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Precious Metals for Semiconductor Applications Precious Metals for Semiconductor Applications

Precious Metals for Semiconductor Applications Precious Metals for Semiconductor Applications

Precious for Semiconductor Applications Precious Metals for Semiconductor Applications

Umicore Thin Film Products Thin Film Products, a globally active business unit within the Umicore , is one of the leading producers of coating materials for physical vapor deposition with more than 50 years experience in this field. Its Semiconductor portfolio covers a wide range of highly effective sputtering targets and evaporation materials.

Precious Metals (PMs) e.g. , , and Platinum are used in the field of Semiconductors and Microelectronics. PMs thin film layers can serve as barrier against oxidation for retaining good electrical connectivity, as medium for , as electrical contact layer, as constituent for semiconductor effects e.g. in Schottky or Zehner , connecting layers, as a for bonding, and for other applications.

Au wire

Au sputtering target Au starter slug in mo liner Precious Metals for Semiconductor Applications

Supported Precious Metals Purity Evaporation Materials by Umicore Thin Film Products The purity of PMs depends on the established Standardized products are available from stock Silver, Gold, Platinum, , , purity of PMs available on the market and the for small quantities. A variety of shapes, such as , and selected alloys for sputtering ability to purify them to a higher level. Generaly, granulate, discs, have been established to targets or evaporation. higher purity will result in significantly higher serve different PVD applications. PM-alloys are and may increase the time depending available, but the enrichment of one element on the time needed for purification. We provide based on different evaporation pressures of the Production Process Ag, Au, and Pt with typically 4N (99.99%) purity. individual constituents is well known and needs Most of the PMs can be processed by melting, to be addressed during process design (e.g. AuGe12wt%). , and subsequent thermo-mechanical Dimensions transformation. For some PM–alloys and selected PMs, e.g. Iridium, powder processing is the Due to our dynamic management processes, Precious Services established processing route. Umicore TFP can dimension for sputtering targets up to Ø 450 mm provide products manufactured with state of (active surface) can be realized within a short Based on a well trained world wide sales team the art processes best suited for each individual of time. Various geometries, also rec- we are able to collect any spent targets around PM or PM-alloy. tangular up to a length of 900 mm, are available. the world for recycling. Our service provide full transparency to customer including monitoring recycling output and allocating customer specific Analysis Bonding weight of recycled products to newly fabricated All materials are tested in our leading edge Umicore Thin Film Products uses its own propri- products or feeding customer pool account for analytical laboratory or one of our associate etary bonding method, based on a flux-free later processing. We are supporting also world laboratories: technique. Thin film adhesion and diffusion wide PMs procurement. Upon customers request barrier layers are applied to the back of each we can provide recycling of shields with local › Hot gas extraction (LECO) target, followed by a temperature controlled partners. › Induction coupled plasma optical emission metallic solder seal between target and backing spectrometry (ICP-OES) plate. The bonding is compliant to accommodate Quality Assurance mechanical and thermal stress. › Glow discharge mass spectrometry (GDMS) The Balzers location is certified according to › Metallographic investigation ISO 9001:2000, ISO 14001:2004 and OHSAS Packaging 18001:1999 standards. Other production sites are Final cleaning and packaging is completed also ISO 9001:2000 certified. Documentation, under clean-room conditions. All targets are process specifications, traceability, sophisticated In all products obtained by melting and casting vacuum sealed in argon-filled polyethylene bags, analytical methods, and continuously trained full density (100% of theoretical) is obtained. guaranteeing consistent target performance, employees guarantee the highest and most Products manufactured by the powder metal- even when stored for a longer period of time. consistent product reliability. lurgical process are provided with the highest possible density available according to best know practice.

Microstructure Fine grain microstructure is a key factor influ- encing the sputtering behavior of a target and the uniformity of the sputtered layer. Our products are optimized for uniform grain distrib- ution, and grain size has been optimized individu- ally to PMs and applications for best economical benefit to customer.

Composition

PM-alloys such as AuAsw, AuGex, AuSny, AuZnz, are generally used to reduce the melting tem- perature and are typically applied with eutectic composition. We provide sputtering targets and evaporation materials of selected compositions.

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