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Transport of Dangerous Goods
ST/SG/AC.10/1/Rev.16 (Vol.I) Recommendations on the TRANSPORT OF DANGEROUS GOODS Model Regulations Volume I Sixteenth revised edition UNITED NATIONS New York and Geneva, 2009 NOTE The designations employed and the presentation of the material in this publication do not imply the expression of any opinion whatsoever on the part of the Secretariat of the United Nations concerning the legal status of any country, territory, city or area, or of its authorities, or concerning the delimitation of its frontiers or boundaries. ST/SG/AC.10/1/Rev.16 (Vol.I) Copyright © United Nations, 2009 All rights reserved. No part of this publication may, for sales purposes, be reproduced, stored in a retrieval system or transmitted in any form or by any means, electronic, electrostatic, magnetic tape, mechanical, photocopying or otherwise, without prior permission in writing from the United Nations. UNITED NATIONS Sales No. E.09.VIII.2 ISBN 978-92-1-139136-7 (complete set of two volumes) ISSN 1014-5753 Volumes I and II not to be sold separately FOREWORD The Recommendations on the Transport of Dangerous Goods are addressed to governments and to the international organizations concerned with safety in the transport of dangerous goods. The first version, prepared by the United Nations Economic and Social Council's Committee of Experts on the Transport of Dangerous Goods, was published in 1956 (ST/ECA/43-E/CN.2/170). In response to developments in technology and the changing needs of users, they have been regularly amended and updated at succeeding sessions of the Committee of Experts pursuant to Resolution 645 G (XXIII) of 26 April 1957 of the Economic and Social Council and subsequent resolutions. -
TR-499: Indium Phosphide (CASRN 22398-80-7) in F344/N Rats And
NTP TECHNICAL REPORT ON THE TOXICOLOGY AND CARCINOGENESIS STUDIES OF INDIUM PHOSPHIDE (CAS NO. 22398-80-7) IN F344/N RATS AND B6C3F1 MICE (INHALATION STUDIES) NATIONAL TOXICOLOGY PROGRAM P.O. Box 12233 Research Triangle Park, NC 27709 July 2001 NTP TR 499 NIH Publication No. 01-4433 U.S. DEPARTMENT OF HEALTH AND HUMAN SERVICES Public Health Service National Institutes of Health FOREWORD The National Toxicology Program (NTP) is made up of four charter agencies of the U.S. Department of Health and Human Services (DHHS): the National Cancer Institute (NCI), National Institutes of Health; the National Institute of Environmental Health Sciences (NIEHS), National Institutes of Health; the National Center for Toxicological Research (NCTR), Food and Drug Administration; and the National Institute for Occupational Safety and Health (NIOSH), Centers for Disease Control and Prevention. In July 1981, the Carcinogenesis Bioassay Testing Program, NCI, was transferred to the NIEHS. The NTP coordinates the relevant programs, staff, and resources from these Public Health Service agencies relating to basic and applied research and to biological assay development and validation. The NTP develops, evaluates, and disseminates scientific information about potentially toxic and hazardous chemicals. This knowledge is used for protecting the health of the American people and for the primary prevention of disease. The studies described in this Technical Report were performed under the direction of the NIEHS and were conducted in compliance with NTP laboratory health and safety requirements and must meet or exceed all applicable federal, state, and local health and safety regulations. Animal care and use were in accordance with the Public Health Service Policy on Humane Care and Use of Animals. -
The Atmospheric Chemical Vapour Deposition of Coatings on Glass
The Atmospheric Chemical Vapour Deposition Of Coatings On Glass. by Kevin David Sanderson, B.Sc. A thesis submitted to Imperial College of Science Technology and Medicine for the degree of Doctor of Philosophy January, 1996 The copyright of this thesis rests with the author and no quotation from it or information derived from it may be published without the prior written consent of the author. Some of the material presented in this thesis is of a confidential nature. It is therefore requested that anyone reading this thesis maintains this confidentiality until the thesis becomes publicly available. Abstract: The deposition of thin films of indium oxide, tin doped indium oxide (ITO) and titanium nitride for solar control applications have been investigated by Atmospheric Chemical Vapour Deposition (APCVD). Experimental details of the deposition system and the techniques used to characterise the films are presented. Results from investigations into the deposition parameters, the film microstructure and film material properties are discussed. A range of precursors were investigated for the deposition of indium oxide. The effect of pre-mixing the vaporised precursor with an oxidant source and the deposition temperature has been studied. Polycrystalline In203 films with a resistivity of 1.1 - 3 x 10-3 ) cm were obtained with In(thd)3 , oxygen and nitrogen. The growth of ITO films from In(thd)3, oxygen and a range of tin dopants is also presented. The effect of the dopant precursor, the doping concentration, deposition temperature and the effect of additives on film growth and microstructure is discussed. Control over the preferred orientation growth of ITO has been achieved by the addition of acetate species during film growth. -
Aryl‑NHC Group 13 Trimethyl Complexes : Structural, Stability and Bonding Insights
This document is downloaded from DR‑NTU (https://dr.ntu.edu.sg) Nanyang Technological University, Singapore. Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights Wu, Melissa Meiyi 2017 Wu, M. M. (2017). Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights. Doctoral thesis, Nanyang Technological University, Singapore. http://hdl.handle.net/10356/70204 https://doi.org/10.32657/10356/70204 Downloaded on 28 Sep 2021 13:14:06 SGT ATTENTION: The Singapore Copyright Act applies to the use of this document. Nanyang Technological University Library. NANYANG TECHNOLOGICAL UNIVERSITY DIVISION OF CHEMISTRY AND BIOLOGICAL CHEMISTRY SCHOOL OF PHYSICAL & MATHEMATICAL SCIENCES Aryl-NHC Group 13 Trimethyl Complexes: Structural, Stability and Bonding Insights Wu Meiyi Melissa G1102527F Supervisor: Asst Prof Felipe Garcia Contents Acknowledgements .............................................................................................................. iv Abbreviations ....................................................................................................................... v Abstract.............................................................................................................................. viii 1. Introduction 1.1. N-Heterocyclic Carbenes (NHC) ................................................................................. 1 1.1.1. Electronic Properties ............................................................................................ 1 1.1.2. Steric -
Pyrophoric Materials
Appendix A PYROPHORIC MATERIALS Pyrophoric materials react with air, or with moisture in air. Typical reactions which occur are oxidation and hydrolysis, and the heat generated by the reactions may ignite the chemical. In some cases, these reactions liberate flammable gases which makes ignition a certainty and explosion a real possibility. Examples of pyrophoric materials are shown below. (List may not be complete) (a) Pyrophoric alkyl metals and derivatives Groups Dodecacarbonyltetracobalt Silver sulphide Dialkytzincs Dodecacarbonyltriiron Sodium disulphide Diplumbanes Hexacarbonylchromium Sodium polysulphide Trialkylaluminiums Hexacarbonylmolybdenum Sodium sulphide Trialkylbismuths Hexacarbonyltungsten Tin (II) sulphide Nonacarbonyldiiron Tin (IV) sulphide Compounds Octacarbonyldicobalt Titanium (IV) sulphide Bis-dimethylstibinyl oxide Pentacarbonyliron Uranium (IV) sulphide Bis(dimethylthallium) acetylide Tetracarbonylnickel Butyllithium (e) Pyrophoric alkyl non-metals Diethylberyllium (c) Pyrophoric metals (finely divided state) Bis-(dibutylborino) acetylene Bis-dimethylarsinyl oxide Diethylcadmium Caesium Rubidium Bis-dimethylarsinyl sulphide Diethylmagnesium Calcium Sodium Bis-trimethylsilyl oxide Diethylzinc Cerium Tantalum Dibutyl-3-methyl-3-buten-1-Yniborane Diisopropylberyllium Chromium Thorium Diethoxydimethylsilane Dimethylberyllium Cobalt Titanium Diethylmethylphosphine Dimethylbismuth chloride Hafnium Uranium Ethyldimthylphosphine Dimethylcadmium Iridium Zirconium Tetraethyldiarsine Dimethylmagnesium Iron Tetramethyldiarsine -
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COORDINATION COMPOUNDS OF ALKYL GALLIUM HYDRIDES by VICTOR GRAHAM WIEBE B.Sc. (Hons.) University of British Columbia 1966 A THESIS SUBMITTED IN PARTIAL FULFILMENT OF THE REQUIREMENTS FOR THE DEGREE OF MASTER OF SCIENCE In The Department of Chemistry We accept this thesis as conforming to the required standard The University of British Columbia June 1968 In presenting this thesis in partial fulfilment of the requirements for an advanced degree at the University of British Columbia, I agree that the Library shall make it freely available for reference and Study. I further agree that permission for extensive copying of this thesis for scholarly purposes may be granted by the Head of my Department or by hits representatives. It is understood that copying or publication of this thesis for financial gain shall not be allowed without my written permission. Department of The University of British Columbia Vancouver 8, Canada - ii - Abstract Although the organo hydride derivatives of boron and aluminum are well characterized^little work has been reported on the corresponding gallium systems. The present study was initiated to determine the relative stabilities and reactivity of organo gallium hydride derivatives as compared with the stabilities and reactions of the corresponding compounds of boron and aluminum. Various preparative routes to this new class of gallium compounds have been investigated. These include the use of organo-mercury, organo-lithium and lithium hydride derivatives in reactions with gallium hydride and gallium alkyl compounds and their halogen substituted derivatives: Me3NGaH3 + HgR2 >- Me3NGaH2R + l/2Hg + 1/2H2 Me3NGaH2Cl + LiR y Me3NGaH2R + LiCl Me3NGaR2Cl + LiH • Me3NGaHR2 + LiCl A fourth preparative method involves disproportionation reactions between gallium hydride compounds and organo gallium compounds to yield the mixed organo hydride derivatives. -
Safe Handling and Disposal of Chemicals Used in the Illicit Manufacture of Drugs
Vienna International Centre, PO Box 500, 1400 Vienna, Austria Tel.: (+43-1) 26060-0, Fax: (+43-1) 26060-5866, www.unodc.org Guidelines for the Safe handling and disposal of chemicals used in the illicit manufacture of drugs United Nations publication USD 26 Printed in Austria ISBN 978-92-1-148266-9 Sales No. E.11.XI.14 ST/NAR/36/Rev.1 V.11-83777—September*1183777* 2011—300 Guidelines for the Safe handling and disposal of chemicals used in the illlicit manufacture of drugs UNITED NATIONS New York, 2011 Symbols of United Nations documents are composed of letters combined with figures. Mention of such symbols indicates a reference to a United Nations document. ST/NAR/36/Rev.1 UNITED NATIONS PUBLICATION Sales No. E.11.XI.14 ISBN 978-92-1-148266-9 eISBN 978-92-1-055160-1 © United Nations, September 2011. All rights reserved. The designations employed and the presentation of material in this publication do not imply the expression of any opinion whatsoever on the part of the Secretariat of the United Nations concerning the legal status of any country, territory, city or area, or of its authorities, or concerning the delimitation of its frontiers or boundaries. Requests for permission to reproduce this work are welcomed and should be sent to the Secretary of the Publications Board, United Nations Headquarters, New York, N.Y. 10017, U.S.A. or also see the website of the Board: https://unp.un.org/Rights.aspx. Governments and their institutions may reproduce this work without prior authoriza- tion but are requested to mention the source and inform the United Nations of such reproduction. -
Guidelines for Pyrophoric Materials
Guidelines for Pyrophoric Materials Definition and Hazards Pyrophoric materials are substances that ignite instantly upon exposure to air, moisture in the air, oxygen or water. Other common hazards include corrosivity, teratogenicity, and organic peroxide formation, along with damage to the liver, kidneys, and central nervous system. Examples include metal hydrides, finely divided metal powders, nonmetal hydride and alkyl compounds, white phosphorus, alloys of reactive materials and organometallic compounds, including alkylithiums. Additional pyrophoric materials are listed in Appendix A. Failure to follow proper handling techniques could result in serious injury or death. Controlling the Hazards . If possible, use safer chemical alternatives. A “dry run” of the experiment should be performed using low-hazard materials, such as water or solvent, as appropriate. Limit the amount purchased and the amount stored. Do not accumulate unneeded pyrophoric materials. BEFORE working with pyrophoric materials, read the MSDS sheets. The MSDS must be reviewed before using an unfamiliar chemical and periodically as a reminder. A Standard Operating Procedure (SOP) should be prepared and reviewed for each process involving pyrophoric materials. In lab training should be completed and documented. If possible, use the “buddy system”. Working alone with pyrophorics is strongly discouraged. All glassware used for pyrophorics should be oven-dried and free of moisture. Review the location of the safety shower, eyewash, telephone, and fire extinguisher. Keep an appropriate fire extinguisher or extinguishing material close at hand. Additional controls when handling liquid pyrophoric materials . Secure pyrophoric reagent bottle to stand. Secure the syringe so if the plunger blows out of the body of the syringe the contents will not splash anyone. -
Deposition Chemical Selection Guide
SPECIALTY CHEMICALS AND ENGINEERED MATERIALS Deposition Chemical Selection Guide DEPOSITION PRECURSORS — Inter-metal dielectric precursors High-k gate and capacitor precursors TEOS Tetraethylorthosilicate HfCl4 Hafnium tetrachloride (standard and UHP grade) 4MS Tetramethylsilane ZrCl4 Zirconium tetrachloride OMCTS Octamethylcyclotetrasiloxane AlCl3 Aluminium trichloride NxTi Ti dopant CVD dopants Precursors for alternative high-k dielectrics and dopants* TEB Triethylborate TEMAZ Tetrakis(ethylmethylamido)zirconium(IV) TEPO Triethylphosphate TMB Trimethylborate Metallization including barrier materials TMP Trimethylphosphite HP CCTBA* High Purity dicolbalt hexacarbonyl tert- butylacetylene Silicon oxide and nitride precursors TDMAT Tetrakis-dimethylamino Titanium BDEAS Bis (diethylamino)silane TiCl4 Titanium tetrachloride BDMAMS bis(dimethylamino) methylsilane WCl6 Tungsten hexachloride SiNCH* Entegris proprietary WCl5 Tungsten pentachloride HMDS Hexamethyldisilane Joppa27™ (In collaboration with AMAT) HCDS Hexachlorodisilane Precursors for cobalt (selective or non-selective)* C H N Pyridine 5 5 TBTEMT (Tert-butylimido)tris(ethylmethylamido)tantalum(V) H O UHP grade water 2 Other metal precursors (eg. Ru, Y, Er, Mg, Al, Sn, W, Ir) Precursors for low temperature Si oxides and nitrides* TMDSO Tetramethyldisiloxane *Currently available at sampling volumes. Scale up to higher volume production would be available, depending on demand. Other precursors SiCl4 Silicon tetrachloride PZT cocktails Lead zirconate titanate ™ PH3 Phosphine in SAGE packaging -
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A Thesis Submitted for the Degree of PhD at the University of Warwick Permanent WRAP URL: http://wrap.warwick.ac.uk/90802 Copyright and reuse: This thesis is made available online and is protected by original copyright. Please scroll down to view the document itself. Please refer to the repository record for this item for information to help you to cite it. Our policy information is available from the repository home page. For more information, please contact the WRAP Team at: [email protected] warwick.ac.uk/lib-publications Reactions and Co-ordination Chemistry of Indium Trialkyls and Trihalides. Ian Alan Degnan A thesis submitted for the degree of Doctor of Philosophy. University of Warwick, Department of Chemistry. Septem ber 1989 To Mam and Dad -for making this possible. Contents. Page. Chapter 1: Introduction. Group 13 Elements. 4 Co-ordination Chemistry of the Indium Trihalides. 9 Mono-Complexes of Indium Trihalides. 10 Bis-Complexes of Indium Trihalides. 12 Tris-Complexes of Indium Trihalides. 17 Unusual Indium Trihalide Complexes. 20 Phosphine Complexes of Indium Triiodide. 22 Metathetical Reactions of Indium Trihalides. 30 Organometallic Derivatives of Indium. 33 Organoindium Halides. 33 Organoindium Compounds. 37 Reactions of Organoindium Compounds. 39 Control of Oligomerisation in Indium Compounds. 55 Chapter 2. Phosphine Complexes of Indium Trihalides. 58 Introduction. 59 Mono-Phosphine Complexes of Indium Triiodide. 60 X-ray Diffraction Study of InCI3(PMe3)2. 83 Indium Triiodide Complexes of Diphos. 86 Chapter 3. Metathetical Reactions of Indium Trihalides. 94 Introduction. 95 Reaction of Indium Triiodide Phosphine Complexes with Methyllithium. 96 Reaction of Indium Triiodide Triphenylphosphine Complex with Methyllithium. -
The Preparation of Organomagnesium Fluorides
THE PREPARATION OF ORGANOMAGNESIUM FLUORIDES BY ORGANOMETALLIC EXCHANGE REACTIONS AND THE COMPOSITION IN SOLUTION OF ALKOXY(METHYL)MAGNESIUM AND DIALKYLAMINO(METHYL)MAGNESIUM COMPOUNDS A THESIS Presented To The Faculty of the Graduate Division by John A. Nackashi In Partial Fulfillment of the Requirements for the Degree Doctor of Philosophy In the School of Chemistry Georgia Institute of Technology May, 1974 THE PREPARATION OF ORGANOMAGNESIUM FLUORIDES BY ORGANOMETALLIC EXCHANGE REACTIONS AND THE COMPOSITION IN SOLUTION OF ALKOXY(METHYL)MAGNESIUM AND DIALKYLAMINO(METHYL)MAGNESIUM COMPOUNDS Approved: E. C. Ashby, Chairman A. Bertrand C. L. Liotta Date approved by Chairman: ii ACKNOWLEDGMENTS The author is grateful to Dr. E. C. Ashby for his guidance, direction and patience during this research. The reading of this thesis by Dr. A. Bertrand and Dr. C. Liotta is greatly appreciated. The author is also indebted to John P. Oliver for his assistance and friendship, and to the mem bers of the research group who made the successes of this research a joy and the failures acceptable. The warm friend ship expressed by the research group will always be cherished. Financial assistance by the Georgia Institute of Tech nology and the National Science Foundation is gratefully ack nowledged. The author acknowledges a special appreciation to his parents and particularly his wife, Bryan. Their gentle en couragement and patient understanding throughout the entire period of study has made this thesis possible. iii TABLE OF CONTENTS Page ACKNOWLEDGMENTS ii LIST OF TABLES vi LIST OF ASSOCIATION PLOTS iii LIST OF SPECTRA ix SUMMARY x PART I THE PREPARATION OF ORGANOMAGNESIUM FLUORIDES BY ORGANOMETALLIC EXCHANGE REACTIONS CHAPTER I. -
Adduct Purification of Trimethylgallium Using 4-Dimethylaminopyridine
International Journal of Advanced Science and Technology Vol. 41, April, 2012 Adduct Purification of Trimethylgallium using 4-Dimethylaminopyridine Selvakumar Dhanasingh1*, Rajendra Singh2 and Mohammed Nasim3 1Defence BioEngineering and Electromedical laboratory, C. V. Raman Nagar, Bangalore – 560 093, India 2Directorate of ER & IPR, DRDO Bhawan, Rajaji Marg, New Delhi – 110105, India 3Defence Materials & Stores Research and Development Establishment, DMSRDE P.O., G.T. Road, Kanpur – 208 013, India [email protected] Abstract 1:1 and 2:1 adducts of trimethylgallium (TMGa) with 4-dimethylaminopyridine (DMAP) were synthesized and characterized by 1H, 13C NMR, FAB-MS and Trace elemental analyses using ICP-MS. Both adducts are non-pyrophoric, thermally dissociable and easy to handle. FAB-MS study suggests that the adducts are associated in tetrameric forms. TMGa of purity more than 99.999% (5N) was released from these adducts, which shows the adducts are potential candidates to produce high pure metal alkyl sources for Metal-Organic Chemical Vapor Deposition (MOCVD). Keywords: Trimethylgallium, pyrophoric, MOCVD precursor, adduct purification technique 1. Introduction The electronic properties of II-VI and III-V compound semiconducting thin films deposited by MOCVD method are mainly determined by the purity of the precursors [1, 2]. As most of the metal alkyls for MOCVD are volatile and highly reactive pyrophoric liquids, the physical purification methods such as, fractional distillation and low temperature crystallization are difficult to employ and often large amount of metal alkyls need to be discarded to obtain them with high purity. However, these metal alkyls can be purified by ‘adduct purification technique’, which involves the formation of adducts between the metal alkyl with an appropriate Lewis base, which are easy to handle and can be purified by re- crystallization [3, 4, 5].