IEEE CLEDO BRUNETTI AWARD RECIPIENTS

2022 – SIMON DELEONIBUS “For contributions to and leadership in Chief Scientist (Retired), CEA, nanoscale CMOS device and process LETI, Grenoble, France technologies.”

2021 – JESUS DEL ALAMO “For leadership in and contributions to Donner Professor and Professor of InGaAs- and GaN-based field-effect Electrical Engineering, transistor technology.” Massachusetts Institute of Technology, Cambridge, Massachusetts, USA

2020 – JAMES H. STATHIS “For contributions to the understanding of Principal Research gate dielectric reliability and its application Staff Member, IBM Research, to transistor scaling.” Yorktown Heights, New York, USA

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ERNEST YUE WU Senior Technical Staff Member, IBM Research, Albany, New York, USA

2019 – DANIEL C. EDELSTEIN “For contributions to manufacturable, IBM Fellow, IBM T.J. Watson reliable, and scalable Cu interconnect and Research Center, Yorktown low-k dielectric technology for CMOS.” Heights, New York, USA

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ALFRED GRILL IBM Fellow, IBM T.J. Watson Research Center, Yorktown Heights, New York, USA

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CHAO-KUN HU Research Staff Member, IBM T.J. Watson Research Center, Yorktown Heights, New York, USA

2018 - SIEGFRIED SELBERHERR “For pioneering contributions to Technology Professor, Vienna University of Computer Aided Design.” Technology, Institute for Microelectronics, Vienna, Austria

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2017 - GUIDO GROESENEKEN “For contributions to the characterization Professor, Catholic University of and understanding of the reliability physics Leuven, and Fellow, IMEC, Leuven, of advanced MOSFET nanodevices.” Belgium

2016 – AKIRA TORIUMI “For contributions to CMOS device design Professor, The University of Tokyo, from materials engineering to device Tokyo, Japan physics.”

2015 - HIROSHI IWAI “For contributions to the scaling of CMOS Professor, Tokyo Institute of devices.” Technology, Yokohama, Kangawa, Japan

2014 – MARTIN VAN DEN BRINK “For designing new lithography tool Vice President, ASML, concepts and bringing these to the market, Veldhoven, The Netherlands enabling micrometer to nanometer imaging.”

2013 – GIORGIO BACCARANI “For contributions to scaling theory and Full Professor, University of modeling of metal oxide Bologna, Bologna, Italy (MOS) devices.”

2012 - YAN BORODOVSKY “For contributions to developing and Intel Senior Fellow, Director of implementing innovative lithographic and Advanced Lithography, Intel patterning equipment and processes to Corporation, Hillsboro, OR, USA enable cost-effective scaling for logic AND technologies.” SAM SIVAKUMAR Intel Fellow, Director of Lithography, Intel Corporation, Hillsboro, OR, USA

2011 – MASSIMO V. FISCHETTI “For contributions to the fundamental Professor, University of understanding of the physics, design and Massachusetts, Amherst, MA, USA scaling of nanosized electronic devices.” AND DAVID J. FRANK Research Staff Member, IBM T. J. Watson Research Center, Yorktown Heights, NY, USA AND STEVEN E. LAUX Research Staff Member, IBM T. J. Watson Research Center, Yorktown Heights, NY, USA

2010 – GHAVAM SHAHIDI “For contributions to and leadership in the

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IBM Fellow Director of Tech development of silicon-on-insulator CMOS IBM TJ Watson Research Ctr technology.” Yorktown Heights, NY, USA

2009 – BURN JENG LIN "For contributions to immersion lithography Senior Director of Micropatterning for the manufacture of integrated circuit Division, TSMC, Ltd. Hsin-Chu, devices." Taiwan

2008 – MICHEL BRUEL “For inventing Smart Cut™ layer transfer Deputy Director of CEA-LETI, technology that enabled widespread Director of Research, CEA, Cedex, adoption of SOI for CMOS circuits.” France

2007 – SANDIP TIWARI “For pioneering contributions to nano- Professor, Electrical and Computer crystal memories and to quantum effect Engineering, Cornell University devices.” Ithaca, NY

2006 – SUSUMU NAMBA “For contributions to ion-beam and optical Professor, Nagasaki Institute of technologies for application to Applied Science semiconductor devices.” Nagasaki, Japan

2005 – WILLIAM G. OLDHAM “For pioneering contributions to lithographic Professor Emeritus, University of engineering and to high-density isolation California, Berkeley technology.” Berkeley, CA

2004 – STEPHEN Y. CHOU “For the invention and development of tools Professor, Department of Electrical for nanoscale patterning, especially Engineering nanoimprint lithography, and for the scaling Princeton University of devices into new physical regimes.” Princeton, NJ

2003 - ANDREW R. NEUREUTHER "For pioneering contributions to modeling Professor, EECS, University of and simulation of the lithographic materials, California, Berkeley, CA processes, and tools used in microelectronics manufacturing."

2002 – MARK LUNDSTROM “For significant contributions to the SUPRIYO DATTA understanding and innovative simulation of Purdue University, West Lafayette, nano-scale electronic devices." IN

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2001 – R. FABIAN W. PEASE “For advancing high resolution patterning Stanford University technologies, high performance thermal Stanford, CA management, and scanning electron microscopy for microelectronics.”

2000 - ROBERT E. FONTANA "For contributions to micro fabrication IBM Almaden Research Center techniques for the manufacture of thin film San Jose, CA and giant magnetoresistive heads used in hard disk drives."

1999 - DAVID K. FERRY “For fundamental contributions to the Arizona State Univ., Tempe, AZ theory and development of nanostructured devices.”

1998 - ROGER T. HOWE "For leadership and pioneering contributions RICHARD S. MULLER to the field of microelectromechanical University of California, Berkeley, systems." CA

1997 - DIETER P. KERN "For the development of sub-0.1 micron GEORGE A. SAI-HALASZ MOSFET devices and circuits." MATTHEW R. WORDEMAN IBM Research, Yorktown Heights, NY

1996 - MITSUMASA KOYANAGI "For pioneering research and development Tohoku Univ Intell Sys Lab of the three dimensional stacked capacitor Sendai, Japan DRAM cell."

1995 - HENRY I. SMITH "For contributions to microfabrication MIT, Cambridge, MA science and technology, notably microlithography."

1994 - EIJI TAKEDA "For pioneering contributions to the Hitachi Ltd. characterization and understanding of Tokyo, Japan hot-carrier effects in MOS devices."

1993 - TAKAFUMI NAMBU "For the development of the WALKMAN, the MITSURU IDA realization of a totally new concept of KAMON YOSHIYUKI miniaturization of consumer electronics." SONY Corporation, Tokyo, Japan

1992 - DAVID A. THOMPSON "For pioneering work in miniature magnetic IBM Corp. devices for data storage, including the San Jose, CA invention, design and development of thin-film and magnetoresistive recording heads."

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1991 - HIDEO SUNAMI "For contributions in the invention and Hitachi, Ltd., Tokyo, Japan development of the trench capacitor DRAM cell."

1990 - ELSE KOOI "For invention and development of the Philips Research Labs. process for localized oxidation of silicon Sunnyvale, CA using a silicon nitride mask, which enabled greatly reduced dimensions in VLSI circuits."

1989 - SHUN-ICHI IWASAKI "For contributions to the miniaturization of Tohoku University, Sendai, Japan magnetic recording systems."

1988 - IRVING AMES - IBM Corp., NY "For the invention of FRANCOIS M. d'HEURLE electromigration-resistant copper-doped RICHARD E. HORSTMANN aluminum metallurgy."

1987 - MICHAEL HATZAKIS "For fundamental contributions to the IBM Corp., Yorktown Heights, NY patterning techniques of submicron electron devices."

1986 - RICHARD M. WHITE "For invention of surface acoustic wave Univ of California, Berkeley, CA electronic devices for signal processing applications."

1985 - ALEC N. BROERS "For leadership and pioneering contributions IBM Corporation to the technology and applications of Hopewell Junction, NY electron beams to fine line lithography."

1984 - HARRY W. RUBINSTEIN "For early key contributions to the Sprague Electric Co. development of printed components and Grafton, Wisconsin conductors on a common insulating substrate."

1983 - ABE OFFNER "For the invention and design of the optics Perkin-Elmer Corp. which made possible the projection Wilton, CT lithography systems that were key to advancing integrated circuit manufacture."

1982 - ROBERT H. DENNARD "For the invention of the one-transistor IBM Corp. dynamic random access memory cell and Yorktown Heights, NY for contributions to scaling of MOS devices."

1981 - DONALD R. HERRIOTT "For key contributions to the development Bell Labs. of a practical electron beam system for Murray Hill, NJ fabrication of integrated circuit masks and to other aspects of microlithography."

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1980 - MARCIAN E. HOFF, JR. "For the conception and development of the INTEL Corp. ." Santa Clara, CA

1979 - GEOFFREY W. A. DUMMER "For contributions to materials development Worcestershire, England and fabrication techniques for miniature AND passive electronic components and PHILIP J. FRANKLIN assemblies." GSA, Federal Supply Service Washington, DC

1978 - JACK S. KILBY "For contributions to miniaturization Texas Instrument, Dallas, TX through inventions and the development of ROBERT N. NOYCE integrated circuits." Intel Corporation, Santa Clara, CA

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