Download (7Mb)
Total Page:16
File Type:pdf, Size:1020Kb
Load more
Recommended publications
-
TR-499: Indium Phosphide (CASRN 22398-80-7) in F344/N Rats And
NTP TECHNICAL REPORT ON THE TOXICOLOGY AND CARCINOGENESIS STUDIES OF INDIUM PHOSPHIDE (CAS NO. 22398-80-7) IN F344/N RATS AND B6C3F1 MICE (INHALATION STUDIES) NATIONAL TOXICOLOGY PROGRAM P.O. Box 12233 Research Triangle Park, NC 27709 July 2001 NTP TR 499 NIH Publication No. 01-4433 U.S. DEPARTMENT OF HEALTH AND HUMAN SERVICES Public Health Service National Institutes of Health FOREWORD The National Toxicology Program (NTP) is made up of four charter agencies of the U.S. Department of Health and Human Services (DHHS): the National Cancer Institute (NCI), National Institutes of Health; the National Institute of Environmental Health Sciences (NIEHS), National Institutes of Health; the National Center for Toxicological Research (NCTR), Food and Drug Administration; and the National Institute for Occupational Safety and Health (NIOSH), Centers for Disease Control and Prevention. In July 1981, the Carcinogenesis Bioassay Testing Program, NCI, was transferred to the NIEHS. The NTP coordinates the relevant programs, staff, and resources from these Public Health Service agencies relating to basic and applied research and to biological assay development and validation. The NTP develops, evaluates, and disseminates scientific information about potentially toxic and hazardous chemicals. This knowledge is used for protecting the health of the American people and for the primary prevention of disease. The studies described in this Technical Report were performed under the direction of the NIEHS and were conducted in compliance with NTP laboratory health and safety requirements and must meet or exceed all applicable federal, state, and local health and safety regulations. Animal care and use were in accordance with the Public Health Service Policy on Humane Care and Use of Animals. -
The Atmospheric Chemical Vapour Deposition of Coatings on Glass
The Atmospheric Chemical Vapour Deposition Of Coatings On Glass. by Kevin David Sanderson, B.Sc. A thesis submitted to Imperial College of Science Technology and Medicine for the degree of Doctor of Philosophy January, 1996 The copyright of this thesis rests with the author and no quotation from it or information derived from it may be published without the prior written consent of the author. Some of the material presented in this thesis is of a confidential nature. It is therefore requested that anyone reading this thesis maintains this confidentiality until the thesis becomes publicly available. Abstract: The deposition of thin films of indium oxide, tin doped indium oxide (ITO) and titanium nitride for solar control applications have been investigated by Atmospheric Chemical Vapour Deposition (APCVD). Experimental details of the deposition system and the techniques used to characterise the films are presented. Results from investigations into the deposition parameters, the film microstructure and film material properties are discussed. A range of precursors were investigated for the deposition of indium oxide. The effect of pre-mixing the vaporised precursor with an oxidant source and the deposition temperature has been studied. Polycrystalline In203 films with a resistivity of 1.1 - 3 x 10-3 ) cm were obtained with In(thd)3 , oxygen and nitrogen. The growth of ITO films from In(thd)3, oxygen and a range of tin dopants is also presented. The effect of the dopant precursor, the doping concentration, deposition temperature and the effect of additives on film growth and microstructure is discussed. Control over the preferred orientation growth of ITO has been achieved by the addition of acetate species during film growth. -
Aryl‑NHC Group 13 Trimethyl Complexes : Structural, Stability and Bonding Insights
This document is downloaded from DR‑NTU (https://dr.ntu.edu.sg) Nanyang Technological University, Singapore. Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights Wu, Melissa Meiyi 2017 Wu, M. M. (2017). Aryl‑NHC group 13 trimethyl complexes : structural, stability and bonding insights. Doctoral thesis, Nanyang Technological University, Singapore. http://hdl.handle.net/10356/70204 https://doi.org/10.32657/10356/70204 Downloaded on 28 Sep 2021 13:14:06 SGT ATTENTION: The Singapore Copyright Act applies to the use of this document. Nanyang Technological University Library. NANYANG TECHNOLOGICAL UNIVERSITY DIVISION OF CHEMISTRY AND BIOLOGICAL CHEMISTRY SCHOOL OF PHYSICAL & MATHEMATICAL SCIENCES Aryl-NHC Group 13 Trimethyl Complexes: Structural, Stability and Bonding Insights Wu Meiyi Melissa G1102527F Supervisor: Asst Prof Felipe Garcia Contents Acknowledgements .............................................................................................................. iv Abbreviations ....................................................................................................................... v Abstract.............................................................................................................................. viii 1. Introduction 1.1. N-Heterocyclic Carbenes (NHC) ................................................................................. 1 1.1.1. Electronic Properties ............................................................................................ 1 1.1.2. Steric -
Advances-In-Inorganic-Chemistry-50
Advances in INORGANIC CHEMISTRY Volume 50 ADVISORY BOARD I. Bertini J. Reedijk Universita´ degli Studi di Firenze Leiden University Florence, Italy Leiden, The Netherlands A. H. Cowley P. J. Sadler University of Edinburgh University of Texas Edinburgh, Scotland Austin, Texas, USA A. M. Sargeson H. B. Gray The Australian National University California Institute of Technology Canberrs, Australia Pasadena, California, USA Y. Sasaki M. L. H. Green Hokkaido University University of Oxford Sapporo, Japan Oxford, United Kingdom D. F. Shriver O. Kahn Northwestern University Evanston, Illinois, USA Institut de Chimie de la Matie`re Condense´e de Bordeaux Pessac, France R. van Eldik Universita¨t Erlangen-Nu¨mberg Andre´E. Merbach Erlangen, Germany Institut de Chimie Mine ´rale et Analytique K. Wieghardt Universite´ de Lausanne Max-Planck Institut Lausanne, Switzerland Mu¨lheim, Germany Advances in INORGANIC CHEMISTRY Main Group Chemistry EDITED BY A. G. Sykes Department of Chemistry The University of Newcastle Newcastle upon Tyne United Kingdom CO-EDITED BY Alan H. Cowley Department of Chemistry and Biochemistry The University of Texas at Austin Austin, Texas VOLUME 50 San Diego San Francisco New York Boston London Sydney Tokyo This book is printed on acid-free paper. ᭺ȍ Copyright 2000 by ACADEMIC PRESS All Rights Reserved. No part of this publication may be reproduced or transmitted in any form or by any means, electronic or mechanical, including photocopy, recording, or any information storage and retrieval system, without permission in writing from the Publisher. The appearance of the code at the bottom of the first page of a chapter in this book indicates the Publisher’s consent that copies of the chapter may be made for personal or internal use of specific clients. -
Indium(III) Chloride – Catalyzed Michael Addition of Thiols to Chalcones : a Remarkable Solvent Effect
View metadata, citation and similar papers at core.ac.uk brought to you by CORE provided by Publications of the IAS Fellows Issue in Honor of Dr. Rama Rao ARKIVOC 2005 (iii) 44-50 Indium(III) chloride – catalyzed Michael addition of thiols to chalcones : a remarkable solvent effect Brindaban C. Ranu,* Suvendu S. Dey, and Sampak Samanta Department of Organic Chemistry, Indian Association for the Cultivation of Science, Jadavpur, Calcutta – 700 032, India E-mail: [email protected] Dedicated to Dr. A. V. Rama Rao on the occasion of his 70th birthday (received 28 Aug 04; accepted 23 Sep 04; published on the web 26 Sep 04) Abstract Indium(III) chloride in methanol efficiently catalyzes Michael addition of aromatic and aliphatic thiols to chalcones and related compounds. This reaction is remarkably solvent selective and it does not proceed in conventional solvents such as tetrahydrofuran, methylene chloride and water. Keywords: Michael addition, thiol, chalcone, indium(III) chloride, solvent effect Introduction The Michael addition of thiols to electron deficient alkenes is a very useful process for making carbon-sulfur bond. This addition to chalcone derivatives is very interesting and challenging as it is less facile compared to the addition to aliphatic acyclic enones and thus it is not always satisfactory with the conventional reagents used for general 1,4-addition. Recently, a number of 1a procedures involving a variety of catalysts such as synthetic diphosphate Na2CaP2O7, natural 1b 1c 1d phosphate, InBr3, fluorapatite, have been reported. Indium halides, particularly indium(III) chloride have emerged as a potent Lewis acid for various organic transformations in recent times.2 As a part of our interest in indium(III) chloride 3 catalyzed reactions we discovered that although InCl3 has been used in the Michael addition of silylenol ethers,4a amines,4b pyrroles4c and indoles4d to electron-deficient alkenes no report has been found demonstrating the use of InCl3 for addition of thiols to chalcones and related systems. -
Thermochemical Modelling and Experimental Validation of in Situ Indium Volatilization by Released Halides During Pyrolysis of Smartphone Displays
metals Article Thermochemical Modelling and Experimental Validation of In Situ Indium Volatilization by Released Halides during Pyrolysis of Smartphone Displays Benedikt Flerus 1,2,*, Thomas Swiontek 1, Katrin Bokelmann 2, Rudolf Stauber 2 and Bernd Friedrich 1 1 Institute of Process Metallurgy and Metal Recycling IME, RWTH Aachen University, Intzestraße 3, 52056 Aachen, Germany; [email protected] (T.S.); [email protected] (B.F.) 2 Project Group, Materials Recycling and Resource Strategies IWKS, Fraunhofer Institute for Silicate Research ISC, Brentanostraße 2, 63755 Alzenau, Germany; [email protected] (K.B.); [email protected] (R.S.) * Correspondence: bfl[email protected]; Tel.: +49-(0)241-80-95856 Received: 22 November 2018; Accepted: 5 December 2018; Published: 8 December 2018 Abstract: The present study focuses on the pyrolysis of discarded smartphone displays in order to investigate if a halogenation and volatilization of indium is possible without a supplementary halogenation agent. After the conduction of several pyrolysis experiments it was found that the indium evaporation is highly temperature-dependent. At temperatures of 750 ◦C or higher the indium concentration in the pyrolysis residue was pushed below the detection limit of 20 ppm, which proved that a complete indium volatilization by using only the halides originating from the plastic fraction of the displays is possible. A continuous analysis of the pyrolysis gas via FTIR showed that the amounts of HBr, HCl and CO increase strongly at elevated temperatures. The subsequent thermodynamic consideration by means of FactSage confirmed the synergetic effect of CO on the halogenation of indium oxide. Furthermore, HBr is predicted to be a stronger halogenation agent compared to HCl. -
Stabilization and Reactivity of Low Oxidation State Indium Compounds
University of Windsor Scholarship at UWindsor Electronic Theses and Dissertations Theses, Dissertations, and Major Papers 2013 Stabilization and Reactivity of Low Oxidation State Indium Compounds Christopher Allan University of Windsor Follow this and additional works at: https://scholar.uwindsor.ca/etd Recommended Citation Allan, Christopher, "Stabilization and Reactivity of Low Oxidation State Indium Compounds" (2013). Electronic Theses and Dissertations. 4939. https://scholar.uwindsor.ca/etd/4939 This online database contains the full-text of PhD dissertations and Masters’ theses of University of Windsor students from 1954 forward. These documents are made available for personal study and research purposes only, in accordance with the Canadian Copyright Act and the Creative Commons license—CC BY-NC-ND (Attribution, Non-Commercial, No Derivative Works). Under this license, works must always be attributed to the copyright holder (original author), cannot be used for any commercial purposes, and may not be altered. Any other use would require the permission of the copyright holder. Students may inquire about withdrawing their dissertation and/or thesis from this database. For additional inquiries, please contact the repository administrator via email ([email protected]) or by telephone at 519-253-3000ext. 3208. STABILIZATION AND REACTIVITY OF LOW OXIDATION STATE INDIUM COMPOUNDS By Christopher J. Allan A Dissertation Submitted to the Faculty of Graduate Studies Through Chemistry and Biochemistry In Partial Fulfillment of the Requirements for The Degree of Doctor of Philosophy at the University of Windsor Windsor, Ontario, Canada 2013 ©2013 Christopher J. Allan Declaration of Co-Authorship / Previous Publications I. Declaration of Co-Authorship This thesis incorporates the outcome of joint research undertaken in collaboration with Hugh Cowley under the supervision of Jeremy Rawson. -
Abstract Book
Monday Afternoon, June 29, 2020 to be developed with atomic-scale level of controllability, including uniformity and selectivity. In this talk, atomic layer etching (ALE) of Cu and Atomic Layer Etching Ni, for their intended application in BOEL and EUV are presented. Room Baekeland - Session ALE1-MoA The unique aspect of this ALE process is the combined effect of directional chemical ions and isotropic reactive neutrals. Specifically, ALE of Ni and Cu ALE of Metals and Alloys thin film is realized using sequential surface modification by directional Moderators: Heeyeop Chae, Sungkyunkwan University (SKKU), Alfredo plasma oxidation and removal of the modified surface layer by isotropic gas Mameli, TNO/Holst Center phase formic acid exposure. Both blanket and patterned samples were 1:30pm ALE1-MoA-1 Mechanistic Insights into Thermal Dry Atomic Layer studied using this reaction scheme. A etch rate of 3 to 5 nm/cycle is determined from the blanket samples, and final features with sidewall Etching of Metals and Alloys, Andrew Teplyakov, University of Delaware angle of 87 is obtained on patterned samples. The effectiveness of the INVITED approach is chemically confirmed by the measuring the increase and The mechanisms of thermally induced reactions of atomic layer deposition decrease of the signals of metal oxide peaks using XPS. Etched thickness (ALD) and atomic layer etching (ALE) can be in sometimes viewed as and final feature geometry are determined by SEM and TEM. proceeding in opposite directions. However, for atomic layer processing of metals, that would mean that the best designed and most efficient reaction With proper chemistries and experimental conditions, this thermal-plasma pathways leading to metal deposition would produce insurmountable ALE is capable of delivering highly selective and anisotropic patterning of energy barriers for a reverse process to occur spontaneously. -
Chemical Hygiene Plan Ii Revised 03/2021 Table of Contents
MAR 2021 Office of Environmental Health and Safety Principal Author/Editor: David Webber, PhD/Chemical Hygiene Officer Contributing Authors/Editors: Nikolai Evdokimov, PhD, James Gibson, PhD, Tania Guardado, PhD, Amanda Jevons, Deona Willes, MPH Graphics/Design: Alfred M. Bouziane, MS, Brent Pantell USC Chemical Hygiene Plan ii Revised 03/2021 Table of Contents i.0 2021 Revision Summary Section 3.0 vi Section 4.0 vi Section 5.0 vii Section 7.0 vii Section 8.0 viii Section 10.0 x Appendix D x Appendix G x 1.0 Introduction Purpose and Scope 1.1 Sources of Safety Information 1.2 2.0 Regulatory Requirements 3.0 Roles and Responsibilities Research Safety Oversight Committee (RSOC) 3.1 Campus-Wide Chemical Safety Committee (CCSC) 3.1 Other Safety Committees 3.2 Office of Environmental Health & Safety 3.2 Principal Investigator (PI) 3.3 Training Requirements 3.5 4.0 Basics of Laboratory Safety Hazard, Risk, and Safety Management 4.1 Hierarchy of Safety Controls 4.1 Group Safety Management and Safety Culture 4.4 USC Chemical Hygiene Plan iii Revised 03/2021 Basics of Lab Facilities, Equipment, and Emergency Supplies 4.7 Emergency Equipment and Supplies 4.15 Open Flames 4.20 5.0 Hazard Communication Labeling and Signage Systems 5.2 Labelling and Signage in the Lab: What You Need to Do 5.5 Safety Data Sheets (SDSs): What Are They? 5.7 SDSs in The Lab: What You Need to Do 5.8 6.0 Hazardous Chemicals and Hazard Classification Introduction 6.1 Health-Hazardous Chemicals: Routes of Exposure 6.2 Particularly Hazardous Substances (PHS) 6.16 7.0 Chemical -
Chemicals, Inc. New Products Introduced Since Chemiker Vol
Chemicals, Inc. New Products Introduced Since Chemiker Vol. XXV, No. 2 an employee-owned company metals · inorganics · organometallics · catalysts · ligands · custom synthesis · cGMP facilities · nanomaterials ALUMINUM (Compounds) $ Price 13-2528 gamma-Alumina, 1/16" spheres [1344-28-1] 500g 92.00 Al O ; FW: 101.96; white spheres 2kg 276.00 2 3 98-4007 25g 2040.00 Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml electropolished Swagelok® cylinder (96-1077) for CVD/ALD [75-24-1] HAZ (CH3)3Al; FW: 72.09; colorless liq.; m.p. 15.4°; b.p. 20°/8mm; f.p. -1°F; d. 0.752 (20°) moisture sensitive, pyrophoric 98-4008 Trimethylaluminum, elec. gr. (99.999+%-Al) PURATREM, 98-1955, contained in 50 ml 25g 1640.00 Swagelok® cylinder for CVD/ALD [75-24-1] HAZ (CH3)3Al; FW: 72.09; colorless liq.; m.p. 15.4°; b.p. 20°/8 mm; f.p. -1°F; d. 0.752 (20°) moisture sensitive, pyrophoric ANTIMONY (Compounds) $ Price 51-2400 Antimony(V) sulfide, min. 98% [1315-04-4] 50g 28.00 Sb S ; FW: 403.82; yellow-orange solid 250g 56.00 2 5 51-1430 Antimony(III) telluride (99.96%-Sb) [1327-50-0] 1g 20.00 Sb Te ; FW: 626.32; black pwdr. 5g 80.00 2 3 51-5025 Tris(trimethylsilyl)antimony, 99% [7029-27-8] 100mg 68.00 [(CH ) Si] Sb; FW: 341.33; colorless to yellow liq. 500mg 272.00 3 3 3 amp air sensitive, pyrophoric HAZ NO UPS BISMUTH (Compounds) $ Price 83-4075 Bismuth(III) telluride (99.99%-Bi) [1304-82-1] 5g 45.00 Bi Te ; FW: 800.76; black pwdr. -
Preparation of Dimethylgallium-Amidine Complexes
A Thesis Submitted for the Degree of PhD at the University of Warwick Permanent WRAP URL: http://wrap.warwick.ac.uk/110549/ Copyright and reuse: This thesis is made available online and is protected by original copyright. Please scroll down to view the document itself. Please refer to the repository record for this item for information to help you to cite it. Our policy information is available from the repository home page. For more information, please contact the WRAP Team at: [email protected] warwick.ac.uk/lib-publications SOME ASPECTS OF THE ORGANOMETALUC CHEMISTRY OF GALLIUM AND INDIUM by NICHOLAS CHARLES BLACKER A Thesis submitted as part requirement for the Degree of Doctor of Philosophy University of Warwick Department of Chemistry August 1992 ii CONTENTS Page CHAPTER 1 Introduction. Gallium and Indium 1 I. Gallium and Indium 2 II. Trivalent Organometallic Chemistry of the Group 13 Elements 4 11.1. Oligomerisation S 11.2. Group Exchange 5 11.3. Neutral Adduct Formation 6 11.4. Formation of Anionic Complexes 10 11.5. Alkane Elimination Reactions 10 11.6. R2M+ Cations 13 11.7. Reaction with Oxygen 14 11.8. Insertion Reactions 15 III. The Organometallic Chemistry of Gallium and Indium 18 III. 1. The Preparation of Simple Trialkyl, Triaryls and Organometallic Halides 18 A. The Trialkyls and Triaryls 18 B. The Organometallic Halides 21 111.2. Functionalised Organometallic Compounds 23 111.3. Neutral Adducts 23 111.4. Reactions of R3M with Acids 27 A. Metal-Carbon Bonds 28 B. Metal-Nitrogen, Metal-Phosphorus and Metal-Arsenic Bonds 29 C. -
Preparation, Characterization, and Structural Systematics of Diphosphane and Diarsane Complexes of Indium(III) Halides
Inorg. Chem. 2008, 47, 9691-9700 Preparation, Characterization, and Structural Systematics of Diphosphane and Diarsane Complexes of Indium(III) Halides Fei Cheng, Sarah I. Friend, Andrew L. Hector, William Levason,* Gillian Reid, Michael Webster, and Wenjian Zhang School of Chemistry, UniVersity of Southampton, Southampton, United Kingdom SO17 1BJ Received June 13, 2008 The ligands o-C6H4(PMe2)2 and o-C6H4(AsMe2)2 (L-L) react with anhydrous InX3 (X ) Cl, Br, or I) in a 2:1 InX3/ ligand ratio to form [InX2(L-L)][InX4] containing distorted tetrahedral cations, established by X-ray crystal structures 1 31 for L-L ) o-C6H4(PMe2)2 (X ) Br or I) and o-C6H4(AsMe2)2 (X ) I). IR, Raman, and multinuclear NMR ( H, P, 115In) spectroscopy show that these are the only species present in solution in chlorocarbons and in the bulk solids. The products from reactions in a 1:1 or 1:2 molar ratio are more diverse and include the halide-bridged dimers [In2Cl6{o-C6H4(PMe2)2}2] and [In2X6{o-C6H4(AsMe2)2}2](X) Cl or Br) and the distorted octahedral cation trans-[InBr2{o-C6H4(PMe2)2}2][InBr4]. The neutral complexes partially rearrange in chlorocarbon solution, with - multinuclear NMR spectroscopy revealing [InX4] among other species. The iodo complexes trans-[InI2(L-L)2] [InI4(L-L)] contain rare examples of six-coordinate anions, as authenticated by an X-ray crystal structure for L-L ) o-C6H4(PMe2)2. Two species of formula [In2Cl5(L-L)2]n[InCl4]n (L-L ) o-C6H4(PMe2)2 and o-C6H4(AsMe2)2) were identified crystallographically and contain polymeric cations with six-coordinate indium centers bonded to one chelating L-L and a terminal chlorine, linked by alternating single and double chlorine bridges into chains.