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On the Large Capacitance of Nitrogen Doped Graphene Derived by a Facile Route
M. Praveen Kumar 1, T. Kesavan 1, Golap Kalita 2, P. Ragupathy 1, ∗∗∗, Tharangattu N. Narayanan 1 and Deepak K. Pattanayak 1, ∗∗∗
1CSIR Central Electrochemical Research Institute, Karaikudi 630006, India. 2Nagoya Institute of Technology, Gokisho cho, Nagoya 4668555, Japan.
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* Corresponding Authors. E mail: (D. K. P) [email protected]: (P. R) [email protected]
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Abstract
Recent research activities on graphene identified doping of foreign atoms in to the honeycomb lattice as a facile route to tailor its bandgap. Moreover, the presence of foreign atoms can acts as defective centres in basal plane, and these centres can enhance the electrochemical activities of graphene surface. Here, we report a facile synthesis approach for the bulk synthesis of nitrogen doped graphene (N Graphene) from graphene oxide by a hydrothermal process, with a large control over the amount of N doping. The electrochemical activeness of N Graphene (with 4.5 atomic % of nitrogen) is studied by conducting supercapacitor measurements. The N Graphene exhibits remarkably high specific