A Gate-Free Monolayer Wse2 Pn Diode
ARTICLE DOI: 10.1038/s41467-018-05326-x OPEN A gate-free monolayer WSe2 pn diode Jhih-Wei Chen1, Shun-Tsung Lo1, Sheng-Chin Ho1, Sheng-Shong Wong1, Thi-Hai-Yen Vu1, Xin-Quan Zhang2, Yi-De Liu1, Yu-You Chiou1, Yu-Xun Chen3, Jan-Chi Yang 1, Yi-Chun Chen1, Ying-Hao Chu4, Yi-Hsien Lee 2, Chung-Jen Chung5, Tse-Ming Chen1,5, Chia-Hao Chen6 & Chung-Lin Wu1,6 Interest in bringing p- and n-type monolayer semiconducting transition metal dichalcogenides (TMD) into contact to form rectifying pn diode has thrived since it is crucial to control the electrical properties in two-dimensional (2D) electronic and optoelectronic devices. Usually 1234567890():,; this involves vertically stacking different TMDs with pn heterojunction or, laterally manip- ulating carrier density by gate biasing. Here, by utilizing a locally reversed ferroelectric polarization, we laterally manipulate the carrier density and created a WSe2 pn homojunction on the supporting ferroelectric BiFeO3 substrate. This non-volatile WSe2 pn homojunction is demonstrated with optical and scanning probe methods and scanning photoelectron micro- spectroscopy. A homo-interface is a direct manifestation of our WSe2 pn diode, which can be quantitatively understood as a clear rectifying behavior. The non-volatile confinement of carriers and associated gate-free pn homojunction can be an addition to the 2D electron–photon toolbox and pave the way to develop laterally 2D electronics and photonics. 1 Department of Physics, National Cheng Kung University, Tainan 70101, Taiwan. 2 Department of Materials Science and Engineering, National Tsing Hua University, Hsinchu 30013, Taiwan. 3 Department of Electrophysics, National Chiao Tung University, Hsinchu 30010, Taiwan.
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