DOCSLIB.ORG

CHEMICAL HERITAGE FOUNDATION VINCENT J. COATES a Work In

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text

Load more

CHEMICAL HERITAGE FOUNDATION VINCENT J. COATES A Work In Analytical Instrument Design (1925-2003) Transcript of an Interview Conducted by David C. Brock at Milpitas, California on 5 May 2003 (With Subsequent Corrects and Additions) Vincent J. Coates This interview has been designated as Free Access. One may view, quote from, cite, or reproduce the oral history with the permission of CHF. Please note: Users citing this interview for purposes of publication are obliged under the terms of the Chemical Heritage Foundation Oral History Program to credit CHF using the format below: Vincent J. Coates, interview by David C. Brock in Milpitas, California, 5 May 2003 (Philadelphia: Chemical Heritage Foundation, Oral History Transcript # 0275). Chemical Heritage Foundation Oral History Program 315 Chestnut Street Philadelphia, Pennsylvania 19106 VINCENT J. COATES 1925 Born in Bridgeport, Connecticut on 19 January Education 1946 B.S., engineering, Yale University Professional Experience 1943-1946 United States Naval Reserve 1946-1948 Designer, Chance-Vought Aircraft Corp. Perkin-Elmer Corporation 1948-1952 Project Engineer 1952-1954 Sales Engineer 1954-1955 Manager, Special Engineering Sales 1955-1959 Manager, Applied Engineering 1958-1963 Director, Research Internal Operations 1963 Director, Distribution Products Department 1963 Co-Founder, Coates and Welter Instrument Corporation Nanometrics Incorporated 1975 Founder 1975-1996 President 1975-1997 Chief Executive Officer 1989 Secretary 1999-present President, Vincent J. Coates Foundation Honors 1995 Semiconductor and Equipment and Materials International Award ABSTRACT Vincent J. Coates begins the interview with a description of his childhood in Bridgeport, Connecticut. Having been too young to join the military at the start of World War II, Coates got a job filing machine parts and began attending the Bridgeport Engineering Institute. He later applied the knowledge he had gained at the Institute on the Navy’s Officer Candidate School exam, earning him the highest score in Connecticut. At the behest of his mother, Coates attended Yale University, majoring in mechanical engineering. After a short tour in the Navy, Coates took a job at Chance-Vought Aircraft. He worked there for two years, but when he learned that the company planned to move to Texas, he decided to seek employment elsewhere. In 1948, he was hired at Perkin-Elmer Corporation; a job that was to have a great impact on his life. He began as a project engineer, but when John U. White left suddenly in 1949, the responsibility for their project, the Model 21, fell completely on Coates’s shoulders. He was undaunted, however, and after extensive research of infrared spectroscopy, Coates, with the help of John Atwood, finished the instrument. After the original Model 21 became a proven success, Coates began developing accessories for the instrument, such as the Prism Interchange Unit, to expand its potential market. Eventually, he was moved to California to head their Ultech Company subsidiary. Coates decided to leave Perkin-Elmer after the president decided to shut down Coates’s field-emission scanning electron microscopes [FESEM] project at the request of Hitachi. Having realized the potential of FESEMs, Coates and Len Welter started the Coates & Welter Instrument Company to produce the world’s first commercial FESEMs. Though they had a good business, they soon ran out of money and were acquired by the American Optical Corporation [AO]. Coates worked for AO briefly, and then he stared his own business, Nanometrics Incorporated, in 1975. At first, Coates attempted to build and sell a Raman spectrophotometer system, but the instruments resolution proved inadequate for measuring Raman lines. He then adapted his instrument for measuring fluorescent-tagged samples. He had assumed the instrument would be useful for biological research, but nobody was interested initially. He finally, and unexpectedly, found a niche for the instrument in the measurement of integrated circuits. His Microspot Film-Thickness-Measurement Systems became essential for the manufacture of advanced microchips, and his company became extremely successful as a result. Currently, Coates shares his successes with the scientific community through the philanthropy of the Vincent J. Coates Foundation. INTERVIEWERS David C. Brock is Program Manager for Educational and Historical Services at the Chemical Heritage Foundation in Philadelphia. He is currently a Ph.D. candidate in the History Department, Program in the History of Science at Princeton University. In 1995, Mr. Brock received his M.A. in the History of Science from Princeton University and in 1992, he earned a M.Sc. in the Sociology of Scientific Knowledge from the University of Edinburgh. TABLE OF CONTENTS 1 Childhood and Education Growing up in Bridgeport, Connecticut. Grammar school and high school during World War II. Attending the Bridgeport Engineering Institute. Working at the Bridgeport Brass Company. Yale University. Navy Officer Training School. Naval tour. Family. Warren Harding High School. The Navy’s “V-12” program. 4 Early Career Working at Chance-Vought Aircraft. Designing the F7U’s hydraulic system. Application to Perkin-Elmer Corporation and brief history of the company. Interview with John U. White. Working on the Model 12 and Model 21. The 1950 Pittsburg Conference. Redesigning the Model 21 and creating accessories for the instrument. Designing standard charts for “pure spectra.” Paul Wilks and Van Zandt Williams disinterest in Coates’s work. First meeting with Dick Perkin. The early significance of the Model 21 to Perkin- Elmer. 10 Expanded Role at Perkin-Elmer Working in Perkin-Elmer’s sales department. Designing the Interchange Unit for the Model 21. Working in international relations. Competing with Beckman Instrument’s first infrared [IR] spectrophotometer. Introduction of the Model 21A. Infighting over the Model 21’s importance versus the Model 21C. Hiring Abe Savitsky. The Model 13. Redesigning the Model 13 as the 13U. Developing an IR microscope attachment for the Model 85. Working with Abe Offner. Reflections on the development of the NanoSpec 20 IR. Sadtler’s compilation of “pure spectra.” Redesigning instruments for John White. Development of the Model 139. 18 Trip to Japan Hitachi’s superior mass spectrometer. Finding a market for Hitachi’s instrument. Klaus Biemann. Selling Hitachi electron microscopes. Fixing the Hitachi mass spectrometer. The deal between Perkin-Elmer and Hitachi. Designing the Model 270. The disintegration of Perkin-Elmer’s relationship with Hitachi. Working with Hitachi in California. Development of the field- emission scanning electron microscopes [FESEM]. Quitting Perkin-Elmer. 23 Starting His Own Business Len Welter. Coates & Welter Instrument Corporation. American Optical Corporation buys-out Coates’s company. The applications lab at Perkin- Elmer. Harry Hausdorff and the expansion of Perkin-Elmer in to Europe. Alan Walsh and atomic absorption. Directing Perkin-Elmer’s research and development subsidiaries in Europe. Peter B. Fellgett. Move to California. The Ultech Company. American Optical’s conservative business practices. Developing a Raman SEM instrument for Perkin-Elmer. 32 Nanometrics Incorporated Development of Nanometrics Raman spectrophotometer systems. Working with Professor Michael Bernes. Joseph DeRisi and SARS. Selling to integrated-circuit manufacturers. Early integration of computer technology in to Nanometrics’s instruments. Development of low-voltage SEMs. The shift in the electronics market from the United States to Asia. The European semiconductor market. Coates’s philanthropy. 40 Chester Nimitz and Perkin-Elmer Nimitz’s influence on Perkin-Elmer. Van Zandt Williams. Paul Wilks. The future of mass spectrometry. Protein analysis. Gas chromatography at Perkin-Elmer. Marcey Golay. Nathaniel Brenner. Temperature-programmed gas chromatographs. Designing the triple-stage gas chromatograph. Involvement in ultraviolet spectrometry at Perkin-Elmer. Development of the Trinon and Bi-Chromator Analyzers. Making the Trinon successful. Competition for work at Dow Chemical. 47 Notes 49 Appendixes I: Publications II: Patents Issued III: The Perkin-Elmer Instrument News (1960): 2-3. IV: Spettroscopia E Chromatografia Di Gas: International Section (1958): 10- 11. V: Vincent J. Coates, Abe Offner, and E. H. Siegler, Jr., “Design and Performance of an Infrared Microscope Attachment,” Journal of the Optical Society of America 43, no. 11 (November 1953):984-989. VI: Vincent J. Coates, “A Variable Thickness Liquid Absorption Cell,” The Review of Scientific Instruments 22, no. 11 (November 1951): 853-854. VII: PEN 9, no. 10 (November 1961): 1, 8. VIII: Photograph of Coates at an International Sales Meeting [Date and publication unknown] IX: Photographs of Coates at Hitachi Perkin-Elmer, Ltd. Meeting held in Japan [Date and publication unknown] X: Vincent J. Coates, “Differential Knob Device,” U.S. Patent # 2,658, 395. Issued 10 November 1953. XI: Bryce Crawford, Jr., “Chemical Analysis by Infrared,” Scientific American (October 1953):42-48. XII: “Comparison of Various Infrared Spectrometric Systems” XIII: “Laboratory of the Month,” Analytical Chemistry [Date unknown] XIV: Perkin-Elmer Instrument News for Science and Industry 6, no. 3 (Spring 1955):1, 3-4, 8. XV: Vincent J. Coates and Nathaniel Brenner, “Fuel Gas Analysis by Chromatography?” Petroleum Refiner 35, no. 11 (November 1956): 197-201. XVI: Vincent J. Coates and Robert Anacreon, “Model 21 Ordinate
Recommended publications
  • China's Progress in Semiconductor Manufacturing Equipment

    China's Progress in Semiconductor Manufacturing Equipment

    MARCH 2021 China’s Progress in Semiconductor Manufacturing Equipment Accelerants and Policy Implications CSET Policy Brief AUTHORS Will Hunt Saif M. Khan Dahlia Peterson Executive Summary China has a chip problem. It depends entirely on the United States and U.S. allies for access to advanced commercial semiconductors, which underpin all modern technologies, from smartphones to fighter jets to artificial intelligence. China’s current chip dependence allows the United States and its allies to control the export of advanced chips to Chinese state and private actors whose activities threaten human rights and international security. Chip dependence is also expensive: China currently depends on imports for most of the chips it consumes. China has therefore prioritized indigenizing advanced semiconductor manufacturing equipment (SME), which chip factories require to make leading-edge chips. But indigenizing advanced SME will be hard since Chinese firms have serious weaknesses in almost all SME sub-sectors, especially photolithography, metrology, and inspection. Meanwhile, the top global SME firms—based in the United States, Japan, and the Netherlands—enjoy wide moats of intellectual property and world- class teams of engineers, making it exceptionally difficult for newcomers to the SME industry to catch up to the leading edge. But for a country with China’s resources and political will, catching up in SME is not impossible. Whether China manages to close this gap will depend on its access to five technological accelerants: 1. Equipment components. Building advanced SME often requires access to a range of complex components, which SME firms often buy from third party suppliers and then assemble into finished SME.
  • American Semiconductor Equipment Technologies

    American Semiconductor Equipment Technologies

    t, f • American Semiconductor Equipment Technologies American Semiconductor Equipment Technologies 6110 Variel Avenue Woodland Hills, California 91367 Telephone: (818) 884-5050 (Thousands of Dollars) Balance Sheet (Fiscal year ending 3/31/86) Working Capital $4,375 Long-Term Debt $2,000 Net Worth $3,446 Current Liability to Net Worth 183.75% Current Liability to Inventory 131.89% Total Liability to Net Worth 241.79% Fixed Assets to Net Worth 241.79% Total Employees 150 Operating performance data are not available Source: Dun & Bradstreet SEMS Industry Econometrics © 1987 Dataquest Incorporated May American Semiconductor Equipment Technologies (Material in this section has been compiled from Dun & Bradstreet financials, Dataquest's SEMS data base, and company literature supplied by ASET. For more information on this start-up company, Dataguest clients are invited to use their inquiry privileges.) > ir THE COMPAMY Background American Semiconductor Equipment Technologies (ASET) was formed in February 1986 to pursue both ongoing and newly developing markets for lithographic systems. The Company was organized by Greg Reyes and Ralph Miller with funding of $3.9 million from four venture capital firms. ASET's product line includes i-line wafer steppers, g-line wafer steppers, substrate steppers, standalone image repeaters and pattern generators, and combination systems. 0perat,^7"g aT«d Strategy ASET Corporation currently serves the semiconductor equipment markets in the image patterning area. The Company also looks to develop business in alternate industries, including laser cards, flat panel displays, and hybrid substrates. ASET maintains research efforts directed toward expanding micro- lithographic technology. ASET acquired the assets of TRE Corporation's wafer stepper and pattern generation manufacturing unit early in 1986.
  • A Q U I F E R P R O T E C T I O N a R E a S N O R W a L K , C O N N E C T I C

    A Q U I F E R P R O T E C T I O N a R E a S N O R W a L K , C O N N E C T I C

    !n !n S c Skunk Pond Beaver Brook Davidge Brook e d d k h P O H R R O F p S o i d t n n l c t u i l R a T S d o i ll l t e e lv i d o t R r r d r l h t l l a H r n l t r M b a s b R d H e G L R o r re R B C o o u l e t p o n D o e f L i s Weston Intermediate School y l o s L d r t e Huckleberry Hills Brook e t d W d r e g Upper Stony Brook Pond N L D g i b R o s n Ridgefield Pond a t v d id e g e H r i l Country Club Pond b e a R d r r S n n d a g e L o n tin a d ! R d l H B n t x H e W Still Pond d t n Comstock Knoll u d a R S o C R k R e L H d i p d S n a l l F tt h Town Pond d l T te r D o e t l e s a t u e L e c P n n b a n l R g n i L t m fo D b k H r it to Lower Stony Brook Pond o r A d t P n d s H t F u d g L d d i Harrisons Brook R h e k t R r a e R m D l S S e e G E o n y r f ll H rt R r b i i o e n s l t ld d d o r l ib l a e r R d L r O e H w i Fanton Hill g r l Cider Mill School P y R n a ll F i e s w L R y 136 e a B i M e C H k A s t n d o i S d V l n 3 c k r l t g n n a d R i u g d o r a L 3 ! a l r u p d R d e c L S o s e Hurlbutt Elementary School R d n n d D A i K w T n d o O n D t f R l g d R l t ad L i r e R e e r n d L a S i m a o f g n n n D d n R o t h n Middlebrook School ! l n t w Lo t a 33 i n l n i r E id d D w l i o o W l r N e S a d l e P g n V n a h L C r L o N a r N a S e n e t l e b n l e C s h f ! d L nd g o a F i i M e l k rie r id F C a F r w n P t e r C ld l O e r a l y v f e u e o O n e o a P i O i s R w e t n a e l a n T t b s l d l N l k n t g i d u o e a o R W R Hasen Pond n r r n M W B y t Strong
  • California Institute Technology

    California Institute Technology

    VOLUME XXXV NUMBER 113 BULLETIN OF THE CALIFORNIA INSTITUTE OF TECHNOLOGY ANNUAL CATALOGUE PASADENA, CALIFORNIA DECEMBER, 1926 C!tutttttttn Page COLLEG~: C.\ LE XD"\R _________________________________________________________________________________ 5 OFFICEl": The Board of Trustees__________________________________________________________________ 7 Officers of the Board of Trustees________ _____________________ 8 Administrative Officers of the Institute____ ______________________ 8 •\dvbory Coulldl__ _________________ 9 Research Associates________________________________________________ 9 Officers and Committees of the Faculty____________________________________ 10 STAFF OF IXSTRUCTIOX AND RESEARCI-L______________________________________________ 11 HISTORICAL SKETCH _________ _ 40 EDUCATIONAL POUCIES ______ _ '13 REQUIREMENTS FOR AD;\IISSION ___________________________ _ 47 BUILDIXGS AND E:n:-C_\TIONAL F_\CILITIF.S ______ _ 53 EXPENSES ______________________________ _ 60 REGISTRATIOX AND GEXER.\L REGUL.\TIONS 63 SCHOLASTIC GR.\DIXG .'C\'Il REQUlREiHEC\'TS 65 EXTRA-CURRICULUM OPI'OR'lTXITIES 71 SCHOLARSHIPS .\NIl PHTZES 75 NEW COURSES IX AEJWN.\lTTICS NEW COURSES IN GEOLOG" AXD P.\T.EONTOLOG, 86 GRADUATE STUDY AND RESE-UtCI[: Graduate Staff __________________________ _ 99 Information and Regulations ___________ _ 96 Description of Ad,-anced Subjects __ III Publications ____ ._ 128 DESCRIPTION OF UNDEHGRADUATE AXD FIFTH-YE.\R COURSES: Engineering Courses _________ . _________________________ _ 135 Courses in Science______________________________________
  • Eightieth Annual Commencement June 14J 1974

    Eightieth Annual Commencement June 14J 1974

    Eightieth Annual Commencement June 14J 1974 CALIFORNIA INSTITUTE OF TECHNOLOGY CALIFORNIA INSTITUTE OF TECHNOLOGY Eightieth Annual Commencement FRIDAY MORNING AT TEN-THIRTY O 'CLOCK JUNE FOURTEENTH, NINETEEN SEVENTY-FOUR Academic Procession Chief Marshal, William R. Cozart, Ph.D. Assistant Marshals Marshall Hall, J L, Ph.D. Jon Mathews, Ph.D. Robert V. Langmuir, Ph.D. Vito A. Vanoni, Ph.D. MARCHING ORDER CANDIDATES FOR THE DEGREE OF BACHELOR OF SCIENCE CANDIDATES FOR THE DEGREE OF MASTER OF SCIENCE CANDIDATES FOR THE DEGREE OF ENGINEER CANDIDATES FOR THE DEGREE OF DOCTOR OF PHILOSOPHY THE FACULTY THE CHAIRMEN OF DIVISIONS THE DEANS THE PROVOST THE TRUSTEES THE COMMENCEMENT CHAPLAIN THE PRESIDENT THE CHAIRMAN OF THE BOARD OF TRUSTEES 2 Program PRESIDING R. Stanton Avery, LL.D . Chairman of the Board of Trustees PRELUDE. Caltech Convocation Brass and Percussion Choir William Nicholls, M.M., Director Three pieces by Giovanni Gabrieli: 1.) Canzon Primi Toni. 2) Sonata pian' e forte. 3) Canzona per Sonare No. 1. "La Spiritata." AN INTRODUCTION TO COMMENCEMENT David C. Elliot, Ph.D. Secretary of the Faculty PROCESSIONAL . Leslie J. Deutsch, Class of 1.976, Organ and The Brass and Percussion Choir INVOCA TION . Rabbi Edgar F. Magnin, D.D. Wilshire Boulroard Temple, Los Angeles COMMENCEMENT ADDRESS "Unscientific Evidence" Richard P. Feynman, Ph.D., Nobel Laureate Richard Chace Tolman Professor of Theoretical Physics, Caltech MUSICAL SELECTIONS . The Caltech Glee Club Olaf M. Frodsham, A.M., Director CONFERRING OF DEGREES Harold Brown, Ph.D., D. Eng., LL.D. President, California Institute of Technology PRESENT A TION OF CANDIDATES FOR DEGREES For the Degree of Bachelor of Science James J.
  • Food Access– Stamford, CT Demographic & Survey Research

    Food Access– Stamford, CT Demographic & Survey Research

    Food Access– Stamford, CT Demographic & Survey Research Jonathan Delgado MPA ‘19 Ronald Clarke MPA ‘19 Elizabeth Anderson MPA ‘18 Jonathan Raj MPA ‘19 Erin Monahan ‘18 Joshua Singleton ‘18 Julia Huber ‘18 Lina Foncello ‘19 Community Based Participatory Research Initiative FAIRFIELD UNIVERSITY | 1073 N BENSON RD, FAIRFIELD, CT 06824 Community Based Participatory Research Initiative and United Way of Western CT Table of Contents I. Mission/Executive Summary ................................................... 1 II. Maps ....................................................................................... 6 III. SES Indicator ........................................................................ 19 IV. Transportation ..................................................................... 21 V. Statistics ............................................................................... 24 VI. General Map and Survey Findings ....................................... 25 VII. Recommendations.............................................................. 26 VII. References .......................................................................... 28 I. Mission/Executive Summary The purpose of this research was to visually display the population distribution of, as well as linkages between our variables; with the hopes that our maps would legibly illustrate correlations and patterns between specific demographic identifiers. Thus, in doing so, the maps would highlight areas of acute need that are perhaps being unmet, and, further, prompt one to reflect
  • Silicon Valley Group

    Silicon Valley Group

    Silicon Valley Group ANNUAL REPORT AND FORM 10-K Silicon Valley Group Enabling integrated circuit manufacturers to win the productivity race by providing leading-edge technology products that maximize yield through innovative design is the driving force of Silicon Valley Group. Our mission is fulfilled when products are delivered and installed on time and top-of-the-line service and support are provided to help customers achieve their productivity objectives. SILICON VALLEY GROUP TECHNOLOGY LEADER We are prepared for growth. a letter to our shareholders AS THE SEMICONDUCTOR GROWTH CYCLE GAINS MOMENTUM, SVG IS WELL POSITIONED FOR THE FUTURE. As the semiconductor industry goes, so too does SVG. The recent industry downturn, which started in 1998 and continued into 1999, presented major hurdles for Silicon Valley Group and its customers. It particularly impacted SVG at a time when our lithography manufacturing capacity and other capabilities had been increased to take advantage of what had been predicted to be a period of unprecedented growth. Managing a downturn is no easy feat. Although our return to profitability in the fourth quarter of the fiscal year was not as vigorous as we would have liked, I am pleased to say that SVG has risen to the challenge. We focused on the long-term health of the Company with cash preservation and investments in research and development (R&D). Our business is cyclical in nature, and I believe that the current upward momentum we are experiencing in the industry is a very positive indicator for the future. This was a very difficult year for SVG.
  • Optical Lithography … 40 Years and Holding

    Optical Lithography … 40 Years and Holding

    Copyright 2007 Society of Photo-Optical Instrumentation Engineers. This paper was published in SPIE Vol. 6520 (2007) p. 652004, and is made available as an electronic reprint with permission of SPIE. Single print or electronic copies for personal use only are allowed. Systematic or multiple reproduction, or distribution to multiple locations through an electronic listserver or other electronic means, or duplication of any material in this paper for a fee or for commercial purposes is prohibited. By choosing to view or print this document, you agree to all the provisions of the copyright law protecting it. Invited Paper Optical Lithography … 40 years and holding John H. Bruning Corning Tropel Corporation Fairport, NY 14450 ABSTRACT Optical lithography has been the dominant patterning process for semiconductor fabrication for over 40 years. The patterning process evolved initially from methods used in the printing industry, but as integrated circuits became more complex, and as device geometries shrank, sophisticated new imaging methods evolved. Today’s optical lithography systems represent the highest resolution, most accurate optical imaging systems ever produced. This remarkable evolutionary process continues to this day, paced by “Moore’s Law”. The evolutionary development of lithography systems over the last 40 years is reviewed along with a brief discussion of options for the future. Keywords: lithography history, photolithography, optical lithography, immersion, reduction lithography 1. INTRODUCTION The production of microelectronics has made incredible strides over a period of nearly 50 years. The main driver of lithography improvements is reduced device cost. This has come about through improvements in resolution, resulting in more chips per wafer, higher performance devices, and improvements in productivity, all of which continue to reduce the cost per function in integrated circuits.
  • Stamford Neighborhood Traffic Calming Final Report Appendices

    Stamford Neighborhood Traffic Calming Final Report Appendices

    Stamford Neighborhood Traffi c Calming Final Report Appendices Table of Contents Appendix A - Neighborhood Plans Bulls Head Castlewood/Cedar Heights Cove Downtown East Side Glenbrook Hubbard Heights Newfi eld North Stamford Roxbury Shippan South End Springdale Waterside West Side Westover Appendix B - Focus Group and Charrette Minutes Appendix C - Traffi c Calming Committees Appendix D - Probable Construction Costs APPENDIX A NEIGHBORHOOD PLANS Bulls Head The opening charrette for the Bull Head neighborhood was held on October 23, 2007 at Rippowam Middle School. Residents who attended identifi ed pedestrian safety as an issue throughout the entire neighborhood. The intersection of Prospect Street, Hoyt Street, Strawberry Hill Avenue, Grove Street, and Hillandale Avenue was described as being particularly confusing and unfriendly for pedestrians. Other areas singled out as being in need of pedestrian safety improvements are Oaklawn Avenue, Strawberry Hill Avenue, High Ridge Road, Long Ridge Road, and the intersection of Bedford Street and Summer Street. Speeding was noted to be a concern on Oaklawn Avenue, Halpin Avenue, Fourth Street, Washington Boulevard, Bedford Street, Terrace Avenue, McClean Avenue, and Cross Road. Participants identifi ed the Halpin Road at High Ridge Road and Halpin Avenue at Oaklawn Avenue as intersections where traffi c safety was an issue. On June 10, 2008 a closing charrette for the neighborhood was conducted at Cloonan Middle School. Fifth Street was singled out as an additional location where speeding was an issue. Residents also recommended that Fifth Street and Fourth Street be treated simultaneously so that the speeding issue is not simply shifted from one street to the other.
  • Available Immediately

    Available Immediately

    AVAILABLE IMMEDIATELY By Order of ON Semiconductor, Assets Surplus to On-Going Operations 6" 150mm and 4" 100mm Semiconductor Fabrication, Lithography, Inspection and Facility Equipment Piešťany, Slovakia 31555 West Fourteen Mile Road, Suite 301 Farmington Hills, Michigan 48334 USA Ph +1 248-254-9999 • Fx +1 248-254-9995 www.hilcoind.com A Hilco Global Company Vested in Your Success AVAILABLE IMMEDIATELY By Order of ON Semiconductor, Assets Surplus to On-Going Operations Vrbovská cesta 2617/102 Piešťany, Slovakia All Assets Available Prior to Auction On-Going Private Treaty/Negotiated Sale to be Followed with an On-Line Auction Closing January 30, 2014 For more information, please contact Matthew Hoskins +44 (0)113 3945 963 [email protected] John Ward +1 714 393 5111 [email protected] 2 To schedule an auction, please call Hilco Industrial at +1 616-732-1800 6” 150mm ETCHERS 6” 150mm ETCHERS 3 – LAM 4420 6” 150MM PLASMA ETCHERS 2 – LAM AUTO ETCH 590/490 6” 150MM PLASMA ETCHERS Partial Listing Only, Please Visit Our Website 2 – TEGAL PLASMA 900E 6” 150MM PLASMA ETCHERS www.hilcoind.com For Complete Lot Catalog For more information, please visit us on the web at www.hilcoind.com 3 4” 100mm ETCHERS 4” 100mm ETCHERS 4 – AMAT P5000 4” 100MM CVD TEOS PLASMA ETCHERS - SOLD 2 – AMAT AME-8100 4” 100MM PLASMA ETCHERS 1 – TRIKON OMEGA 201 4” 100MM PLASMA ETCHER - SOLD 4 To schedule an auction, please call Hilco Industrial at +1 616-732-1800 6” 150mm SEMICONDUCTOR TOOLS 6” 150mm SEMICONDUCTOR TOOLS 4 – NIKON NSR-1755G7A 6” 150MM STEPPERS
  • Stepper Training Manual

    Stepper Training Manual

    Stepper Training Overview A Wafer Stepper is a reduction projection exposure tool. An image formed in a chrome-on-glass photomask, called a Reticle, is reproduced on a wafer one “die” at a time by projecting the reticle image onto a wafer positioned below the reduction lens. The wafer, which is coated with a UV light-sensitive polymer film called Photoresist, is moved from one die position to the next by a motorized stage assembly. The reticle image size, up to 88mm x 88mm, is reduced 5 or 4 times by the projection lens making individual die exposures as large as 22mm x 22mm. The positioning of the wafer for exposure under the lens is computer controlled using a laser interferometer system for very high accuracy. Alignment for layer-to-layer overlay can be performed with similar precision. Placement, exposure, and focusing of each exposure is programmable with all operations performed automatically. History Steppers were created to address the problems limiting yield of working devices or “good die” in semiconductor wafer manufacturing. Before this Mask Aligners were exclusively used in photolithographic manufacturing processes. A mask aligner mounts a fixed photomask and has a movable wafer chuck that can bring the wafer and mask into tight contact. Alignment systems are used to view alignment marks on the wafer through the photomask. The photoresist coated wafer is then exposed in one action. However, contact mask aligners could not achieve adequate alignment across wafers as they had no ability to compensate for scaling and orthogonality changes caused by processing or introduced by mask making variations.
  • Interview with John D. Roberts

    Interview with John D. Roberts

    JOHN D. ROBERTS (1918-2016) INTERVIEWED BY RACHEL PRUD’HOMME February-May, 1985 Photograph by Chris Tschoegl. Courtesy Caltech’s Engineering & Science ARCHIVES CALIFORNIA INSTITUTE OF TECHNOLOGY Pasadena, California Subject area Chemistry, nuclear magnetic resonance spectroscopy Abstract Interview in seven sessions, February–May 1985, with John D. Roberts, Institute Professor of Chemistry (now emeritus) in the Division of Chemistry and Chemical Engineering. Family background, early education, Los Angeles; Caltech open houses in early 1930s. Studies chemistry, UCLA (BA 1941). Graduate work Penn State University with F. Whitmore; return to UCLA, war-related research; theoretical organic chemistry with S. Winstein (PhD 1944). 1945, NRC Fellowship, Harvard; R. B. Woodward. Assistant professorship MIT; recollections of A. Cope, A. A. Morton; L. Pauling’s theory of molecular resonance; molecular orbital theory of R. S. Mulliken. Research on carbonium ions, carbon cations with R. Mazur; dispute with S. Winstein. Consultant at DuPont, starting 1950. Guggenheim, Caltech, 1952; joins chemistry faculty 1953. H. Lucas, L. Pauling, other colleagues. Guggenheim to England. J. H. Sturdivant, V. Schomaker, D. Semenow, G. Whitesides. Election (1956) to NAS; heads http://resolver.caltech.edu/CaltechOH:OH_Roberts_J chemistry section; NAS response to W. Shockley and R. Lewontin affairs. NSF chemistry advisory panel (1957-1962); Mohole Seismological Drilling Project; faculty salaries. Writes Nuclear Magnetic Resonance (1959), Basic Principles of Organic Chemistry (1964); W. A. Benjamin; collaboration with M. B. Caserio on Basic Principles of Organic Chemistry; writes Modern Organic Chemistry. NMR at Caltech; construction of NMR spectrometer lab; carbon-13 experiments; work of F. Wiegert, K. Kanamori; E. Swift, division chairman; H.