coatings Article Thermal Atomic Layer Deposition of Yttrium Oxide Films and Their Properties in Anticorrosion and Water Repellent Coating Applications Christian Dussarrat 1,*, Nicolas Blasco 2, Wontae Noh 3, Jooho Lee 3, Jamie Greer 1, Takashi Teramoto 1, Sunao Kamimura 1, Nicolas Gosset 1 and Takashi Ono 1 1 Air Liquide Laboratories, Tokyo Innovation Campus, 2-2 Hikarinooka, Yokosuka, Kanagawa 239-0847, Japan;
[email protected] (J.G.);
[email protected] (T.T.);
[email protected] (S.K.);
[email protected] (N.G.);
[email protected] (T.O.) 2 Air Liquide Advanced Materials, 3121 Route 22 East, Branch Estates, Suite 200, Branchburg, NJ 08876, USA;
[email protected] 3 Air Liquide Laboratories Korea, 50 Yonsei-ro, Sinchon-dong, Seodaemun-gu, Seoul 03722, Korea;
[email protected] (W.N.);
[email protected] (J.L.) * Correspondence:
[email protected] Abstract: The thermal atomic layer deposition (ThALD) of yttrium oxide (Y2O3) was developed using i the newly designed, liquid precursor, Y(EtCp)2( Pr2-amd), as the yttrium source in combination with different oxygen sources, such as ozone, water and even molecular oxygen. Saturation was observed ◦ for the growth of the Y2O3 films within an ALD window of 300 to 450 C and a growth per cycle Citation: Dussarrat, C.; Blasco, N.; (GPC) up to 1.1 Å. The resulting Y2O3 films possess a smooth and crystalline structure, while avoiding Noh, W.; Lee, J.; Greer, J.; Teramoto, any carbon and nitrogen contamination, as observed by X-ray photoelectron spectroscopy (XPS). T.; Kamimura, S.; Gosset, N.; Ono, T.