RTG "Functionalization of Semiconductors"
Seminar 2014
San Sebastián, Spain, 31.07.2014 – 01.08.2014
Research Summaries
supported by:
Graduiertenkolleg 1782 „Functionalization of Semiconductors“
Workshop & Seminar
San Sebastian, Spain, july 28th – august 1st
Seminar program (august 1st):
Topic area A: Nanoscale layer structures for the functionalization of Silicon 9.00 – 9.30: K. Jandieri "Band alignment at (GaB)(AsP) / GaP interface: Theoretical suggestions from different experiments" 9.30 – 9.50: P. Springer, S. W. Koch, and M. Kira "New Approach to Calculate Excitonic Wave Functions in Indirect Semiconductors" 9.50 – 10.10: R. Woscholski, M. Stein, M. Drexler, A. Rahimi Iman and M. Koch "Optical properties and carrier dynamics of III/V semiconductors" 10.10 – 10.30: N. Knaub, A. Beyer, P. Ludewig and K. Volz "Quantitative STEM HAADF analysis of dilute Bi containing GaAs"
Topic area C: Control of functionalization 10.30 – 10.50: K. Werner, A. Beyer, K. Volz and W. Stolz "Atomic Processes during the MOCVD of Gallium on Si (001)" 10.50 – 11.10: J. O. Oelerich, A. Stegmüller, K. Werner, A. Beyer, R. Tonner, W. Stolz, K. Volz and S. D. Baranovskii "Computer Simulation of Growth Kinetics of Compound Semiconductors"
11.10 – 11.40: BREAK
11.40 – 12.00: M. Reutzel, G. Mette, M. Dürr, U. Koert and U. Höfer "Breaking the O-C-bond: adsorption of diethyl ether on Si(001)" 12.00 – 12.20: S. Laref and R. Tonner "DFT Calculations of TETRAHYDROFURAN on Si(001)-4x2" 12.20 – 12.40: A. Pick and G. Witte "Site-selective Perylene-Deposition onto Microcontact-Printed Organothiols on Au-surfaces"
Topic area B: Nanoparticles 12.40 – 13.00: J. Eußner and S.Dehnen "Functional binary and ternary Organotin Chalcogenides" 13.00 – 13.20: N. Rosemann and S. Chatterjee "Time-resolved photoluminescence-studies on AuSn-X clusters" 13.30 – 13.40: A. M. Abdelmonem, B. Pelaz and W. J. Parak "ZnO Nanoparticles: Synthesis and surface Modification for Biological Applications" 13.40 – 14.00: U. Kaiser, N. Sabir, M. Schneider, D. Jimenez de Aberasturi, W. J. Parak and W. Heimbrodt "Energy transfer characteristics of Mn doped CdS/ZnS quantum dots"
3 Poster program (july 30th, 16.00 – 19.00):
Topic area A: Nanoscale layer structures for the functionalization of Silicon
E. Sterzer, A. Beyer, K. Werner, R. Straubinger, W. Stolz. C. v. Hänisch, J. Sundermeyer and K. Volz "Nitrogen incorporation in GaAs using alternative precursors containing As-N and Ga-N bonds" T. Wegele, A. Beyer, M. Zimprich, K. Jandieri, W. Stolz and K. Volz "Investigations Focused on the Local Composition Determination of Dilute Nitride Quaternary Material Systems Grown on Si-substrates" A. Ott, A. Beyer, A. Ruiz Perez, B. Kunert, W. Stolz and K. Volz "Investigation of antimonide-based materials grown on exactly oriented (001) silicon substrate" S. Gies, M. Zimprich, T. Wegele, C. Kruska , A. Beyer, W. Stolz, K. Volz and W. Heimbrodt "Optical Spectroscopy of Novel III-V-Semiconductor-Heterostructures" J. Kuhnert, P. Ludewig, K. Volz and S. Chatterjee "Photo-modulated reflection and temperature-dependent photoluminescence studies of Ga(AsBi) bulk and quantum well structures" C. Berger, U. Huttner, M. Mootz, M. Kira, S. W. Koch, J.-S. Tempel, M. Aßmann, M. Bayer, A. M. Mintairov, and J. L. Merz "Microscopic Theory of Semiconductor Lasers" L. Kraft and H. Jänsch "An NMR-Approach to semiconductor burried interfaces"
Topic area B: Nanoparticles
N. Sabir, P. del Pino and W. J. Parak "Mn doped CdS, CdS/ZnS Nanoparticles Synthesis and characterization" B. Pelaz and W. J. Parak "Surface modification of nanoparticles" P. del Pino and W. J. Parak "Smart Particles for Bio-Apps" J. P. Eußner and S. Dehnen "Functional Binary and Ternary Organotin Chalcogenide Clusters"
Topic area C: Control of functionalization
A. Ostapenko and G. Witte "Preparation and characterization of phosphonic acid based self-assembled monolayers on Zn0 substrates" M. Lipponer, N. Armbrust, M. Dürr and U. Höfer "Reaction dynamics of exemplary organic molecules on Si(001) - a molecular beam study" A. Stegmüller and R. Tonner "MOVPE" Growth Phenomena of III/V Semiconductor studied by DFT P. Rosenow and R. Tonner "DFT-Study on the Adsorption of MOVPE-Precursors on III/V Semiconductors on Silicon and on Properties of III/V-Semiconductor Quantum Well Materials"
4
Topic area A: Nanoscale layer structures for the functionalization of Silicon
New MOVPE Precursor Molecules for Highly Efficient Casting of Nitrogen into III-V Semiconductor Materials Wolf Schorn, Katrin Schlechter, Eduard Sterzer, Kerstin Volz, Wolfgang Stolz, Jörg Sundermeyer Faculty of Chemistry, Faculty of Physics and Materials Science Center, Philipps Universität Marburg, Hans-Meerwein Str. 4 and 6
1. Introduction
Within our GRK 1782 research project A1 we are aiming to develop new volatile MOVPE precursor molecules that combine group 13 (B, Al, Ga, In) alkyl and hydride functionalities with an anionic low molecular weight N,N-chelate ligand motif. The goal is to lower the high activation barrier, the high deposition temperature and the large excess of ammonia or other nitrogen sources typically needed during casting of substantial amounts of N atoms via MOVPE into the GaAs and InP growth process, and into meta-stable III-V semiconductor materials, in particular.
2. Results
2.1 Design, Synthesis and XRD Structure Determination of MOVPE Precurors
The low energy of N-N bond cleavage in hydrazine has prompted us to use 1,1- dimethylhydrazine (DMH), an established nitrogen source in MOVPE, as building block for volatile and even liquid boranes, alanes, gallanes and indanes. In order to stabilize these covalent molecules, we established the class of N,N’-bis-dimethylamino-acetamidine (BDMA) substituents. Our ligand synthesis follows a condensation of an active iminoester of acetic acid with two equivalents of DMH [1] (Scheme 1):
Me Me 2 Me2NNH2, NEt3 HCl Me2N NMe2 HN OEt N N H H-BDMA
Scheme 1: Synthesis of H-BDMA
The reaction of Me3M (M = Al, Ga, In) with H-BDMA leads to elimination of methane and formation of low-melting, subliming and pentane soluble inorganic ring compounds
Me2M(BDMA), which were characterized via single-crystal XRD analyses (Fig. 1).
7
Me2Al(BDMA) Me2Ga(BDMA) Me2In(BDMA) m.p. 41 °C m.p. 47 °C m.p. 47 °C
Figure 1: XRD structure analyses of Me2M(BDMA) precursor molecules
The synthesis of corresponding group 13 hydrides is a challenging goal outlined in our GRK proposal. The absence of any metal-carbon bond in the precursor minimizes the danger of undesired carbon incorporation during the MOVPE process. This problem becomes immanent in the presence of the lighter elements boron and aluminum. The binary hydrides are hazardous gases (B2H6), non-volatile polymers [AlH3]x or thermally (> -30°C) highly unstable compounds Ga2H6 or [InH3]x. We found, that our BDMA ligand stabilizes molecular ternary hydride compounds of these elements. Most of them are non hazardous liquids easy to condense. Our synthesis process chain for hydrido boranes, alanes and gallanes is displayed in Scheme 2 [1,2]: Unregistered PLT
4 LiH + GaCl3 LiAlH4 - LiCl
NR3HCl -LiCl, -H2 LiGaH4
GaCl , Et O -LiCl, -H 3 2 2 R3N-AlH3
Et2O-GaH3 NMe2 NMe2 NMe2 NMe2 Me Me H Me Me N N N N H H H Al Al Ga - H , -OEt N - H , -NR N H N N H 2 2 N 2 3 N N N H Me Me Me Me Me Me Me Me H-BDMA H2Al(BDMA) H2Ga(BDMA) THF-BH3 NMe2 - H2, -THF NMe2 Me N Me N H H-BDMA, 120 °C H B B N H - H2 N H N N H3B Me Me Me H2B(BDMA) Me
Scheme 2: Synthesis of group 13 hydrides stabilized by BDMA
Single-crystal XRD structure analyses were performed at low temperature in order to evaluate the monomer or dimer nature of these molecular hydrides (Fig. 2):
8
H2B(BDMA)(BH3) H2Al(BDMA) H2Ga(BDMA)
Figure 2: XRD structure analyses of H2M(BDMA) precursor molecules
2.2 MOVPE Studies
The liquid H2Ga(BDMA) precursor was synthesized on a 20 gram scale, purified, condensed into a bubbler and used in MOVPE studies [4]. Nitrogen incorporation was determined by XRD measurements (X-Ray Diffraction). We achieved a GaNAs/GaAs growth of up to 0.8% N in combination with conventional Ga and As precursors (TEGa, TBAs) as shown in Fig. 3. The origin of the observed growth rate increase is interpreted as an efficient MOVPE process incorporating not only N but also Ga from the new precursor. Growth conditions without TEGa during GaNAs growth confirmed this interpretation. Room temperature photoluminescence (PL) measurements (Fig. 4) of not annealed sample show the expected band gap shift per % N.
No TEGa 0,8 0,9 N Incorporation Growth rate 0,7 0,8 0,7 0,6 0,6 0,5 0,5 0,4 0,4 0,3 0,3
0,2 Growth rate (in nm/s) (in rate Growth N Incorporation N %) (in 0,2 0,1 0,1 0,0 0,0 0 200 400 600 800 1000 Flow Ga(BDMA)H2 (in ml/min) Figure 3: With increasing H2Ga(BDMA) flow, N incorporation and the growth rate increase. The encircled data points represent the sample without TEGa.
1 500 ml/min + TEGa 1 1000 ml/min +TEGa 500 ml/min without TEGa
0,1 0,1
0,01 0,01 Corrected(a.u.) Intensity 1E-3 1E-3
1,0 1,1 1,2 1,3 1,4 1,5 Energy [eV] Figure 4: Room temperature PL measurements on not annealed samples (same as shown in Fig. 3).
9 3. Conclusions
We have managed to establish a new class of group 13 alkyls and hydrides suitable for synchroneous nitrogen and group 13 metal gas phase epitaxy at relatively low deposition temperatures. The key feature of these precursors is a molecular skeleton incorporating two 1,1-dimethylhydrazine building blocks with labile N-N bonds.
4. Outlook
Unregistered PLT In our current work [3] we plan to optimize the large scale synthesis 2 and purification of group 13 BDMA precursor molecules. We develop R 1 the synthesis of a corresponding set of bis-dimethylamino- R N 1 X formamidinato (BDMF) compounds (R = H) and of mono- M 2 N X dimethylamino-acet- and formamidinato compounds (R = alkyl). We N try to optimize the thermal decomposition paths and precursor volatility Me via variation of all substituents R1, R2 and X next to the central atom M. Me In addition, the growth and incorporation characteristics using the novel precursors will be studied in detail.
5. References
[1] W. Schorn, „Amidrazone, Hydrazidine und Formazane: Hydrazin-basierte Liganden zur Darstellung flüchtiger Metallverbindungen“, Dissertation Marburg 2012. [2] J. Sundermeyer, W. Schorn, R. Karch, “Metal complexes with N-aminoamidinate ligands as precursors for chemical vapor deposition processes”, WO2012113761 (A1). [3] K. Schlechter, ongoing research towards the dissertation. [4] E. Sterzer, Master thesis, to be submitted august, 2014.
10 MOVPE Growth of Dilute Bismide Ga(AsBi) Quantum Well Structures for High Efficiency IR Laser Devices P. Ludewig, N. Knaub, Z. Bushell, L. Nattermann, E. Sterzer, W. Stolz, K. Volz Faculty of Physics and Material Sciences Center, Philipps-Universität Marburg
Dilute bismide Ga(AsBi) based lasers diodes are promising candidates for high efficiency IR light sources. The incorporation of only a small amount of Bi into GaAs decreases the temperature sensitivity of the emission wavelength compared to conventional III/V semiconductors hence less cooling of the devices is needed. Furthermore, if the Bi content is above 10.5 %, the spin-orbit splitting becomes larger than the bandgap which is due to the band anticrossing in the valance band. In this case auger loss processes could be suppressed leading to higher efficiencies and less heating of the devices. However, Ga(AsBi) is highly metastable which leads to segregation of bismide at the surface and the formation of metallic droplets during growth. In order to incorporate a significant amount of Bi into GaAs low growth temperatures are required and all growth parameters need to be adjusted very carefully.
Ga(AsBi)/GaAs quantum well (QW) and bulk structures were grown by metal organic vapor phase epitaxy (MOVPE) on exact GaAs (001) substrates. All liquid precursors as triethylgallium (TEGa), trimethylaluminum (TMAl), tertiarybutylarsine (TBAs) and trimethylbismuth (TMBi) were used to enable growth temperature as low as 375 °C to 450 °C. The structure of the samples was investigated by as scanning transmission electron microscopy (STEM), high resolution X-ray diffraction (HR-XRD) and atomic force microscopy (AFM). The optical properties were studied by room temperature photoluminescence (PL) measurements.
If all parameters are adjusted carefully Ga(AsBi) layers with Bi fractions up to 5% in good quality can be realized without any formation of metallic droplets. It was found, that the incorporation of Bi into GaAs is limited depending on the applied growth temperature and growth rate and can be influenced by the V/V ratio. Surplus Bi then segregates to the surface and can incorporate into subsequent layers or form metallic droplets if it is not evaporated by a growth interruption at higher temperatures. All samples show a significant PL signal already after growth which can further be improved by annealing at temperatures between 600 °C and 700 °C. The PL peak shifts by about 80 meV / % Bi which is in a good agreement with the theory. The introduction of (AlGa)As barriers grown at 625 °C improves the electronic confinement of the Ga(AsBi) quantum wells compared to pure GaAs barriers and therefore allows the growth of laser diodes. First experiments on a Ga(AsBi0.022)/(AlGa)As SQW device show promising threshold currents in the range of 800 mA/cm² at an emission wavelength of 950 nm. In addition, Ga(AsBi) laser structures with Bi > 4% were realized that showed lasing operation at low temperatures and indicate a reduced temperature sensitivity of the emission wavelength.
11
Quantitative STEM HAADF analysis of dilute Bi containing GaAs Nikolai Knaub, Andreas Beyer, Tatjana Wegele and Kerstin Volz Material Sciences Center and Faculty of Physics, Philipps-Universität Marburg
Introduction Our field of research in the framework of the GRK „Functionalization of Semiconductors“ is the quanitative analysis of dilute III/V semiconductors such as Ga(AsBi) or Ga(NAs) on an atomic scale. These dilute III/V semiconductors became very promising materials for optical and electronical devices because the dilute elements have a significant influence on the semiconductors‘ band structure. Since the samples (e.g. Ga(AsBi) ) were grown by metal organic vapour phase epitaxy (MOVPE) under metastable growth conditions [1], a homo- geneous distribution of the dilute atoms is not automatically given and thus the structure has to be examined.
Results For the characterization of dilute Bi containing GaAs we use the high angle annular dark field (HAADF) method via the scanning transmission electron microscope (STEM), which is also known as the so called Z-contrast imaging. Thus the measured intensity is approximately proportional to Z² (Rutherford-scattering). The imaging was performed with a double spheri- cal aberration corrected JEOL JEM 2200 FS, operating at 200 kV. For a quantitative evaluation and comparison with the experiment, image simulations are unavoidable. We used the HREM package [2] which is based on a fast Fourier transforma- tion (FFT) multislice method. Here, a supercell of a certain thickness is divided in many slices (usual slice thickness is the thickness of a unit cell). However, the simulated probe interacts with each slice separately where the scattering and thus the intensity is calculated. At the end the final intensity is the sum of the particular slice intensities. To evaluate the simulated (as well as the experimental) images we used the integrated intensity method combined [3]. By using this method one can create a histogram where the intensity distribution is shown. Figure 1a) depicts the group V intensity distribution of a simulated Ga(AsBi) supercell with 3.8% Bi and with a thickness of 5 nm. A huge peak at 0.0225 and two other smaller peaks at higher intensities are clearly visible. Since the scattered intensity is approximately proportion- nal to Z², the highest peak belongs to the pure As containing columns. Knowing this, one can attribute the other peaks to the Bi distribution on the group V columns. Since we know the structure of the the supercell, it is possible to mark the columns which contain Bi atoms. Such a Bi distribution map is depicted in figure 1b). Here group V columns are marked (yellow) which contain two Bi atoms in a column. By knowing the x-y coordinates of these columns intensity and coordinates can be matched. This allows to identify how many Bi atoms are in each group V column.
13 Group V intensites
Therefore it can be concluded that the highest intensities in fig. 1a) belong to group V columns containing two Bi atoms and the intensities around 0.03 belong to group V columns containing one Bi atom.
Outlook The presented results of the simulated images evaluation are promising for the comparison with experimental measurements. For real quantitative evaluation of single impurity atoms on the group V sublattice, also the sample preparation has to be improved further, allowing us to obtain much thinner samples.
[1] Ludewig et al., Journal of Crystal Growth 396 (2014), pp. 95 - 99 [2] Ishizuka K., Ultramicroscopy 90 (2002), pp. 71-83 [3] S.I. Molina et al., Ultramicroscopy 109 (2009), pp. 172-176
14 Investigations Focused on the Local Composition Determination of Dilute Nitride Quaternary Material Systems Grown on Si-substrates
T. Wegele, A. Beyer, M. Zimprich, K. Jandieri and K. Volz Material Sciences Center and Faculty of Physics, Philipps-Universität Marburg
Introduction Our investigations in the framework of the GRK „Functionalization of Semiconductors“ is focused on the quantitative analysis of dilute quaternary semiconductor materials grown by by metal organic vapour phase epitaxy (MOVPE) under metastable growth conditions, for example, Ga(NAsP), which is important as an active layer in laser structures to realize a laser on a Si substrate [1]. The quality of the layer depends on the local composition and on the distribution of the components that can be investigated only on the atomic scale using a scanning transmission electron microscope (STEM).
Results
The investigations of the quaternary semiconductor materials were performed using a JEOL JEM 2200 FS with a double corrected spherical aberration, operating at 200 kV. Especially the high-angle annular dark-field (HAADF-STEM) technique was applied, which makes the interpretation of the micrographs easier in comparison to the conventional TEM measurements because the scattered intensity is proportional to Z1.6-2 [2] (Rutherford-like scattering [3]). For evaluation of experimental results the integrated intensity method was used [4]. This method includes the identification of the peak positions in the micrographs, separation of the peaks belonging to the different sublattices, integration of the intensities within a certain radius around these peaks and at least creation of the histograms describing the distribution of the peak intensities. The optimal integration radius is a variable, which was also determined during our studies. Characterization of our structures using Raman spectroscopy as well as photoluminescence spectroscopy [5] showed a change of the composition of the Ga(NAsP)-layers after annealing treatment, which is normally applied to increase the quality of the layers [6]. To assess what happens on a local scale, HAADF-STEM imaging of the Ga(NAsP)-layers was performed. Fig. 1 a) shows that the interfaces of the GaNAsP-layers become rougher with increasing temperature of the thermal treatment. Moreover, the HAADF-intensity of the Ga(NAsP)-layer decreases for higher annealing temperature. Along with that, we observe a HAADF-intensity increase of the neighboring GaP-layers. This means, that outdiffusion of the components of the Ga(NAsP)-layer takes place. Moreover, Ga(NAsP)-layers of the annealed specimens reveal some kind of defects, that show up in HAADF images as dark spots. For quantitave analysis of these defects the high resolution STEM images (Fig. 1 b)) were done for different scattering angles. The measurements at high scattering angles are more sensitive to the atoms with high Z, whereas the lighter atoms can be better detected at lower scattering angles [7]. The intensities in the dark spots and the bright regions in the Ga(NAsP)-layers were compared. The histogram for the intensities of group-V-sublattice at lower angle reveals a significant shift to the higher intensity values, it becomes broader and more asymmetric in the bright region. The skew direction shows that atoms with low Z were detected. This means, that bright region contains more N than dark region.
15 Outlook
To determine the N-content in the bright region simulations have to be done [8]. For that reason the exact knowledge of the sample thickness and microscope parameters are needed. We optimized the thickness determination of simple materials, e.g., GaP using simulated intensities. This can be used to determine the thickness of neighbouring Ga(NAsP)-layer, so we will be able to do reliable simulations.
Fig. 1: ADF-STEM images of Ga(NAsP): a) low resolution HAADF images of the as-grown specimen and the specimens annealed at T=925 °C and T=975 °C with corresponding normalized intensity profiles. b) high resolution ADF-images of the specimen annealed at T=925 °C, measured at low (top) and high (bottom) scattering angles. The histograms describe the distributions of the intensities, evaluated from the dark and bright regions in the Ga(NAsP)-layer.
16 References
[1] S. Liebich, M. Zimprich, A. Beyer, C. Lange, D. J. Franzbach, S. Chatterjee, N. Hossain, S. J. Sweeney, K. Volz, B. Kunert and W. Stolz, Appl. Phys. Lett. 99, 071109 (2011) [2] S. Pennycook, B. Rafferty, and P. Nellist, Microscopy and Microanalysis 6, 343 (2000). [3] E. Rutherford, Philosophical Magazine 21, 669 (1911). [4] J. M. LeBeau, S. D. Findlay, L. J. Allen, and S. Stemmer, Nano Lett. 10 (2010), 4405-4408. [5] S. Gies, M. Zimprich, T. Wegele, C. Kruska, A. Beyer, W. Stolz, K. Volz, W. Heimbrodt, Journal of Crystal Growth, 402 (2014) 169-174. [6] B. Kunert, D. Trusheim, V. Voßebürger, K. Volz, and W. Stolz, Phys. Stat. Sol. (a), 1 (2008) 114- 119. [7] Y. Kotaka, Appl. Phys. Lett.101, 133107 (2012). [8] K. Ishizuka, Ultramicroscopy 90 (2002) 71-83.
17
Carrier Dynamics in (BGa)(NAsP)-materials on silicon R. Woscholski, M. Stein, A. Rahimi-Iman, W. Stolz, M. Koch Faculty of Physics and Material Sciences Center, Philipps-Universität Marburg
Introduction
The goal of my work performed in the framework of the GRK functionalization of semiconductors is to investigate the carrier dynamics of metastable nitrogenous and boracic III/V semiconductors on Silicon, fabricated in the framework of the GRK.
Work and Results
The band gap of the quantum well material lies at higher energies than the band gap-energy of the silicon substrate. As typical pump-probe measurements analyze the transmitted probe light, the spectral part that carries the absorption characteristics of the quantum wells will be absorbed when passing through the substrate.
Therefore the substrate of samples that are to be analyzed in a transmission setup needs to be removed. I compared different approaches for substrate removal or thinning with regard to their expenditure and feasibility: the etching of silicon with KOH and the mechanical sanding and polishing. To minimize irregularities in thickness when using chemical etching it is helpful to keep the etch time short. The etch rate of KOH is between one and two micrometers per minute at a temperature of 80°C. Therefore a substrate of several hundred micrometers thickness would need a mechanical thinning beforehand. Additional requirements for the glue used to stick the sample to a sapphire plate make sanding and polishing the preferable alternative for sample preparation.
Silicon has an indirect band gap. If the substrate is thin enough the absorption of the substrate is not dominating the absorption spectrum of the sample. This could be tested by comparing the linear absorption spectrum of prepared sample with a silicon substrate. The suitable substrate thickness lies between forty to seventy micrometers. Further sanding results in damaging the samples. Time-resolved photoluminescence (TRPL) measurements that were performed on both thinned and unprepared sample pieces proved that the quantum well structure has not been damaged by the preparation. Unfortunately the linear absorption showed neither at room temperature nor at 10K distinct features that would have allowed us to identify the band edge or the different excitonic resonances.
An interesting process of the carrier dynamics would be the observation of the -X transfer, meaning the transfer of carriers from the -point in the quantumwell to the X-point in the barrier. Depending on the strain and the nitrogen concentration, the energetic position of the barrier conduction band at the X-point might or might not lie near the first two energy levels of the quantum well. Depending on the exact alignment, which is to be investigated, this could result in a fast carrier transfer from the quantum well to the barrier which would have a major influence on the lasing characteristics of this material. In order to investigate this, TRPL measurements with different excitation wavelengths have been perforemed. However, no drastic changes in the
19 decay time have been observed. This might be due to the GaP intermediate layers that separate the quantumwell material from the barriers to prevent the boron and the nitrogen from forming clusters. Samples with thinner intermediate layers, however, might show a different behavior.
Nevertheless, the time resolved photoluminesence of this sample revealed decay times in the range of a few nanoseconds and a faster and more pronounced non-exponential decay with rising excitation power (Fig. 1a). The comparison of the time-integrated and the initial photoluminescence intensities (Fig. 1b) indicates that this faster decay is probably due to a faster non-radiative recombination.
10mW time-integrated (a) 1 (b) 20mW directly after exc. 30mW 40mW 50mW 10 60mW 80mW 100mW 120mW 140mW 160mW
0.1 180mW
200mW
norm. PL Intensity PLnorm. =1
PL intensity (a. u.)
1 #15512 #15512 0.01 0 300 600 10 100 Time (ps) Power [mW]
Figure 1: (a) Integrated transients for different excitation densities at T=10 K. (b) Comparison of the initial and the time integrated PL intensities.
Conclusion and Outlook
Due to the sample structure and the material system, absorption measurements remain challenging while the samples are very much suited for photoluminesence measurements. To investigate -X transfer samples with a certain barrier material and thin GaP intermediate layers will be fabricated by the WZMW. It is planned to study the influence of the composition and fabrication parameters on the carrier dynamics by photoluminesence measurements with excitation wavelength, power and temperature.
20 THz Effects on bulk GaAs M. Drexler, R. Woscholski, A. Rahimi-Iman, M. Koch Faculty of Physics and Material Sciences Center, Philipps-Universität Marburg
The interaction of an optically induced excitonic polarisation with strong electric fields that are in the terahertz (THz) frequency-range has been studied in various systems so far, within group IV, III-V, and II-VI materials [1]–[3]. However, most of these studies have been concerned with multiple quantum wells (MQW). Here we study a bulk GaAs sample being 1.1 µm thick glued to a sapphire substrate. Due to strain caused by the substrate, the heavy-hole (hh) and light-hole (lh) resonance exhibits a splitting of 1.6 nm. The setup has previously been described in [1], [2]. Instead of a broad supercontinuum pulse, here we use the frequency-doubled output of an optical parametric amplifier. At an excitation wavelength of 820 nm, a pulse length of 120 fs and an excitation density of 4·109 photons/cm2 the absorption is not broadened by the optical probe pulse itself. If the THz pulse is coincident with the optical pulse at the time-zero, a bleaching of both the hh- and lh- resonances is observed (Fig. 1). In fact, this bleaching exhibits a double-structure in time that resembles the temporal evolution of the THz pulse. This behavior differs from the II-VI MQW studies [2]. The Ge/SiGe MQW system studied in [1], however, shows a comparable time dependence of the transient absorption following the electric field. When varying the electric field-strength of the THz-field (Fig. 2 (a)), the bleaching of both resonances at time-zero exhibit a threshold behavior.
Fig. 1: THz-induced changes in the absorption of a 1 µm bulk GaAs sample on a sapphire substrate at T=10 K for an electric field-strength of 9.4 kV/cm
Another remarkable feature of the transient absorption is an oscillatory signal for negative time delays where the infrared probe pulse precedes the THz pulse (Fig. 1). From optical pump-optical probe experiments it is known that for negative time-delays the polarization induced by the probe pulse will dephase instantaneously when the pump pulse is present. In
21 the spectral domain this manifests as coherent oscillations [4]. In this study, however, the polarization of the probe pulse dephases due to the impinging THz-field. The field- dependence of these coherent oscillations is shown in Fig. 2 (b) as changes in the differential absorption ΔαL for negative time-delays.
(a) (b)
Fig. 2: (a) THz field-dependent bleaching of the hh- and lh-resonances at a THz-delay time of TTHz=0 fs (grey horizontal line in Fig. 1.) in the linear absorption. (b) THz field-dependent coherent oscillations at a THz-delay time of TTHz=-1170 fs (white horizontal line in Fig. 1.) as seen in the differential linear absorption. The field-strength is varied from 0 kV/cm (back) to 9.4 kV/cm (front) within 35 steps for both cases.
[1] N. S. Köster, A. C. Klettke, B. Ewers, R. Woscholski, S. Cecchi, D. Chrastina, G. Isella, M. Kira, S. W. Koch, and S. Chatterjee, “Controlling the polarization dynamics by strong THz fields in photoexcited germanium quantum wells,” New J. Phys., vol. 15, no. 7, p. 075004, Jul. 2013. [2] B. Ewers, N. Köster, R. Woscholski, M. Koch, S. Chatterjee, G. Khitrova, H. Gibbs, a. Klettke, M. Kira, and S. Koch, “Ionization of coherent excitons by strong terahertz fields,” Phys. Rev. B, vol. 85, no. 7, pp. 1–5, Feb. 2012. [3] H. Hirori, M. Nagai, and K. Tanaka, “Excitonic interactions with intense terahertz pulses in ZnSe/ZnMgSSe multiple quantum wells,” Phys. Rev. B, vol. 81, no. 8, p. 081305, Feb. 2010. [4] K. Kolata, N. Köster, A. Chernikov, M. J. Drexler, E. Gatti, S. Cecci, D. Chrastina, G. Isella, M. Guzzi, and S. Chatterjee, “Dephasing in Ge/SiGe quantum wells measured by means of coherent oscillations,” Phys. Rev. B, vol. 86, no. 20, p. 201303, Nov. 2012.
22 The effects of rapid thermal annealing on the disorder and composition of Ga(N,As,P) quantum wells on silicon for laser application Sebastian Gies, Martin Zimprich, Tatjana Wegele, Carsten Kruska, Andreas Beyer, Wolfgang Stolz, Kerstin Volz, and Wolfram Heimbrodt Faculty of Physics and Material Science Center, Philipps University Marburg, D-35032 Marburg, Germany
Abstract Realizing suitable light sources for optical data transmission on silicon is one of the major goals of optoelectronic integration nowadays. The quaternary Ga(N,As,P) is a promising candidate for this as it can be integrated monolithically on silicon. Here, we present an analysis of the annealing effects on Ga(N,As,P) quantum wells (QWs) on silicon using PL, PL excitation and raman spectroscopy as well as transmission electron microscopy (TEM).
The samples consist of a 5 nm thick Ga(N0.07,As0.82,P0.11) QW between 5.6 nm GaP and 33 nm (B,Ga)P barriers. This unit is repeated 3 times and embedded in an optical confinement region of (B,Ga)(As,P) layers. As substrate Si was used. The growth was performed using metal-organic vapor-phase epitaxy at a growth temperature of 575 °C. After growth the samples underwent rapid thermal annealing for ten seconds at annealing temperatures Ta between 800 °C and 1000 °C. Figure 1 depicts the room temperature PL spectra of the samples. The spectra are normalized to the silicon emission at 1.09 eV. Around 1.35 eV the Ga(N,As,P) emission can be seen. For the as grown sample no emission could be observed. With increasing Ta the luminescence intensity undergoes a maximum at 925 °C. Additionally, the FWHM has a minimum around 900 °C. Therefore, we can determine the optimal Ta to be in this range. Most surprising is the fact, that the emission is monotonously blueshifted with increasing Ta. In addition to the PL we performed raman spectroscopy, observing a decrease of the GaAs-LO signal with increasing annealing temperature. This result is in perfect Figure 1: PL spectra of the Ga(N,As,P)-MQW samples agreement with the PL measurement. at room temperature. The spectra a labeled according to the annealing temperature during RTA processing. The The blueshift of the emission is caused inset shows the integrated intensity and the FWHM as a by a As-P-exchange between the function of Ta. Ga(N,As,P) QW and the barriers. The amount of As-P-exchange can be estimated from raman spectroscopy to be approx. 10%. In order to get accurate access to the electronic changes we performed PLE spectroscopy revealing the excitation bands. Comparing these with QW calculations taking strain into account we could determine the As-P-exchange to be 5-10% for Ta = 975 °C. To further analyze the interplay of removing defects by annealing and creating new ones by As-P-
23 exchange we studied the disorder of the Ga(N,As,P) QW. A two scaled disorder common for these materials was found [1,2]. Both disorder scales are minimal for Ta between 900 °C and 925 °C. This can be explained considering that the As-P-exchange leads to more microscopic defect (short ranged disorder) and may also generate well width fluctuations and strain fields (log ranged disorder). Finally, we examined the structure using TEM to directly examine the changes in QW morphology and composition. The HAADF-images and corresoponding intensity profiles further support decreasing QW quality and a reduction in As content with increasing Ta. To sum up, we found that the annealing process necessary to increase the optical properties of the Ga(N,As,P) QW are inevitably accompanied by an As- P-exchange between QW and barrier, leading to a blueshift of the emission.
References [1] C. Karcher et al., Journal of Luminescence 133, 125 (2013). [2] C. Karcher et al., Phys. Rev. B 82, 245309 (2010).
24 Type-II Excitons in (Ga,In)As/Ga(N,As)-quantum wells on GaAs Sebastian Gies, Philip Hens, Carsten Kruska, Wolfgang Stolz, Kerstin Volz, and Wolfram Heimbrodt Faculty of Physics and Material Science Center, Philipps University Marburg, D-35032 Marburg, Germany
Abstract Quantum Well (QW) structures are used in many semiconductor devices. These systems inevitably contain interfaces, that influence the charge carriers. Since the recombination of the excitons takes place across the interface their properties are influenced by the interface, making type-II excitons an excellent probe to study internal interfaces. Here, we present an analysis of the recombination of spacially indirect (type-II) excitons in (Ga,In)As/Ga(N,As)- MQWs on GaAs.
The MQW structures under investigation were grown epitaxially using metal-organic vapor- phase epitaxy. On the GaAs substrates a 10 nm thick (Ga0.76,In0.24)As was grown. This layer is followed by a GaAs barrier of varying thickness between 1 and 7 nm and a QW consisting of Ga(N,As). The nitrogen content in this QW was chosen to be 0.5% to have type-I samples and 5% to have type-II samples. The final capping consists of 45 nm GaAs. No post-growth annealing was applied. Figure 1 shows the luminescence spectra of the type-II samples for different GaAs interlayer thicknesses. For the sample with a 6 nm thick interlayer the type-I transition of the (Ga,In)As is clearly visible at 1.250 eV. Additionally a broad IR-band around 0.8 eV is visible. This is most likely because of the EL2 level of the GaAs substrate. For decreasing interlayer thicknesses the type-I transition disappears and a new peak arises at approx. 0.950 eV. This is because of the type-II transition between the electron in the Ga(N,As) QW and the heavy hole (hh) in the (Ga,In)As. The type-II luminescence does not occur for the thickest interlayer because the special separation of electron and hole is too big. The type-I samples containing 0.5% of nitrogen only show the type-I (Ga,In)As transition, which is lowest in energy Figure 1: Low temperature PL spectra of the (not depicted). The inset shows the (Ga,In)As/Ga(N,As) type-II samples for different interlayer result of a quantum well calculation thicknesses. The inset shows the bandoffsets of the MQW structure and the energy levels and probability density of using the transfer matrix method. In electron and hole contributing to the type-II transition. this calculation we take strain into account. Conjuction of experiment and calculation reveal the heterooffest between the conduction bands of Ga(N,As) and GaAs to be 600 meV. For the heavy hole band within the
25 errorbars no offset was found. Furthermore, we find the electron and the heavy hole wavefunction to be strongly confined to their respective QW supporting the explanation for the absence of the type-II transition in the PL spectra for a 6 nm thick interlayer. Additionally, we performed PL experiments using varying excitation intensities. These measurements reveal a second indirect transition for high excitation intensities. This transition is most likely because of the e1-hh2 transitions, which is possible because the selection rules are weakend for indirect transitions. Finally, we aim to present time resolved mearurements of the type-I and type-II transitions to reveal the recombination dynamics of the type-II transitions and their interplay with interface properties such as interlayer thickness and quality.
26 B. Breddermann et al. / Journal of Luminescence 154 (2014) 95–98 97
sp st As a general trend, we observe a strong redshift of the PL peak frequency of photon mode q. Ωk;q and Ωk;q are, respectively, the spontaneous emission source and renormalized field describing with increasing x. Furthermore, we note that the measured PL stimulated emission or absorption, while for a given photon mode intensity shows a strong bleaching with decreasing x, at least in comprises the dipole matrix element between electron and the range of dilute Bi contents up to x 4:4%. The most likely F q ¼ fi hole states, the mode function and the vacuum-field amplitude. explanation for this observed reduction in PL ef ciency is the sample-dependent carrier excitation efficiencies [20]. For decreas- Coulomb scattering effects are treated in the second Born–Markov x approximation [17,18]. ing the purity of the samples decreases, which is related to the presence of a higher density of defects in samples with low x. The numerical evaluation of the equations allows us to extract the intrinsically homogeneously broadened luminescence spectra. Localized growth-condition related defect states can trap carriers Microscopic Calculation of theor Luminescence induce dephasing processes, Spectra thereby of reducing the effective To account for the disorder effects in the samples [10], the microscopically computed PL spectra can be inhomogeneouslyDilute Bismidecarrier Systems density in the material. Since the defect density is higher for the samples with lower Bi compositions, this results in strongly broadened by convolving them with a Gaussian distribution [19]. B. Breddermann, A. Bäumner,reduced P. Springer, effective S. carrierW. Koch densities at low x. The comparison to experimental results from the literature, see e.g. Ref. [20], reveals Department of Physics and Material Sciencesthat Center, our Bi-dependent Philipps-Universität PL-bleaching Marburg effect is significantly stronger for most of the samples studied here. We tentatively attribute 4. Results and discussionThe strong modifications to the band structure introduced by bismuth incorporation promise these features to the differences in sample quality. However, as Fig. 1 depicts (a)the the possibility measured and of (b) band the calculated gap engineering PL spectra leadingalready to mentioned, applications the in uniform active intensity and passive trend is only observed for the six samplessemiconductor with systematic optical variation devices of the Bi [1]. composition Of special interestup to x is4 : the4% (sample long-wavelength 5). For higher operation Bi content, of the intensity ¼ x, as characterizedGaAs-based in Table 1 . optical The cases devices of lower in which [higher] Auger Bi recombinationtrend is reversed can to abe bleaching suppressed for increasing by proper(instead of decreas- contents are depictedengineering in subframe of the (i) band [(ii)], structure for both experimentthrough targeteding) introduction Bi content, of as bismuth it is corroborated into the system by the intensity[2, reduction and theory, respectively. In order to compare both measured and from x 4:4% (sample 5) to x 5% (sample 6). This trend reversal 3]. ¼ ¼ calculated PL on the same scale among all of the samples with between 4 and 5% is in full agreement to the experimental findings different Bi content,In order a single to analyze overall experimental scaling factor results– one obtained for of in Ref. the[20] group. of Prof. Volz, we calculated the experiment andphotoluminescence one for theory – was (PL)extracted spectra by normalizing of GaBixAs1-x samplesTo account for for differentthe sample-dependent, bismuth content experimentally x available all spectra with respectsolving to the respective time dynamics peak value of of the the photon-assisted sample effective polarization carrier densities and coupled in the theoretical microscopic analysis, we have to with highest overallquantities intensity, such i.e., assample the 5. photon-number-correlation The fully computed adjust and the carrier optically distributions. active electron To– holetheoretically plasma densities. There- results including the inhomogeneous broadening are shown as fore, the computed spectra3 * in Fig. 1(b-i/ii) were determined under account for the bismuth incorporation into the system we used a sp s tight-binding supercell 11 2 solid lines in Fig. 1(b-i/ii), while the intrinsically homogeneously adaption of the carrier density yielding 1:5 10 cm À for and a 14-band k⋅p approach [4] to calculate the band structure appropriately. This method 11 broadened results corresponding to the full ones are added as samples 1 and 2, i.e, the lowest Bi contents, and 5 10 cm 2,  À dotted lines. We obtainaccounts the best for several overall theory-experiment effects such as agree- Bi-related8 : resonant0 1011 cm states2, and undergoing 3:5 1012 cm valence2 for samples band 3, 4, and 5 with  À  À ment by choosinganti-crossing the width of the(VBAC) inhomogeneous and interactions distribution with as extendedincreasing statesx. Finally,of the GaAs for sample valence 6 at bandx 5 %edge, the experimentally ¼ 50 meV. [5]. observed intensity trend reversal is reflected by the underlying
0.02
0.01
0.00 1.15 1.20 1.25 1.30 1.20 1.25 1.30
1.0
0.5
0.0 1.0 1.1 1.2 1.3 1.0 1.1 1.2 1.3
Fig. 1. Comparison of (a) measured and (b) calculated photoluminescence (PL) spectra for the GaBixAs1 x samples of Table 1 (lower Bi contents in subframe (i), higher ones Fig. 1: Comparison of (a) experimental and (b) theoretical photoluminescenceÀ spectra for different in (ii), for both experiment and theory, respectively). Red, green, blue, black, magenta, and cyan lines denote the PL spectra for samples 1, 2, 3, 4, 5, and 6, respectively. The solid (dotted) linesbismuth in (b) denote content the casex. The with subframes (without) inhomogeneous i show lower broadening, contents as describedcompared in the to text.subframes In order to ii. compare The solid the measured(dotted) and calculated PL on the same scale, all oflines the spectra in (b) were denote normalized computations with respect with to the (without) respective in peak homogenous PL of the case broadening. with the highest All peak spectra intensity, are i.e, normalized sample 5, as clarified in the text. (For interpretation ofwith the references respect toto colorthe PL in this peakfigure of caption,sample the 5. reader is referred to the web version of this article.)
27 As depicted in Fig. 1 [6], we could achieve an astonishing agreement between experimental (subfigures a-i and a-ii) and theoretical (subfigures b-i and b-ii) luminescence spectra for all investigated Bi contents. The trend of a strong redshift of the PL peak with increasing x could be reconstructed as well as the bleaching of the PL intensity with decreasing x up to a certain bismuth level (x=4.4%) by adjusting the carrier densities. This behavior can be explained by the sample purity which decreases with decreasing Bi continent due to a higher defect !density. Overall, we computed the band structure of diluted bismide systems using an effective 14- band k⋅p method. On this basis we computed the photoluminescence spectra for several !bismide contents and found very good agreement with experimental findings. [1] Y. Tominaga, K. Oe, M. Yoshimoto, Photo-pumped GaAs1-xBix lasing operation with low- temperature-dependent oscillation wavelength, in: International Society for Optics and Photonics, SPIE OPTO, Bellingham, Washington, p. 827702. [2] C.A. Broderick, M. Usman, S.J. Sweeney, E.P. O'Reilly, Semicond. Sci. Technol. 27 (2012) 094011. [3] K. Alberi, J. Wu, W. Walukiewicz, K.M. Yu, O.D. Dubon, S.P. Watkins, C.X. Wang, X. Liu, Y.-J. Cho, J. Furdyna, Phys. Rev. B 75 (2007) 045203. [4] M. Usman, C.A. Broderick, A. Lindsay, E.P. O'Reilly, Phys. Rev. B 84 (2011) 245202. [5] S. Imhof, C. Bückers, A. Thränhardt, J. Hader, J.V. Moloney, S.W. Koch, Semicond. Sci. Technol. 23 (2008) 125009. [6] B. Breddermann, A. Bäumner, S.W. Koch, P. Ludewig, W. Stolz, K. Volz, J. Hader, J.V. Moloney, C.A. Broderick, E.P. O’Reilly, Journal of Luminescence 154 (2014), pp. 95 - 98.
28 Towards Novel Redox Mediators for Dye-sensitised Solar Cells Lars Hendrik Finger AK Sundermeyer, FB Chemie, Philipps-Universität Marburg
In the frame of my PhD research within the GRK 1782 I am focusing on the development of - - alternative redox couples -the traditional I /I3 couple suffers from severe disadvantages- thereby facilitating the exciton dissociation into mobile electrons and holes at the TiO2 semiconductor surface.[1] Polysulfides are prospective alternatives for the iodide tri-iodide redox couple in quantum dot[2,3] or dye sensitised solar cells.[4] Ionic liquids (ILs) offer a range of advantages for the application in organic solar cells, e.g. very low vapour pressure, wide electrochemical and thermal stability window. Hydrosulfide based ionic liquids were synthesised previously by salt metathesis reactions under aqueous conditions, and were employed in the synthesis of organic polysulfides.[2] It is a fact that the resulting substances cannot be easily purified from halogen and water residues which are highly undesirable for electrochemical applications. We wish to present an easy and completely halogen, metal and water free approach to hydrosulfide based ILs and low melting salts with organic cations.[5] Corresponding substances were prepared by introducing hydrogen sulfide gas into solutions of methyl carbonate based ILs (Scheme 1) which are easily accessible themselves from the appropriate nucleophiles (e.g. 1-ethylimidazole) and dimethyl carbonate.[6]
Scheme 1. Halogen free synthesis of hydrosulfide and polysulfide based ionic liquids.
A variety of cations has been employed ranging from alkyl-methyl-imidazolium, over alkyl-methyl-pyrrolidinium and –piperidinium to trialkyl-methyl-phosphonium ions. The compounds were characterized by NMR spectroscopy and elemental, single crystal XRD (Figure 1) and TGA/DSC analyses.
Figure 1. Molecular structures of butyl-methyl-pyrrolidinium hydrosulfide, ethyl-methyl-imidazolium hydrosulfide and butyl-methyl-imidazolium hydrosulfide.
The reactivity of the compounds was investigated primarily with respect to the dissolution of elemental sulfur under non-aqueous conditions (Scheme 1). Polysulfide based 2- 2- ILs with anions in the range S2 to S8 can be prepared in this manner. UV/Vis spectroscopic examination proved a mixture of polysulfides to be present (Figure 2) which is in agreement with the published literature where sulfur has been dissolved e.g., in dicyanamide[7] and
29 dithiocarbonate[8] based ILs. Cyclic voltammetry (Figure 2) was performed in order to evaluate the redox chemistry of the polysulfides.
Figure 2. UV-Vis spectra and cyclic voltammetry of butyl-methyl-pyrrolidinium sulfides.
It is evident, that the redox chemistry of the compounds greatly depends on the sulphur content. While the disulfide salt shows only irreversible processes (φox: −1.721 V,
−0.833 V, −0.764 V, φred: −1.687 V) the formal octasulfide salt exhibits two reversible redox processes (φ0,a: −1.762 V, φ0,b: −0.929 V) and one additional irreversible oxidation (φox: −1.258 V). Upon comparison with literature values[7] the reversible redox processes can be attributed to the following redox reactions: