Adduct Purification of Trimethylgallium Using 4-Dimethylaminopyridine
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Aryl‑NHC Group 13 Trimethyl Complexes : Structural, Stability and Bonding Insights
This document is downloaded from DR‑NTU (https://dr.ntu.edu.sg) Nanyang Technological University, Singapore. Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights Wu, Melissa Meiyi 2017 Wu, M. M. (2017). Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights. Doctoral thesis, Nanyang Technological University, Singapore. http://hdl.handle.net/10356/70204 https://doi.org/10.32657/10356/70204 Downloaded on 28 Sep 2021 13:14:06 SGT ATTENTION: The Singapore Copyright Act applies to the use of this document. Nanyang Technological University Library. NANYANG TECHNOLOGICAL UNIVERSITY DIVISION OF CHEMISTRY AND BIOLOGICAL CHEMISTRY SCHOOL OF PHYSICAL & MATHEMATICAL SCIENCES Aryl-NHC Group 13 Trimethyl Complexes: Structural, Stability and Bonding Insights Wu Meiyi Melissa G1102527F Supervisor: Asst Prof Felipe Garcia Contents Acknowledgements .............................................................................................................. iv Abbreviations ....................................................................................................................... v Abstract.............................................................................................................................. viii 1. Introduction 1.1. N-Heterocyclic Carbenes (NHC) ................................................................................. 1 1.1.1. Electronic Properties ............................................................................................ 1 1.1.2. Steric -
Comparison of Trimethylgallium and Triethylgallium As “Ga” Source
Comparison of trimethylgallium and triethylgallium as “Ga” source materials for the growth of ultrathin GaN films on Si (100) substrates via hollow-cathode plasma- assisted atomic layer deposition Mustafa AlevliAli Haider, Seda Kizir, Shahid A. Leghari, and Necmi Biyikli Citation: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34, 01A137 (2016); doi: 10.1116/1.4937725 View online: http://dx.doi.org/10.1116/1.4937725 View Table of Contents: http://avs.scitation.org/toc/jva/34/1 Published by the American Vacuum Society Articles you may be interested in Substrate temperature influence on the properties of GaN thin films grown by hollow-cathode plasma-assisted atomic layer deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 34, 01A12501A125 (2015); 10.1116/1.4936230 Atomic layer deposition of GaN at low temperatures Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 30, 01A12401A124 (2011); 10.1116/1.3664102 Low-temperature self-limiting atomic layer deposition of wurtzite InN on Si(100) Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 6, 045203045203 (2016); 10.1063/1.4946786 Kinetics of thermal decomposition of triethylgallium, trimethylgallium, and trimethylindium adsorbed on GaAs(100) Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 9, (1998); 10.1116/1.577146 Substrate impact on the low-temperature growth of GaN thin films by plasma-assisted atomic layer deposition Journal of Vacuum Science & Technology A: Vacuum, Surfaces, -
Deposition Chemical Selection Guide
SPECIALTY CHEMICALS AND ENGINEERED MATERIALS Deposition Chemical Selection Guide DEPOSITION PRECURSORS — Inter-metal dielectric precursors High-k gate and capacitor precursors TEOS Tetraethylorthosilicate HfCl4 Hafnium tetrachloride (standard and UHP grade) 4MS Tetramethylsilane ZrCl4 Zirconium tetrachloride OMCTS Octamethylcyclotetrasiloxane AlCl3 Aluminium trichloride NxTi Ti dopant CVD dopants Precursors for alternative high-k dielectrics and dopants* TEB Triethylborate TEMAZ Tetrakis(ethylmethylamido)zirconium(IV) TEPO Triethylphosphate TMB Trimethylborate Metallization including barrier materials TMP Trimethylphosphite HP CCTBA* High Purity dicolbalt hexacarbonyl tert- butylacetylene Silicon oxide and nitride precursors TDMAT Tetrakis-dimethylamino Titanium BDEAS Bis (diethylamino)silane TiCl4 Titanium tetrachloride BDMAMS bis(dimethylamino) methylsilane WCl6 Tungsten hexachloride SiNCH* Entegris proprietary WCl5 Tungsten pentachloride HMDS Hexamethyldisilane Joppa27™ (In collaboration with AMAT) HCDS Hexachlorodisilane Precursors for cobalt (selective or non-selective)* C H N Pyridine 5 5 TBTEMT (Tert-butylimido)tris(ethylmethylamido)tantalum(V) H O UHP grade water 2 Other metal precursors (eg. Ru, Y, Er, Mg, Al, Sn, W, Ir) Precursors for low temperature Si oxides and nitrides* TMDSO Tetramethyldisiloxane *Currently available at sampling volumes. Scale up to higher volume production would be available, depending on demand. Other precursors SiCl4 Silicon tetrachloride PZT cocktails Lead zirconate titanate ™ PH3 Phosphine in SAGE packaging -
Gallium in 2017 (PDF)
2017 Minerals Yearbook GALLIUM [ADVANCE RELEASE] U.S. Department of the Interior April 2020 U.S. Geological Survey Gallium By Brian W. Jaskula Domestic survey data and tables were prepared by Wanda G. Wooten, statistical assistant. Low-grade primary gallium was recovered globally as a gallium production was 5% from 2007 through 2017. World byproduct of processing bauxite and zinc ores. No domestic high-grade secondary refined gallium production increased at a low-grade primary gallium was recovered in 2017. Imports CAGR of 7%. World gallium consumption, which increased at of gallium metal and gallium arsenide (GaAs) wafers plus a CAGR of 6% from 2007 through 2017, was estimated to have domestically refined and recycled gallium continued to account been 355 t in 2017. for all U.S. gallium consumption (metal and gallium in GaAs). Metal imports were 93% higher than those in 2016 (table 1). Production The leading sources of imported gallium metal were, in No domestic production of low-grade primary gallium was descending order, China (including Hong Kong), the United reported in 2017. Neo Performance Materials Inc. (Canada) Kingdom, France, Ukraine, Russia, and the Republic of Korea recovered gallium from new scrap materials, predominantly (table 4). A significant portion of imports was thought to be those generated during the production of GaAs ingots and low-grade gallium that was refined in the United States and wafers. Neo’s facility in Blanding, UT, had the capability to shipped to other countries. Data on refined gallium exports, produce about 50 metric tons per year of high-grade gallium. however, were not available. -
Trimethylaluminium - Wikipedia, the Free Encyclopedia Page 1 of 3
Trimethylaluminium - Wikipedia, the free encyclopedia Page 1 of 3 Trimethylaluminium From Wikipedia, the free encyclopedia (Redirected from Trimethylaluminum) Trimethylaluminium is the chemical compound with Trimethylaluminium the formula Al2(CH3)6, abbreviated as Al2Me6, (AlMe3)2 or the abbreviation TMA. This pyrophoric, colorless liquid is an industrially important organoaluminium compound. It evolves white smoke (aluminium oxides) when the vapor is released into the air. IUPAC name Contents trimethylalumane Other names ■ 1 Structure and bonding Trimethylaluminium; aluminium trimethyl ■ 2 Synthesis and applications Identifiers ■ 3 Semiconductor grade TMA CAS number 75-24-1 ■ 4 References PubChem 16682925 ■ 5 External links ChemSpider 10606585 SMILES C[Al](C)C Structure and bonding InChI InChI=1S/3CH3.Al/h3*1H3; Al2Me6 exists as a dimer, analogous in structure and Key: JLTRXTDYQLMHGR-UHFFFAOYSA-N bonding to diborane. As with diborane, the metalloids are connected by a 3-center-2-electron bond: the InChI=1/3CH3.Al/h3*1H3;/rC3H9Al/c1-4(2)3/h1- shared methyl groups bridge between the two 3H3 aluminium atoms. The Al-C(terminal) and Al-C Key: JLTRXTDYQLMHGR-MZZUXTGEAJ (bridging) distances are 1.97 and 2.14 Å, respectively. Properties [1] The carbon atoms of the bridging methyl groups Molecular formula C6H18Al2 are each surrounded by five neighbors: three Molar mass 144.18 g/mol hydrogen atoms and two aluminium atoms. The Appearance Colorless liquid methyl groups interchange readily intramolecularly Density 0.752 g/mL and intermolecularly. Melting point 15 °C 3-Centered-2-electron bonds are an utterance of "electron-deficient" molecules and tend to reactions Boiling point with Lewis bases that would give products consisting 125 °C of 2-centered-2-electron bonds. -
Gallium Arsenide
GaAs GaInN Most efficient solar cells Most efficient white light GaN ITO Transparent conducting oxide Light emitting diodes blue 1907 The first light emitting diode (LED) made of SiC Gallium nitride (GaN) Aluminium gallium arsenide (AlGaAs) Henry Joseph Round Silicon carbide Gallium phosphide Indium gallium nitride etc To the Editors of Electrical World: SIRS: – During an investigation of the unsymmetrical passage of current through a contact of carborundum and other substances a curious phenomenon was noted. On applying a potential of 10 volts between two points on a crystal of carborundum, the crystal gave out a yellowish light. Only one or two specimens could be found which gave a bright glow on such a low voltage, but with 110 volts a large number could be found to glow. In some crystals only edges gave the light and others gave instead of a yellow light green, orange or blue. In all cases tested the glow appears to come from the negative pole, a bright blue-green spark appearing at the positive pole. In a single crystal, if contact is made near the center with the negative pole, and the positive pole is put in contact at any other place, only one section of the crystal will glow and that same section wherever the positive pole is placed. There seems to be some connection between the above effect and the e.m.f. produced by a junction of carborundum and another conductor when heated by a direct or alternating current; but the connection may be only secondary as an obvious explanation of the e.m.f. -
The First Hydrides of Boron
UNIVERSIDADE DE LISBOA FACULDADE DE CIÊNCIAS SECÇÃO AUTÓNOMA DE HISTÓRIA E FILOSOFIA DAS CIÊNCIAS UNDER THE CARBON SPELL: DIBORANE’S PUZZLING STRUCTURE AND THE EMERGENGE OF BORON CHEMISTRY Nuno Manuel Castanheira de Figueiredo Dissertação orientada pela Professora Doutora Ana Simões, da Secção Autónoma de Filosofia e História das Ciências da Faculdade de Ciências da Universidade de Lisboa. MESTRADO EM HISTÓRIA E FILOSOFIA DAS CIÊNCIAS 2011 Resumo Este trabalho apresenta o primeiro estudo sistemático da história da química dos boranos, compostos de boro e hidrogénio cujas estruturas e natureza das ligações químicas desafiaram de forma irredutível a teoria da ligação química até aos anos cinquenta do século XX. Actualmente, a química do boro é um dos mais promissores ramos da química, com um vasto leque de aplicações às indústrias química e farmacéutica, à nano-tecnologia e à medicina. Neste último ramo, destacam-se as aplicações na luta contra o cancro e no desenvolvimento de medicamentos com um elevado grau de especificidade e inovação. Num futuro próximo, espera-se que a química do boro seja capaz de operar uma verdadeira revolução social, posicionando-se como uma poderosa alternativa à química do carbono que será capaz de oferecer todo um novo mundo de aplicações inéditas. Estas são o resultado da fascinante capacidade do átomo de boro para se ligar de formas surpreendentes e formar complexas estruturas que se baseiam em compostos de boro e hidrogénio (boranos). A grande apetência do boro para se ligar ao oxigénio impede que os boranos existam na natureza. A grande susceptibilidade destes à acção da humidade e do ar torna-os especialmente instáveis e difíceis de manusear e preservar. -
Filament-Activated Chemical Vapour Deposition of Nitride Thin Films
ADVANCED MATERIALS FOR OPTICS AND ELECTRONICS, VOL 6,135-146 (1996) Review Paper Filament-activated Chemical Vapour Deposition of Nitride Thin Films Sadanand V. Deshpande,* Jeffrey L. Dupuiet and Erdogan Gulari* Department of Chemical Engineering and Center for Display Technology and Manufacturing, The University of Michigan, Ann Arbor, MI 48109, U.S.A. We have applied the novel method of hot filament-activated chemical vapour deposition (HFCVD) for low-temperature deposition of a variety of nitride thin films. In this paper the results from our recent work on aluminium, silicon and titanium nitride have been reviewed. In the HFCVD method a hot tungsten filament (1500-1850°C) was utilised to decompose ammonia in order to deposit nitride films at low substrate temperatures and high rates. The substrate temperatures ranged from 245 to 600°C. The film properties were characterised by a number of analytical and optical methods. The effect of various deposition conditions on film properties was studied. All the films obtained were of high chemical purity and had very low cr no detectable tungsten contamination from the filament metal. KEYWORDS hot filament chemical vapour deposition; CVD; high-rate deposition; ammonia: silicon nitride: aluminium nitride: titanium nitride INTRODUCTION design and operating regimes, films with varied properties can be deposited with little or no COP- tamination from reactions at the reactor walls as is Hot filament-activated chemical vapour deposition found in other techniques such as plasma-assisted (HFCVD) is a simple and a relatively inexpensive chemical vapour deposition. method that has been used to deposit a variety of HFCVD has been extensively used for over a materials. -
The Allure of Aluminium
in your element The allure of aluminium Daniel Rabinovich outlines the history, properties and uses of aluminium — one of the most versatile, pervasive and inexpensive metals today, yet it was considered a rare and costly element only 150 years ago. t is hard to believe that aluminium was silver, which hampered the development a common Lewis acid, is extensively applied once more expensive than gold and that, of large-scale applications and motivated in Friedel–Crafts acylation and alkylation Iin the mid-nineteenth century, Napoleon the search for an alternative and more reactions, and aluminium chlorohydrate, III used silverware made of the light metal economical preparation process. Al2Cl(OH)5, is the active ingredient in when he really wanted to impress his guests It was only in 1886 that Charles M. Hall many antiperspirants. Large quantities at stately dinners. Even though element 13 in the US and Paul L. T. Héroult in France, of methylaluminoxane, a generic name is the most abundant metal in the Earth’s almost simultaneously and completely used to describe the ill-defined mixture of crust (~8%) and is present in more than independently, devised aluminium species obtained by partial hydrolysis of 270 different minerals, its high affinity for production processes that relied on the trimethylaluminium, are employed in the oxygen and the chemical stability of its electrolysis of alumina (Al2O3) dissolved Ziegler–Natta polymerization of olefins. oxides and silicates precluded its isolation in molten cryolite (Na3AlF6). An efficient The -
Crystal Structure and Quantum-Chemical Calculations of a Trimethylaluminium– THF Adduct
research communications Crystal structure and quantum-chemical calcula- tions of a trimethylaluminium–THF adduct ISSN 2056-9890 Lukas Brieger, Andreas Hermann, Christian Unkelbach and Carsten Strohmann* Technische Universita¨t Dortmund, Anorganische Chemie, Otto-Hahn-Strasse 6, D-44227 Dortmund, Germany. *Correspondence e-mail: [email protected] Received 10 January 2018 Accepted 20 January 2018 The title compound, trimethyl(tetrahydrofuran-O)aluminium(III), [Al(CH3)3(C4H8O)], is an addition product of trimethylaluminium and tetra- hydrofuran (THF). Instead of a dimeric structure, which is very common for Edited by A. J. Lough, University of Toronto, these types of compounds, a monomeric molecular structure is observed. The Canada C—Al—C angles in the molecule are very different from the C—Al—C angles found in dimeric molecular structures, leading to a different symmetry around Keywords: crystal structure; aluminium; tri- III methylaluminium; thf; adduct; monomer; angle. the Al atom. The reasons for these differences are discussed. CCDC reference: 1588683 Supporting information: this article has 1. Chemical context supporting information at journals.iucr.org/e Similar to diborane, trimethylaluminium is present as a dimer at room temperature. Analogously, two monomers are connected by two three-center–two-electron bonds bridging both molecules. The monomer of trimethylaluminium can be observed at high temperatures and low pressure with a trigonal-planar symmetry in the gas phase (Almenningen et al., 1971). The most important use of trimethylaluminium is in the production of methylaluminoxane, which is used to acti- vate the Ziegler–Natta catalysts for olefin polymerization (Andresen et al., 1976). Another known and important application is in the synthesis of Tebbe’s reagent, which is used for methylenation reactions in organic synthesis (Herrmann, 1982). -
The Growth and Characterization of Gallium Arsenide Nanowire Structures by Metal Organic Chemical Vapor Deposition
The Growth and Characterization of Gallium Arsenide Nanowire Structures by Metal Organic Chemical Vapor Deposition DISSERTATION Presented in Partial Fulfillment of the Requirements for the Degree Doctor of Philosophy in the Graduate School of The Ohio State University By Nicholas G. Minutillo Graduate Program in Physics The Ohio State University 2014 Dissertation Committee: Professor Fengyuan Yang, Advisor Professor Jay A. Gupta Professor Klaus Honscheid Professor Mohit Randeria Copyright by Nicholas Gaetano Minutillo 2014 Abstract Semiconductor nanowires hold a wealth of promise for studying the fundamental physics of electron behavior and interactions in a quasi-one dimensional environment as well as components in or the foundation of technological advancement in electronic and spintronic devices. Especially in the case of spintronic applications, the crystalline environment must be highly controlled. Unlike in electronic devices, predicated on the transport or storage of charges, spintronic devices often depend on relative phases of spin states. These phases are easily lost in an environment where scattering probabilities are high. In any material system, control of the material fabrication is the limiting factor to achieving the theoretical characteristics and operation. Still an active area of research, bottom-up synthesis of semiconductor nanowires has yet to reach the level of control required for wide spread adoption as a base system in condensed matter research. At this point in time, the material synthesis to meet the criteria for advanced applications remains a bottle neck in advancing the application of GaAs or any other semiconductor nanowires. In this dissertation we discuss the vapor-liquid-solid (VLS) mechanism and its role in the growth of gallium arsenide and other III-V semiconductors. -
Numerical Analysis of the High Pressure MOVPE Upside-Down Reactor for Gan Growth
electronics Article Numerical Analysis of the High Pressure MOVPE Upside-Down Reactor for GaN Growth Przemyslaw Niedzielski 1,* , Ewa Raj 1 , Zbigniew Lisik 1, Jerzy Plesiewicz 2, Ewa Grzanka 2,3 , Robert Czernecki 2,3 and Mike Leszczynski 2,3 1 Department of Semiconductor and Optoelectronic Devices, Lodz University of Technology, Wolczanska 211/215, 90-924 Lodz, Poland; [email protected] (E.R.); [email protected] (Z.L.) 2 TopGaN Ltd., Sokolowska 29/37, 01-142 Warsaw, Poland; [email protected] (J.P.); [email protected] (E.G.); [email protected] (R.C.); [email protected] (M.L.) 3 Institute of High Pressure Physics PAS, Sokolowska 29/37, 01-142 Warsaw, Poland * Correspondence: [email protected] Abstract: The present paper focuses on the high-pressure metal-organic vapor phase epitaxy (MOVPE) upside-down vertical reactor (where the inlet of cold gases is below a hot susceptor). This study aims to investigate thermo-kinetic phenomena taking place during the GaN (gallium nitride) growth process using trimethylgallium and ammonia at a pressure of above 2 bar. High pressure accelerates the growth process, but it results in poor thickness and quality in the obtained layers; hence, understanding the factors influencing non-uniformity is crucial. The present inves- tigations have been conducted with the aid of ANSYS Fluent finite volume method commercial software. The obtained results confirm the possibility of increasing the growth rate by more than six times through increasing the pressure from 0.5 bar to 2.5 bar. The analysis shows which zones Citation: Niedzielski, P.; Raj, E.; vortexes form in.