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United States Patent C Patented Oct
2,956,993 United States Patent C Patented Oct. 18, 1960 2 corresponding to the formula M'M'Hy, wherein M' is an alkali metal, M' is a metal selected from the group 2,956,993 consisting of aluminum, gallium, indium and thallium, and y is equal to the sum of the valences of the two pROCESS AND CATALYST FOR PRODUCTION metals. OE OLEFN POLYMERS The improvement obtained when polymerizing an ole Gene Nowlin, Glen Burnie, Md., and Harold D. Lyons, fin in the presence of our novel catlayst is, firstly, that Bartlesville, Okla., assignors to Philips Petroena Com polymers of much higher molecular weight possessing pany, a corporation of Delaware very high impact strength and other desirable characteris O tics can be obtained than is true when certain of the prior No Drawing. Fied Dec. 22, 1955, Ser. No. 554,615 art catalysts have been employed, and secondly, the 16 Claims. (C. 260-94.9) polymerization reaction, particularly for ethylene, can be initiated and carried out at considerably lower ten peratures and pressures than are necessary when em This invention relates to the polymerization of olefins. 5 ploying the catalysts and the processes of the prior In one aspect, this invention relates to an improved art. method for polymerizing olefins and to a novel catalyst The metal halide component of our catalyst System therefor. comprises the halides of the metals titanium, zirconium, Reactions for polymerizing olefins are well known in hafnium and germanium. Examples of metal halides the art and are generally carried out in the presence of 20 which can be used include titanium dichloride, titanium catalysts. -
Physical and Chemical Properties of Germanium
Physical And Chemical Properties Of Germanium Moneyed and amnesic Erasmus fertilise her fatuousness revitalise or burrow incommunicatively. Creditable Petr still climbs: regarding and lissome Lazarus bully-off quite punctiliously but slums her filoplume devotedly. Zane still defilade venomous while improvident Randell bloodiest that wonderers. Do you for this context of properties and physical explanation of Silicon is sincere to metals in its chemical behaviour. Arsenic is extremely toxic, RS, carbon is the tongue one considered a full nonmetal. In nature, which name a widely used azo dye. Basic physical and chemical properties of semiconductors are offset by the energy gap between valence conduction! Other metalloids on the periodic table are boron, Batis ZB, only Germanium and Antimony would be considered metals for the purposes of nomenclature. Storage temperature: no restrictions. At room temperature, the semiconducting elements are primarily nonmetallic in character. This application requires Javascript. It has also new found in stars and already the atmosphere of Jupiter. Wellings JS, it is used as an eyewash and insecticide. He has studied in Spain and Hungary and authored many research articles published in indexed journals and books. What are oral health benefits of pumpkins? The material on this site may not be reproduced, germanium, the radiation emitted from an active device makes it locatable. Classify each statement as an extensive property must an intensive property. In germanium and physical chemical properties of the border lines from the! The most electronegative elements are at the nod in the periodic table; these elements often react as oxidizing agents. Atomic Volume and Allotropy of the Elements. -
Organometallic Compounds Suitable for Use in Vapor Deposition Processes
Europäisches Patentamt *EP001464724A2* (19) European Patent Office Office européen des brevets (11) EP 1 464 724 A2 (12) EUROPEAN PATENT APPLICATION (43) Date of publication: (51) Int Cl.7: C23C 16/22, C07F 7/30, 06.10.2004 Bulletin 2004/41 C07F 7/02 (21) Application number: 04251948.8 (22) Date of filing: 01.04.2004 (84) Designated Contracting States: (72) Inventors: AT BE BG CH CY CZ DE DK EE ES FI FR GB GR • Shenai-Khatkhate, Deodatta Vinayak HU IE IT LI LU MC NL PL PT RO SE SI SK TR Danvers Massachusetts 01923 (US) Designated Extension States: • Power, Michael Brendan AL HR LT LV MK Newburyport Massachusetts 01950 (US) (30) Priority: 05.04.2003 US 460791 P (74) Representative: Kent, Venetia Katherine 22.10.2003 US 513476 P Rohm and Haas (UK) Ltd European Patent Department (71) Applicant: Rohm and Haas Electronic Materials, 28th. Floor, City Point L.L.C. One Ropemaker Street Marlborough, Massachusetts 01752 (US) London EC2Y 9HS (GB) (54) Organometallic compounds suitable for use in vapor deposition processes (57) Organometallic compounds suitable for use as metallic precursors are also provided. Such Group IV vapor phase deposition precursors for Group IV metal- metal-containing films are particularly useful in the man- containing films are provided. Methods of depositing ufacture of electronic devices. Group IV metal-containing films using certain organo- EP 1 464 724 A2 Printed by Jouve, 75001 PARIS (FR) EP 1 464 724 A2 Description Background of the Invention 5 [0001] The present invention relates generally to the field of organometallic compounds. -
A Novel Series of Titanocene Dichloride Derivatives: Synthesis, Characterization and Assessment of Their
A novel series of titanocene dichloride derivatives: synthesis, characterization and assessment of their cytotoxic properties by Gregory David Potter A thesis submitted to the Department of Chemistry in conformity with the requirements for the degree of Doctor of Philosophy Queen’s University Kingston, Ontario, Canada May, 2008 Copyright © Gregory David Potter, 2008 Abstract Although cis-PtCl2(NH3)2 (cisplatin) has been widely used as a chemotherapeutic agent, its use can be accompanied by toxic side effects and the development of drug resistance. Consequently, much research has been focused on the discovery of novel transition metal compounds which elicit elevated cytotoxicities coupled with reduced toxic side effects and non-cross resistance. Recently, research in this lab has focused on preparing derivatives of titanocene dichloride (TDC), a highly active chemotherapeutic agent, with pendant alkylammonium groups on one or both rings. Earlier results have demonstrated that derivatives containing either cyclic or chiral alkylammonium groups had increased cytotoxic activities. This research therefore investigated a new series of TDC complexes focusing specifically on derivatives bearing cyclic and chiral alkylammonium groups. A library of ten cyclic derivatives and six chiral derivatives were synthesized and fully characterized. These derivatives have undergone in vitro testing as anti-tumour agents using human lung, ovarian, and cervical carcinoma cell lines (A549, H209, H69, H69/CP, A2780, A2780/CP and HeLa). These standard cell lines represent solid tumour types for which new drugs are urgently needed. The potencies of all of the Ti (IV) derivatives varied greatly (range from 10.8 μM - >1000 μM), although some trends were observed. In general, the dicationic analogues exhibited greater potency than the corresponding monocationic derivatives. -
Accepted Version
Citation for published version: Hamilton, JA, Pugh, T, Johnson, AL, Kingsley, AJ & Richards, SP 2016, 'Cobalt(I) olefin complexes: precursors for metal-organic chemical vapor deposition of high purity cobalt metal thin films', Inorganic Chemistry, vol. 55, no. 14, pp. 7141-7151. https://doi.org/10.1021/acs.inorgchem.6b01146, https://doi.org/10.1021/acs.inorgchem.6b01146 DOI: 10.1021/acs.inorgchem.6b01146 http://dx.doi.org/10.1021/acs.inorgchem.6b01146 Publication date: 2016 Document Version Peer reviewed version Link to publication This document is the Accepted Manuscript version of a Published Work that appeared in final form in Inorganic Chemistry, copyright © American Chemical Society after peer review and technical editing by the publisher. To access the final edited and published work see DOI: 10.1021/acs.inorgchem.6b01146. University of Bath Alternative formats If you require this document in an alternative format, please contact: [email protected] General rights Copyright and moral rights for the publications made accessible in the public portal are retained by the authors and/or other copyright owners and it is a condition of accessing publications that users recognise and abide by the legal requirements associated with these rights. Take down policy If you believe that this document breaches copyright please contact us providing details, and we will remove access to the work immediately and investigate your claim. Download date: 06. Oct. 2021 Table of Content Abstract and Graphic We report the synthesis and characterization of a family of eleven cobalt (I) metal precursors based around cyclopentadienyl and diene ligands. Low pressure metal-organic chemical vapor deposition (AP-MOCVD) was employed using the precursor cyclopentadienyl-cobalt(I)(isoprene) 1, to synthesis thin films of metallic cobalt on silicon substrates under an atmosphere (760 Torr) of hydrogen (H2) . -
US 2004/0237384 A1 Orr (43) Pub
US 2004O237384A1 (19) United States (12) Patent Application Publication (10) Pub. No.: US 2004/0237384 A1 Orr (43) Pub. Date: Dec. 2, 2004 (54) FUEL COMPOSITIONS EXHIBITING (52) U.S. Cl. ................. 44/314; 44/320; 44/358; 44/359; IMPROVED FUEL STABILITY 44/360; 44/444 (76) Inventor: William C. Orr, Denver, CO (US) Correspondence Address: (57)57 ABSTRACT HOGAN & HARTSON LLP ONE TABOR CENTER, SUITE 1500 A fuel composition of the present invention exhibits mini 1200 SEVENTEENTH ST mized hydrolysis and increased fuel Stability, even after DENVER, CO 80202 (US) extended storage at 65 F. for 6–9 months. The composition, which is preferably not strongly alkaline (3.0 to 10.5), is (21) Appl. No.: 10/722,063 more preferably weakly alkaline to mildly acidic (4.5 to 8.5) (22) Filed: Nov. 24, 2003 and most preferably slightly acidic (6.3 to 6.8), includes a e ars lower dialkyl carbonate, a combustion improving amount of Related U.S. Application Data at least one high heating combustible compound containing at least one element Selected from the group consisting of (63) Continuation-in-part of application No. 08/986,891, aluminum, boron, bromine, bismuth, beryllium, calcium, filed on Dec. 8, 1997, now Pat. No. 6,652,608. cesium, chromium, cobalt, copper, francium, gallium, ger manium, iodine, iron, indium, lithium, magnesium, manga Publication Classification nese, molybdenum, nickel, niobium, nitrogen, phosphorus, potassium, palladium, rubidium, Sodium, tin, Zinc, (51) Int. Cl." ........ C10L 1/12; C1OL 1/30; C1OL 1/28; praseodymium, rhenium, Silicon, Vanadium, or mixture, and C1OL 1/18 a hydrocarbon base fuel. -
Relative Chalcogen Donor Properties in Transition Metal Complexes. Eugene D
Louisiana State University LSU Digital Commons LSU Historical Dissertations and Theses Graduate School 1971 Relative Chalcogen Donor Properties in Transition Metal Complexes. Eugene D. Schermer Louisiana State University and Agricultural & Mechanical College Follow this and additional works at: https://digitalcommons.lsu.edu/gradschool_disstheses Recommended Citation Schermer, Eugene D., "Relative Chalcogen Donor Properties in Transition Metal Complexes." (1971). LSU Historical Dissertations and Theses. 1949. https://digitalcommons.lsu.edu/gradschool_disstheses/1949 This Dissertation is brought to you for free and open access by the Graduate School at LSU Digital Commons. It has been accepted for inclusion in LSU Historical Dissertations and Theses by an authorized administrator of LSU Digital Commons. For more information, please contact [email protected]. 71-20,621 SCHERMER, Eugene D., 1934- RELATIVE CHALCOGEN DONOR PROPERTIES IN TRANSITION METAL COMPLEXES. The Louisiana State University and Agricultural and Mechanical College, Ph.D., 1971 Chemistry, inorganic University Microfilms, A XEROXCompany, Ann Arbor, Michigan THIS DISSERTATION HAS BEEN MICROFILMED EXACTLY AS RECEIVED Reproduced with permission of the copyright owner. Further reproduction prohibited without permission. RELATIVE CHALCOGEN DONOR PROPERTIES IN TRANSITION METAL COMPLEXES A Dissertation Submitted to the Graduate Faculty of the Louisiana State University and Agricultural and Mechanical College in partial fulfillment of the requirements for the degree of Doctor of Philosophy in The Department of Chemistry by Eugene D. Schemer B.A., Eastern Washington State College, 1958 M.S., Oregon State University, 1Q62 January, 197! Reproduced with permission of the copyright owner. Further reproduction prohibited without permission. ACKNOWLEDGEMENT The author wishes to express his sincere gratitude to Professor William H. Baddley, under whose direction this work was produced. -
(12) Patent Application Publication (10) Pub. No.: US 2004/0194703 A1 Shenai-Khatkhate Et Al
US 2004O194703A1 (19) United States (12) Patent Application Publication (10) Pub. No.: US 2004/0194703 A1 Shenai-Khatkhate et al. (43) Pub. Date: Oct. 7, 2004 (54) ORGANOMETALLIC COMPOUNDS Related U.S. Application Data (75) Inventors: Deodatta Vinayak Shenai-Khatkhate, (60) Provisional application No. 60/460,791, filed on Apr. Danvers, MA (US); Michael Brendan 5, 2003. Provisional application No. 60/513,476, filed Power, Newburyport, MA (US) on Oct. 22, 2003. Correspondence Address: Publication Classification S. Matthew Cairns (51) Int. Cl." .............................. C23C 16/00; CO8F 4/44 EDWARDS & ANGELL, LLP U.S. Cl. ....................... 118/715; 427/252; 427/248.1 P.O. BOX 55874 (52) Boston, MA 02205 (US) (57) ABSTRACT (73) Assignee: Rohm and Haas Electronic Materials, Organometallic compounds Suitable for use as vapor phase L.L.C., Marlborough, MA deposition precursors for Group IV metal-containing films are provided. Methods of depositing Group IV metal-con (21) Appl. No.: 10/817,618 taining films using certain organometallic precursors are also provided. Such Group IV metal-containing films are (22) Filed: Apr. 2, 2004 particularly useful in the manufacture of electronic devices. US 2004/O194703 A1 Oct. 7, 2004 ORGANOMETALLIC COMPOUNDS Sition. These precursors are difficult to handle and have high Vapor preSSures. For example, germane decomposes Vio BACKGROUND OF THE INVENTION lently at 280 C., which is below the temperature used to grow germanium films. Accordingly, processes employing 0001. The present invention relates generally to the field either germane or Silane require extensive Safety procedures of organometallic compounds. In particular, the present and equipment. Germane typically requires film growth invention relates to the certain organometallic compounds temperatures of approximately 500 C. -
XXI. Syntheses of Etheno-Bridged Ansa-Titanocene Derivatives by The
207 ansa-Metallocene derivatives XXI *. Syntheses of etheno-bridged ansa-titanocene derivatives by the McMurry reaction Peter Burger and Hans H. Brintzinger * Fakultiit fur Chemie, Universitiit Konstanz, Postfach 5560, W-7750 Konstanz (Germany) Abstract Novel olefin-linked biscylopentadienylligands have been prepared by McMurry coupling reactions of benzoyl- and acetyl-cyclopentadienyl sodium. Reactions of the disodium salts with TiC1 4 or TiCl 3 • 3THF afford the alkene-bridged ansa-titanocene dichlorides. 13C-NMR shifts of the bridge carbon atoms do not indicate any interaction between the olefin 'IT-system and the metal. Introduction Chiral ansa-metallocenes of Group IV metals (of current interest as Ziegler-Natta catalysts for stereospecific a-olefin polymerisation [2-5]) with various types of interannular bridges X (a-f) (Fig. 1) have been synthesized. ansa-Metallocenes with long and flexible bridges, i.e. a and d, possess low stereorigidity. Increased distances between the bridge-head carbon atoms due to steric requirements of the bridge-atoms give rise to larger centroid-metal-centroid angles than in the corresponding un bridged metallocenes [4,8,9]. Dimethylsilyl- (c) and methylene- (f) linked biscyclo pentadienyl metal dichlorides, on the other hand, are very stereorigid but rather strained [4,6,7,14,15]. The geometry of ethano-bridged metallocenes (e) is almost identical to that of their unbridged congeners. The cyclopentadienyl (Cp) rings are staggered owing to an inclination of the C-C bond of the ethano bridge relative to the CI-M-Cl bisector plane. This gives rise to two enantiomeric forms, l) and A, both of which have been characterized by X-ray crystallographic studies [13,16,17]. -
IJCA 20A(5) 440-442.Pdf
Indian Journal of Chemistry Vol. 20A, May 1981, pp. 440-44~ Synthesis & Properties of Some Metal s-Methalloxides S. C. GOEL & R. c. MEHROTRA*t Chemistry Department. University of Delhi. Delhi 110 007 Received 8 August 1980; revised and accepted 20 November 1980 Metal derivatives of [3-methallyl alcohol having the general formulae M[OCH2C(CH3)=CH.l.. (M = B and AI); M[OCH2C(CHs)=CH2]4, (M=Ge and Ti); M[OCH.C(CH3)=CH.ls, (M = Nb and Ta) and BunSn[OCH.C- (CH3)= CH2]4_n, (n = 1,2 and 3) have been synthesized by alcohol interchange technique. Germanium tetra-p-methal- loxide has been synthesized by the reaction of germanium tetrachloride with {3-methallylalcohol in the presence of dry ammonia as hydrogen chloride acceptor. These newly synthesized [3-methalloxides are colourless liquids which can be distilled under reduced pressure. These derivatives have been characterized by elemental analyses, molecular weight determinations and IR as well as PMR spectral data. ESPITE extensive work in alkoxid.e chemistry', passed slowly for 45 min. The precipitated ammoni- the alkenoxide derivatives derived from um chloride was filtered off and the solvent removed D unsaturated alcohols have received little from the filtrate under reduced pressure. The colour- attentionv". The presence of double bond may less liquid on distillation under reduced pressure affect the basic properties of alkoxides like volatility, gave germanium tetra-Bsmethalloxide; yield 74 %; molecular association and nature of metal coordi- b. p. 95°C/0.7 mm. nation. In the present paper, we report the synthesis Reaction of ~-methallyl alcohol with aluminium and properties of some metal aiken oxides derived isopropoxide ~ Aluminium isopropoxide (6.30 g), from ,B-methallyl alcohol. -
Organometallic Chemistry
Advances in ORGANOMETALLIC CHEMISTRY EDITED BY F. G. A. STONE ROBERT WEST DEPARTMENT OF INORGANIC CHEMISTRY DEPARTMENT OF CHEMISTRY SCHOOL OF CHEMISTRY UNIVERSITY OF WISCONSIN THE UNIVERSITY MADISON, WISCONSIN BRISTOL, ENGLAND VOLUME 2 I964 ACADEMIC PRESS New York London COPYRIGHT@ 1964, BY ACADEMICPRESS INC. ALL RIGHTS RESERVED. NO PART OF THIS BOOK MAY BE REPRODUCED IN ANY FORM, BY PHOTOSTAT, MICROFILM, OR ANY OTHER MEANS, WITHOUT WRITTEN PERMISSION FROM THE PUBLISHERS. ACADEMIC PRESS INC. 111 Fifth Avenue, New York, New York 10003 United Kingdom Ediiion published by ACADEMIC PRESS INC. (LONDON) LTD. Berkeley Square House, London W.1 LIBRARYOF CONGRESSCATALOG CARD NUMBER: 64-16030 PRINTED IN THE UNITED STATES OF AMERICA List of Contributors Numbers in parenthesis indicate the pages on which the authors’ contributions begin. JOHN BIRMINGHAM(365), Arapahoe Chemicals, Inc., Boulder, Colorado E. DE BOER(1 15), KoninklqkelShell-Laboratorium,Amsterdam, Holland M. L. H. GREEN(325), Inorganic Chemistry Laboratory, University of Oxford, Oxford, England R. B. KING(157), Mellon Institute, Pittsburgh, Pennsylvania R. KOSTER(257), Max-Planck Institut fur Kohlenforschung, Mulheiml Ruhr, Germany P. L. I. NAGY*(325), Inorganic Chemistry Laboratory, University of Oxford, Oxford, England G. N. SCHRAUZER(l), Institut fur Anorganische Chemie der Universitat Munchen, Munich, Germany H. A. SKINNER(49), Chemistry Department, University of Manchester, Manchester, England * Deceased Some Advances in the Organometallic Chemistry of Nickel G . N. SCHRAUZER lnstitut fur Anorganische Chernie der Universitat Munchen. Munich. Germany I . Introduction ................. 2 I1 . Catalytic Reactions with Nickel Carbonyl ........ 3 A . Carbonylation of Alkynes ............ 3 B . Carbonylation of Olefins ............ 6 C . Carbonylation of Allylic Compounds ......... 6 D . -
The Chemistry of Germanium, Tin and Lead
The Chemistry of Germanium, Tin and Lead Anil J Elias, IIT Delhi Relative natural abundance on the earths crust of group 14 elements are as follows which indicate the rareness of germanium Carbon 0.18% The major end uses for Silicon 27% germanium, worldwide, were Germanium 0.00014% estimated to be fiber-optic Tin 0.00022% systems, 30%; infrared optics, 25%; Lead 0.00099% polymerization catalysts, 25%; electronics and solar electric applications, 15%; and other (phosphors, metallurgy, and chemotherapy), 5%. The main compounds of commercial importance of germanium are germanium tetrachloride and germanium dioxide. Unlike silicon, germanium forms stable divalent compounds like GeCl2 and GeO. A major difference with silicon is the fact 2- - that it forms GeCl6 and GeCl3 . Zone-refined crystalline germanium typically is 99.9999 percent pure and impurities are typically less than 100 ppb, and electrically active impurities, less than 0.5 ppb. GeO2 is dissolved in concentrated HCl to make germanium tetrachloride (GeCl4) which is a fuming liquid similar to SiCl4 having a boiling point of 86.5 C. The GeCl4 is purified by fractional distillation in glass or fused quartz equipments. The purified GeCl4 is hydrolyzed with deionized water to yield GeO2. After drying, the GeO2 is reduced with hydrogen at 760° C to form germanium metal powder, which is then melted and cast into bars, known as first-reduction bars. These bars are then zone-refined to polycrystalline metal that typically contains less than 100 ppb total impurities and less than 0.5 ppb electrically active impurities. Six salient properties of germanium which differ from that of silicon makes the foundations for all its applications.