Eufn 2017 Programme
Total Page:16
File Type:pdf, Size:1020Kb
Eu-F-N Workshop Day 1 (July 4th) Time Topic Status Title Presenter Affiliation 8:00 Get Together Ferdinand Hofer 8:45 Official Opening Graz University of Technology Intro Harald Plank Secondary Ion Mass Spectrometry on the Helium Ion Microscope: 9:00 Invited F. Vollnhals Luxembourg Institute of Science and Technology, a Powerful Tool for High-Resolution High-Sensitivity Nano-Analytics Belvaux, Luxembourg Helium-Ion-Beam Etched Encapsulated 9:30 Delft University of Technology, Delft, The Netherlands Contributed Graphene Nanoribbons P. Alkemade Localized ion beam mixing using a focused Neon 9:50 Contributed G. Hlawacek Helmholtz Zentrum Dresden Rossendorf, Dresden, Germany beam for future SET applications (Chair H. Plank) Beyoned Ga FIBs Large Area and High Precision Nanofabrication S. Bauerdick Raith, Dortmund, Germany 10:10 Exhibitor Employing Gallium and AuSi Focused Ion Beams 10:30 Coffee Break 11:00 Contributed COLDFIB: The new FIB source from laser cooled atoms J.B. Mellier Orsay Physics, Fuveau, France Mass-Separated Focused Ion Beams for 11:20 Altmann) Helmholtz Zentrum Dresden Rossendorf, Dresden, Germany . Contributed Self-Organized Surface Patterning L. Bischoff Faster Sputtering Rate Accompanied by the Improved 11:40 ExhibitorExhibitor T. Hrncir Tescan, Brno, Czech Republic (Chair F Low-Energy Resolution of the Novel Orage Ga-FIB Column Beyoned Ga FIBs 12:00 Lunch Break 13:00 Poster Session 14:30 Tutorial Cryo-FIB Sample Preparation: Challenges and Solutions M. Schaffer Max Planck Institute of Biochemistry, Martinsried, Germany Audoit) 15:00 Exhibitor Using a Cryo-Compatible Microgripper for Cryo TEM Sample Liftout S. Kleindiek Kleindiek Nanotechnik, Reutlingen, Germany utorials I T 15:20 Tutorial FIB Artifacts and Tricks to Overcome Them J. Reuteler ETH, Zürich, Switzerland (Chair G. 15:50 Coffee Break 16:20 Contributed Combined FIB-Nanotomography and 3D-EDX of Solid-Oxide Electrolysis Cells M. Cantoni EPFL, Lausanne, Switzerland Femtosecond Laser and FIB: A Winning Team for the Rapid Preparation of 16:40 Contributed M. Pfeifenberger Erich Schmid of Materials Science Institute, Leoben, Austria Micro-Mechanical Samples echnique Analysis of Plastic Deformation and Stresses in Micro-Cantilevers by means 17:00 Contributed EMPA, Thun, Switzerland of Electron Backscatter Diffraction J. Ast Approaches I Multi-T (Chair J.Reuteler) Correlative AFM/SEM Crystallographic and Nano- Exhibitor GETec Microscopy, Vienna, Austria 17:20 mechanical Property Analysis of FIB Treated Samples M. Winhold 17:40 Break & Common Walk Downtown 18:00 Conference Dinner Eu-F-N Workshop Day 2 (July 5th) Time Topic Status Title Presenter Affiliation 8:30 Get Together Recent Advances in FEBID Technology: Highlights from COST Invited P. Swiderek University of Bremen, Bremen, Germany 9:00 Action CM1301 CELINA 9:30 Contributed Gas Assisted Silver Deposition via Focused Electron Beam L. Berger EMPA, Thun, Switzerland 9:50 Contributed Direct-Write Fabrication of 2D and 3D Plasmonic Structures via FEBID R. Winkler Centre for Electron Microscopy, Graz, Austria Deposition (Chair H. Plank) 10:10 Particle Induced Exhibitor FIB Fabrication of Nanofluidic Devices for DNA Optical Mapping F. Pérez-Willard Carl Zeiss Microscopy, Oberkochen, Germany 10:30 Coffee Break FIBSIMS, AFM, SEM Combination for Simultaneous Analysis Contributed L. Pillatsch EMPA, Thun, Switzerland 11:00 of Elemental Composition and Surface Topography FIB Lamella Sample Preparation on to MEMS Nano-Chips 11:20 . Bábor) DENSsolutions, Delft, The Netherlands echnique Contributed for In Situ TEM Applications Y. Pivak Correlative Probe and Electron Microscopy and FIB 11:40 Approaches II ExhibitorExhibitor J. Neuman NenoVision, Brno, Czech Republic (Chair P Multi-T Applications, CPEM - New Standards in Correlative Microscopy 12:00 Lunch Break 13:00 Poster Session 14:00 Question & Answer, Podium Discussion (Chair J. Reuteler) 14:30 Tutorial 3D EDX microanalysis by FIB-SEM M. Cantoni EPFL, Lausanne, Switzerland The JIB-4700F – JEOLs new high performance 15:00 Exhibitor FIB multi-beam system G. Raggl JEOL, Freising, Germany (Chair utorials II T Graz Centre for Electron Microscopy & 15:20 Tutorial 3D Nanoprinting via Focused Electron Beams R. Winkler H.J. Engelmann) Graz University of Technology, Graz, Austria 15:50 Coffee Break Hypberbolic Cavities as Tunable Platform for Spontaneous Helmholtz Zentrum Berlin, Berlin, Germany 16:20 Contributed Emission Enhancement of Dye Molecules K. Höflich Remove Focus Ion Beam Curtaining Caused by Different Layers B. Orel Infineon Technologies AG, Villach, Austria 16:40 Contributed and Cavities within 60μm Deep Structures Pico-Second Laser and Broad Argon Beam Tools For Characterization Of A. Kastenmüller 17:00 Contributed Advanced Packages And Devices Gatan Inc. USA Advanced FIB Processing Sample Preparation for Semiconductor Process Technology (Chair M. Cantoni) Thermo Fisher Scientific, Hillsboro Oregon, USA 17:20 Exhibitor Development and Advanced Packaging Analysis using Plasma FIB D.M. Donnet 17:40 Concluding Remarks Poster Presentations Number Title Authors P-01 Polyatomic Ions from Liquid Metal Alloy Ion Sources for Broad Beam Ion Irradiation W. Pilz, L. Bischoff, R. Böttger, P. Laufer, M. Tajmar Ion channelling contrast to reveal structure and crystalline architecture of a M. Mundszinger, T. Wälde, J. Bernhard, M. Mancini P. Axmann, P-02 LiNi0.47Mn1.53O4 battery material U. Golla-Schindler, G. Neusser, M. Wohlfahrt-Mehrens, U. Kaiser Using of X-Ray to quantify thickness and composition of thin films and P-03 D. Pleha, V Hrachovec, T. Drab multilayers TIGBT P-04 FIBSIMS: Analysis of the sample composition by Secondary Ion Mass Spectroscopy L. Pillatsch, F. Östlund, J. Michler Use of Focused Ion Beam as a Tool for the Growth Control and Contacting P-05 S. Chlupova, A. Schenk, J. Vanis, J. Grym of ZnO Nanorods P-06 Fiber Facet Photonic Structures made by Ga+ Focused Ion Beam J. Vaniš, M. Vaněk, F. Todorov, P. Honzátko M.M. Shawrav, N. Cazier, S. Waid, M. Schinnerl, H. Wanzenboeck, Investigation of FIB milling on various type of gold nanostructures P-07 E. Bertagnolli, S. Schmid P-08 NanoSpace: An Analytical FIB-SEM at Ultra-High Vacuum for Ultimate Performances E. Verzeroli, A. Delobbe, A. Houel, J.B. Mellier P-09 Plasma FIB artefact-free milling using TRUE X-sectioning technique M. Šikula, T. Hrnčíř, M. Hrabovský, J. V. Oboňa P-10 Xe Plasma FIB based Delayering for Physical Failure Analysis of 14 nm Device Technology Sharang, M. Hrabovský, J.V. Obona, T. Hrncir P-11 Multi-Scale Fabrication of Diamond Nanoimprinting Dies P. Braun, J. Dluhoš, K. Durst M. Ross-Messemer, G. Riedesel, E. Mueller, M. Krieger, A. Adolf, P-12 FIB-Atlas J. Biberger, T. Volkenandt P-13 Automated TEM lamella thinning with end-point detection T. Volkenandt, F. Pérez-Willard, M. Rauscher Direct-Write Fabrication of Electric and Thermal High-Resolution Nano-Probes J. Sattelkow, J.E. Froech, R. Winkler, U. Radeschnig, C. Schwalb, M. Winhold, P-14 on Self-Sensing AFM Cantilever A. Deutschinger, T. Strunz, E.G. Fantner, V. Stavrov, G.E. Fantner, H. Plank .