(12) United States Patent (10) Patent No.: US 9,048,183 B2 Ganguli Et Al
USOO9048183B2 (12) United States Patent (10) Patent No.: US 9,048,183 B2 Ganguli et al. (45) Date of Patent: Jun. 2, 2015 (54) NMOSMETAL GATE MATERIALS, (52) U.S. Cl. MANUFACTURING METHODS, AND CPC .......... HOIL 21/28008 (2013.01); C23C I6/06 EQUIPMENT USING CVD AND ALD (2013.01); C23C 16/32 (2013.01); PROCESSES WITH METAL BASED (Continued) PRECURSORS (58) Field of Classification Search (71) Applicant: Applied Materials, Inc., Santa Clara, None CA (US) See application file for complete search history. (56) References Cited (72) Inventors: Seshadri Ganguli, Sunnyvale, CA (US); Srinivas Gandikota, Santa Clara, CA U.S. PATENT DOCUMENTS (US); Yu Lei, Belmont, CA (US); Xinliang Lu, Fremont, CA (US); Sang 5,055,280 A 10/1991 Nakatani et al. Ho Yu, Cupertino, CA (US); Hoon Kim, 6,139,922 A 10/2000 Kaloyeros et al. Santa Clara, CA (US); Paul F. Ma, Santa (Continued) Clara, CA (US); Mei Chang, Saratoga, CA (US); Maitreyee Mahajani, FOREIGN PATENT DOCUMENTS Saratoga, CA (US); Patricia M. Liu, Saratoga, CA (US) KR 2003OOO9093. A 1, 2003 s OTHER PUBLICATIONS (73) Assignee: APPLIED MATERIALS, INC., Santa International Search Report PCT/US2011/033820 dated Jan. 5, Clara, CA (US) 2012. (*) Notice: Subject to any disclaimer, the term of this (Continued) patent is extended or adjusted under 35 Primary Examiner — Yasser A Abdelaziez U.S.C. 154(b) by 0 days. (74) Attorney, Agent, or Firm — Patterson & Sheridan, LLP (21) Appl. No.: 14/147,291 (57) ABSTRACT Embodiments provide methods for depositing metal-contain (22) Filed: Jan. 3, 2014 ing materials. The methods include deposition processes that form metal, metal carbide, metal silicide, metal nitride, and (65) Prior Publication Data metal carbide derivatives by a vapor deposition process, including thermal decomposition, CVD, pulsed-CVD, or US 2014/O12O712 A1 May 1, 2014 ALD.
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