Effect of Nitrogen Pressure on the Structure of Cr-N, Ta-N, Mo-N, and WN Nanocrystals Synthesized by Arc Discharge
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Enhancement of the Corrosion Resistance of 304 Stainless Steel by Cr–N and Cr(N,O) Coatings
Article Enhancement of the Corrosion Resistance of 304 Stainless Steel by Cr–N and Cr(N,O) Coatings Mihaela Dinu 1, Emile S. Massima Mouele 2, Anca C. Parau 1, Alina Vladescu 1,3, Leslie F. Petrik 2 and Mariana Braic 1,* 1 National Institute for Optoelectronics, 409 Atomistilor St., 077125 Magurele, Romania; [email protected] (M.D.); [email protected] (A.C.P.); [email protected] (A.V.) 2 Department of Chemistry, Environmental and Nano Sciences, University of the Western Cape, Robert Sobukwe Road, Bellville 7535, South Africa; [email protected] (E.S.M.M.); [email protected] (L.F.P.) 3 National Research Tomsk Polytechnic University, Lenin Avenue 43, Tomsk 634050, Russia * Correspondence: [email protected]; Tel.: +4-21-457-57-59 Received: 27 February 2018; Accepted: 2 April 2018; Published: 5 April 2018 Abstract: Chromium nitride and oxynitride coatings were deposited as monolayers ((Cr–N), Cr(N,O)) and bilayers (Cr–N/Cr(N,O), Cr(N,O)/Cr–N) on 304 steel substrates by reactive cathodic arc method. The coatings were characterised by X-ray diffraction (XRD), scanning electron microscopy (SEM), energy dispersive X-ray spectrometry (EDS), surface profilometry, and scratch tester. The anticorrosive properties of the coatings were assessed by electrochemical tests in 0.10 M NaCl + 1.96 M H2O2, carried out at 24 °C. Cr2N, CrN, and Cr(N,O) phases were identified in the coatings by grazing incidence X-ray diffraction (GI-XRD) measurements. The measured adhesion values ranged from 19 N to 35 N, the highest value being obtained for the bilayer with Cr(N,O) on top. -
Compound - Physical Properties Density Melting Point G Cm-3 C
Goodfellow Corporation 125 Hookstown Grade Road, Coraopolis, PA 15108-9302. USA Tel: 1-800-821-2870 : Fax 1-800-283-2020 Compound - Physical Properties Density Melting point g cm-3 C Aluminum Carbide 2.36 - Al C 4 3 Aluminum Nitride 3.26 - AlN Antimony Telluride 6.50 - Sb Te 2 3 Barium Titanate 5.8-6.0 - BaTiO3 Bismuth Telluride 7.7 - Bi Te 2 3 Boron Nitride 2.25 - BN Calcium Boride 2.3 - CaB6 Calcium Fluoride 3.18 1360-1400 CaF2 Calcium Titanate 4.10 1975 CaTiO3 Chromium Carbide 6.68 - Cr C 3 2 Chromium Diboride 4.36 - CrB2 Chromium Nitride 5.9 - Cr2N Chromium Silicide 5.5 - CrSi2 Cobalt (II) Oxide 6.45 1795 CoO Cobalt (III) Oxide 5.18 - Co O 3 4 Copper Selenide 5.99 - CuSe Cupric Oxide 6.39 - CuO Hafnium Carbide 12.2 approx. 3890 HfC Hafnium Diboride 10.5 3100 HfB2 Indium Oxide/Tin Oxide 7.16 - In O 90 /SnO2 10 2 3 All information and technical data are given as a guide only. Although every effort has been made to ensure that the information 1 is correct, no warranty is given as to its completeness or accuracy. September 17 2021 Goodfellow Corporation 125 Hookstown Grade Road, Coraopolis, PA 15108-9302. USA Tel: 1-800-821-2870 : Fax 1-800-283-2020 Compound - Physical Properties Density Melting point g cm-3 C Iron Silicide 6.1 - FeSi Lanthanum Hexaboride 2.61 - LaB6 Lead Selenide 8.10 - PbSe Magnesium Fluoride - 1396 MgF2 Magnesium Oxide 3.58 - MgO Molybdenum Carbide 8.9 - Mo2C Molybdenum Diboride 7.12 - MoB2 Molybdenum Disilicide 6.31 - MoSi2 Nickel Oxide 6.67 1984 NiO Niobium Boride 6.97 - NbB2 Niobium Carbide 7.6 - NbC Niobium Nitride 8.4 - NbN Niobium Pentoxide 4.47 - Nb O 2 5 Niobium Silicide 5.37 - NbSi2 Silicon Carbide 3.217 - SiC Silicon Monoxide 2.13 - SiO Silicon Nitride 3.44 - Si N 3 4 Silver Chloride 5.56 455 AgCl Sodium Chloride 2.16 - NaCl Tantalum Boride 11.15 approx. -
Atom Transfer Reactions of High-Valent Chromium and Manganese Porphyrins James G
Iowa State University Capstones, Theses and Retrospective Theses and Dissertations Dissertations 1991 Atom transfer reactions of high-valent chromium and manganese porphyrins James G. Goll Iowa State University Follow this and additional works at: https://lib.dr.iastate.edu/rtd Part of the Inorganic Chemistry Commons Recommended Citation Goll, James G., "Atom transfer reactions of high-valent chromium and manganese porphyrins " (1991). Retrospective Theses and Dissertations. 10035. https://lib.dr.iastate.edu/rtd/10035 This Dissertation is brought to you for free and open access by the Iowa State University Capstones, Theses and Dissertations at Iowa State University Digital Repository. It has been accepted for inclusion in Retrospective Theses and Dissertations by an authorized administrator of Iowa State University Digital Repository. For more information, please contact [email protected]. INFORMATION TO USERS This manuscript has been reproduced from the microfihn master. UMI films the text directly from the original or copy submitted. Thus, some thesis and dissertation copies are in typewriter face, while others may be from any type of computer printer. The quality of this reproduction is dependent upon the quality of the copy submitted. Broken or indistinct print, colored or poor quality illustrations and photographs, print bleedthrough, substandard margins, and improper alignment can adversely affect reproduction. In the unlikely event that the author did not send UMI a complete manuscript and there are missing pages, these will be noted. Also, if unauthorized copyright material had to be removed, a note wiU indicate the deletion. Oversize materials (e.g., maps, drawings, charts) are reproduced by sectioning the original, beginning at the upper left-hand corner and continuing from left to right in equal sections with small overlaps. -
Materials of Low Secondary Electron Emission to Prevent the Multipactor Effect in High-Power RF Devices in Space
6th Spacecraft Charging Technology Conference, AFRL-VS-TR-20001578, 1 September 2000 Materials of Low Secondary Electron Emission to Prevent the Multipactor Effect in High-Power RF Devices in Space N.Díaz, S.Castañeda, J.M.Ripalda, I.Montero*, L.Galán, S. Feltham**, D.Raboso** and F.Rueda Departamento de Física Aplicada, Universidad Autónoma de Madrid, 28049-Madrid (Spain) * Instituto de Ciencia de Materiales de Madrid, CSIC, 28049-Madrid (Spain) ** ESTEC. ESA, Noordwijk (The Netherlands) Abstract Deposition methods of promising low secondary electron emission coatings such a TiNx, CrNx and CNx have been studied using ion assisted electron gun evaporation in nitrogen atmosphere. Surface composition, by XPS, crystalline structure, by XRD, and morphology by SEM have been studied. Secondary electron emission coefficient has been correlated with multipactor threshold power. For each material its distinguishing physical properties and its prospect for antimultipactor coating implementation as a function of the composition of the films is obtained. TiNx and CNx, both obtained in crystalline phase, appear as excellent coatings to prevent multipactor. Introduction an electron bombardment evaporator The multipactor effect sets one of and a 3 cm diameter ion gun the main limits to the working power (Commonwealth Scientific). of RF devices in space. The Aluminium alloy blocks were used as multipactor discharge is an electron the substrates of the coatings to be avalanche in vacuum in resonance multipactor tested at ESTEC. Ion with the RF field and sustained by assistance consists of the Ar+ ion the secondary electron emission bombardment with energy in the (SEE) from the surfaces exposed. range of 100-200 eV and 0.2 This electron avalanche phenomenon mA/cm2 ionic current, in a radius of appears for a determined power, about 5 cm, while the coating is frequency and electrode or wall being deposited distance and may destroy a RF X-Ray Photoelectron Spectroscopy equipment working in vacuum. -
UBM Coatings
The microstructure and properties of unbalanced magnetron sputtered CrN[x] coatings. HURKMANS, Antonius Petrus Arnoldus. Available from the Sheffield Hallam University Research Archive (SHURA) at: http://shura.shu.ac.uk/19846/ A Sheffield Hallam University thesis This thesis is protected by copyright which belongs to the author. The content must not be changed in any way or sold commercially in any format or medium without the formal permission of the author. When referring to this work, full bibliographic details including the author, title, awarding institution and date of the thesis must be given. Please visit http://shura.shu.ac.uk/19846/ and http://shura.shu.ac.uk/information.html for further details about copyright and re-use permissions. CITY CAMPlllS, HOWARD STREET SHEFFIELD SI 1WB REFERENCE ProQuest Number: 10697152 All rights reserved INFORMATION TO ALL USERS The quality of this reproduction is dependent upon the quality of the copy submitted. In the unlikely event that the author did not send a com plete manuscript and there are missing pages, these will be noted. Also, if material had to be removed, a n o te will in d ic a te the d e le tio n . uest ProQuest 10697152 Published by ProQuest LLC(2017). Copyright of the Dissertation is held by the Author. All rights reserved. This work is protected against unauthorized copying under Title 17, United States Code Microform Edition © ProQuest LLC. ProQuest LLC. 789 East Eisenhower Parkway P.O. Box 1346 Ann Arbor, Ml 48106- 1346 THE MICROSTRUCTURE AND PROPERTIES OF UNBALANCED MAGNETRON SPUTTERED CrNx COATINGS Antonius Petrus Arnoldus Hurkmans A thesis submitted in partial fulfilment of the requirements of Sheffield Hallam University for the degree of Doctor of Philosophy March 2002 Collaborating organisation: Hauzer Techno Coating B.V. -
Solid State Metathesis Preparations of Hard Refractory Ceramics
S o u p S t a t e M e t a t h e s is P reparations OF H a r d R e f r a c t o r y C e r a m i c s A thesis presented by: Artur Marek Nartowski BSc in partial fulfilment for the award of Ph. D. U n iv e r s it y C o l l e g e Lo n d o n D e p t , o f C h e m is t r y ProQuest Number: 10014877 All rights reserved INFORMATION TO ALL USERS The quality of this reproduction is dependent upon the quality of the copy submitted. In the unlikely event that the author did not send a complete manuscript and there are missing pages, these will be noted. Also, if material had to be removed, a note will indicate the deletion. uest. ProQuest 10014877 Published by ProQuest LLC(2016). Copyright of the Dissertation is held by the Author. All rights reserved. This work is protected against unauthorized copying under Title 17, United States Code. Microform Edition © ProQuest LLC. ProQuest LLC 789 East Eisenhower Parkway P.O. Box 1346 Ann Arbor, Ml 48106-1346 Acknowledgements This work was supported by EPSRC and was completed under very helpfiil and encouraging supervision of Dr. I. P. Parkin. Grateful acknowledgement is due to members of staff, especially Dr. C. Carmalt, Prof. A. J. Craven, Dr. M. MacKenzie and the departmental microanalyst. I am also indebted to my fellow students, in particular, L. -
Rpt POL-TOXIC AIR POLLUTANTS 98 BY
SWCAA TOXIC AIR POLLUTANTS '98 by CAS ASIL TAP SQER CAS No HAP POLLUTANT NAME HAP CAT 24hr ug/m3 Ann ug/m3 Class lbs/yr lbs/hr none17 BN 1750 0.20 ALUMINUM compounds none0.00023 AY None None ARSENIC compounds (E649418) ARSENIC COMPOUNDS none0.12 AY 20 None BENZENE, TOLUENE, ETHYLBENZENE, XYLENES BENZENE none0.12 AY 20 None BTEX BENZENE none0.000083 AY None None CHROMIUM (VI) compounds CHROMIUM COMPOUN none0.000083 AY None None CHROMIUM compounds (E649962) CHROMIUM COMPOUN none0.0016 AY 0.5 None COKE OVEN COMPOUNDS (E649830) - CAA 112B COKE OVEN EMISSIONS none3.3 BN 175 0.02 COPPER compounds none0.67 BN 175 0.02 COTTON DUST (raw) none17 BY 1,750 0.20 CYANIDE compounds CYANIDE COMPOUNDS none33 BN 5,250 0.60 FIBROUS GLASS DUST none33 BY 5,250 0.60 FINE MINERAL FIBERS FINE MINERAL FIBERS none8.3 BN 175 0.20 FLUORIDES, as F, containing fluoride, NOS none0.00000003 AY None None FURANS, NITRO- DIOXINS/FURANS none5900 BY 43,748 5.0 HEXANE, other isomers none3.3 BN 175 0.02 IRON SALTS, soluble as Fe none00 AN None None ISOPROPYL OILS none0.5 AY None None LEAD compounds (E650002) LEAD COMPOUNDS none0.4 BY 175 0.02 MANGANESE compounds (E650010) MANGANESE COMPOU none0.33 BY 175 0.02 MERCURY compounds (E650028) MERCURY COMPOUND none33 BY 5,250 0.60 MINERAL FIBERS ((fine), incl glass, glass wool, rock wool, slag w FINE MINERAL FIBERS none0.0021 AY 0.5 None NICKEL 59 (NY059280) NICKEL COMPOUNDS none0.0021 AY 0.5 None NICKEL compounds (E650036) NICKEL COMPOUNDS none0.00000003 AY None None NITROFURANS (nitrofurans furazolidone) DIOXINS/FURANS none0.0013 -
Transition Metal Carbides and Nitrides in Energy Storage and Conversion
www.advancedscience.com www.MaterialsViews.com Transition Metal Carbides and Nitrides in Energy Storage REVIEW and Conversion Yu Zhong , Xinhui Xia ,* Fan Shi , Jiye Zhan , Jiangping Tu , and Hong Jin Fan* solar energy. Fuel cell is considered as the High-performance electrode materials are the key to advances in the areas of main futuristic power source due to its energy conversion and storage (e.g., fuel cells and batteries). In this Review, high performance and infi nitely renew- recent progress in the synthesis and electrochemical application of transi- able characteristics, but the overwhelming roadblocks related to high-cost and unreli- tion metal carbides (TMCs) and nitrides (TMNs) for energy storage and ability of Pt-based electrocatalysts make it conversion is summarized. Their electrochemical properties in Li-ion and impractical for large-scale manufacture at Na-ion batteries as well as in supercapacitors, and electrocatalytic reactions this stage. The electrode for fuel cells con- (oxygen evolution and reduction reactions, and hydrogen evolution reaction) sists of active electrocatalysts and support are discussed in association with their crystal structure/morphology/com- matrix, and the active electrocatalyst is the position. Advantages and benefi ts of nanostructuring (e.g., 2D MXenes) are key factor to the performance of fuel cells. Current trend has turned to nonprecious highlighted. Prospects of future research trends in rational design of high- high-performance electrocatalysts instead performance TMCs and TMNs electrodes are provided at the end. of noble metals to drive the commercial application. [ 3–5 ] Meanwhile, in parallel with the research of fuel cell, great efforts are 1. Introduction dedicated to developing new-generation EES technologies to meet the increasing demand in both consumable electronics To maintain the economic growth of modern society and simul- and electric transport systems. -
(12) United States Patent (10) Patent No.: US 7,780,793 B2 Yang Et Al
USOO7780793B2 (12) United States Patent (10) Patent No.: US 7,780,793 B2 Yang et al. (45) Date of Patent: Aug. 24, 2010 (54) PASSIVATION LAYER FORMATION BY (56) References Cited PLASMA CLEAN PROCESS TO REDUCE U.S. PATENT DOCUMENTS NATIVE OXDE GROWTH 4,209,357 A 6, 1980 Gorin et al. (75) Inventors: Haichun Yang, Santa Clara, CA (US); (Continued) Xinliang Lu, Fremont, CA (US); Chien-Teh Kao, Sunnyvale, CA (US); FOREIGN PATENT DOCUMENTS Mei Chang, Saratoga, CA (US) CN 13755.75 10, 2002 (73) Assignee: Applied Materials, Inc., Santa Clara, (Continued) CA (US) OTHER PUBLICATIONS PCT International Search Report and Written Opinion dated Jun. 23. (*) Notice: Subject to any disclaimer, the term of this 2009 for International Application No. PCT/US2008/087436. patent is extended or adjusted under 35 (Continued) U.S.C. 154(b) by 140 days. Primary Examiner Michael Kornakov (21) Appl. No.: 11/962,791 Assistant Examiner—Ryan Coleman (74) Attorney, Agent, or Firm Patterson & Sheridan, LLP (22) Filed: Dec. 21, 2007 (57) ABSTRACT (65) Prior Publication Data Embodiments described herein provide methods for remov US 2008/O160210 A1 Jul. 3, 2008 ing native oxide Surfaces on Substrates while simultaneously passivating the underlying Substrate Surface. In one embodi Related U.S. Application Data ment, a method is provided which includes positioning a Substrate containing an oxide layer within a processing cham (60) Continuation-in-part of applic at1On No. 11 /622.437, ber, adjusting a first temperature of the substrate to about 80° filed on Jan. 11, 2007, which is a continuation-in-part C. -
Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties
Coatings 2015, 5, 656-687; doi:10.3390/coatings5040656 OPEN ACCESS coatings ISSN 2079-6412 www.mdpi.com/journal/coatings Review Molybdenum Nitride Films: Crystal Structures, Synthesis, Mechanical, Electrical and Some Other Properties Isabelle Jauberteau 1,*, Annie Bessaudou 2, Richard Mayet 1, Julie Cornette 1, Jean Louis Jauberteau 1, Pierre Carles 1 and Thérèse Merle-Méjean 1 1 Université de Limoges, CNRS, ENSCI, SPCTS UMR7315, F-87000 Limoges, France; E-Mails: [email protected] (R.M.); [email protected] (J.C.); [email protected] (J.L.J.); [email protected] (P.C.); [email protected] (T.M.-M.) 2 Université de Limoges, CNRS, XLIM UMR6172, F-87060 Limoges, France; E-Mail: [email protected] * Author to whom correspondence should be addressed; E-Mail: [email protected]; Tel.: +33-587-502-323; Fax: +33-587-502-304. Academic Editor: Alessandro Lavacchi Received: 24 July 2015 / Accepted: 29 September 2015 / Published: 13 October 2015 Abstract: Among transition metal nitrides, molybdenum nitrides have been much less studied even though their mechanical properties as well as their electrical and catalytic properties make them very attractive for many applications. The δ-MoN phase of hexagonal structure is a potential candidate for an ultra-incompressible and hard material and can be compared with c-BN and diamond. The predicted superconducting temperature of the metastable MoN phase of NaCl-B1-type cubic structure is the highest of all refractory carbides and nitrides. The composition of molybdenum nitride films as well as the structures and properties depend on the parameters of the process used to deposit the films. -
New Pathways to Tungsten and Molybdenum Oxides, Nitrides and Azides Michael Richard Close Iowa State University
Iowa State University Capstones, Theses and Retrospective Theses and Dissertations Dissertations 1992 New pathways to tungsten and molybdenum oxides, nitrides and azides Michael Richard Close Iowa State University Follow this and additional works at: https://lib.dr.iastate.edu/rtd Part of the Inorganic Chemistry Commons Recommended Citation Close, Michael Richard, "New pathways to tungsten and molybdenum oxides, nitrides and azides " (1992). Retrospective Theses and Dissertations. 10104. https://lib.dr.iastate.edu/rtd/10104 This Dissertation is brought to you for free and open access by the Iowa State University Capstones, Theses and Dissertations at Iowa State University Digital Repository. It has been accepted for inclusion in Retrospective Theses and Dissertations by an authorized administrator of Iowa State University Digital Repository. For more information, please contact [email protected]. INFORMATION TO USERS This manuscript has been reproduced from the microfilni master. UMI films the text directly from the original or copy submitted. Thus, some thesis and dissertation copies are in typewriter face, while others may be from any type of computer printer. The quality of this reproduction is dependent upon the quality of the copy submitted. Broken or indistinct print, colored or poor quality illustrations and photographs, print bleedthrough, substandard margins, and improper alignment can adversely affect reproduction. In the unlikely event that the author did not send UMI a complete manuscript and there are missing pages, these will be noted. Also, if unauthorized copyright material had to be removed, a note will indicate the deletion. Oversize materials (e.g., maps, drawings, charts) are reproduced by sectioning the original, beginning at the upper left-hand comer and continuing from left to right in equal sections with small overlaps. -
A Map of the Inorganic Ternary Metal Nitrides
ARTICLES https://doi.org/10.1038/s41563-019-0396-2 A map of the inorganic ternary metal nitrides Wenhao Sun 1*, Christopher J. Bartel2, Elisabetta Arca3, Sage R. Bauers3, Bethany Matthews4, Bernardo Orvañanos5, Bor-Rong Chen6, Michael F. Toney 6, Laura T. Schelhas 6, William Tumas3, Janet Tate 4, Andriy Zakutayev3, Stephan Lany 3, Aaron M. Holder 2,3* and Gerbrand Ceder1,7 Exploratory synthesis in new chemical spaces is the essence of solid-state chemistry. However, uncharted chemical spaces can be difficult to navigate, especially when materials synthesis is challenging. Nitrides represent one such space, where strin- gent synthesis constraints have limited the exploration of this important class of functional materials. Here, we employ a suite of computational materials discovery and informatics tools to construct a large stability map of the inorganic ternary metal nitrides. Our map clusters the ternary nitrides into chemical families with distinct stability and metastability, and highlights hundreds of promising new ternary nitride spaces for experimental investigation—from which we experimentally realized seven new Zn- and Mg-based ternary nitrides. By extracting the mixed metallicity, ionicity and covalency of solid-state bonding from the density functional theory (DFT)-computed electron density, we reveal the complex interplay between chemistry, composi- tion and electronic structure in governing large-scale stability trends in ternary nitride materials. itrides are an exciting space for materials design1–3, as exem- similar propensity to form stable or metastable ternary nitrides. To plified by state-of-the-art nitride materials for solid-state visualize these clustered nitride families, we construct a large and lighting4,5, ceramic hard coatings6, ammonia-synthesis cata- comprehensive stability map of the inorganic ternary metal nitrides.