

PRASANNA S GANDHI [email protected]

WAFER LEVEL ENCAPSULATION

„ In wafer level enca pp,sulation, capping wafer is bonded to the top of aadevicedevice wafer which eliminates the need for special die handling fixturesfixtures..

„ High temperature ((10001000 °CC))requiredrequired for direct bondingbonding..GlassGlassfrit or (500 (500 °CC))isis used more commonly but it may cause stressstress..

„ However, WLE is unique to semiconductor sensor packaging and adds considerable cost to the sensor die because of the added fabrication steps and increased die areaarea..

PRASANNA S GANDHI [email protected]

14 DIE HANDLING

„ Die handling is currently not meeting the requirements of MEMS

„ Because of the delicate surface features, MEMS chips cannot be moved using vacuum pickpick--upup heads

„ MEMS dice must be picked up and handled by the edges which is more difficult than by the top surface because of greatly reduced surface area and increased dexterity requirements of the pickpick--andand--placeplaceequipment „ Stringent requirements on vibration levels during handling PRASANNA S GANDHI [email protected]

OUTGASSING

„ When epoxies or cyanate esters are used for die attach, they out gas as they curecure..

„ The water and organic vapors may then redeposit on the features, in crevices, and on bond pads. pads.

„ This leads to device stiction and corrosion. corrosion.

„ Possible solutions to outgassing challenges include – Very low outgassing die attach materials ––RemovalRemovalof outgassing vapors during die attach curing ––LowLow Young’s Modulus solders

PRASANNA S GANDHI [email protected]

15 TESTING

„ The major problem with testing is with applying nonnon--electricelectricstimuli to the devicesdevices..

„ Currently the only way for testing is to test the packaged chip but this is too expensive and time consumingconsuming..

„ A feasible solution is to test all that is possible using waferwafer--scalescaleprobing, and finish with cost effective, specially modified test systems

PRASANNA S GANDHI [email protected]

New Topic: Design and analysis of MEMS ƒ Analysis ƒ Static analysis: thermal stresses and deflection ƒ Dynamic analysis: vibration analysis MDOF ƒ Fluid mechanics and heat transfer ƒ Correlation measured quantity to electrical signal depending on sensing method ƒ Signal conditioning and processing ƒ Automatic control ƒ Special physics coming at MEMS scale: ex. Electrostatic actuation, squeeze film damping, electrowettingelectrowetting,, optics related, and so on… PRASANNA S GANDHI [email protected]

16 Basic Stress Analysis ƒ A lot of use of flexures is carried out for MEMS designs ƒ Standard Euler-Euler-BernoulliBernoulli beam theory (thin slender beam) is mostly sufficient; assuming that you are all familiar with the same. Basic equation M E σ d 2 y = = M = EI I R y dx2 PRASANNA S GANDHI [email protected]

Basic Stress Analysis ƒ Coupling of stress analysis with actuation forces say electrostatic actuation

PRASANNA S GANDHI [email protected]

17 Analysis of Pressure Sensor ƒ Basis: thin diaphragm formulation . Equations b ⎛ ∂2 ∂2 ⎞⎛ ∂2w ∂2w⎞ p a p x ⎜ + ⎟⎜ + ⎟ = ⎜ 2 2 ⎟⎜ 2 2 ⎟ ⎝ ∂x ∂y ⎠⎝ ∂x ∂y ⎠ D Eh3 D = y 12(1−ν 2 ) z ƒ Use fixed-fixed-fixedfixed boundary conditions to get the solution: quite tedious task PRASANNA S GANDHI [email protected] analytically

Analysis of Pressure Sensor ƒ Circular diaphragm ƒ Max deflection in center 3W(m2 −1)a2 w = − max 16πEm2h3 ƒ Max radial stress and max hoop stress at eddge: 3W 3νW (σ ) = (σ ) = rr max 4πh2 θθ max 4πh2 W = (πa2 )p m =1/ν

PRASANNA S GANDHI [email protected]

18 Analysis of Pressure Sensor ƒ Rectangular diaphragm a ƒ Max deflection in center pb4 x w = −α b max Eh3 ƒ Max stress pb2 y (σ ) = β yy max h2

a/b 1 1.2 1.4 1.6 1.8 2.0 ∞ α 0.0138 0.0188 0.0226 0.0251 0.0267 0.0277 0.0284

β 0.3078 0.3834PRASANNA 0.4356 S GANDHI 0. [email protected] 0.4872 0.4974 0.5

Pressure Sensor: Example

ƒ ExampleExample:: Rectangular diaphragm has dimensions a = 752micron and b = 376 microns. Thickness of diaphragm is 13.9 micron and pressure applied is 20MPa. Material is Si with yield strength = 7000MPa and E = 190,000MPa v=0.25. Determine maximum stress and deflection. Will the diaphragm be safe under this loading? If the circular diaphragm of the same area is used with same thickness, will it be safe?

PRASANNA S GANDHI [email protected]

19 Thank You

PRASANNA S GANDHI [email protected]

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