Advances in IMAGING AND ELECTRON PHYSICS
VOLUME 159
Cold Field Emission and the Scanning Transmission Electron Microscope EDITOR-IN-CHIEF PETER W. HAWKES CEMES-CNRS Toulouse, France Advances in IMAGING AND ELECTRON PHYSICS
VOLUME 159 Cold Field Emission and the Scanning Transmission Electron Microscope
Edited by PETER W. HAWKES CEMES-CNRS, Toulouse, France
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Printed in the United States of America 0910111210987654321 Contents
Preface xi Contributors xv Future Contributions xvii
1. The Work of Albert Victor Crewe on the Scanning Transmission Electron Microscope and Related Topics 1 A. V. Crewe 1. Introduction 2 2. Some Chicago Aberrations: A Personal Collection 6 Acknowledgments 13 3. Electron Microscope Studies: Achievements of the Crewe Lab 13 Introduction 14 Construction (Reference Group A) 16 Source Development (Reference Group B) 17 STEM Development and Atomic Images (Reference Group C) 18 The Field Emission SEM (Reference Group D) 19 Energy Loss and Radiation Damage (Reference Group E) 20 Secondary Electron Production (Reference Group F) 21 DNA Labeling (Reference Group G) 21 Nucleosomes (Reference Group H) 22 Attempts at Aberration Correction (Reference Group I) 23 Theoretical Electron Optics (Reference Group J) 27 Optimization and the Super-High-Resolution SEM (Reference Group K) 28 Image Processing (Reference Group L) 30 Three-Dimensional Reconstruction (Reference Group M) 31 Hemoglobin Work (Reference Group N) 32 References (of Chicago Aberrations) 37 References (of DOE Report) 38 2. A Review of the Cold-Field Electron Cathode 63 L. W. Swanson and G. A. Schwind 1. Introduction 63 2. Work Function 65
v vi Contents
3. Energy Distribution 67 3.1. Theoretical Background 67 3.2. Analytical versus Numerical Results 68 3.3. Measured Values of the FWHM for the Tungsten Cold-Field Electron 72 4. Source Optics 79 5. Column Optics Using the Cold-Field Electron Source 82 6. Current Stability 86 6.1. High-Frequency Current Fluctuations 87 6.2. Long-Term Current Drift 88 6.3. Cold-Field Electron End-of-Life Mechanisms 94 7. Summary 97 Acknowledgments 98 References 98
3. History of the STEM at Brookhaven National Laboratory 101 Joseph S. Wall, Martha N. Simon, and James F. Hainfeld 1. Introduction 101 2. Instrument Design Parameters 102 3. Heavy Metal Cluster Labeling 106 4. Early User/Collaborator Projects 108 5. Recent Work 115 6. Conclusion 115 Acknowledgments 115 References 116
4. Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 123 Hiromi Inada, Hiroshi Kakibayashi, Shigeto Isakozawa, Takahito Hashimoto, Toshie Yaguchi, and Kuniyasu Nakamura 1. Introduction 124 2. The Dawn of Hitachi Electron Microscopes (by Hiromi Inada) 125 2.1. Crewe STEM Shock and Field Emission Development 125 3. Cold FE-SEM Studies and Expansion to Different Fields 128 3.1. CFE-STEM Development at HCRL 128 3.2. CFE-SEM Development at Naka Works 131 3.3. Studies of Field Emission Stability 132 4. Expansion of High-Voltage TEMs and STEMs 137 4.1. Holography Studies by Tonomura with FE-TEMs 137 4.2. Multistage Acceleration CFEG for TEM Applications 138 4.3. Commercialized Analytical CFE-TEM/STEM 139 5. Development of 50-kV STEM in 1970s (by Shigeto Isakozawa) 141 5.1. Development of Hitachi’s 50kV Prototype CFE-STEM 141 Contents vii
5.2. Bright-Field Images Obtained with 50-kV CFE-STEM 142 5.3. Single-Atom Observation 144 5.4. Development of the Electron Energy-Loss Spectrometer 147 5.5. Further Development of 50-kV CFE-STEM 149 6. Hitachi’s First Commercialized Dedicated STEM (by Takahito Hashimoto) 150 6.1. 200-kV Analytical CFE-TEM, HF-2000 150 6.2. ‘‘Gate Viewer,’’ Trigger for Dedicated STEM 154 6.3. Novel Functions for HD Series 161 7. Cutting-Edge Applications with Customized HD Models (by Toshie Yaguchi) 165 7.1. 120-kV FE UHV for Nanotubes 165 7.2. 200-kV FE Ultrahigh-Resolution STEM 165 7.3. 3D Structural and Elemental Analysis 169 8. Aberration-Corrected CFE-STEM (by Kuniyasu Nakamura) 170 8.1. Atomic-Level Characterization Instrument 170 8.2. Theoretical Consideration of Advantages of Aberration-Corrected CFE-STEM 172 8.3. Evaluation of Aberration-Corrected CFE-STEM 173 8.4. Advanced Application Results with HD-2700C 176 9. Conclusion and Future Prospective (by Hiroshi Kakibayashi) 181 Acknowledgments 182 References 182
5. Two Commercial STEMs: The Siemens ST100F and the AEI STEM-1 187 P. W. Hawkes 1. Introduction 188 2. The AEI STEM-1 188 3. The Siemens ST100F 191 3.1. The New ELMISKOP ST100F Scanning Transmission Electron Microscope 195 Introduction 195 Construction of the ELMISKOP ST100F 195 Advantages of the Scanning Transmission Electron Microscope 198 Imaging with Low Radiation Damage 198 Conclusion 201 3.2. Image Forming Systems 203 General Remarks 203 The Imaging Process 204 Image Forming Properties of Magnetic Lenses 205 Strong Lenses 208 Lens Systems for CTEM and STEM: Similarities and Differences 210 Requirements for Analytical Microscopy 215 Acknowledgments 217 References 217 viii Contents
6. A History of Vacuum Generators’ 100-kV Scanning Transmission Electron Microscope 221 Ian R. M. Wardell and Peter E. Bovey 1. The Early Days 222 2. Design Considerations for a Commercial STEM 224 2.1. The Objective Lens 225 2.2. The Specimen Stage 225 2.3. The Electron Gun 226 2.4. Location of Analytical Facilities 226 2.5. The Resultant Assembly 227 3. The First STEMs and HB5 Development 227 3.1. The Optical Column 232 3.2. Stage Development 238 3.3. Early Airlock and Manipulator 240 3.4. The Dark-Field Detector 241 3.5. Secondary Electron Detector 245 3.6. Diffraction Facilities 246 3.7. The Energy Analyzer Mk1 249 3.8. Electronics 251 4. Improved Resolution 254 4.1. The MIT HB5 254 4.2. The University of Illinois HB5 255 5. Other Developments 256 5.1. Beam-Blanking Plates 256 5.2. Detectors and the Virtual Objective Aperture 257 5.3. Stage Motor Drives 261 5.4. New Airlock 262 5.5. Energy Analyzer Mk2 264 5.6. Gun Lens 266 5.7. High-Excitation Objective Lens 266 6. Stages and Cartridges 268 6.1. Basic Cartridges 268 6.2. Beryllium Cartridges 269 6.3. Cold Stage 269 6.4. Cryo-Transfer System 270 7. The HB501 271 7.1. General Development 271 7.2. HB501UX and High-Resolution Imaging 273 8. Special and Variant Instruments 273 8.1. University of Glasgow’s HB5 275 8.2. The HB501A 276 9. The HB601 278 Contents ix
10. Postscript 280 Acknowledgments 282 References 283
7. Development of the 300-kV Vacuum Generator STEM (1985–1996) 287 H. S. von Harrach 1. Prelude in Oxford (1973–1975) 288 2. The MIDAS Project (1985–1988) 288 2.1. System 289 2.2. Gun Lens 289 2.3. Objective Lens 290 2.4. Side-Entry Stage 291 2.5. MIDAS Performance 291 3. The HB603 300-kV STEM instruments 292 3.1. The Prototype Design Phase 293 4. MIT and ANL Designs 305 5. Oak Ridge Design 307 6. Lehigh Design 310 7. Testing, Testing 311 8. Record-Breaking Results 316 8.1. Source Brightness 316 8.2. Energy Spread 316 8.3. ADF Resolution 316 8.4. X-Ray Microanalysis 317 9. Conclusions 320 Acknowledgments 321 References 322
8. On the High-Voltage STEM Project in Toulouse (MEBATH) 325 Bernard Jouffrey 1. Introduction 325 2. The Building 328 3. Generator 333 4. The Column 336 4.1. The Source 336 4.2. Accelerating Tube 342 4.3. Lenses 346 4.4. Spectrometers 348 5. Suspension of the Platform and the Microscope 349 6. Recording of The Signal 351 7. Conclusions 352 Acknowledgments 352 References 353 x Contents
9. Scanning Transmission Electron Microscopy: Biological Applications 357 Andreas Engel 1. Introduction 358 2. Image Formation 359 2.1. Electron-Sample Interactions 359 2.2. The Optical System 360 2.3. Detectors 360 2.4. Single-Electron Counting 361 2.5. Imaging Modes 363 3. Imaging Thin Sections 363 4. Imaging Negatively Stained Samples 365 5. Mass Measurements Using the Basel STEM 366 5.1. Principle 366 5.2. Estimate of the Statistical Error 369 5.3. Mass Determination of Biological Samples 371 6. Specific Examples of STEM Imaging and Mass Measurements 373 7. High-Throughput Visual Proteomics 378 8. Conclusions and Perspectives 380 Acknowledgments 382 References 382
10. STEM at Cambridge University: Reminiscences and Reflections from the 1950s and 1960s 387 K. C. A. Smith 1. STEM as a Diagnostic Tool for SEM 387 2. The Observation of Specimens in Water Vapor by Means of STEM 393 3. High-Voltage STEM Using a Single-Field Condenser—Objective Lens 400 References 405
Contents of Volumes 151–158 407
Index 411 Preface
Tom Mulvey (right) with Elmar Zeitler, Berlin 1990* I have the sad duty of recording the death of our other Honorary Associ- ate Editor, Tom Mulvey, who died on 16 July 2009, a few days before his 88th birthday. He was born on 26 July 1921 in Manchester; during the wartime years he served in the Navy and was sent to the Far East where he was responsible for anti-submarine operations. After being demobbed, he was awarded the MSc degree by Manchester University for a substan- tial study of electrostatic lenses and then spent several years in the Metropolitan–Vickers research establishment at Aldermaston Court. It was during this period that he met Rita, his future wife, for whom he cared devotedly during the last years of her life. In 1965, he joined the Birmingham College of Advanced Technology, later the University of Aston in Birmingham (today Aston University) and was made Emeritus Professor on his retirement in 1986. The last years of his life were spent near his son Nicholas, close to Oxford. In addition to his own research, he took over from V. E. Cosslett as editor of Advances in Optical & Electron Microscopy and later became an Associate Editor of Advances in Imaging & Electron Physics, to which he contributed several biographical articles on the pioneers of electron microscopy: Ernst Ruska, Dennis Gabor and Jan le Poole; he also wrote the Royal Society memoir on V. E. Cosslett and
* Courtesy of Prof. Dr B. Lencova´
xi xii Preface translated Ruska’s book on the early history of the electron microscope. The history of electron microscopy is richer by the presence of his many articles, of which the first (Brit. J. Appl. Phys. 13, 1962, 197–207) is truly remarkable, written before most of the fundamental documents for such a study had been published; a more extended account appeared in Proc. RMS 2 (1967) 201–227. The volume of these Advances that he guest-edited on ‘‘The Growth of Electron Microscopy’’ was a splendid achievement. His research interests were wide-ranging and he introduced many uncon- ventional lens designs. Among the most memorable were boiling-water lenses, pancake lenses, single-polepiece lenses and snorkel lenses, the dimensions of which were often indicated in units of ‘‘England’s Glory’’ matchboxes. For his 80th birthday (but rather belatedly), the Royal Microscopical Society (of which he was an honorary Fellow) brought together many of his friends for a celebration in Birmingham, which is commemorated in a long section of the Proceedings of the society (39, 2004, 206–233). A much fuller biography is to be found there, as well as tributes from many of those present; a bibliography of his publications was published for an earlier birthday and occupies four pages of the Journal of Microscopy (179, 1995, 101–104). One aspect that emerges from the tributes is just how entertaining he could be – he had an unlimited stock of anecdotes about present and past colleagues and jokes ranging from the politically highly incorrect to the purely frivolous. He was also a Distinguished Scientist and Fellow of the Microscopy Society of America and was awarded the gold Krizı´k medal of the Czech Academy of Sciences. He will be greatly missed and we extend our sympathy to all his family. The scanning transmission electron microscope (STEM) has a long history, going back to the 1960s. In the present volume, its development is traced from its inception in the Argonne National Laboratory and the University of Chicago, where A. V. Crewe built the first simple instru- ments, the success of which owed much to the quality of the field-emission gun. Albert Crewe was unfortunately not able to prepare a new account for this volume and, with his approval, two older documents are reproduced here: ‘‘Some Chicago aberrations’’ and a long report submitted to the US Department of Energy in 1992, which includes a very full list of publications. The field-emission source is the vital element of the STEM, for the brightness of thermionic guns is insufficient for a high-resolution instru- ment. Chapter 2 offers a review of cold field-emission source properties by L. W. Swanson and G. A. Schwind, both major contributors to our understanding of these guns. They cover both early developments and current research preoccupations. The following group of chapters describes specific instruments and commercial developments. J. S. Wall was a member of Crewe’s team Preface xiii when the first STEMs were being constructed and, as he explains, he was later recruited by Brookhaven National Laboratory to advance the con- struction of their STEM. Together with M. N. Simon and J. F. Hainfeld, he describes the design of this early home-made instrument and subsequent developments. The spectacular images obtained by Crewe awakened interest world- wide, not least in Japan. Hitachi in particular was stimulated to enter the STEM field and in Chapter 4, H. Inada, H. Kakibayashi, S. Isakozawa, T. Hashimoto, T. Yaguchi and K. Nakamura describe the early work that made STEM development possible and such topics as holography that also benefited from highly coherent sources. The various models are presented, together with some of the most impressive results. The closing paragraphs bring the story up to the aberration-corrected era. This does not exhaust the STEM projects in Japan. For example, a high-voltage instrument constructed at Nagoya University is described by M. Hibino, H. Shimoyaya and S. Maruse ( J. Electron Microsc. Tech. 12, 1989, 296–304) and an aberration-corrected STEM is also available from JEOL. In Europe, Siemens, AEI and Vacuum Generators all embarked on STEM projects. The VG instruments are described at length by I. R. M. Wardell, P. E. Bovey and S. von Harrach in Chapters 6 and 7. But for Siemens and AEI, I was unable to find authors and have therefore written an account of their STEMs myself, based on published information and personal communica- tion from several of those involved (Chapter 5). It was natural that the Laboratoire d’Optique Electronique in Toulouse, already home to two high-voltage transmission electron micro- scopes, should embark on the design and construction of a high-voltage STEM. In Chapter 8, B. Jouffrey, who launched and piloted this project, describes the principal stages in the preparations for this instrument, which alas was never completed. The foregoing chapters contain much description of instrumentation while Chapter 9 is a reminder that the STEM has proved an invaluable tool for microscopists in many fields of application. Here, A. Engel shows how fruitful it has been in biology. We conclude with a chapter by K. C. A. Smith, who was not only a pioneer of the scanning electron microscope in the Cambridge University Engineering Department but was also responsible for the design and construction of the first Cambridge high-voltage electron microscope, built in the Cavendish Laboratory in the 1960s. It was at that time that the idea of operating the microscope in the STEM mode came to him and it is this little-known early effort that is recorded here. It is worth empha- sizing that it was first mentioned in print in 1968, the same year as Crewe’s key paper in the Journal of Applied Physics. This volume should also have contained two more chapters, by M. S. Isaacson and O. L. Krivanek. Circumstances have prevented them xiv Preface from completing their chapters in time and their contributions will there- fore appear in later volumes of the Advances. I greatly regret that they do not appear here, for M. S Isaacson was one of the pioneers of the STEM while O. L. Krivanek not only produced the first successful corrector of spherical aberration for the STEM but also suggested to me that a thematic volume on STEM would be timely. As always, I am most grateful to all the contributors for writing such readable and informative accounts.
Peter W. Hawkes Contributors
A. V. Crewe 1 Enrico Fermi Institute and Department of Physics, University of Chicago, Chicago, USA L. W. Swanson and G. A. Schwind 63 FEI Co. Hillsboro, Oregon, USA Joseph S. Wall, Martha N. Simon, and James F. Hainfeld 101 Biology Department, Brookhaven National Laboratory, Upton, New York 11073, USA Hiromi Inada, Hiroshi Kakibayashi, Shigeto Isakozawa, Takahito Hashimoto, Toshie Yaguchi, and Kuniyasu Nakamura 123 Hitachi High-Technologies Corp., Tokyo, Japan P. W. Hawkes 187 CEMES-CNRS, Toulouse, France Ian R. M. Wardell 221 Department of Physics and Astronomy, University of Sussex, Brighton, United Kingdom Peter E. Bovey 221 Lindfield, West Sussex, United Kingdom H. S. von Harrach 287 FEI Electron Optics, Eindhoven, The Netherlands Bernard Jouffrey 325 Laboratoire de Structures, Sols et Mate´riaux (LMSS-Mat), E´ cole Centrale Paris, Unite´ Mixte de Recherche (UMR), National Center for Scientific Research (CNRS) 8579, Chaˆtenay-Malabry, France Andreas Engel 357 M. E. Mu¨ller Institute for Structural Biology, Biozentrum, University of Basel, Klingelbergstrasse 70, Basel, CH-4056 Switzerland, and Department of Pharmacology, Case Western Reserve University, 10900 Euclid Avenue, Wood Bldg 321D, Cleveland, Ohio 44106, USA K. C. A. Smith 387 Fitzwilliam College, University of Cambridge, Cambridge CB3 0DG, United Kingdom
xv Future Contributions
S. Ando Gradient operators and edge and corner detection K. Asakura Energy-filtering X-ray PEEM W. Bacsa Optical interference near surfaces, sub-wavelength microscopy and spectroscopic sensors Baranczuk, J. Giesen, Z. K. Simon and P. Zolliker (vol. 160) Gamut mapping C. Beeli Structure and microscopy of quasicrystals C. Bobisch and R. Mo¨ller Ballistic electron microscopy G. Borgefors Distance transforms Z. Bouchal Non-diffracting optical beams A. Buchau Boundary element or integral equation methods for static and time-dependent problems B. Buchberger Gro¨bner bases E. Cosgriff, P. D. Nellist, L. J. Allen, A. J. d’Alfonso, S. D. Findlay, and A. I. Kirkland Three-dimensional imaging using aberration-corrected scanning confocal electron microscopy T. Cremer Neutron microscopy C. J. Edgcombe New dimensions for field emission: effects of structure in the emitting surface
xvii xviii Future Contributions
A. N. Evans (vol. 160) Area morphology scale-spaces for colour images A. X. Falca˜o The image foresting transform R. H. A. Farias and E. Recami Introduction of a quantum of time (‘‘chronon’’) and its consequences for the electron in quantum and classical physics R. G. Forbes Liquid metal ion sources C. Fredembach Eigenregions for image classification A. Go¨lzha¨user Recent advances in electron holography with point sources M. Haschke Micro-XRF excitation in the scanning electron microscope L. Hermi, M. A. Khabou and M. B. H. Rhouma (vol. 162) Shape recognition based on eigenvalues of the Laplacian M. I. Herrera The development of electron microscopy in Spain M. S. Isaacson Early STEM development J. Isenberg Imaging IR-techniques for the characterization of solar cells K. Ishizuka Contrast transfer and crystal images A. Jacobo Intracavity type II second-harmonic generation for image processing L. Kipp Photon sieves G. Ko¨gel Positron microscopy T. Kohashi Spin-polarized scanning electron microscopy O. L. Krivanek Aberration-corrected STEM R. Leitgeb Fourier domain and time domain optical coherence tomography B. Lencova´ Modern developments in electron optical calculations Future Contributions xix
H. Lichte New developments in electron holography M. Mankos, V. Spasov and E. Munro (vol. 161) Principles of dual-beam low energy electron microscopy M. Marrocco Discrete diffraction M. Matsuya Calculation of aberration coefficients using Lie algebra S. McVitie Microscopy of magnetic specimens J. D. Mendiola-Santiban˜ez, I. R. Terol-Villalobos and I. M. Santilla´n-Me´ndez (vol. 161) Determination of adequate parameters for connected morphological contrast mappings through morphological contrast measures I. Moreno Soriano and C. Ferreira (vol. 161) Fractional Fourier transforms and geometrical optics M. A. O’Keefe Electron image simulation D. Oulton and H. Owens Colorimetric imaging D. Paganin and T. Gureyev Intensity-linear methods in inverse imaging N. Papamarkos and A. Kesidis The inverse Hough transform K. S. Pedersen, A. Lee and M. Nielsen The scale-space properties of natural images Y. Pu (vol. 160) Harmonic holography G. X. Ritter and G. Urcid (vol. 160) Lattice algebra approach to endmember determination in hyperspectral imagery R. Ru¨denberg (vol. 160) Origin and background of the invention of the electron microscope, Memoir H. G. and P. Rudenberg (vol. 160) Origin and background of the invention of the electron microscope, Commentary R. Shimizu, T. Ikuta and Y. Takai Defocus image modulation processing in real time S. Shirai CRT gun design methods xx Future Contributions
A. S. Skapin The use of optical and scanning electron microscopy in the study of ancient pigments T. Soma Focus-deflection systems and their applications P. Sussner and M. E. Valle Fuzzy morphological associative memories I. Talmon Study of complex fluids by transmission electron microscopy M. E. Testorf and M. Fiddy Imaging from scattered electromagnetic fields, investigations into an unsolved problem N. M. Towghi
Ip norm optimal filters E. Twerdowski Defocused acoustic transmission microscopy Y. Uchikawa Electron gun optics K. Vaeth and G. Rajeswaran Organic light-emitting arrays V. Velisavljevic and M. Vetterli (vol. 161) Space-frequence quantization using directionlets M. H. F. Wilkinson and G. Ouzounis (vol. 161) Second generation connectivity and attribute filters E. Wolf (vol. 162) History and a recent development in the theory of reconstruction of crystalline solids from X-ray diffraction experiments Chapter 4
Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes
Hiromi Inada, Hiroshi Kakibayashi, Shigeto Isakozawa, Takahito Hashimoto, Toshie Yaguchi, and Kuniyasu Nakamura
Contents 1. Introduction 124 2. The Dawn of Hitachi Electron Microscopes (by Hiromi Inada) 125 2.1. Crewe STEM Shock and Field Emission Development 125 3. Cold FE-SEM Studies and Expansion to Different Fields 128 3.1. CFE-STEM Development at HCRL 128 3.2. CFE-SEM Development at Naka Works 131 3.3. Studies of Field Emission Stability 132 4. Expansion of High-Voltage TEMs and STEMs 137 4.1. Holography Studies by Tonomura with FE-TEMs 137 4.2. Multistage Acceleration CFEG for TEM Applications 138 4.3. Commercialized Analytical CFE-TEM/STEM 139 5. Development of 50-kV STEM in 1970s (by Shigeto Isakozawa) 141 5.1. Development of Hitachi’s 50kV Prototype CFE-STEM 141
Hitachi High-Technologies Corp., Tokyo, Japan
Advances in Imaging and Electron Physics, Volume 159, ISSN 1076-5670, DOI: 10.1016/S1076-5670(09)59004-0. Copyright # 2009 Elsevier Inc. All rights reserved.
123 124 Hiromi Inada et al.
5.2. Bright-Field Images Obtained with 50-kV CFE-STEM 142 5.3. Single-Atom Observation 144 5.4. Development of the Electron Energy-Loss Spectrometer 147 5.5. Further Development of 50-kV CFE-STEM 149 6. Hitachi’s First Commercialized Dedicated STEM (by Takahito Hashimoto) 150 6.1. 200-kV Analytical CFE-TEM, HF-2000 150 6.2. ‘‘Gate Viewer,’’ Trigger for Dedicated STEM 154 6.3. Novel Functions for HD Series 161 7. Cutting-Edge Applications with Customized HD Models (by Toshie Yaguchi) 165 7.1. 120-kV FE UHV for Nanotubes 165 7.2. 200-kV FE Ultrahigh-Resolution STEM 165 7.3. 3D Structural and Elemental Analysis 169 8. Aberration-Corrected CFE-STEM (by Kuniyasu Nakamura) 170 8.1. Atomic-Level Characterization Instrument 170 8.2. Theoretical Consideration of Advantages of Aberration-Corrected CFE-STEM 172 8.3. Evaluation of Aberration-Corrected CFE-STEM 173 8.4. Advanced Application Results with HD-2700C 176 9. Conclusion and Future Prospective (by Hiroshi Kakibayashi) 181 Acknowledgments 182 References 182
1. INTRODUCTION
Hitachi started researching and developing electron microscopes in 1940 and has since developed and manufactured many electron microscopes. Cold-field emission (CFE) technology developed in a number of different directions. Crewe invented the field emission scanning transmission electron microscope (FE-STEM) and used an early version to observe individual atoms. Stimulated by his reports, Hitachi began developing a CFE-STEM in the mid-1960s and invited Crewe to serve as a consultant to Hitachi. He introduced his CFE technology and helped Hitachi develop and commercialize STEMs and scanning electron microscopes (SEMs). Hitachi’s prototype CFE-STEM opened a new world of analytical electron microscopes equipped with an X-ray analyzer and energy spectrometer. The HFS-2 FE-SEM, which was built at Hitachi’s Naka Works in 1972, was the first step in Hitachi’s development of FE-SEMs. A 50-kV CFE-TEM Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 125 was developed at Hitachi’s Central Research Laboratory (HCRL) by Tonomura and his group in 1973 for application to electron holography, which enabled higher image resolution. To incorporate a sophisticated FE electron gun into microscopes, it was necessary to create an ultrahigh vacuum (UHV) (of the order of 10 8 Pa) to fundamentally stabilize the FE current. This chapter describes Hitachi’s efforts over the past 40-plus years to develop CFE technology and STEMs. We also introduce cutting-edge application data obtained with the latest CFE-STEMs (with and without an aberration corrector), highlight Hitachi’s contributions to FE technology development, and show how the knowledge gained has been passed from generation to generation at Hitachi. Additionally, we show how CFE SEM/ STEM technologies were established.
2. THE DAWN OF HITACHI ELECTRON MICROSCOPES (BY HIROMI INADA)
K. Kasai, one of the founders of the 37th Subcommittee of the Japanese Society for the Promotion of Science, with regard to electron microscopes, moved to Hitachi from one of the Japanese National Laboratories, Electrotechnical Laboratory in 1939 and began to develop electron micro- scopes by using the experience he gained working on cathode ray oscil- lography in Germany. His guiding principle was that one should work in a manufacturing company to be able to do innovative practical develop- ment. Kasai joined forces with B. Tadano at Hitachi and, in 1940, they developed the first Hitachi TEM (model HU-1) (Komoda 1996a). A second TEM with improved resolution (the HU-2) was developed and installed at Nagoya Imperial University (now Nagoya University) in 1943. Hitachi established a central research laboratory (HCRL) in Kokubunji, a suburb of Tokyo, in 1942 where it continued developing electron microscopes despite the wartime conditions.
2.1. Crewe STEM Shock and Field Emission Development 2.1.1. Trigger for Field Emission Microscopes A. V. Crewe reported the successful development of an SEM equipped with a CFE gun (CFEG) in 1964 (Crewe, 1964; Crewe et al., 1970a). This report greatly affected Hitachi researchers, who were seriously fighting to obtain the highest TEM resolution in the mid-1960s (Komoda 1996b). Crewe and his group were provident in terms of advantages of CFE and the progress of UHV technology, and they began pioneering devel- opment of an STEM equipped with a CFEG in the early 1960s. They 126 Hiromi Inada et al. achieved a resolution of 0.5 nm and successfully observed individual atoms of uranium and thorium, even though their microscope had a simple design and contained a single-electron magnetic lens with a CFEG. This breakthrough observation overturned the conventional wis- dom about electron microscopy at that time and revealed the power of FE technology. Moreover, they directly observed individual atoms with a STEM, not a TEM, whereas most scientists believed that only a TEM could achieve such high-resolution imaging (Crewe et al., 1968a,b; Crewe, Wall, and Langmore, 1970b). Hitachi started developing SEMs in the early 1960s and commercia- lized the first thermionic gun SEM (model HSM-2) in 1969. Conventional SEMs with a thermionic gun at that time had a resolution of 10 nm, which was much worse than that of TEMs (0.3 nm); hence, nobody compared performance between TEMs and SEMs. However, Crewe’s development of an SEM in 1964 made it possible to compare SEMs with TEMs using the same criteria. An SEM can be used to acquire time series of various types of signals (secondary, transmission electron, X-ray, and energy loss) from a speci- men simultaneously by focusing on an electronically specific point and/ or area by imaging it with a narrow scanning electron beam. The development of the CFE-SEM meant the birth of a new scientific instrument capable of simultaneous nanometer-order analysis and imag- ing. Although some scientists (Eggenberger, Hart, and Libal, 1968; Siegel et al., 1968; Wiesner and Everhart, 1969) had started early FEG electron microscopes, none of the electron microscope vendors had succeeded in building a CFE-SEM. Accordingly, Hitachi was driven to quickly develop a CFE-SEM due to its importance. R. Ueda (Nagoya University) said in the preface of the first issue revival of the Journal of Electron Microscopy in 1975, ‘‘Crewe STEM was excellent and nobody had imagined before such achievement and his outstanding concept’’ (Ueda, 1975). This statement reflects the sensational effect the FE-SEM had at that time.
2.1.2. Field Emission Gun Development at Hitachi Hitachi launched a major project in 1969 to produce ultrahigh-resolution FE-SEMs and FE-TEMs. As a microscope manufacturer, Hitachi focused on ease of use and ease of production, as well as on imaging capability. In 1970, Hitachi invited Crewe to serve as a technical consultant for its development of a CFE-SEM. Field emission was discovered by R. W. Wood in the nineteenth century (Wood, 1897). Millikan and Lauritsen (1928) and E. W. Mu¨ ller (1937) studied the characteristics of this type of emission. FE patterns Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 127 were investigated (Gomer, 1961), and study of FE as a source of electrons began in 1955 (Butler, 1966; Dyke et al., 1953; Everhart, 1967; Martin, Trolan, and Dyke, 1960). FE electrons can be obtained by applying several thousand volts to the tip of a metal needle (FE tip) with a radius of less than 100 nm. The energy spread of the emitted electrons is narrow (0.2–0.3 eV) because the emitter runs at room temperature. FE electrons are emitted through the potential barrier of the surface from near the Fermi level because the barrier is thinned by the application of a negative electronic field with a strength of 107 V/cm to the metal surface, which is the tunnel effect. The current density J(A/cm2) is obtained using equation 1 from Fowler and Nordheim (Fowler and Nordheim, 1928), and the density strongly depends on the electric field applied to the FE tip and on the work function of the metal. () 2 5 3=2 F 6:83 10 f vðyÞ J ¼ 1:54 10 2 exp ; (4.1) ft2ðyÞ F where t2(y) and v(y) are elliptic functions nearly equal to 1, F is the electric field strength, and f is the cathode work function. The thermionic elec- tron current density is obtained using the Richardson–Dushman equa- tion. The CFE current density (104–106 A/cm2) is three orders of magnitude larger than that of the thermionic electrons (1–10 A/cm2). The FE source is ideally a point source, and the diameter of the virtual source ranges from 5 to 10 nm because of the small FE tip, which is 1/1000 the source size of the thermionic emission (1–10 m). Thus, changing the FE source can reduce the beam spot size; that is, it can improve SEM image resolution. An electron gun should be designed to have less spherical aberration and mechanical vibration. Crewe used the Butler electrostatic lens, which has less spherical aberration than his prototype design, for his CFE-STEM and thereby obtained high resolution. An FE electron gun with a Butler lens consists of an FE tip and a diode region for the extraction and acceleration electrodes (Figure 1). A. Tonomura at HCRL used a micro- computer to optimize the Butler lens shape and minimize the aberration (Shimoyama, Ichihashi, and Tamura, 1989; Tonomura and Komoda, 1973). Table 1 shows a comparison of the characteristics of emitters with FE and thermionic electron guns. Although applying the FE gun to electron microscopes was an obvious next step, it took many years to develop such a microscope that was practical. This was due to the instability of the FE current and the diffi- culty of achieving an UHV of the order of 10 8 Pa. 128 Hiromi Inada et al.
FE tip
V 1 1st anode V 0
2nd anode
FIGURE 1 Schematic diagram of FE gun with Butler electrode lens.
TABLE 1 Characteristics of Emitters
Thermionic emission Field emission W<310> (Tungsten filament)
Source brightness 109 A/cm2 sr 5 105 A/cm2 sr Source size 5–10 nm 1–10 m Energy spread 0.3 (eV) 2 (eV) Temperature 300 K (R.T.) 2800 K Vacuum pressure <10–8 Pa <10–3 Pa Lifetime 1 year 50 hours
3. COLD FE-SEM STUDIES AND EXPANSION TO DIFFERENT FIELDS 3.1. CFE-STEM Development at HCRL In 1968, a group at HCRL organized by T. Komoda began developing a CFE-STEM (Komoda et al., 1972). The prototype CFE-STEM consisted of (i) a gun chamber evacuated to 1 10 8 Pa and separated from the microscope column by a differential aperture and (ii) a microscope column evacuated to 3 10 5 Pa. A Butler FE gun and two stages of electromagnetic lenses (Figure 2) produced a convergent beam on the Field emission gun Ion-pump (1) 2 ϫ 10−10 torr
Ion-pump (2) ϫ −8 Aperture 5 10 torr
Condenser lens (stigmator) Objective lens (deflector) Ion-pump (3) Specimen stage
Detector 1 ϫ 10−6 torr (P.M. tube)
FIGURE 2 (Left) Schematic diagram of FE-STEM developed at HCRL and (right) general view of Hitachi’s first FE-STEM. 130 Hiromi Inada et al. specimen when an acceleration voltage of 50 kV and an extraction voltage of 5 kV were applied. A tungsten <310>-oriented FE tip in NaOH electro- polished was used as an electron source. Komoda’s group developed a pulsed power supply to stabilize the polishing and thereby maintain the quality of the FE tip. They calculated the electron path and aberrations with a microcomputer to optimize the Butler lens to machine it more precisely and thus minimize spherical aberration (Tonomura, 1973). Ultimately, a brightness of 5 108 A/cm2 was obtained. A side-entry specimen stage holding the specimen, a movable aperture, and a cold finger were inserted into the 6.5-mm gap in the objective lens pole piece, which had a bore of 2 mm. A transmission electron detector consisting of a phosphor and a photo- multiplier was placed at the bottom of the microscope column. A contrast aperture was inserted immediately above the detector to control the detection angle and to produce three kinds of contrast. Crewe and Wall (1970c) and Zeitler (Zeitler et al., 1970a,b) asserted that a bright-field (BF) STEM image is equivalent to a conventional TEM image by reciprocity. The use of a contrast aperture resulted in (i) a BF-STEM detection angle of less than 10 mrad without elastic scattered electrons, (ii) a phase contrast of less than 2 mrad, producing a small illumination angle TEM image, and (iii) a dark-field (DF) STEM detection angle of more than 10 mrad, enabling detection of elastic scattered electrons. Hitachi achieved a resolution of 1 nm with their instrument and observed BF and DF contrast reversal of evaporated Au particles, the equal-thickness fringe of MgO single crystals, and a microtome tissue section (Figure 3) that clearly indicates a double-cell membrane.
FIGURE 3 Tissue section of biological specimen showing double-layered structure of cell membrane. Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 131
3.2. CFE-SEM Development at Naka Works Another FE project had been started by the Naka Works. A team led by S. Saito had the goal of producing an FE-SEM capable of secondary electron (SE) detection. This goal was set because the market and target were clear and because no one had achieved very fine feature analysis (on the order of 3 nm) for biological studies. The resolution available with tungsten-filament SEMs ( 10 nm) was insufficient. However, most elec- tron microscopes produced in the 1970s were for biology, and scientists were looking for impressively beautiful electron micrographs. Hence, these were obviously tough years for scanning microscopes, which produced rough pixel images that were unacceptable to most scientists. Saito was dispatched to Perkin-Elmer Ultek Inc. to learn about and investigate UHV technologies for practical use, and they introduced. In 1970, Hitachi Naka Works invited Crewe to serve as a consultant to Hitachi and assist with the development of a CFE-SEM for two years. The Naka engineers brought a drawing board to a conference room to help them concentrate on working closely with Crewe to design a new concept microscope (Figure 4). They eventually succeeded in developing the world’s first commercialized CFE-SEM, model HFS-2, in 1972 (Komoda and Saito, 1972b)(Figure 5). It had an aberration-optimized Butler lens, a variable acceleration voltage of 1–25 kV, and resolution of 3 nm. The microscope column was separated into three chambers by using differen- tial pumping apertures, and the chambers were pumped with individual ion pumps. The CFEG maintained a vacuum pressure of 10 8 Pa even when the pressure in the specimen chamber was 10 3 Pa. For longer running time, two FE tips were inserted into the gun, which eliminated the need to vent the gun chamber. The column had a single stage con- denser lens and an objective lens, enabling the illuminating electron beam
FIGURE 4 Photograph taken at meeting with Professor Crewe of Chicago University and Hitachi colleagues during his consultancy (1972). 132 Hiromi Inada et al.
FIGURE 5 Hitachi’s first commercial FE-SEM (model HFS-2). to be varied widely in size, resulting in a probe size of 2–20 nm and a probe current of 10 pA to 2 nA. This CFE-SEM has been installed in major biology research facilities. Collaborative work with K. Tanaka of Tottori University led to the development of instruments with much higher resolution. Since then the resolution and FE stability of CFE-SEMs have continued to be improved (Figure 6). Thanks to the development of an in-lens pole-piece design, CFE-SEMs now have much higher resolution (<1 nm), and a recent CFE-SEM (model S-5500), which has an environment-resistant design, has a resolution of 0.4 nm in SE image (Figure 7).
3.3. Studies of Field Emission Stability The biggest problem in applying CFE technology to microscopes is improving FE stability and operation. It is not an exaggeration to state that progress in CFE technology is equivalent to progress in UHV technology. The improvements made include automatic V0/V1 ratio control for the Butler lens, noise reduction for the electronics, and beam monitor incorpora- tion for user operation of the sophisticated FE technique. The FE current fluctuates, and instability of the emission current increases with the probe current. This instability is one of the problems that must be overcome for FE technology to be used practically. Figure 8 illustrates the general behavior of the FE current as a function of time after flashing. Flashing the FE tip causes gas molecules on the tip surface to desorb and smooths the surface. An extraction voltage (V1)of 2–5 kV is then applied to obtain a total emission current of 1–100 A. Immediately after flashing, the FE current decreases as a gas monolayer builds up on the emitter surface. Stable region, relatively flat emission Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 133
500 Å
T2-bacterio phage ; taken by ultra T2-bacterio phage ; taken by ultra high resolution SEM, model HFS-2 high resolution SEM, model UHS-t1 (Prof.A.V.Crewe, Chicago University, (Prof.K.Tanaka, Tottori University, U.S.A, 1972) Japan) (1988)
FIGURE 6 Secondary electron micrograph image comparison of T2 bacteriophage, recorded with HFS-2 (left, in 1972) and with prototype in-lens–type FE-SEM for Professor Tanaka at Tottori University (right, in 1988).
16 HSM-2 14 Thermionic electron SEMs 12
HSM-2A 10
8
6 HFS-2 (5 nm) SEM resolution (nm) 4 Field emission SEMs S-700 S-800 2 S-900 S-5000 S-5200 S-5500 0 1960 1970 1980 1990 2000 2010 Year
FIGURE 7 Progress in image resolution of Hitachi FE-SEMs. The resolution of an early thermionic gun is plotted for comparison. Spatial resolution improved to sub-nanometer order with introduction of model S-900 due to incorporating in-lens design optics. 134 Hiromi Inada et al.
Emitter destroyed E
I by vacuum arc
Current decreasing Current increasing due to adsorption due to ion bombardment Emission current
IMIN
Time Flashing Cyclical lifetime
FIGURE 8 General behavior of field emission current as a function of time after flashing (Shimoyama, Ichihashi, and Tamura, 1989). current flows; however, continuous absorbing, desorbing, and migration of gas molecules occurs on the emitter surface; this derives FE noise, which is very fast random current fluctuation. After the region is kept stable for several hours (<10 hours), the FE current rises with a large fluctuation, which possibly destroys the tip. The emission current decreases as a function of the work function of the absorbing gas in accordance with Eq. (4.1). H. Todokoro et al.(Todokoro, Saito, and Yamamoto, 1982) of HCRL investigated the fluctuations in the FE current with the vacuum pressure of the FE gun and experimentally found that current stability is affected by ion bombardment of the FE source. The experiments were done using a vacuum chamber equipped with two FE guns (A and B). Gun A had a single FE tip and was used to record the total emission current under various vacuum pressures. The relative fluctuation, DI/I,as a function of the product of the pressure and emission current (P I) is shown in Figure 9. It is proportional to the logarithm of P I above 7 10 12 PaA. This indicates that the fluctuation increase is caused by ion bombardment of the residual gas molecules. This fluctuation represents a function of P I, not of I. Below 7 10 12 PaA, the relative fluctuation is less than 1% and constant, probably due to migration of the absorbed gas molecules on the FE tip surface. The results of this experiment show that FE current fluctuation caused by ion bombardment increases when the product of pressure and emission current exceeds a threshold. Gun B had two emitters 5 mm apart that were supplied with individual high voltages simultaneously to verify the origin of the ions (Figure 10). Emitter I emitted a current ranging from 5 to 250 A, and emitter II emitted a constant current of 5 A. As Figure 11 shows, the emission fluctuation of emitter II was maintained despite the very close placement of the emitters Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 135
15
− 4 ϫ 10 8 Pa − 4.5 ϫ 10 7 Pa − 1 ϫ 10 6 Pa − 4.5 ϫ 10 6 Pa 10 (%) ∞ /I ∞ D I 5
0 − − − − − 10 13 10 12 10 11 10 10 10 9 P ϫ I∞(Pa.A)
FIGURE 9 Relative emission fluctuation as a function of product of gun pressure and total emission current. Reproduced with permission of Todokoro, Saito, and Yamamoto, 1982. and their sharing of the same ambient gas pressure. This shows that the bombarding ions are generated close to the emitters. H. Shimoyama described the history of improvements in emission current (Shimovama, Ichihashi, and Tamura, 1989). For example, the total emission current steadily increased year by year due to improve- ments in vacuum technology, surface treatment, and reproductive FE tips. For instance, the emission current obtained was only a few microamperes in the 1970s compared with 100 A in the 1980s. A small desktop FE-SEM (model S-310) (Figure 12, W400 D500 H500 mm, released in 1976) sparked the idea for a critical dimension (CD)-SEM. The CD-SEM used a simple optics CFEG and a single objective lens, and it had a resolution of 10 nm in TV rate scanning. The gun had a single-electrode design, and the acceleration voltage was the same as the extraction voltage (4–6 kV). This microscope had an emission current (20 A) 10 times higher than previous microscopes, resulting in improved spatial resolution of quickly scanned images. Accordingly, it was an important breakthrough for improving FE stability and emitting a higher FE current. The model S-310 microscope was suitable for nonconductive speci- mens, such as cloth and semiconductor devices without charge-up, because of its low acceleration voltage. It nevertheless did not meet customer needs at that time (the late 1970s) because most users apparently expected beautiful art-like electron microscope images. It was better 136 Hiromi Inada et al.
V Ј 1 V1
REC. REC.
Emitter Emitter I II
Anode
1cm
FIGURE 10 Experimental apparatus of Gun B. Two FE tips were placed face to face and had the same anode distance of 10 mm. Reproduced with permission of Todokoro, Saito, and Yamamoto, 1982.
Emitter I 1.1
1.0 5 mA m 10 mA 50 mA 100 mA 250 A 0.9 1 min
3 ϫ 10−7 Pa 1.1 Emitter II 1.0
5 mA5mA 5 mA5mA5mA 0.9
FIGURE 11 Emission current fluctuations for two simultaneously operating FE tips obtained using different emission currents. Emitter I had emission current of 5 A to 250 A, whereas emitter II was controlled to emit a constant 5 A. Reproduced with permission of Todokoro, Saito, and Yamamoto, 1982. Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 137
FIGURE 12 Overview of desktop S-310 FE-SEM, which is now displayed in the reception area of Hitachi High Technologies America. suited for the early 21st century when there was a boom in interest for small SEMs. The S-310 low-kilovolt microscope, on the other hand, gave an essential for semiconductor device in line dedicated CD-SEM.
4. EXPANSION OF HIGH-VOLTAGE TEMs AND STEMs 4.1. Holography Studies by Tonomura with FE-TEMs Researchers at HCRL had an idea for using FE guns on TEMs at the very beginning of CFE-STEM development. TEM resolution had improved drastically through the 1970s under the heat of competition, and the ultimate resolution had been reached with conventional TEM. Gabor invented holography in 1948 (Gabor, 1949) to compensate for spherical aberration. Although A. Tonomura et al. (1968) proved the practicability of electron holography in their pioneering work using Hibi’s pointed filament (Hibi, 1956) in 1968, the resolution of the reconstructed image was not satisfactory due to poor electron beam interference. Tonomura et al. developed, in 1972,withButlerlensFEsourceasagun applicable of acceleration voltage of 50 kV, for electron holography (Figure 13)(Tonomura and Komoda, 1973). They developed an 80-kV CFE-TEM with higher coherency in 1978 and obtained as many as 3000 lines of Fresnel fringes (Tonomura et al., 1979b)comparedwiththe 300 fringes obtained up until then, and thereby ensured the realization of practical electron holography. The lattice resolution was improved to 0.062 nm due to a chromatic aberration effect. The Aharonov–Bohm effect was proven experimentally in 1982 (Tonomura et al., 1979b, 1982, 1998)with 138 Hiromi Inada et al.
FIGURE 13 Overview of 50-kV FE-TEM (Tonomura, 1972).
the 80-kV CFE-TEM. They also studied the use of holography using a 1-MeV CFE-TEM (Kawasaki et al., 2000) atHitachi’s Advanced Research Laboratory and investigated the dynamics of vortices (magnetic-flux quanta) in high– transition temperature (Tc) superconductors. Using this 1-MeV CFE-TEM, they obtained 10,000 Fresnel fringes and a lattice resolution of 0.049 nm.
4.2. Multistage Acceleration CFEG for TEM Applications Many remarkable CFE-TEM experiments have been done with the 80-kV CFE-TEM at HCRL; however, it was difficult to exceed an acceleration voltage of 80 kV with the Butler lens electron gun because of discharge between the emitter and electrodes. Endo of HCRL and his group devel- oped a multistage electrode gun that produced an acceleration voltage of 125 kV to improve coherency and resolution. The distance between the emitter and ground electrode in the multistage electrode gun was Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 139
Insulator housing
Field emission tip
Electrodes
Insulator
FIGURE 14 Cross-sectional image of FE gun with multistage acceleration tube (Tonomura, 1984).
approximately 10 times that in the Butler lens gun (Tonomura, 1984) (Figure 14). This new CFEG produced a total emission current of 100 A and a consequent probe current of 8 nA. This gun incorporated countermeasures against outside magnetic fields. Extra care was needed when mounting the FE tip because of its tall design. This multistage electron gun was used not only for electron holography studies (Tonomura et al., 1982) but also for 100-kV analytical CFE-TEM (Koreeda et al., 1990).
4.3. Commercialized Analytical CFE-TEM/STEM Tomita and Naka Works designers developed the first analytical CFE- TEM (model H-600FE) equipped with an energy-dispersive X-ray (EDX) spectrometer and an electron energy-loss spectrometer (EELS) analyzer. It was installed at Osaka University in 1986. This TEM used a multistage electrode gun to produce 100 kV. It had SE and two STEM detectors and a maximum specimen tilt angle of 60 , and it had a lattice resolution of 0.14 nm and an STEM resolution of 1 nm (Koreeda et al., 1990)(Figure 15). An energy spread of 1 eV was obtained with a serial EELS designed by S. Isakozawa of the Naka Works. Electron microscope column Energy dispersive (FE-Gun) X-ray micro analysis
C-F discri
SEM. image SEM. det.
0 EDX. det. I P1 Def. coil P2
EELS. control EELS. det
STEM. det Slit Ratemeter
FIGURE 15 (Left) Side view 100-kV field emission analytical TEM/STEM (H-600FE) installed at Osaka University. (Right) Schematic diagram of H- 600FE with analytical tools (SEM, EDS, and EELS detectors) (Koreeda et al., 1990). Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 141
5. DEVELOPMENT OF 50-KV STEM IN 1970S (BY SHIGETO ISAKOZAWA) 5.1. Development of Hitachi’s 50kV Prototype CFE-STEM The basic design for Hitachi’s 50-kV CFE-STEM was developed by S. Nomura and H. Todokoro at HCRL. S. Saito, Y. Minamikawa, and Kakiuchi at Naka Works worked on the detailed designs and the production of a prototype. Table 2 shows the specifications of the FE-STEM prototype. Figure 16 shows a schematic diagram of the basic design. A CFE cathode is used for the electron source. Condenser and objective lenses demagnify the electron beam, which is accelerated to 50 kV to form a spot with a diameter of 0.3 nm on the specimen. To meet the requirements for high-resolution observation, the specimen stage was designed on the basis of a TEM specimen stage. Specimens have to be thin sections and are placed on a 3-mm diameter grid. Forward-scattering electrons are detected with an annular dark-field (ADF) detector. The electron intensity detected by the detector is displayed on a cathode ray tube (CRT). As the driving signals of the CRT are synchronized with the raster scan signals, the arrangement of the electron intensity signals forms a DF-STEM image. UHV technologies were not well established in the 1970s, so the reliability of CFE sources was sufficient only for obtaining several micro- amperes of emission current for only a few hours with a 50-kV accelera- tion voltage. Nevertheless, this was good enough to observe a single atom. Much work was undertaken by Nomura and Todokoro to improve
TABLE 2 Specifications of the prototype FE-STEM
Item Specifications
Resolution 0.3 nm Maximum acceleration 50 kV voltage Maximum magnification 10,000,000 Gun type Cold-field emission Time for exchanging 10 minutes specimen Vacuum evacuation system Three-stage differential pumping system Ion pump (60 L/sec, 20 L/sec, 150 L/sec) Column structure Components connected with metal gaskets Electron optics Illuminating, objective, projection lenses 142 Hiromi Inada et al.
Field emission gun CRT for display
Probe forming lens
X ray detector Specimen
Electron detector(A)
Electron energy Slit loss spectrometer
Electron detector(B) (B)
FIGURE 16 Concept of FE-STEM by Nomura. stage stability, reduce noise from the scan coil current, reduce specimen contamination, and so on. They were then able to obtain high-resolution STEM images. They also invented new techniques—for example, a speci- men exchange method to evacuate air with a sorption pump and then insert it into the UHV chamber. Development of the 50-kV CFE-STEM was completed in 1975. Figure 17 shows an overall view of the CFE-STEM developed by Hitachi. Note that an EELS was mounted on the bottom of the microscope column. The basic design concept enabled not only single-atom observation, but also element analysis with atomic spatial resolution.
5.2. Bright-Field Images Obtained with 50-kV CFE-STEM Figures 18 and 19 show lattice fringes of carbon graphite and single-crys- tal Au film acquired to confirm the mechanical and electrical stabilities and probe size of the FE-STEM prototype. As the reciprocity relationship between conventional TEM (CTEM) and STEM had been studied at HCRL, it was well known that crystal lattice fringes could be obtained with BF-STEM exactly like those obtained with CTEM. The BF-STEM images in Figures 18 and 19 clearly show that crystal lattices with spacings of 0.34 and 0.20 nm can be observed. This means that the electron beam spot size was 0.3 nm or less and that the instrument was stable enough to obtain atomic resolution. The image in Figure 19 is certainly the first example of observing lattice fringes with spacing of 0.2 nm using BF-STEM. Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 143
FIGURE 17 General view of FE-STEM.
3.4 Å
FIGURE 18 Lattice fringe of carbon graphite (bright-field image).
3nm
FIGURE 19 A 0.2-nm lattice fringe of single-crystal Au (bright-field image). 144 Hiromi Inada et al.
5.3. Single-Atom Observation The intensities of electrons elastically scattered from 2-nm-thick carbon and from thorium single atoms were calculated by Nomura. The acceler- ation voltage was assumed to be 100 kV, and the electron beam spot size was assumed to be 0.3 nm. Figure 20 shows the relationship between the intensities of the scattered electrons and the scattering angle. It shows that electrons scat- tered from a thorium atom are distributed at a higher angle than carbon atoms and that their intensity is higher even at a scattering angle of 150 mrad or higher. DF imaging using CTEM, which uses a narrower range of scattering angles (less than 10 or at most 30 mrad), cannot achieve efficient detection. DF-STEM imaging with an ADF detector (which covers from 20–200 mrad) can drastically improve detection efficiency. The calculated relationship between atom image contrast and electron probe diameter is plotted for three probe sizes in Figure 21. Image con- trast is defined as Iz/Ic, where Ic is the signal intensity from the carbon atoms supporting the thin film, and Iz is the signal intensity from the summation of a single atom and its supporting carbon. Taking the statis- tical variation in the number of carbon atoms in the supporting film into consideration, we can observe a single atom if the image contrast is higher than 1.5 (broken line). The smaller the probe diameter, the higher the image contrast. In reality, a signal intensity of 10–12 A or more is needed to obtain images with a better signal to noise ratio (SNR). If the ratio of detected
0.20 )
0 0.15 (I/I
A thorium atom 0.10
0.05 Carbon film (15 C atoms) Scattered electrons intensities
0 0 50 100 150 (mrad.) Scattered angle
FIGURE 20 Intensity angular distribution of scattered electrons (calculated by Nomura). Hitachi’s Development of Cold-Field Emission Scanning Transmission Electron Microscopes 145
4.0
3.0 Probe size
2.0 5Å Contrast 10Å 1.0
0 02040 60 80 100
Atomic number
FIGURE 21 Atom observation contrast dependence on probe size (calculation).
100 − I0=1 ϫ 10 10A 50 100 kV Wgun ( Å )
10 F W LaB6 LaB 5 E FE gun 6 gun Electorn probe diameter 1 106 107 108 109 (A/cm2.sr.) Brightness