DOCSLIB.ORG

Introduction to MEMS Bruce K

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text
Introduction to MEMS Bruce K Introduction to MEMS Bruce K. Gale Overview Mechanical Engineering Department ! What is micromanufacturing and MEMS? BIOEN 6421, ELEN 5221, MEEN 5960 and 6960 ! Why the interest in MEMS? ! IC Fabrication Processes ! Bulk Micromachining Processes ! Surface Micromachining Processes ! Combined Processes ! References MEMS - evolved from the Microelectronics So what exactly is MEMS? Revolution Micro-Electro-Mechanical Systems (MEMS) is the integration of mechanical elements, sensors, actuators, and IC Industry Timeline electronics on a common substrate through the utilization of microfabrication technology or “microtechnology”. 1947 1958 1999 single transistor first IC 10 million transistors MEMS Timeline MEMS Examples 1980 pressure sensors 1999 accelerometers flow sensors inkjet printers Bulk micromachined pressure sensor deformable mirror devices gas sensors micromotors microgears lab-on-a-chip systems 2030 TI DMD ? (1.3 million micro-mirrors) The Opportunity of MEMS Technology General MEMS Advantages ! Batch fabrication – Reduced cost ! Reduced size – Is everything better smaller? ! Reduced power ! High precision ! New capabilities? ! Improved performance? The MicroTechnology/MEMS Tool Set Micromachining Processes ! Standard Integrated Circuit (IC) Processes Cleanroom plus microfab processes – Identical to those used in IC fabrication – Generally used for surface micromachining + ! Surface Micromachining – Additive processes ! Bulk Micromachining – Subractive Process ! Dividing line can become very blurry Standard IC Processes Standard IC Processes Source: Photolithography Jaeger Source: CWRU Source: Jaeger Standard IC Processes Standard IC Processes 1) Deposit/Grow Thin Films 2) Pattern Thin Films • Sputtering • Lithography • Evaporation • Etching Techniques (wet, dry, RIE) • Thermal Oxidation • CVD • Spinning • Epitaxy Standard IC Processes Micromachining Processes 3) Introduce Dopants (to form electrically-active Bulk Micromachining regions for diodes, transistors, etc.) • wet vs dry • isotropic vs anisotropic • Thermal Diffusion • subtractive process • Ion Implantation Micromachining Processes Micromachining Processes Bulk Micromachining Deep Reactive Ion Etching (DRIE) Source: Madou • high density ICP plasma • high aspect ratio Si structures • cost: $500K Source: LucasNova Source: Maluf Source: STS Source: STS Source: AMMI Source: Maluf MEMS Examples Micromachining Processes Pressure Sensor (conventional) Source: NovaSensor Wafer-Level Bonding • glass-Si anodic bonding • Si-Si fusion bonding • eutectic bonding • low temp glass bonding 60 50 40 30 20 Output Voltage Voltage (mV)Output 10 0 0 20406080100120 Source: UofL Source: Maluf Source: EV Pressure (PSI) Micromachining Processes Micromachining Processes Surface Micromachining LIGA (lithographie, galvanoformung, abformtechnik) • additive process • uses x-ray lithography (PMMA), electrodeposition and • structural & sacrificial layers molding to produce very high aspect ratio (>100) micro- structures up to 1000 um tall (1986) Source: Sandia Source: Madou Source: Kovacs MEMS Examples Micromachining Processes Micro-structures using LIGA Poor Man’s LIGA • uses optical epoxy negative-resist (SU-8) developed by IBM to produce high aspect ratio micro-structures (1995) UofL Micro-reaction wells: 150 um wide, 120 um tall, 50 um wall thickness Source: UW Source: Maluf MEMS Examples MEMS Examples Micromotors Optical MEMS (MOEMS) Source: MIT and Berkeley Source: NIST, Simon Fraser, UCLA, and MCNC MEMS Examples MEMS Examples Pressure Sensor (ultra-miniature) Lab-on-a-Chip Systems • separation • dilution • mixing and dispensing • analysis Source: NovaSensor Source: Caliper Integration EFFF Fabrication 1 ! Micromachining processes may be ! Anisotropic etching of Silicon integrated input and output ports in 20% KOH at 65 C with ! Both bulk and surface micromachining may Au Si N mask Conta Detect Ti be performed on a single substrate 3 4 ct or ! Deposit and pattern ! Micromachined structures may be Ti/Au electrodes on Silicon integrated with ICs front of wafer Polyimide ! Thick photosensitive polyimide or SU-8 used Silicon to define flow channels EFFF Fabrication 2 EFFF Fabrication 3 Output Port Input Port ! Remove Si N ! Completed channel 3 4 Silicon membrane looking from the top Channel Polyimide ! Deposit and pattern Glass Detector Electrode Channel Electrod Ti/Au electrode on glass Au substrate Ti ! Cross section through Glass channel showing ! Bond glass substrate to electrodes, polyimide Completed Cross Section polyimide using and substrates biocompatible UV Silicon curable adhesive Results- Results- Section Fabrication System Assembly Glass substrate with titanium, gold, and platinum electrode Silicon substrate with input/output ports, gold electrodes and patterned SU-8 Above- Complete device with input/output port connections Right- Complete systems with sample and buffer input, µ-EFFF system, and detectors MEMS Examples Fabrication Results Micromachined Tips for FEDs and AFMs ! Micrograph of detector wire Detection Wire across channel defined by polyimide ! Wire is 19 µm wide Output Port ! Location of wire Channel Sidewalls eliminates all end effects Source: Micron (?) Source: IBM MEMS Examples MEMS Examples Neural Probes Neural Interface Chip Source: Stanford Source: Mich (K. Wise) MEMS Examples MEMS Examples Micro-Grippers Micro-Tweezers Source: Berkeley Source: MEMS Precision Instruments MEMS Examples MEMS Examples Optical MEMS (MOEMS) Accelerometers Source: IMC (Sweden), Maluf and TI Sources: Analog Devices, Lucas NovaSensor, and EG&G IC Sensors MEMS Examples MEMS References Channels, Nozzles, Flow Structures, and Load Cells Fundamentals of Microfabrication; Marc J. Madou Micromachined Transducers Sourcebook; G. Kovacs An Introduction to MEMS Engineering; by Nadim Maluf Silicon Micromachining; by Elwenspoek and Jansen Microsensors; by Richard S. Muller, Roger T. Howe, Stephen D. Senturia, R. Smith (Editors) Micromechanics and Mems : Classic and Seminal Papers to 1990; by W. Trimmer (Editor) MEMS WWW Bookstore: http://mems.isi.edu/bookstore/ Source: EG&G IC Sensors.
Load more

Recommended publications
  • Surface Micromachine Microfluidics: Design, Fabrication, Packaging, and Characterization
    SURFACE MICROMACHINE MICROFLUIDICS: DESIGN, FABRICATION, PACKAGING, AND CHARACTERIZATION Paul Galambos*, William P. Eaton, Randy Shul, Christi Gober Willison, Jeffry J. Sniegowski, Samuel L. Miller and Daniel Gutierrez of Sandia National Labs, PO Box 5800, MS 1080, Albuquerque NM 87185-1080 http://www.mdl.sandia.gov/Micromachine, *(505)844-1542, FAX (505)844-2991, [email protected] ABSTRACT 1998). These devices are fabricated using a wide The field of microfluidics is undergoing range of technologies including: bulk micromachining rapid growth in terms of new device and system (e.g. KOH etch), high aspect ratio micromachining development. Among the many methods of (e.g. DRIE or LIGA), laser machining, very small fabricating microfluidic devices and systems, surface scale conventional machining (drilling and milling), micromachining is relatively underrepresented due to; capillary tubing assembly and various unconventional difficulties in the introduction of fluids into the very techniques (Whitesides 1997). Conspicuously absent small channels produced, packaging problems, and from this list is surface micromaching. difficulties in device and system characterization. The potential advantages of using surface micromachining Consider as a representative sample the microfluidic include: compatibility with the existing integrated papers presented at the ASME winter annual meeting circuit tool set, integration of electronic sensing and last October (Forster et. al. 1998). Of the 39 papers actuation with microfluidics, and fluid volume dealing with experimental microfluidic devices only 3 minimization. In order to explore these potential utilized surface micromachining. Of these 3 papers advantages we have developed first generation surface one (Tseng 1998) was a hybrid design utilizing both micromachined microfluidic devices (channels) using bulk and surface micromachining with the flow an adapted pressure sensor fabrication process to channels fabricated utilizing bulk micromachining.
    [Show full text]
  • Fundamentals of MICROFABRICATION the Science of Miniaturization Second Edition
    Fundamentals of MICROFABRICATION The Science of Miniaturization Second Edition Marc J. Madou CRC PRESS Boca Raton London New York Washington, D.C, Table of Contents Chapter 1 Lithography 1 Introduction 1 Historical Note: Lithography's Origins 1 Photolithography Overview 2 Introduction 2 Masks 3 Spinning Resist and Soft Baking 3 Exposure and Postexposure Treatment 4 Development 5 De-scumming and Postbaking '.'. 6 Resists 6 Wafer Priming 10 Wafer Cleaning and Contaminants: The Clean Room 10 Resist Stripping 13 Critical Dimension, Overall Resolution, Line Width 14 Lithographie Sensitivity and Intrinsic Resist Sensitivity (Photochemical Quantum Efficiency) 14 Lithographie Sensitivity 14 Intrinsic Sensitivity ofa Resist (Photochemical Quantum Efficiency) 15 Resist Profiles 16 Overview of Profile Types 16 Lift-Off Profile 18 Contrast and Experimental Determination of Lithographie Sensitivity 19 Resolution in Photolithography 21 Introduction , 21 Resolution in Contact and Proximity Printing (Shadow Printing) 21 Projection Printing 22 Planarization 31 Photolithography Resolution Enhancement Technology 32 Introduction 32 Strategies for Improved Resolution through Improved Resist Performance 33 Strategies for Improved Resolution through Improved Mask Technology 41 Beyond Moore's Law 44 Introduction 44 Moore's Law 44 Kurzweil 46 Next-Generation Lithographies 48 Introduction 48 Extreme Ultraviolet Lithography 48 X-Ray Lithography 49 Charged-Particle-Beam Lithography 52 Emerging Lithography Technologies 58 Introduction 58 Scanning Probe Lithography
    [Show full text]
  • Techniques and Considerations in the Microfabrication of Parylene C Microelectromechanical Systems
    micromachines Review Techniques and Considerations in the Microfabrication of Parylene C Microelectromechanical Systems Jessica Ortigoza-Diaz 1, Kee Scholten 1 ID , Christopher Larson 1 ID , Angelica Cobo 1, Trevor Hudson 1, James Yoo 1 ID , Alex Baldwin 1 ID , Ahuva Weltman Hirschberg 1 and Ellis Meng 1,2,* 1 Department of Biomedical Engineering, University of Southern California, Los Angeles, CA 90089, USA; [email protected] (J.O.-D.); [email protected] (K.S.); [email protected] (C.L.); [email protected] (A.C.); [email protected] (T.H.); [email protected] (J.Y.); [email protected] (A.B.); [email protected] (A.W.H.) 2 Ming Hsieh Department of Electrical Engineering, University of Southern California, Los Angeles, CA 90089, USA * Correspondence: [email protected]; Tel.: +1-213-740-6952 Received: 31 July 2018; Accepted: 18 August 2018; Published: 22 August 2018 Abstract: Parylene C is a promising material for constructing flexible, biocompatible and corrosion- resistant microelectromechanical systems (MEMS) devices. Historically, Parylene C has been employed as an encapsulation material for medical implants, such as stents and pacemakers, due to its strong barrier properties and biocompatibility. In the past few decades, the adaptation of planar microfabrication processes to thin film Parylene C has encouraged its use as an insulator, structural and substrate material for MEMS and other microelectronic devices. However, Parylene C presents unique challenges during microfabrication and during use with liquids, especially for flexible, thin film electronic devices. In particular, the flexibility and low thermal budget of Parylene C require modification of the fabrication techniques inherited from silicon MEMS, and poor adhesion at Parylene-Parylene and Parylene-metal interfaces causes device failure under prolonged use in wet environments.
    [Show full text]
  • Bec008-Mems and Nems
    BEC008-MEMS AND NEMS UNIT I OVERVIEW AND INTRODUCTION New trends in Engineering and Science: Micro and Nanoscale systems Introduction to Design of MEMS and NEMS, Overview of Nano and Microelectromechanical Systems, . Applications of Micro and Nanoelectromechanical systems, Microelectromechanical systems, devices and structures Definitions, .Materials for MEMS: Silicon, silicon compounds, polymers, metals UNIT II MEMS FABRICATION TECHNOLOGIES • Microsystem fabrication processes: Photolithography, Ion Implantation, Diffusion, Oxidation.Thin film depositions: • LPCVD, Sputtering, Evaporation, Electroplating; Etching techniques: Dry and wet etching, electrochemical etching; Micromachining: Bulk Micromachining, Surface Micromachining • High Aspect-Ratio (LIGA and LIGA-like) Technology; Packaging: Microsystems packaging, Essential packaging technologies, Selection of packaging materials III MICRO SENSORS • MEMS Sensors: Design of Acoustic wave sensors, • resonant sensor, Vibratory gyroscope, • Capacitive and Piezo Resistive Pressure sensors- • Engineering mechanics behind these Microsensors. • Case study: Piezo-resistive pressure sensor UNIT IV MICRO ACTUATORS • Design of Actuators: Actuation using thermal forces • Actuation using shape memory Alloys, • Actuation using piezoelectric crystals, • Actuation using Electrostatic forces (Parallel plate, Torsion bar, Comb drive actuators), Micromechanical Motors and pumps. • Case study: Comb drive actuators UNIT V NANOSYSTEMS AND QUANTUM MECHANICS • Atomic Structures and Quantum Mechanics, • Molecular
    [Show full text]
  • Silicon Microelectronics Programs at the NATIONAL INSTITUTE of STANDARDS and TECHNOLOGY
    mm 1*4 NIST NISTIR 6884 Silicon Microelectronics Programs AT THE NATIONAL INSTITUTE OF STANDARDS AND TECHNOLOGY Programs, Activities and Accomplishments JULY 2002 Edited by Stephen Knight Joaquin V. Martinez de Pinillos and Michele Buckley National Institute of Standards and Technology Technology Administration, U.S. Department of Commerce Cover Picture Caption Silicon Microelectronics Programs at the National Institute of Standards and Technology is a NIST- wide effort to meet the highest priority measurement needs of the semiconductor industry and its supporting infrastructure. Research efforts include development of standard test structures for inter- connect reliability evaluation; fundamental measurements of ionization cross sections of gas species used in plasma processing of integrated circuits; development of advanced at-speed test techniques for gigahertz integrated circuits; and development of precise measurement techniques for characterizing aspheric lenses for Extreme Ultraviolet Lithography. m Silicon Microelectronics Programs at National Institute of Standards and Technology Programs, Activities, and Accomplishments B| NISTIR 6884 July 2002 m U.S. DEPARTMENT OF COMMERCE Donald L. Evans, Secretary Technology Administration Phillip J. Bond, Under Secretary of Commerce for Technology National Institute of Standards and Technology Arden L. Bement, Jr., Director Disclaimer Disclaimer: Certain commercial equipment and/or software are identified in this report to adequately describe the experimental procedure. Such identification does not imply recommendation or endorse- ment by the National Institute of Standards and Technology, nor does it imply that the equipment and/or software identified is necessarily the best available for the purpose. References: References made to the International Technology Roadmap for Semiconductors (ITRS) apply to the most recent edition, dated 1999.
    [Show full text]
  • Micromachining for Microelectromechanical Systems
    View metadata, citation and similar papers at core.ac.uk brought to you by CORE provided by Defence Science Journal Defence Science Journal, VoI48,'No January1998, pp. 5-19 (0 1998, DESlDOC Micromachining for Microelectromechanical Systems K.N. Bliat Indian Institute of Technology, Chennai-600 036. ABSTRACT The various micromachining processes required for microengineering and for the successful realisation of microeletromechanical systems on Si are presented. The techniques presented include bulk and surface micromachining, Si fusion bonding, and the lithography, electroforming and micromoulding (LIGA) process. The paper also includes discussion on the markets, applications and future trends for microenginerated products. I. INTRODUCTION desired purpose. The integrated sensors have the The microfabrication technology which has maximum number of applications in MEMSs. The been key to the success of microchips and market for integrated sensors is growing more than microelectronics is now revolutionising the 16 per cent annually and is about $ 1.1 billion in mechanical systems. Using this technology, basic 19971. The application of other systems include: mechanical devices, such as motors, gears, bearings flow valves, electromechanical switches and relays, and springs have been miniaturised and integrated gyroscopes, ink-jet nozzles, micromanipulators and on Si chips. The miniaturisation of mechanical connectors, as well as optical components, such as components brings the same benefits to mechanical lenses, gratings, waveguides, mirrors, sources and systems that microfabrication brought to detectors2. For instance, a chip that contained over electronics. Micromechanical devices and systems two. million tiny mirrors, each individually are inherently smaller, lighter and faster than their addressed and moved by electrostatic actuation, has macroscopic counterparts and are invariably more been produced by Texas Instruments3, USA.
    [Show full text]
  • Microfabrication in Biology and Medicine
    Annu. Rev. Biomed. Eng. 1999. 01:401±425 Copyright q 1999 by Annual Reviews. All rights reserved Microfabrication in Biology and Medicine Joel Voldman1,2, Martha L. Gray1,2,3, and Martin A. Schmidt1,2 1Department of Electrical Engineering and Computer Science, 2Microsystems Technology Laboratories, and 3Division of Health Sciences and Technology, Massachusetts Institute of Technology, Cambridge, Massachusetts 02139; e-mail: [email protected], [email protected], [email protected] Key Words micromachining, microelectromechanical systems, cell biology, molecular biology, MEMS Abstract Microfabrication uses integrated-circuit manufacturing technology supplemented by its own processes to create objects with dimensions in the range of micrometers to millimeters. These objects can have miniature moving parts, stationary structures, or both. Microfabrication has been used for many applications in biology and medicine. These applications fall into four domains: tools for molecular biology and biochemistry, tools for cell biology, medical devices, and biosensors. Microfa- bricated device structures may provide signi®cantly enhanced function with respect to a conventional device. Sometimes microfabrication can enable devices with novel capabilities. These enhancing and enabling qualities are conferred when microfabri- cation is used appropriately to address the right types of problems. Herein, we describe microfabrication technology and its application to biology and medicine. We detail several classes of advantages conferred by microfabrication
    [Show full text]
  • Biomedical Applications of Mems
    BIOMEDICAL APPLICATIONS OF MEMS Jack W. Judy University of California, Los Angeles 68-121 Engineering IV, Box 159410 Los Angeles, CA 90095-1594 Tel: (310) 206-1371 [email protected] Abstract – Micromachining and MEMS For a discussion of the early work in MEMS, technologies can be used to produce complex including many of the seminal papers, the interested electrical, mechanical, fluidic, thermal, optical, reader is directed to reference [1]. For a and magnetic structures, devices, and systems comprehensive discussion of micromachining on a scale ranging from organs to subcellular processes and MEMS devices, the interested reader organelles. This miniaturization ability has is directed to the texts by Kovacs [2] and Madou [3]. enabled MEMS to be applied in many areas of biology, medicine, and biomedical engineering – MICROFABRICATION a field generally referred to as BioMEMS. The future looks bright for BioMEMS to realize (1) Although many of the microfabrication techniques microsensor arrays that act as an electronic and materials used to produce MEMS have been nose or tongue, (2) microfabricated neural borrowed from the IC industry, the field of MEMS has systems capable of controlling motor or sensory also driven the development and refinement of other prosthetic devices, (3) painless microsurgical microfabrication processes and non-traditional tools, and (4) complete microfluidic systems for materials. total chemical or genetic analyses. Conventional IC Processes and Materials: INTRODUCTION - photolithography; thermal oxidation; dopant diffusion; ion implantation; LPCVD; PECVD; Microelectromechanical systems (MEMS) is a evaporation; sputtering; wet etching; plasma technology of miniaturization that has been largely etching; reactive-ion etching; ion milling adopted from the integrated circuit (IC) industry and applied to the miniaturization of all systems (i.e., not - silicon; silicon dioxide; silicon nitride; aluminum only electrical systems but also mechanical, optical, fluidic, magnetic, etc).
    [Show full text]
  • Microfabrication for MEMS: Part I
    Microfabrication for MEMS: Part I Carol Livermore Massachusetts Institute of Technology * With thanks to Steve Senturia, from whose lecture notes some of these materials are adapted. Cite as: Carol Livermore, course materials for 6.777J / 2.372J Design and Fabrication of Microelectromechanical Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY]. CL: 6.777J/2.372J Spring 2007, Lecture 1 - 1 Outline > A way to think about process design > Surface and bulk micromachining concepts > Next class: substrates, lithography and patterning, and thin films > Class #3: etching, wafer bonding (including bulk micromachining), surface micromachining and process integration > Class #4: in class process design exercise > Class #5: fabrication for the life sciences and material properties Cite as: Carol Livermore, course materials for 6.777J / 2.372J Design and Fabrication of Microelectromechanical Devices, Spring 2007. MIT OpenCourseWare (http://ocw.mit.edu/), Massachusetts Institute of Technology. Downloaded on [DD Month YYYY]. CL: 6.777J/2.372J Spring 2007, Lecture 1 - 2 Learning to “speak” fab > There are huge lists of things that you can and can’t do in microfab (vocabulary) > There are limits on how you can combine steps together to form a process (grammar) > An experienced microfabricator knows most of these capabilities and limits from long experience (fluency) > A beginning microfabricator must struggle to master details and rules > Our goal: teach enough vocabulary and grammar to get you started (today starts with grammar) > Only practice will make you fluent! Cite as: Carol Livermore, course materials for 6.777J / 2.372J Design and Fabrication of Microelectromechanical Devices, Spring 2007.
    [Show full text]
  • Bulk Micromachiningmicromachining
    PEE-5740 "Tópicos de Fabricação de Microestruturas" Prof.Prof. Dr.Dr. PatrickPatrick B.B. VerdonckVerdonck Programação Preliminar de aulas de PEE-5740 3o Período de 2004 (13/09) 1o aula: Introdução : Organização, conceitos básicos – Mario Gongora. (20/09) 2o aula: Química da corrosão úmida de silício : Malu + Humber Furlan (27/09) 3o aula: Materiais e processos utilizados na fabricação de microestruturas e de microsensores, Conceitos de fabricação de microestruturas em substratos e em superfície. (04/10) 4o aula: Materiais para fabricação de microestruturas em superfícies : Nilton Morimoto (11/10) 5o aula: Técnicas de fabricação de microestruturas em substratos, (18/10) 6o aula: Técnicas de fabricação de microestruturas em superfícies (25/10) 7o aula: Simulação de microestruturas : Eliphas W. Simões (08/11) 8o aula: Encapsulamento de microestruturas : Mario Gongora (22/11) 9o aula: Processo LIGA e outros processos avançados. (29/11) 10o aula: Prova (06/12) 11o aula: Apresentação dos trabalhos Conceitos Média=Média= 0,2*(Nota0,2*(Nota dede Trabalho)+0.2*(NotaTrabalho)+0.2*(Nota dede Listas)+0.6*(NotaListas)+0.6*(Nota dede Prova)Prova) BIBLIOGRAFIA: 1) M. Madou, Fundamentals of Microfabrication, CRC Press (Boca Raton - New York) (1997) 2) J.N.Zemel and R.Furlan, Microfluidics, capítulo 12 do Handbook of Chemical and Biological Sensors, editado por J.S.Schulz, Inst. of Phys Publishing Inc. (Bristol), (1996). 3) Sensor technology and devices, editado por Ljubisa Ristic, Artech House (Boston), (1994). 4) Semiconductor sensors, editado por S.M Sze, J. Wiley (New York) (1994). 5) Microsensor: principles and applications, editado por J.W.Gardner, J.Wiley (New York) 1994.
    [Show full text]
  • Semiconductor Microelectronics and Nanoelectronics Programs
    On the cover (top to bottom): Joseph Hodges operating frequency-stabilized cavity ring-down spectroscopy (CRDS) for measuring very low concentration contaminants in process gases. Time-resolved vertical distribution of optical emission at 750nm from a dual-frequency capacitively-coupled plasma. Critical Dimension Small Angle X-Ray Scattering (CD-SAXS) detector image resulting from a dense array of 60 nm vias. Curt Richter loads a molecular electronic sample for electrical characterization. Photo copyright Robert Rathe. SEMICONDUCTOR MICROELECTRONICS AND NANOELECTRONICS PROGRAMS NISTIR 7426 July 2007 U.S. DEPARTMENT OF COMMERCE Carlos M. Gutierrez, Secretary Technology Administration Robert Cresanti, Under Secretary of Commerce for Technology National Institute of Standards and Technology William Jeffrey, Director DISCLAIMER Disclaimer: Certain commercial equipment and/or software are identifi ed in this report to adequately describe the experimental procedure. Such identifi cation does not imply recom- mendation or endorsement by the National Institute of Standards and Technology, nor does it imply that the equipment and/or software identifi ed is necessarily the best available for the purpose. References: References made to the International Technology Roadmap for Semiconductors (ITRS) apply to the most recent edition, dated 2005 or the ITRS 2006 Update. Semiconductor Industry Association. The International Technology Roadmap for Semicon- ductors, 2005 edition. SEMATECH: Austin, TX, 2005. These documents are available on-line at URL: http://public.itrs.net or in printed copy by contacting SEMATECH, 2706 Montopolis Drive, Austin, TX 78741, ITRS department 860-008, phone: (512) 356-3500. The reader will notice that there are acronyms and abbreviations throughout this document that are not spelled out due to space limitations.
    [Show full text]
  • UC Berkeley UC Berkeley Electronic Theses and Dissertations
    UC Berkeley UC Berkeley Electronic Theses and Dissertations Title NEM Relay Scaling for Ultra-low Power Digital Logic Permalink https://escholarship.org/uc/item/0s2216x1 Author Yaung, Jack Publication Date 2014 Peer reviewed|Thesis/dissertation eScholarship.org Powered by the California Digital Library University of California NEM Relay Scaling for Ultra-low Power Digital Logic by Jack Yaung A dissertation submitted in partial satisfaction of the requirements for the degree of Doctor of Philosophy in Engineering – Electrical Engineering and Computer Sciences in the Graduate Division of the University of California, Berkeley Committee in charge: Professor Tsu-Jae King Liu, Chair Professor Elad Alon Professor Junqiao Wu Spring 2014 NEM Relay Scaling for Ultra-low Power Digital Logic Copyright © 2014 By Jack Yaung Abstract NEM Relay Scaling for Ultra-low Power Digital Logic By Jack Yaung Doctor of Philosophy in Engineering – Electrical Engineering and Computer Sciences University of California, Berkeley Professor Tsu-Jae King Liu, Chair CMOS has been the building block for modern digital logic for decades and the performance and energy efficiency of CMOS continues to improve as technology develops, mainly through scaling. However due to the 60 mV/dec limit on MOS transistors, continue to reduce the power supply voltage would result in an increase in off-stage leakage current that would eventually dominate and increase the energy per operation of a transistor. In order to overcome this barrier, mechanical switches are proposed. Mechanical relays has the benefit of no leakage current through the air gap in the off state, which potentially enables further scaling of power supply voltage that can surpass MOS transistors.
    [Show full text]