Aligned Carbon Nanotube Carpets on Carbon Substrates for High Power Electronic Applications

Total Page:16

File Type:pdf, Size:1020Kb

Aligned Carbon Nanotube Carpets on Carbon Substrates for High Power Electronic Applications Aligned Carbon Nanotube Carpets on Carbon Substrates for High Power Electronic Applications A dissertation submitted in partial fulfillment of the requirements for the degree of Doctor of Philosophy By Betty Tun-Huan Quinton M.S. Egr., Wright State University, 2008 B.S., University of Illinois at Chicago, 2006 2016 Wright State University WRIGHT STATE UNIVERSITY GRADUATE SCHOOL April 25, 2016 I HEREBY RECOMMEND THAT THE DISSERTATION PREPARED UNDER MY SUPERVISION BY Betty Tun-Huan Quinton. ENTITLED Aligned Carbon Nanotube Carpets On Carbon Substrates For High Power Electronic Applications. BE ACCEPTED IN PARTIAL FULFILLMENT OF THE REQUIREMENTS FOR THE DEGREE OF Doctor of Philosophy. Sharmila M. Mukhopadhyay, Ph.D. Dissertation Director Dr. Frank W. Ciarallo, Ph.D. Director, Ph.D. in Engineering Program Robert E. W. Fyffe, Ph.D. Vice President for Research and Dean of the Graduate School Committee on Final Examination Sharmila M. Mukhopadhyay, Ph.D. Hong Huang, Ph.D. P. Terrence Murray, Ph.D. James D. Scofield, Ph.D. Henry Daniel Young, Ph.D. Abstract Quinton, Betty Tun-Huan. Ph.D., Engineering Ph.D. Program, Wright State University, 2016. Aligned Carbon Nanotube Carpets On Carbon Substrates for High Power Electronic Applications. One of the driving forces behind nanotechnology research is the miniaturization of electronic devices. Electrical and thermal transport properties of device materials at micrometer and nanometer scales become very important in such applications. Carbon materials, especially carbon nanotubes (CNTs), have exceptionally low density and superior electrical, thermal, and mechanical properties. Vertically aligned CNTs attached to lightweight carbon substrates may hold the key to fully use these outstanding properties. However, the majority of studies reported to date involve either loosely unattached CNTs or CNTs attached to traditional electronic grade silicon, which have limited use in lightweight electronic components. Studies of CNT arrays attached to carbon substrates are extremely scarce, but if successful, such a composition could lead to unprecedented lightweight electronic devices with superior electrical and thermal transport properties. This dissertation is aimed at performing detailed investigation of such structures. This work investigates the synthesis-structure-property relationships of CNT arrays attached to carbon surfaces relevant to power electronic applications. Several detailed investigations were performed to achieve the goal of creating multiscale combination materials and to test their feasibility as high power electronic devices. Background iii studies were piloted to determine the most practical growth technique and growth parameters in order to achieve dense CNT growth. Floating catalyst chemical vapor deposition was determined to be the most effective, scalable, and reliable growth method. In addition, an oxide buffer layer was deemed necessary for dense CNTs growth on carbon substrate. Several oxides were compared in order to determine the most suitable for CNTs growth while providing superior thermal properties. Among the buffer oxides investigated in this study, the ALD Al2O3 buffer layer provided the fastest CNT nucleation and most uniform size distribution. However, Al2O3 buffer layer was plagued by adhesion issues, which may limit future applications. Plasma SiO2 offers a slower initial nucleation rate, but yields the tallest carpet height in identical growth conditions, and also appears to be the most stable and repeatable. Thermal properties investigations were conducted on the final products, which consisted of aligned CNTs arrays of different carpet heights on carbon substrates. Observations show that the thermal resistance of the CNT array varies linearly with CNT carpet height, as expected. This variation was used to estimate the thermal conductivity of multi-walled nanotube in the carpet, and found to be approximately 35W/m-K. This value shows promise that such lightweight structure can replace current commercially available products. This dissertation will reveal key results and discuss the investigations from the following areas: comparing chemical vapor deposition growth techniques, the importance of oxide buffer layer on carbon substrates, the effect of buffer layer composition, structure and iv thickness on CNT growth, and the feasibility of such lightweight structures for power electronics through thermal analysis investigations. v Table of Contents Abstract .......................................................................................................................... iii Table of Contents ........................................................................................................... vi List of Figures .............................................................................................................. xiii List of Tables ............................................................................................................... xvii List of Equations ......................................................................................................... xvii Acknowledgements .................................................................................................... xviii Dedication ..................................................................................................................... xx Section I: Introduction and Background ................................................................... xxvi CHAPTER 1 Introduction ............................................................................................... 1 1.1 Introduction ........................................................................................................... 1 1.2 Motivation ............................................................................................................. 3 1.3 Scope and Objectives ............................................................................................. 6 CHAPTER 2 Background ............................................................................................... 8 2.1 Background and literature reviews ........................................................................ 8 2.2 Significance of Carbon and Its Allotropes ............................................................ 9 2.3 Diamond versus Graphite .................................................................................... 11 2.4 Carbon Nanotube ................................................................................................. 13 2.4.1 Physical Properties of CNTs ......................................................................... 15 2.4.1.1 Electrical properties: .............................................................................. 15 2.4.1.2 Thermal properties: ................................................................................ 16 2.4.1.3 Mechanical properties: ........................................................................... 16 2.5 Possible Applications with CNTs ........................................................................ 17 2.6 Carbon Materials for High Power Electronics Applications ............................... 18 2.6.1 sp3 Carbon Diamond ................................................................................ 18 2.6.2 sp2 carbon Graphitic and Vitreous ........................................................... 19 2.7 History of Buffer Layer Usage for CNT Growth ................................................ 20 2.7.1 Background: Evolution of buffer layers ....................................................... 20 2.7.2 Pure Metallic buffer: ..................................................................................... 21 2.7.3 Alloy Metallic buffer: ................................................................................... 21 2.7.4 Non-metallic buffer:...................................................................................... 23 vi 2.7.5 Critical buffer layer thickness: ...................................................................... 23 CHAPTER 3: Materials and Techniques Used In This Investigation ........................... 25 3.1 Materials used as substrates ................................................................................. 25 3.1.1 Dense carbon (sp3) Diamond Substrates: ................................................ 25 3.1.2 Lightweight carbon (sp2) materials graphite, CNT, carbon foams .......... 27 3.1.2.1 Pressed Graphite:.................................................................................... 27 3.1.2.2 RVC foam: ............................................................................................. 28 3.1.2.3 Highly Oriented Pyrolytic Graphic (HOPG) from SPI, Inc: .................. 30 3.1.2.4 Model carbon samples ............................................................................ 32 3.2 Metals Catalysts Materials: ................................................................................. 33 3.3 Oxide Buffer Layer Materials and Comparison: ................................................. 34 3.3.1 Oxide Materials for the Investigation ........................................................... 34 3.3.1.1 Alumina (Al2O3):.................................................................................... 35 3.3.1.2 Silica (SiO2): .......................................................................................... 35 3.3.2 Formation of Oxide Buffer Layer Materials ................................................
Recommended publications
  • Chlorotrimethylsilane
    Chlorotrimethylsilane Health-based recommended occupational exposure limit Gezondheidsraad Voorzitter Health Council of the Netherlands Aan de Staatssecretaris van Sociale Zaken en Werkgelegenheid Onderwerp : Aanbieding adviezen over Chloortrimethylsilaan en Butylacetaten Uw kenmerk : DGV/MBO/U-932542 Ons kenmerk : U 2173/AvdB/tvdk/459-D35 Bijlagen : 2 Datum : 15 november 2001 Mijnheer de Staatssecretaris, Bij brief van 3 december 1993, nr. DGV/BMO-U-932542, verzocht de Staatssecretaris van Welzijn, Volksgezondheid en Cultuur namens de Minister van Sociale Zaken en Werkgelegenheid om gezondheidskundige advieswaarden af te leiden ten behoeve van de bescherming van beroepsmatig aan stoffen blootgestelde personen. Per 1 januari 1994 heeft mijn voorganger daartoe een commissie ingesteld die de werkzaamheden voortzet van de Werkgroep van Deskundigen (WGD). De WGD was een door de genoemde Minister ingestelde adviescommissie. Hierbij bied ik u - gehoord de Beraadsgroep Gezondheid en Omgeving - twee publicaties aan van de commissie over chloortrimethylsilaan en butylacetaten. Deze publicaties heb ik heden ter kennisname aan de Minister van Volksgezondheid, Welzijn en Sport en aan de Minister van Volkshuisvesting, Ruimtelijke Ordening en Milieubeheer gestuurd. Hoogachtend, w.g. prof. dr JA Knottnerus Bezoekadres Postadres Parnassusplein 5 Postbus 16052 2511 VX Den Haag 2500 BB Den Haag Telefoon (070) 340 75 20 Telefax (070) 340 75 23 Chlorotrimethylsilane Health-based recommended occupational exposure limit report of the Dutch Expert Committee on Occupational Standards, a committee of the Health Council of The Netherlands to the Minister and State Secretary of Social Affairs and Employment No. 2001/05OSH, The Hague, 15 November 2001 The Health Council of the Netherlands, established in 1902, is an independent scientific advisory body.
    [Show full text]
  • Advances in the Understanding of Low Molecular Weight Silicon Formation and Implications for Control by Amc Filters
    APPLICATION NOTE ADVANCES IN THE UNDERSTANDING OF LOW MOLECULAR WEIGHT SILICON FORMATION AND IMPLICATIONS FOR CONTROL BY AMC FILTERS Authors: Jürgen M. Lobert, Philip W. Cate, David J. Ruede, Joseph R. Wildgoose, Charles M. Miller and John C. Gaudreau Abstract Introduction Trimethylsilanol (TMS) is a low molecular Silicon containing hydrocarbons are a class of weight / low boiling point silicon-containing, AMC causing persistent degradation of UV exposure airborne contaminant that has received increased tool optical surfaces.1,2,3 Organic silicon compounds interest over the past few years as an important are efficiently split into components by 193 nm UV cause for contamination of optical surfaces in light, commonly used in photolithography appli- lithography equipment. cations. The resulting, reactive silicon atoms can recombine with oxygen to create a layer of amor- TMS is not captured well by carbon-based filters, phous silicon dioxide on optical surfaces such as and hexamethyldisiloxane (HMDSO), even though exposure tool lenses.3,4 This haze layer can be captured well, can be converted to TMS when using difficult to remove and may require lens exchange acidic filter media commonly used for ammonia and polishing, potentially destroying optical coatings removal. TMS and HMDSO coexist in a chemical and creating substantial tool downtime and cost. equilibrium, which is affected by the acidity and The importance of TMS and related refractory moisture of their environment. species in optical degradation is one reason for This publication shows that HMDSO is converted the low level of allowable refractory compounds to TMS by acidic media at concentrations typically (100 ppt) specified in the International Technology found in cleanroom environments.
    [Show full text]
  • Decomposition of Hexamethyldisilazane on Hot Metal Filaments and Its Gas-Phase Chemistry in a Hot-Wire Chemical Vapor Deposition Reactor
    University of Calgary PRISM: University of Calgary's Digital Repository Graduate Studies The Vault: Electronic Theses and Dissertations 2019-09-04 Decomposition of Hexamethyldisilazane on Hot Metal Filaments and its Gas-phase Chemistry in a Hot-wire Chemical Vapor Deposition Reactor Ampong, Eric Ampong, E. (2019). Decomposition of Hexamethyldisilazane on Hot Metal Filaments and its Gas-phase Chemistry in a Hot-wire Chemical Vapor Deposition Reactor (Unpublished master's thesis). University of Calgary, Calgary, AB. http://hdl.handle.net/1880/110892 master thesis University of Calgary graduate students retain copyright ownership and moral rights for their thesis. You may use this material in any way that is permitted by the Copyright Act or through licensing that has been assigned to the document. For uses that are not allowable under copyright legislation or licensing, you are required to seek permission. Downloaded from PRISM: https://prism.ucalgary.ca UNIVERSITY OF CALGARY Decomposition of Hexamethyldisilazane on Hot Metal Filaments and its Gas-phase Chemistry in a Hot-wire Chemical Vapor Deposition Reactor by Eric Ampong A THESIS SUBMITTED TO THE FACULTY OF GRADUATE STUDIES IN PARTIAL FULLFILMENT OF THE REQUIREMENTS FOR THE DEGREE OF MASTER OF SCIENCE GRADUATE PROGRAM IN CHEMISTRY CALGARY, ALBERTA SEPTEMBER, 2019 © Eric Ampong 2019 Abstract Hot-wire chemical vapor deposition (HWCVD) has been used to produce silicon- containing thin films, nanomaterials, and functional polymer coatings for applications in microelectronic and photovoltaic devices. Silicon carbonitride (SiCyNz) thin films, deposited by HWCVD, have found a wide range of applications due to their nonstoichiometric component that exhibits unique properties from a combination of SiC and Si3N4 binary compounds.
    [Show full text]
  • Silicon-Based Reducing Agents
    Gelest, Inc. Silicon-Based Reducing Agents GeraldGerald L. LarsonLarson ViceVice President, President, Research Research && Development Development Materials for the reduction of: Aldehydes Ketones Acetals Ketals Esters Lactones Thioesters Enamines Imines Acids Amides Halides Olefi ns Metal Halides Supplement to the Gelest Catalog, “Silicon, Germanium & Tin Compounds, Metal Alkoxides and Metal Diketonates” which is available on request. 1 AZmax TEL: 035543-1630 • FAX: 03-5543-0312 • www.azmax.co.jp (215) 547-1015 • FAX: (215) 547-2484 • www.gelest.com 127 Gelest, Inc. SILICON-BASED REDUCING AGENTS Introduction The widely used organometallic-based reducing agents can be broadly classifi ed as either ionic, such as lithium aluminum hydride and sodium borohydride, or free-radical such as tri-n-butyltin hydride. The mechanistic differences between these two classes of reducing agents very often complement one another in their ability to reduce organic substrates. Organosilanes have been found to possess the ability to serve as both ionic and free-radical reducing agents. These reagents and their reaction by-products are safer and more easily handled and disposed of than other reagents. Their reductive abilities are accomplished by changes in the nature of the groups attached to silicon, which can modify the character of the Si-H bond in the silane. For example, the combination of a triethylsilane and an acid has proven to be excellent for the reduction of substrates that can generate a “stable” carbenium ion intermediate. Examples of substrates that fall into this class are olefi ns, alcohols, esters, lactones, aldehydes, ketones, acetals, ketals, and other like materials. On the other hand triphenylsilane and especially tris(trimethylsilyl)silane have proven to be free-radical reducing agents that can substitute for tri-n-butyltin hydride.
    [Show full text]
  • Draft Screening Assessment for the Challenge
    Screening Assessment for the Challenge Trisiloxane, octamethyl- (MDM) Chemical Abstracts Service Registry Number 107-51-7 Environment Canada Health Canada March 2015 1 Cat. No.: En14-223/2015E-PDF ISBN 978-1-100-25931-4 Information contained in this publication or product may be reproduced, in part or in whole, and by any means, for personal or public non-commercial purposes, without charge or further permission, unless otherwise specified. You are asked to: • Exercise due diligence in ensuring the accuracy of the materials reproduced; • Indicate both the complete title of the materials reproduced, as well as the author organization; and • Indicate that the reproduction is a copy of an official work that is published by the Government of Canada and that the reproduction has not been produced in affiliation with or with the endorsement of the Government of Canada. Commercial reproduction and distribution is prohibited except with written permission from the author. For more information, please contact Environment Canada’s Inquiry Centre at 1-800- 668-6767 (in Canada only) or 819-997-2800 or email to [email protected]. © Her Majesty the Queen in Right of Canada, represented by the Minister of the Environment, 2015. Aussi disponible en français 2 Synopsis Pursuant to section 74 of the Canadian Environmental Protection Act, 1999 (CEPA 1999), the Ministers of the Environment and of Health have conducted a screening assessment on Trisiloxane, octamethyl-, Chemical Abstracts Service Registry Number1 107-51-7. This substance is referred to by its derived acronym, MDM, in the assessment. MDM was identified as a high priority for screening assessment and included in the Challenge initiative under the Chemicals Management Plan because it was found to meet the ecological categorization criteria for persistence, bioaccumulation potential and inherent toxicity to non-human organisms and was believed to be in commerce in Canada.
    [Show full text]
  • Alkylimido Complexes of Transition Metals
    ALKYLIMIDO COMPLEXES OF TRANSITION METALS A thesis submitted by CINDY JOANNE LONGLEY, B.Sc., A.R.C.S. for the DEGREE OF DOCTOR OF PHILOSOPHY UNIVERSITY OF LONDON Department of Chemistry Imperial College of Science & Technology London SW7 2AY July 1988 ABSTRACT The sodium/amalgam reduction of (B^N^ReCOSiN^) in hexane gives the dimeric rhenium(VI) complex, [(B^N^ReCii-NBu1-)^, which has been structurally characterised. This represents the first full report of a homoleptic transition metal imido complex. The structures of (ButN) 3Re(OSiMe3) and (B^N^ReC^ have also been determined. The latter complex reacts with silver acetate to give (B^N^ReCOAc^. The synthesis of a range of organometallic rhenium(VII) complexes, (ButN) 3Re(aryl) (aryl = o-tol, xylyl, mes, Ph, p-Bu^h), from (Bu^N^ReCOSiN^) and the appropriate Grignard reagent is reported. Treatment of these complexes with HC1 yields the corresponding dichloro-complexes, (B^N ^ReC^aryl). The crystal structure of (B^N^ReC^Ctf-tol) reveals a square pyramidal geometry with one linear and one bent imido ligand, which formally suggests a 16-electron configuration. The solid state structure of (B^N^ReC^Ph shows a trigonal bipyramidal molecule, with equatorial imido groups. The reaction of (B^N ^ReC^ with o-tolylmagnesium bromide gives (B utN) 2Re(0- tol)3, whereas with mesitylmagnesium bromide reduction occurs to produce (ButN) 2Re(mes)2 * This paramagnetic d} species has been oxidised chemically to give [(ButN) 2Re(mes)2]X (X = PF^, OTf). The results of preliminary investigations into the insertion chemistry of these complexes are presented.
    [Show full text]
  • Chemical Inventory
    Name CAS Number SOP Status Supplier Size Qt. Location Received Purchaser Hazards (1,3-bis)2,4,6-trimethylphenyl)-4,5-dihydroimidazol-2-ylidene[2-(i-propoxy)-5-(N,N-dimethyl aminosulfonyl)phenyl]methylene Ru(II) dichloride918870-76-5 100mg 1 Storage # 3 (2-bromoethyl) benzene 98% 103-63-9 100G 2 Storage # 3 (3-aminopropyl)triethoxysilane 919-30-2 Sigma 100 mL 1 Storage #3 Apr-13 Stephanie Flammable, toxic, corrosive (3-aminopropyl)trimethoxysilane 13822-56-5 Sigma 100 mL 1 small fridge May-13 Stephanie Corrosive, irritant (3-iodopropyl)trimethoxysilane 14867-28-8 1 Storage # 2 (3-mercaptopropyl) trimethoxysilane 95% 4420-74-0 25g 1 Shelf # 3 (3-mercaptopropyl)-trimethoxysilane 95% 4420-74-0 25G 2 Storage # 2 (iodomethyl)trimethylsilane 4206-67-1 5mL 1 Storage # 2 (Propan-2-yloxy) benzene 2741-16-4 Enamine 1g 1 Storage # 3 Nov-14 Zach (Trimethylsilyl)methyllithium, 1.0M solution in pentane 1822-00-0 SOP on file-Lithium reagents Aldrich 50ml 1 Large fridge Highly flammable 0.5% Rhodium on 1/8 Alumina pellets 7440-16-6 25g 2 Shelf # 1 1% Pt-Al-1DR 7440-06-4 74292-90-5 0.05kg 1 Shelf # 1 1-(2-hydroxyethyl)-2-pyrolidinone 98% 3445-11-2 5ml 2 Storage # 3 1-(Trimethylsiloxy)cyclohexene 6651-36-1 Alfa 1g 1 Small fridge Mar-14 Bethany 1,1,1,3,3,3-Hexafluoro-2-propanol, 99+% 920-66-1 25g 1 Storage # 4 1,1,1,3,3,3-Hexafluoro-2-propanol-d9, 99 atom%D 38701-74-5 1g 2 Storage #7 1,1,1,3,3,3-hexamethyl-disilane 99.9% 1450-14-2 100mL 2 Storage # 2 1,1,2,2-Tetra chloroethane-D2 (D, 99.6%) 33685-54-0 SOP on file- Acutely toxic chem.
    [Show full text]
  • Hexamethyldisiloxane (HMDS)1 OSPAR Commission 2004
    Hazardous Substances Series ------------------------------------------------------------------------------------------------------------------------------------------- Hexamethyldisiloxane (HMDS)1 OSPAR Commission 2004 1 OSPAR 2007 agreed to deselect Hexamethyldisiloxane (HMDS) from the List of Chemicals for Priority Action (OSPAR 07/24/1, §8.3). OSPAR Commission, 2004: OSPAR background document on hexamethyldisiloxane ____________________________________________________________________________________________ The Convention for the Protection of the Marine Environment of the North-East Atlantic (the “OSPAR Convention”) was opened for signature at the Ministerial Meeting of the former Oslo and Paris Commissions in Paris on 22 September 1992, The Convention entered into force on 25 March 1998. It has been ratified by Belgium, Denmark, Finland, France, Germany, Iceland, Ireland, Luxembourg, Netherlands, Norway, Portugal, Sweden, Switzerland and the United Kingdom and approved by the European Community and Spain. La Convention pour la protection du milieu marin de l'Atlantique du Nord-Est, dite Convention OSPAR, a été ouverte à la signature à la réunion ministérielle des anciennes Commissions d'Oslo et de Paris, à Paris le 22 septembre 1992. La Convention est entrée en vigueur le 25 mars 1998. La Convention a été ratifiée par l'Allemagne, la Belgique, le Danemark, la Finlande, la France, l’Irlande, l’Islande, le Luxembourg, la Norvège, les Pays-Bas, le Portugal, le Royaume-Uni de Grande Bretagne et d’Irlande du Nord, la Suède et la Suisse et approuvée par la Communauté européenne et l’Espagne. © OSPAR Commission, 2004. Permission may be granted by the publishers for the report to be wholly or partly reproduced in publications provided that the source of the extract is clearly indicated. © Commission OSPAR, 2004. La reproduction de tout ou partie de ce rapport dans une publication peut être autorisée par l’Editeur, sous réserve que l’origine de l’extrait soit clairement mentionnée.
    [Show full text]
  • The Nordic Expert Group for Criteria Documentation of Health Risks from Chemicals and the Dutch Expert Committee on Occupational Standards 129
    nr 2002:2 The Nordic Expert Group for Criteria Documentation of Health Risks from Chemicals and The Dutch Expert Committee on Occupational Standards 129. Chlorotrimethylsilane Hans Stouten, Fons Rutten, Iris van de Gevel and Flora de Vrijer Nordic Council of Ministers arbete och hälsa | vetenskaplig skriftserie isbn 91-7045-630-5 issn 0346-7821 http://www.niwl.se/ National Institute for Working Life The National Institute for Working Life is Sweden’s national centre for work life research, development and training. The labour market, occupational safety and health, and work organi- sation are our main fields of activity. The creation and use of knowledge through learning, information and documentation are important to the Institute, as is international co-operation. The Institute is collaborating with interested parties in various develop- ment projects. The areas in which the Institute is active include: • labour market and labour law, • work organisation, • musculoskeletal disorders, • chemical substances and allergens, noise and electromagnetic fields, • the psychosocial problems and strain-related disorders in modern working life. ARBETE OCH HÄLSA Editor-in-chief: Staffan Marklund Co-editors: Mikael Bergenheim, Anders Kjellberg, Birgitta Meding, Bo Melin, Gunnar Rosén and Ewa Wigaeus Tornqvist © National Institut for Working Life & authors 2002 National Institute for Working Life S-112 79 Stockholm Sweden ISBN 91–7045–630–5 ISSN 0346–7821 http://www.niwl.se/ Printed at Elanders Gotab, Stockholm Preface An agreement has been signed by the Dutch Expert Committee on Occupational Standards (DECOS) of the Health Council of the Netherlands and the Nordic Expert Group for Criteria Documentation of Health Risks from Chemicals (NEG).
    [Show full text]
  • Method for Purifying Hexamethyldisiloxane
    turopaiscnes patentamt European Patent Office ® Publication number: 0 277 825 Office europeen des brevets A2 EUROPEAN PATENT APPLICATION (gj) Application number: 88300907.8 © Int. CI.4: C 07 F 7/08 © Date of filing: 03.02.88 Qg) Priority: 03.02.87 JP 23325/87 @ Inventor: Imai, Takeshi 8-18, 2-chome Sakuradai © Date of publication of application : Ichihara-shi Chiba Prefecture (JP) 10.08.88 Bulletin 88/32 Suzuki, Masahiko 1-11, 4-chome Sakuradai @ Designated Contracting States: DE FR GB Ichihara-shi Chiba Prefecture (JP) ® Applicant: Toray Silicone Company, Ltd. Takahashi, Ikuzo 8, 2-chome Muro-machi Nihonbashi 5-3, 5-chome Aobadai Chuo-ku Tokyo 103 (JP) Ichihara-shi Chiba Prefecture (JP) Toida, Shuzo 22-10, 3-chome Sakuradai Ichihara-shi Chiba Prefecture (JP) §) Representative: Lewin, John Harvey et al Elkington and Fife High Holborn House 52/54 High Holborn London WC1V6SH (GB) (§4) Method for purifying hexamethyldisiloxane. (§) A method for purifying impure hexamethyldisiloxane comprising as a major portion hexamethyldisiloxane and as a minor portion a mixture of low-boiling organic solvents, other organosilicon compounds, and odor-producing materials is described. The method comprises (A) first, treating the impure hexamethyldisiloxane with a condensation catalyst to convert the organosilicon compounds to additional hexamethyldisilox- ane; (B) second, washing the treated impure hexamethyldisi- loxane with water; (C) third, separating a water phase from the washed impure hexamethyldisiloxane; (D) fourth, distilling the washed impure hexamethyldisiloxane to yield hexamethyldisi- loxane of enhanced purity; (E) fifth, contacting the hexamethyl- disiloxane of enhanced purity with acid clay at a temperature of greater than about 50° C; and (F) finally, contacting the acid slay treated hexamethyldisiloxane of enhanced purity treated in (E) with activated carbon to yield hexamethyldisiloxane with enhanced purity and minimal unpleasant odor.
    [Show full text]
  • Safety Assessment of Alkoxyl Alkyl Silanes As Used in Cosmetics
    Safety Assessment of Alkoxyl Alkyl Silanes as Used in Cosmetics Status: Draft Final Report for Panel Review Release Date: November 11, 2016 Panel Meeting Date: December 5-6, 2016 The 2016 Cosmetic Ingredient Review Expert Panel members are: Chair, Wilma F. Bergfeld, M.D., F.A.C.P.; Donald V. Belsito, M.D.; Ronald A. Hill, Ph.D.; Curtis D. Klaassen, Ph.D.; Daniel C. Liebler, Ph.D.; James G. Marks, Jr., M.D.; Ronald C. Shank, Ph.D.; Thomas J. Slaga, Ph.D.; and Paul W. Snyder, D.V.M., Ph.D. The CIR Director is Lillian J. Gill, D.P.A. This report was prepared by Lillian C. Becker, Scientific Analyst/Writer. © Cosmetic Ingredient Review 1620 L Street, NW, Suite 1200 Washington, DC 20036-4702 ph 202.331.0651 fax 202.331.0088 [email protected] Commitment & Credibility since 1976 MEMORANDUM To: CIR Expert Panel and Liaisons From: Lillian C. Becker, M.S. Scientific Analyst and Writer Date: November 11, 2016 Subject: Safety Assessment of Alkoxyl Alkyl Silanes as Used in Cosmetics Attached is the draft final report of Alkoxyl Alkyl Silanes as used in cosmetics. [alalsi122016Rep] These four ingredients are grouped because they are structurally related as silanes bearing both simple alkyl and simple alkoxyl groups. These ingredients function as binders, skin-conditioning agents – miscellaneous, and skin-conditioning agents – emollient. In June 2016, the Panel issued a tentative report with the conclusion that these ingredients are safe in cosmetics in the present practices of use and concentration described in this safety assessment. The Panel discussed the use of these ingredients as surface modifiers, the presence of residual starting materials (e.g., disilazane), and the use of inference (read- across) in assessing safety.
    [Show full text]
  • Thesis Analysis Of
    THESIS ANALYSIS OF OCTAMETHYLCYCLOTETRASILOXANE AND DECAMETHYLCYCLOPENTASILOXANE IN WASTEWATER, SLUDGE AND RIVER SAMPLES BY HEADSPACE GAS CHROMATOGRAPHY/MASS SPECTROMETRY Submitted by Yu Zhang Department of Civil and Environmental Engineering In partial fulfillment of the requirements For the Degree of Master of Science Colorado State University Fort Collins, Colorado Summer 2014 Master’s Committee: Advisor: Pinar Ömür-Özbek Kenneth Carlson Gregory Dooley Copyright by Yu Zhang 2014 All Rights Reserved ABSTRACT ANALYSIS OF OCTAMETHYLCYCLOTETRASILOXANE AND DECAMETHYLCYCLOPENTASILOXANE IN WASTEWATER, SLUDGE AND RIVER SAMPLES BY HEADSPACE GAS CHROMATOGRAPHY/MASS SPECTROMETRY Siloxanes are commonly used in cosmetic and personal care products, healthcare products and many industrial applications. Because siloxanes are persistent, they end up in the wastewater and go untreated through the wastewater treatment units, which lead to contamination of the surface waters through effluent discharge. Siloxanes tend to be adsorbed onto or absorbed by the activated sludge in the wastewater treatment process. In the digesters, the siloxanes volatilize and accumulate in the biogas, which leads to mechanical problems due to scaling. The two most common siloxanes detected in wastewaters and sludge are: octamethylcyclotetrasiloxane (D4) and decamethylcyclopentasiloxane (D5). For this study, the D4 and D5 in wastewater and sludge samples were monitored using headspace gas chromatography/mass spectrometry. Samples were collected from the City of Loveland Wastewater Treatment Plant (WWTP), Loveland, CO and the Drake Wastewater Reclamation Facilities (WWRF), Fort Collins, CO. The levels of D4 were in the range of 0.7-11.3 ng·mL-1 in wastewater and 0.3-1.8 µg·g-1 dry solid in the sludge from Drake WWRF; 1.0-6.7 ng·mL-1 in wastewater and 0.3-1.7 µg·g-1 dry solid in the sludge from Loveland WWTP.
    [Show full text]