ARPA/NBS Workshop V Moisture Measurement Technology for Hermetic Semiconductor Devices

Total Page:16

File Type:pdf, Size:1020Kb

ARPA/NBS Workshop V Moisture Measurement Technology for Hermetic Semiconductor Devices NAT'L INST. OF STAND " & TECH " ' NBS Ill PUBLICATIONS NBS SPECIAL PUBLICATION 400-69 U.S. DEPARTMENT OF COMMERCE / National Bureau of Standards iconductor Measurement Technology: ARPA/NBS Workshop V Moisture Measurement Technology for Hermetic Semiconductor Devices QC 100 U57 No.TO-691 1981 c. 3L . NATIONAL BUREAU OF STANDARDS The National Bureau of Standards' was established by an act ot Congress on March 3, 1901. The Bureau's overall goal is to strengthen and advance the Nation's science and technology and facilitate their effective application for public benefit. To this end, the Bureau conducts research and provides: (1) a basis for the Nation's physical measurement system, (2) scientific and technological services for industry and government, (3) a technical basis for equity in trade, and (4) technical services to promote public safety. The Bureau's technical work is per- formed by the National Measurement Laboratory, the National Engineering Laboratory, and the Institute for Computer Sciences and Technology. THE NATIONAL MEASUREMENT LABORATORY provides the national system of physical and chemical and materials measurement; coordinates the system with measurement systems of other nations and furnishes essential services leading to accurate and uniform physical and chemical measurement throughout the Nation's scientific community, industry, and commerce; conducts materials research leading to improved methods of measurement, standards, and data on the properties of materials needed by industry, commerce, educational institutions, and Government; provides advisory and research services to other Government agencies; develops, produces, and distributes Standard Reference Materials; and provides calibration services. The Laboratory consists of the following centers: Absolute Physical Quantities^ — Radiation Research — Thermodynamics and Molecular Science — Analytical Chemistry — Materials Science. THE NATIONAL ENGINEERING LABORATORY provides technology and technical ser- vices to the public and private sectors to address national needs and to solve national problems; conducts research in engineering and applied science in support of these efforts; builds and maintains competence in the necessary disciplines required to carry out this research and technical service; develops engineering data and measurement capabilities; provides engineering measurement traceability services; develops test methods and proposes engineering standards and code changes; develops and proposes new engineering practices; and develops and improves mechanisms to transfer results of its research to the ultimate user. The Laboratory consists of the following centers: Applied Mathematics — Electronics and Electrical Engineering^ — Mechanical Engineering and Process Technology^ — Building Technology — Fire Research — Consumer Product Technology — Field Methods. THE INSTITUTE FOR COMPUTER SCIENCES AND TECHNOLOGY conducts research and provides scientific and technical services to aid Federal agencies in the selection, acquisition, application, and use of computer technology to improve effectiveness and economy in Government operations in accordance with Public Law 89-306 (40 U.S.C. 759), relevant Executive Orders, and other directives; carries out this mission by managing the Federal Information Processing Standards Program, developing Federal ADP standards guidelines, and managing Federal participation in ADP voluntary standardization activities; provides scientific and technological advisory services and assistance to Federal agencies; and provides the technical foundation for computer-related policies of the Federal Government. The Institute consists of the following centers: Programming Science and Technology — Computer Systems Engineering. 'Headquarters and Laboratories at Gaithersburg, MD, unless otherwise noted; mailing address Washington, DC 20234. -Some divisions within the center are located at Boulder, CO 80303. NfiTIONfiL BURERXJ- OF STftND.''j;D3 LiERASY Semiconductor Measurement Technology: at ARPA/NBS Workshop V Moisture Measurement Technology for Hermetic Semiconductor Devices Proceedings of the ARPA/NBS Workshop V held at the National Bureau of Standards, Gaithersburg, MD March 22-23, 1978 Edited by Harry A. Schafft, Stanley Ruthberg, and Elaine C. Cohen Electron Devices Division Center for Electronics and Electrical Engineering National Engineering Laboratory National Bureau of Standards Washington, DC 20234 This activity was supported by Defense Advanced Research Projects Agency 1400 Wilson Blvd. Arlington, VA 22209 and National Bureau of Standards U.S. DEPARTMENT OF COMMERCE, Malcolm Baldrige, Secretary NATIONAL BUREAU OF STANDARDS, Ernest Ambler, Director Issued May 1981 Library of Congress Catalog Card Number: 81-600034 National Bureau of Standards Special Publication 400-69 Nat. Bur. Stand. (U.S.), Spec. Publ. 400-69, 202 pages(May 1981) CODEN: XNBSAV U.S. GOVERNMENT PRINTING OFFICE WASHINGTON: 1981 For sale by the Superintendent of Documents, U.S. Government Printing Office, Wasliington, D.C. 20402 Price $6.00 (Add 25 percent for other than U.S. mailing) Table of Contents Page Preface v Abstract 1 1 . Introduction 1 2. Session I Mass Spectrometer Measurements 3 2.1 Mass Spectrometer Measurements at RADC Benjamin A* Moove (Rome Aiv Development Center) ... 3 2.2 A Method for Measuring the PPM Moisture-Sensing Limitations of Mass Spectrometers in Testing Small Packages Johnny L. Hartley (Sandia Laboratories) 24 2.3 A Dynamic Method of Calibrating a Mass Spectrometer Used for Measuring the Water Content of Semiconductor Encapsulations Robert P. Merrett (British Post Office Research Centre) 33 2.4 Moisture Measurement by Mass Spectrometer John C. Pemiaka (Pemiaka Corporation) 42 2.5 Microcircuit Package Gas Analysis Ray F. Haack and Alex Shurrka (Jet Propulsion Laboratory) 43 2.6 Comparison of Mass Spectrometric Moisture Measurements by Different Laboratories Kenneth L. Perkins (Rockwell International) 58 3. Session II Moisture Sensors 69 3.1 The Effects of Assembly Techniques Upon the Performance Characteristics of AI2O3 In-Situ Moisture Sensors Victor Fang (Panametrics, Inc.) 69 3.2 Application Considerations of Solid State Moisture Chips for Hybrids and Associated Calibration Measurement Techniques Paul F. Bennewitz (Thunder Scientific Corporation) . 75 3.3 Hysteresis and Long-Term Repeatability of Aluminum Oxide Humidity Sensors Herbert L, Webster (Sandia Laboratories) 80 3.4 Moisture Standards and Sensors Charles G. Messenger (Rome Air Development Center), . 82 3.5 Assessment of the Use of Measurement of Surface Conductivity as a Means of Determining Moisture Content of Hermetic Semiconductor Encapsulations Robert P. Merrett and Steven P. Sim (British Post Office Research Centre) 94 3.6 Moisture Sensing With the Charge-Flow Transistor Stephen D. Senturia, Michel G, Huberman, Robert Van der Klott (Massachusetts Institute of Technology) 108 iii 3.7 A Surface Conductance Technique for the Evaluation of Internal Package Environments Colin W, T. Knight, Abe Korgav, and Emit Pievvon (Advanced Micro Devices) •%••%%•••*•%•••• 115 4. Panel Meetings 122 4.1 Discussion Group Summary of Mass Spectrometer Measurements Robert W, Thomas, Chairman (Rome Air Development Center) 122 4.2 Comments on Round-Robin Results Robert W, Thomas, Chairman (Rome Air Development Center) 124 4.3 Moisture Sensors Saburo Hasegawa, Chairrmn (National Bureau of Standards)* 126 5. Session III Package Analysis and Quality Assurance 128 5.1 Parts-Per-Million Water-Vapor Generating System Used to Simulate Moisture in Small Integrated Circuit Packages Johnny L, Hartley (Sandia Laboratories) 128 5.2 A Total Moisture Analyzer for Hermetic Devices Steven R» Louaks and Arthur Bumham (Medtronic Inc*) ••••••«. 133 5.3 Analysis of Water Vapor in Purified Gas Systems Haiping Dun, Brenton L, Mattes, and David A. Stevenson (Stanford University )• 143 5.4 Mass Spectrometric Moisture Analysis of Hermetic Semiconductor Devices by Acetylene Conversion William M» Hickam and William R» Morgan (Westinghouse Research and Development Center) 153 5.5 Moisture in Packages - A User's Viewpoint Aaron Der Marderosian (Raytheon Company) 159 5.6 Problems in Specifying and Measuring Moisture Content Within Electronic Devices Robert W, Thomas (Rome Air Development Center) • • • • • 179 6. Group Encounters 185 6. 1 List of Attendees 187 iv PREFACE The Workshop on Moisture Measurement Technology for Hermetic Semiconductor Devices was conducted as part of the Semiconductor Technology Program in the Electron Devices Division of the National Bureau of Standards (NBS). This Workshop is the fifth in a series dedicated to the furtherance of the mea- surement technology needed by the semiconductor device industry in its at- tempt to provide to its customers products that are based on the most ad- vanced technology, yet have high reliability and the affordable costs which result from high yields. It was held at the Gaithersburg, Maryland^ facility of the National Bureau of Standards on March 22-23, 1978^ under the cosponsor- ship of the National Bureau of Standards and the Defense Advanced Research Projects Agency^ with the concurrence of the Rome Air Development Center. Representatives from industrial, governmental, and academic organizations concerned with device manufacture, analysis, and instrument design participa- ted in this workshop. Speakers were selected from among the finest and most active researchers in the field. The outcome was a large and enthusiastic workshop attendance. The workshop was
Recommended publications
  • Precision Moisture Generation and Measurement
    SANDIA REPORT SAND2010‐1721 Unlimited Release Printed March 2010 Precision Moisture Generation and Measurement Adriane N. Irwin, Steven M. Thornberg, and Michael I. White Prepared by Sandia National Laboratories Albuquerque, New Mexico 87185 and Livermore, California 94550 Sandia National Laboratories is a multi‐program laboratory operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin company, for the U.S. Department of Energy's National Nuclear Security Administration under contract DE‐AC04‐94AL85000. Approved for public release; further dissemination unlimited. Issued by Sandia National Laboratories, operated for the United States Department of Energy by Sandia Corporation. NOTICE: This report was prepared as an account of work sponsored by an agency of the United States Government. Neither the United States Government, nor any agency thereof, nor any of their employees, nor any of their contractors, subcontractors, or their employees, make any warranty, express or implied, or assume any legal liability or responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represent that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government, any agency thereof, or any of their contractors or subcontractors. The views and opinions expressed herein do not necessarily state or reflect those of the United States Government, any agency thereof, or any of their contractors. Printed in the United States of America. This report has been reproduced directly from the best available copy.
    [Show full text]
  • Methods to Avoid and Detect Internal Gas Cylinder Corrosion
    METHODS TO AVOID AND DETECT INTERNAL GAS CYLINDER CORROSION AIGA 062/09 GLOBALLY HARMONISED DOCUMENT Asia Industrial Gases Association 3 HarbourFront Place, #09-04 HarbourFront Tower 2, Singapore 099254 Tel : +65 6276 0160 • Fax : +65 6274 9379 Internet : http://www.asiaiga.org AIGA 062/09 GLOBALLY HARMONISED DOCUMENT METHODS TO AVOID AND DETECT INTERNAL GAS CYLINDER CORROSION PREPARED BY : Hervé Barthélémy AIR LIQUIDE Wolfgang Dörner LINDE GROUP Giorgio Gabrieli SIAD David Birch LINDE GROUP Alexander Kriese MESSER GROUP Joaquin Lleonsi CARBUROS METALICOS Els Vandereven AIR PRODUCTS Andy Webb EIGA Disclaimer All publications of AIGA or bearing AIGA’s name contain information, including Codes of Practice, safety procedures and other technical information that were obtained from sources believed by AIGA to be reliable and/ or based on technical information and experience currently available from members of AIGA and others at the date of the publication. As such, we do not make any representation or warranty nor accept any liability as to the accuracy, completeness or correctness of the information contained in these publications. While AIGA recommends that its members refer to or use its publications, such reference to or use thereof by its members or third parties is purely voluntary and not binding. AIGA or its members make no guarantee of the results and assume no liability or responsibility in connection with the reference to or use of information or suggestions contained in AIGA’s publications. AIGA has no control whatsoever as regards, performance or non performance, misinterpretation, proper or improper use of any information or suggestions contained in AIGA’s publications by any person or entity (including AIGA members) and AIGA expressly disclaims any liability in connection thereto.
    [Show full text]
  • MODEL 3050-OLV Process Moisture Analyzer
    MODEL 3050-OLV Process Moisture Analyzer PROCESS INSTRUMENTS Welcome to the new world of process moisture analysis The Model 3050-OLV measures trace levels of moisture in a gas through the use of a quartz- crystal oscillator sample cell. AMETEK is the leader in quartz-crystal technology, which for thirty years has offered significant advantages over other measurement techniques: • It is the most accurate trace moisture measurement technology available • It responds far faster to both increasing and decreasing moisture levels • It is specific to moisture in most applications • It provides a much more rugged sensor Because of these advantages, the quartz-crystal oscillator has become the industry standard for applications ranging from ultrahigh purity semiconductor gases to natural gas streams containing 30% H2S. Now, the 3050-OLV brings the benefits of quartz-crystal technology to a broad spectrum of moisture measurement applications. Humidity measurement vs. moisture measurement Most process moisture sensors measure relative or absolute humidity, with the data commonly expressed as dew point. But, absolute humidity is a function of not only moisture concentration, but also the pressure of the gas. Relative humidity varies with both pressure and temperature. Humidity sensors, therefore, require pressure and temperature compensa- tion to convert their readings to true moisture concentration. The Model 3050-OLV measures moisture concentration directly, in parts per million by volume, parts per million by weight, or mass of water per standard volume. There is no need for pressure or temperature compensation because the true moisture concentration is totally independent of these parameters. The quartz-crystal oscillator The heart of the 3050-OLV analyzer is a quartz-crystal microbalance (QCM) sensor and sampling system developed by AMETEK specifically for highly accurate moisture measurements.
    [Show full text]
  • Food Analysis Fourth Edition
    Food Analysis Fourth Edition edited by S. Suzanne Nielsen Purdue University West Lafayette, IN, USA ABC II part Compositional Analysis of Foods 6 chapter Moisture and Total Solids Analysis Robert L. Bradley, Jr. Department of Food Science, University of Wisconsin, Madison, WI 53706, USA [email protected] 6.1 Introduction 87 6.2.1.4 Types of Pans for Oven Drying 6.1.1 Importance of Moisture Assay 87 Methods 90 6.1.2 Moisture Content of Foods 87 6.2.1.5 Handling and Preparation of 6.1.3 Forms of Water in Foods 87 Pans 90 6.1.4 Sample Collection and Handling 87 6.2.1.6 Control of Surface Crust Formation 6.2 Oven Drying Methods 88 (Sand Pan Technique) 90 6.2.1 General Information 88 6.2.1.7 Calculations 91 6.2.1.1 Removal of Moisture 88 6.2.2 Forced Draft Oven 91 6.2.1.2 Decomposition of Other Food 6.2.3 Vacuum Oven 91 Constituents 89 6.2.4 Microwave Analyzer 92 6.2.1.3 Temperature Control 89 6.2.5 Infrared Drying 93 S.S. Nielsen, Food Analysis, Food Science Texts Series, DOI 10.1007/978-1-4419-1478-1_6, 85 c Springer Science+Business Media, LLC 2010 86 Part II • Compositional Analysis of Foods 6.2.6 Rapid Moisture Analyzer Technology 93 6.5.4 Infrared Analysis 99 6.3 Distillation Procedures 93 6.5.5 Freezing Point 100 6.3.1 Overview 93 6.6 Water Activity 101 6.3.2 Reflux Distillation with Immiscible 6.7 Comparison of Methods 101 Solvent 93 6.7.1 Principles 101 6.4 Chemical Method: Karl Fischer Titration 94 6.7.2 Nature of Sample 101 6.5 Physical Methods 96 6.7.3 Intended Purposes 102 6.5.1 Dielectric Method 96 6.8 Summary 102 6.5.2 Hydrometry 96 6.9 Study Questions 102 6.5.2.1 Hydrometer 97 6.10 Practice Problems 103 6.5.2.2 Pycnometer 97 6.11 References 104 6.5.3 Refractometry 98 Chapter 6 • Moisture and Total Solids Analysis 87 6.1 INTRODUCTION (d) Glucose syrup must have ≥70% total solids.
    [Show full text]
  • Trace Water Vapor Analysis in Specialty Gases: Sensor and Spectroscopic Approaches
    CHAPTER 7 TRACE WATER VAPOR ANALYSIS IN SPECIALTY GASES: SENSOR AND SPECTROSCOPIC APPROACHES MARK W. RAYNOR,1 KRIS A. BERTNESS,2 KEVIN C. COSSEL,3 FLORIAN ADLER,3 AND JUN YE3 1Matheson, Advanced Technology Center, Longmont, Colorado 2National Institute of Standards and Technology, Boulder, Colorado 3JILA, National Institute of Standards and Technology, and University of Colorado, Depart­ ment of Physics, Boulder, Colorado 7.1 Introduction The analysis of water vapor impurity (often also referred to as moisture) is important in a number of specialty gas applications. However, the main driver for the development and advancement of trace moisture analysis techniques has been the microelectronics industry. The International Technology Roadmap for Semiconductors (ITRS) details the gas purity requirements for various wafer fabrication processes on their website (www.itrs.net). Oxygenated contaminants such as water vapor in the materials used and in the wafer environment are primary causes of defects and process variations that compromise yield. Because even trace levels of water in the process gases can seriously decrease device performance, analytical techniques must be capable of detecting water vapor from ppmv (umol/mol) down to the low and even sub-ppbv (nmol/mol) range. Measurement of water vapor at trace levels is quite challenging not only due to the adsorptive nature of the water molecule on metal and other surfaces, but also because of the range of gas matrices (including inert, oxide, halide, hydride, corrosive, hy- Trace Analysis of Specialty and Electronic Gases. 195 By William M. Geiger and Mark W. Raynor. Copyright ©2013 John Wiley & Sons, Inc. 196 TRACE WATER VAPOR ANALYSIS IN SPECIALTY GASES drocarbon, and halocarbon gases) that can potentially interfere with the measurement process.
    [Show full text]
  • Reliable Moisture Determination in Power Transformers
    RELIABLE MOISTURE DETERMINATION IN POWER TRANSFORMERS Von der Fakultät Informatik, Elektrotechnik und Informationstechnik der Universität Stuttgart zur Erlangung der Würde eines Doktor-Ingenieurs (Dr.-Ing.) genehmigte Abhandlung vorgelegt von Maik Koch aus Guben Hauptberichter: Prof. Dr.-Ing. S. Tenbohlen Mitberichter: Prof. Dr. S. M. Gubanski Tag der mündlichen Prüfung: 14.02.2008 Institut für Energieübertragung und Hochspannungstechnik der Universität Stuttgart 2008 Acknowledgements At first, I will express my deepest gratitude to Professor Stefan Tenbohlen for the encouraging, cooperative and kind way of supervising this research work. Without his challenging leadership to new questions and topics the achievements of this work would not have been possible. He also ensured a close connection between University research and practical application. My special thanks appertain to the second supervisor Professor Stanislaw Gubanski for the amendments to the thesis and the very fruitful cooperation within the European research project REDIATOOL and the CIGRÉ Task Force D1.01.14 "Dielectric response diagnoses for transformer windings". The research within the European project REDIATOOL essentially accelerated the outcome of this work especially in the field of dielectric diagnostic methods. I very much appreciated and profited from the open discussions with researchers from Poznan University of Technology (Poland) and Chalmers University of Technology (Göteborg, Sweden). Furthermore I gratefully acknowledge the financial support by the European Union. The collaboration and discussions in the CIGRÉ Working Group A2.30 "Moisture Equilibrium and Moisture Migration within Transformer Insulation Systems" helped me very much to see the issue of moisture from different points of view and to relate my investigations to the findings of international experts.
    [Show full text]
  • Principles of Moisture Measurement By: Douglas Wright, President
    December 2018 Principles of Moisture Measurement By: Douglas Wright, President There are many methods of reporting and analysing moisture. Here below are listed some of the more common methods for rapid analysis and explanations of them. Relative Air Humidity Relative humidity shows the degree the air is saturated with water vapour. The key principle of Relative Humidity or R.H. is that it measures the moisture content of air relative to the temperature. Absolute Humidity Absolute humidity shows the amount of water contained in the air, regardless of temperature. It is expressed in grams per cubic meter of air (g/m3). Moisture content Water content or moisture content is the quantity of water contained in solid materials like crops or wood, paper and other materials, in relationship to the total weight (or dry weight). Equilibrium Moisture Content EMC Hygroscopic materials: wood, paper, grain The equilibrium moisture content of a hygroscopic material surrounded at least partially by air is the moisture content at which the material is neither gaining nor losing moisture. The value of the EMC depends on the material and the relative humidity and temperature of the air with which it is in contact. Dew point The dew point is the temperature at which the air is saturated with water vapour. Above the dew point, liquid water will begin to condense on solid surfaces. December 2018 Conductance Measurement Electrical conductivity or specific conductance is the reciprocal of electrical resistivity, and measures a materials ability to conduct an electric current. This measuring principle is based on the fact that electrical conductivity changes according to the moisture content of a porous material.
    [Show full text]
  • Reliable Moisture Determination in Power Transformers
    Preface – Electra offers students or young engineers the possibility of publishing articles of a scientific nature. The present paper is a sum- mary of a PhD thesis published at the University of Stuttgart, Germany. Reliable Moisture Determination in Power Transformers Maik Koch, personal member of Cigré Abstract – This article describes and compares methods for reliable assessment of moisture in oil-paper-insulated power transformers. The work concentrates on the use of equilibrium diagrams and dielectric response methods for on-site moisture determination. Case studies illus- trate the practical application of the achievements. I. MOISTURE IN TRANSFORMERS Among aging phenomena of power transformers, moisture in the liquid and solid insulation in recent years became a frequent- ly discussed issue because of uncertainties of traditional measurement methods, the availability of new methods and its detrimen- tal effects on the insulation condition. Moisture decreases the dielectric withstand strength of oil and paper, accelerates paper aging and causes the emission of bubbles at high temperatures. For describing the moisture concentration in materials, today two measures are used. This is firstly relative moisture saturation (RS in %), as the ratio of the actual water vapor pressure to the saturation water vapor pressure, having the same physical meaning like the well-known relative humidity in gases. Secondly, water content is used, calculated by the ratio of water mass to insulation mass and given in % for cellulose materials and ppm for oils. The decision about maintenance actions as for example on-site drying requires dependable knowledge about the actual mois- ture concentration. Though the bulk of water resides in the solid insulation (pressboard, paper), it cannot be readily assessed in transformers and indirect methods are needed.
    [Show full text]
  • Power Transformer Diagnostics, Monitoring and Design Features
    Power Transformer Diagnostics, Monitoring and Design Features Edited by Issouf Fofana Printed Edition of the Special Issue Published in Energies www.mdpi.com/journal/energies Power Transformer Diagnostics, Monitoring and Design Features Power Transformer Diagnostics, Monitoring and Design Features Special Issue Editor Issouf Fofana MDPI • Basel • Beijing • Wuhan • Barcelona • Belgrade Special Issue Editor Issouf Fofana UniversiteduQu´ ebec´ a` Chicoutimi (UQAC) Canada Editorial Office MDPI St. Alban-Anlage 66 4052 Basel, Switzerland This is a reprint of articles from the Special Issue published online in the open access journal Energies (ISSN 1996-1073) from 2015 to 2018 (available at: https://www.mdpi.com/journal/energies/special issues/power-transformer) For citation purposes, cite each article independently as indicated on the article page online and as indicated below: LastName, A.A.; LastName, B.B.; LastName, C.C. Article Title. Journal Name Year, Article Number, Page Range. ISBN 978-3-03897-441-3 (Pbk) ISBN 978-3-03897-442-0 (PDF) c 2018 by the authors. Articles in this book are Open Access and distributed under the Creative Commons Attribution (CC BY) license, which allows users to download, copy and build upon published articles, as long as the author and publisher are properly credited, which ensures maximum dissemination and a wider impact of our publications. The book as a whole is distributed by MDPI under the terms and conditions of the Creative Commons license CC BY-NC-ND. Contents About the Special Issue Editor ...................................... vii Issouf Fofana and Yazid Hadjadj Power Transformer Diagnostics, Monitoring and Design Features Reprinted from: Energies 2018, 11, 3248, doi:10.3390/en11123248 ..................
    [Show full text]
  • Rosemount Analytical
    Rosemount Analytical MODEL 340 TRACE MOISTURE ANALYZER INSTRUCTION MANUAL 081854-N NOTICE The information contained in this document is subject to change without notice. Teflon® is a registered trademark of E.I. duPont de Nemours and Co., Inc. Viton® is a registered trademark of E.I. duPont de Nemours and Co., Inc. Freon12® is a registered trademark of E.I. duPont de Nemours and Co., Inc. SNOOP® is a registered trademark of NUPRO Co. Manual Part Number 081854-P January 2001 Printed in U.S.A. Rosemount Analytical Inc. 4125 East La Palma Avenue Anaheim, California 92807-1802 CONTENTS PREFACE SAFETY SUMMARY ..........................................................................................P1 SPECIFICATIONS - GENERAL .........................................................................P3 Non-Portable Analyzers ...........................................................................P3 Portable Analyzers...................................................................................P3 SPECIFICATIONS - PERFORMANCE...............................................................P4 SPECIFICATIONS - ALARM OPTION (PANEL MOUNT ANALYZERS ONLY)..........P4 SPECIFICATIONS - SAMPLE............................................................................P5 CUSTOMER SERVICE, TECHNICAL ASSISTANCE AND FIELD SERVICE............P6 RETURNING PARTS TO THE FACTORY .........................................................P6 TRAINING ......................................................................................................P6 DOCUMENTATION............................................................................................P6
    [Show full text]
  • Flow Measurement New in 2017 Gas Analysis
    FLOW MEASUREMENT NEW IN 2017 TransPort® PT900 - Portable Ultrasonic Clamp-On Liquid Flow Meter Same ruggedness and superior performance as its predecessor, the PT878, but a new level of intuitive capability. Wireless tablet with Bluetooth® communication, easy programming, NEW easy to install clamping fixture, and 8 GB of datalogging storage. Permanent Ultrasonic Clamp-On LiquiD Flow AquaTrans AT600 – Reliable and cost-effective. Correlation Transit-TimeTM for measurement of liQuids in general industrial environments. Installed in just 4 steps … up and running in minutes! DigitalFlow DF868 – Fixed installation liquid flow measurement of velocity, volumetric and energy flow rates TM using Correlation Transit-Time technology. In-Line Ultrasonic Liquid & Gas PanaFlowTM - The GE PanaFlow Meter System for measurement of liQuids and gasses. Offers the benefits of ultrasonic flow measurement, including no pressure drop, no moving parts and low maintenance. The PanaFlow system offers high performance at low cost. It is preferred in the chemical, oil & gas, and other industries for permanent installation in rugged process environments. Ultrasonic Gas & Steam Panametrics XGM868i – Low cost, general purpose gas flow meter. Weatherproof and approved for use in hazardous areas. Panametrics XGS868i – Designed for mass flow rate measurement of saturated or superheated steam. Weatherproof and explosion proof. Vortex Liquid, Gas and Steam PanaFlowTM MV80 – In-line multivariable vortex flow meter. Vortex shedding velocity sensor, RTD temperature sensor, and a solid state pressure transducer that measures the mass flow rate of liQuids, gasses and steam. PanaFlowTM MV82 – Insertion design with the same features as the MV80. GAS ANALYSIS Galvanic Fuel Cell Thermal ConDuctivity Oxy.IQ – Built-in microprocessor XMTC – Thermal conductivity with two-wire loop power.
    [Show full text]
  • BHCS38638 Measurement Technologies for Natural Gas White
    Moisture measurement technologies for natural gas By Gerard McKeogh. Global Product & Sales Manager, Panametrics The measurement of moisture in natural gas is an important parameter for the processing, storage and transportation of natural gas globally. Natural gas is dehydrated prior to introduction into the pipeline and distribution network. However, attempts to reduce dehydration result in a reduction in “gas quality” and an increase in maintenance costs and transportation as well as potential safety issues. Consequently, to strike the right balance, it is important that the water component of natural gas is measured precisely and reliably. Moreover, in custody transfer of natural gas between existing and future owners maximum allowable levels are set by tariff, normally expressed in terms of absolute humidity (mg/m3 or lbs/mmscfh) or dew point temperature. Several technologies exist for the online measurement and for spot sampling of moisture content. This paper reviews the most commonly used moisture measuring instruments and provides a comparison of those technologies. Introduction Instrument technologies for Prior to transportation, water is separated from raw natural measuring water vapor in natural gas gas. However some water still remains present in the Various viable technologies exist for measuring the amount gaseous state as water vapor. If the gas cools or comes in of water vapor in natural gas. These tend to rely on sample contact with any surface that is colder that the prevailing conditioning systems, where a gas sample is extracted, dew point temperature of the gas, water will condense filtered, the pressures regulated and the flow controlled. in the form of liquid or ice.
    [Show full text]