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1. Introduction & Theory

Neha Singh October 2010 Course Overview

Day 1: Day 2: ƒ Introduction and Theory ƒ Genosc Layer ƒ Transparent Films ƒ Absorbing Films ƒ Microstructure – EMA If time permits: – Surface roughness ƒ Non-idealities – Grading (Simple and ƒ Ultra thin films function-based ITO) ƒ Uniqueness test – Thickness non-uniformity ƒ UV Absorption ƒ Review – Point-by-point fit ƒ Actual Samples

© 2010, All Rights Reserved 2 Introduction & Theory

ƒ ƒ Materials (optical constants) ƒ Interaction between light and materials ƒ Measurements ƒ Data Analysis

© 2010, All Rights Reserved 3 Light Electromagnetic Plane

ƒ From Maxwell’s equations we can describe a plane wave π ⎛ 2λ ⎞ E(z,t) = E0 sin⎜ − (z − vt) + ξ ⎟ ⎝ ⎠ Amplitude Amplitude arbitraryarbitrary phase phase X Wavelength VelocityVelocity λ Electric field E(z,t) Y

Z Direction Magnetic field, B(z,t) of propagation

© 2010, All Rights Reserved 4 Intensity and

ƒ Intensity = “Size” of Electric field. I ∝ E 2

ƒ Polarization = “Shape” of Electric field travel.

Different Size Y •Y E More Intense Less (Intensity) Intense E Same Shape!

X (Polarization) •X

© 2010, All Rights Reserved 5 What is Polarization?

ƒ Describes how Electric Field travels through space and time.

X wave1

Y E wave2 Z

© 2010, All Rights Reserved 6 Describing Polarized Light

ƒ Jones Vector ƒ Stokes Vector

Describe polarized light Describe any light beam with amplitude & phase. as vector of intensity

2 2 ϕ ⎡S ⎤ ⎡ E + E ⎤ i x 0 x0 y0 ⎡Ex ⎤ ⎡E0xe ⎤ ⎢ ⎥ ⎢ 2 2 ⎥ = S1 ⎢ Ex0 −Ey0 ⎥ ⎢ ⎥ ⎢ iϕy ⎥ ⎢ ⎥ = E E e ⎢ ⎥ ⎢ ⎥ ⎣ y ⎦ ⎣⎢ 0y ⎦⎥ S2 2Ex0Ey0 cosΔ ⎢ ⎥ ⎢ ⎥ ⎣S3 ⎦ ⎣⎢2Ex0Ey0 sinΔ⎦⎥

© 2010, All Rights Reserved 7 Light-Material Interaction

ƒ velocity & c wavelength vary v = in different n materials

n = 1 •n = 2

ƒ Frequency remains constant v υ = λ

© 2010, All Rights Reserved What are Optical Constants n , k

Describe how materials and light interact.

ƒ Complex : ñ= n+ ik – Describes how material changes the light wave.

Alternatively …

ƒ Complex Function: ε = ε1+ iε2 – Describes how light changes the material.

ε = ñ2

© 2010, All Rights Reserved 9 Complex Refractive Index ñ(λ) = n(λ) + ik(λ)

ƒ n and k vary with wavelength ƒ n = “Refractive Index” – phase velocity = c/n – direction of propagation (refraction angle) ƒ k = “Extinction Coefficient” – Loss of wave energy to the material. Intensity is “Extinguished.”

Io

−α z I (z) = Ioe I(z) 4πk(λ) α(λ) = λ Dp z © 2010, All Rights Reserved Light at interface Interaction

ƒ Reflections caused by index difference:

Normal incidence: Oblique incidence 2 ()nn12− ƒ φ = φ R = i r 2 ƒ Refraction ()nn12+ Ñ 1 sin φ1 = Ñ 2 sin φ2 index, Ñ1 velocity, c

φ1 φ1

index, Ñ2 velocity, v φ2

© 2010, All Rights Reserved 11 Polarized light at interface

ƒ Electric field either parallel Ep Ep (p) or perpendicular (s) to plane of incidence. Es Es ƒ Material differentiates Ep between p- and s- light plane of incidence Es

1.0 Rp 0.8 Rs 0.6 0.4 Reflection 0.2 0.0 0 20 40 60 80 100 Angle of Incidence (°)

© 2010, All Rights Reserved 12 Fresnel Coefficients

ƒ Maxwell’s Equations at boundary conditions.

ƒ Describes reflection and transmission rs,p n of polarized light (p or s). i ƒ Depends on angle, n(λ),k(λ) n t ts,p θ θ ⎛ E ⎞ n cosθ − n cosθ ⎛ E ⎞ 2θn cos r = ⎜ r ⎟ = t i i t t = ⎜ t ⎟ = i i p ⎜ E ⎟ n cos + n cosθ p ⎜ E ⎟ n cos + n cosθ ⎝ i ⎠ p i t t i ⎝ i ⎠ p i t t i θ θ ⎛ E ⎞ n cosθ − n cosθ ⎛ E ⎞ 2θn cos r = ⎜ r ⎟ = i i t t t = ⎜ t ⎟ = i i s ⎜ E ⎟ n cos + n cosθ s ⎜ E ⎟ n cos + n cosθ ⎝ i ⎠s i i t t ⎝ i ⎠s i i t t

© 2010, All Rights Reserved What does Ellipsometry measure? ƒ Measures change in polarization of reflected light.

~ ~ ~ out in δ ψ r E E Eout p / Ein p p = p p = ei()p −δ s = tan( )eiΔ = ρ ~ ~ out ~ in rs Es Es Eout s / Ein s

E p-plane

s-plane p-plane E

plane of incidence s-plane

© 2010, All Rights Reserved 14 Optical constants from Ellipsometry

ƒ Change in polarization is related to sample properties.

~ n cosθ − n cosθ r r ~ t θi i t s,p p = tan()Ψ eiΔ = ρ r = n ~ p n cos + n cosθ i rs i t t i

nt n cosθ − n cosθ ts,p ~r = i i t t s n cos + n cosθ i i t t

n cosθε − n cosθ n cosθ − n cosθ ρ = ( t i i t )/( t i i t ) n cos + n cosθ n cos + n cosθ i t t i θi t t i

θ 2 For ni=1 ⎡ ρ ⎤ ~ 2 2 2 ⎛1− ⎞ = n = sin ()i ⋅ ⎢1+ tan i ⋅⎜ ()⎟ ⎥ Easy! ⎣⎢ ⎝1+ ρ ⎠ ⎦⎥

© 2010, All Rights Reserved 15 on Substrate

ƒ Multiple reflections inβ single film lead to an infinite series

-2i 2 -4iβ rtot = r01 + t01r12t10e + t01r12 r10t10e +...

−i2 r t r t t r r r t r01( p,s) +r12(p,s)t01(p,s)t10(p,s)e β 10 01 12 10 01 12 10 12 10 rtot( p,s) = −i2β No 1−r01(p,s)r12(p,s)e

N1 β FILM PHASEπ THICKNESS N2 t01t12 t01r12r10t12 t01r12r10r12r10t12 ⎛ dλ1 ⎞ = 2 ⎜ ⎟n1 cosθ1 ⎝ ⎠

© 2010, All Rights Reserved Jones and Mueller Matrix ƒ Describe how sample changes polarization of light

Light in Light out

⎛ So _ out ⎞ ⎡m11 m12 m13 m14 ⎤ ⎛ So _in ⎞ ⎜ ⎟ ⎢ ⎥ ⎜ ⎟ ⎡E ⎤ ⎡ j j ⎤⎡E ⎤ ⎜ S1_ out ⎟ m m m m ⎜ S1_ in ⎟ x−out = 11 12 x−in = ⎢ 21 22 23 24 ⎥ ⋅ ⎢ ⎥ ⎢ ⎥⎢ ⎥ ⎜ S ⎟ ⎜ S ⎟ E j j E 2_ out ⎢m31 m32 m33 m34 ⎥ 2_in ⎣ y−out ⎦ ⎣ 21 22 ⎦⎣ y−in ⎦ ⎜ ⎟ ⎢ ⎥ ⎜ ⎟ ⎜ S ⎟ ⎜ S ⎟ ⎝ 3_ out ⎠ ⎣m41 m42 m43 m44 ⎦ ⎝ 3_in ⎠

© 2010, All Rights Reserved 17 What is Ellipsometry?

ƒ Measures change in polarization of reflected light.

ƒ Ψ, Δ = function of ( n, k, d, λ, θ,…)

E p-plane

s-plane E p-plane

plane of incidence s-plane

© 2010, All Rights Reserved 18 Ellipsometer Components Measurement

Example: Rotating Analyzer Ellipsometer

S

θ Rotating γ sample analyzer A(t) = ωt = 2πft P

Detector converts light to voltage V(t)

Modulation ↔γ ~ ~ E out Ein p p = tan()Ψ eiΔ θ t ~out ~in Es Es

© 2010, All Rights Reserved Rotating Analyzer Limitations: ƒ Δ ‘handedness’ is not determined.

ƒ Uncertainty in Δ near 0°, 180°.

⎡ 1 − N 0 0⎤ ⎢ ⎥ ⎢− N 1 0 0⎥ ⎢ 0 0 C S ⎥ ⎢ ⎥ ⎣ 0 0 − S C⎦

N = cos(2Ψ) C = sin()()2Ψ sin Δ ()() S = sin 2Ψ cos Δ

No measure of S

© 2010, All Rights Reserved 20 VASE® Ellipsometer

Rotating Analyzer with AutoRetarder

P AR S A Detector

r r r e e le e iz d p z r r ly la ta m a Light Source e a n Po R S A to u A

© 2010, All Rights Reserved 21 AutoRetarderTM

ƒ AutoRetarderTM changes polarization delivered to sample for optimum measurement condition.

⎡ 1 − N 0 0⎤ ⎢ ⎥ ⎢− N 1 0 0⎥ ⎢ 0 0 C S ⎥ ⎢ ⎥ ⎣ 0 0 − S C⎦

ƒ Use it!

© 2010, All Rights Reserved 22 Analysis What can SE determine?

Properties of Interest: Ellipsometry Measures: Film Thickness

Refractive Index Psi (Ψ) Surface Roughness Delta (Δ) Interfacial Mixing Composition

Crystallinity

Anisotropy

Uniformity

© 2010, All Rights Reserved 23 Data Content versus Sample Unknowns

ƒ Ensure data contains information to solve all unknowns.

SAMPLE UNKNOWNS

DATA CONTENT Over-Determined

DATA CONTENT SAMPLE UNKNOWNS

DATA CONTENT

SAMPLE UNKNOWNS Under-Determined

© 2010, All Rights Reserved 24 Direct Solution ƒ Single reflection can be directly ‘inverted’ to get n,k.

2λ 2λ DATA UNKNOWNS Ag Experimental Data 8 1.8 Exp -E 70° Exp -E 70° 1.5 6 1.2 < n > k 4 0.9 >

Ψ,Δ < φ 0.6 2 0.3

n,k 0 0.0 200 400 600 800 1000 ε Wavelength (nm) ƒ Single Interface Inversion equation: φ

⎡ φ ρ 2 ⎤ ~ ~ 2 2 2 ⎛1− ⎞ iΔ rp = n = sin ()⋅ ⎢1+ tan ⋅⎜ () ⎟ ⎥ where ρ = tan(Ψ)e = ⎜1+ ρ ⎟ ~ ⎣⎢ ⎝ ⎠ ⎦⎥ rs

© 2010, All Rights Reserved 25 Regression Analysis

Interference

n,k film t

Substrate

ƒ For most samples - “inverse” problem ƒ Result is known instead of Cause. Ellipsometry Sample Structure Measurement Experimental Data 90 180 2 srough 20.00 Å 80 160 Exp -E 73°

Ψ Δ

70 Exp Δ-E 73° indegrees 140 60 1 film 1500.00 Å 120 50

in degrees 100 40 0 silicon 1 mm Ψ 30 80 Yes 20 60 200 400 600 800 1000 Wavelength (nm)

© 2010, All Rights Reserved Data Analysis Flowchart

© 2010, All Rights Reserved 27 1. Measure Sample

ƒ Collect Ψ,Δ ƒ versus angle ƒ versus wavelength

© 2010, All Rights Reserved Data Acquisition ƒ Example: VASE® data acquisition parameters:

© 2010, All Rights Reserved Ellipsometry Measurements ƒ Repeatable & accurate:

– Self-referencing, measures ratio of Ep/Es Thus, reduced problems with: • fluctuation of source intensity • light beam spilling over small samples ƒ Measure two parameters Psi and Delta – increased sensitivity to multiple film parameters

© 2010, All Rights Reserved 2. Build Model

ƒ Propose a layered structure

ƒ Describes Thickness and Optical Constants of all layers

t2 n,k (film 2)

t1 n,k (film 1)

n,k (substrate)

© 2010, All Rights Reserved 31 3. Generated data

Generated and Experimental ƒ Calculate response from 80 Model Fit Exp E 70° model 60 Exp E 75°

40 in degrees Ψ 20 ƒ Compare to Experimental 0 data. 300 600 900 1200 1500 1800 Wavelength (nm) Generated and Experimental 80

60 ƒ Adjust unknown (fit) parameters to get close to 40

in degrees Model Fit Ψ Exp E 70° solution. 20 Exp E 75°

0 300 600 900 1200 1500 1800 Wavelength (nm)

© 2010, All Rights Reserved 32 4. Data Fit

•100 ƒ Software adjusts “fit” •80 •60

parameters to find ••40 in degrees Ψ • best match •20

•0 between model •200 •400 •600 •800 •1000 and experiment. •Wavelength (nm)

ƒ MSE is Difference. MSE

Thickness

© 2010, All Rights Reserved Mean Squared Error

ƒ Mean Squared Error (MSE) used to quantify the difference between experimental and model- generated data.

σ 2 2 1 N ⎡⎛ Ψ mod − Ψexp ⎞ ⎛ Δmod − Δexp ⎞ ⎤ MSE ⎢⎜ i i ⎟ ⎜ i i ⎟ ⎥ = ∑ exp + exp 2N − M ⎢⎜ ⎟ ⎜ σ ⎟ ⎥ i=1 ⎣⎝ Ψ,i ⎠ ⎝ Δ,i ⎠ ⎦

ƒ A smaller MSE implies a better fit. ƒ There is no target (best) MSE value.

© 2010, All Rights Reserved 34 Find Minimum MSE ƒ The Marquardt-Levenberg* algorithm is used to quickly find the minimum MSE. ƒ Good starting values are important

MSE starting thickness (guess)

Local Minima

BEST Thickness FIT

* W.H. Press et al., Numerical Recipes in C, Cambridge, UK: Cambridge University Press, 1988.

© 2010, All Rights Reserved 35 5. Evaluate Results

ƒ Compare experimental and generated data ƒ How low is MSE? Can it be reduced further by increasing model complexity? ƒ Are fit parameters physical? – Normal dispersion, K-K consistency ƒ Check other mathematical “goodness of fit” indicators – Correlation matrix – Uniqueness Test – Error bars

© 2010, All Rights Reserved Correlation Matrix ƒ Look for off-diagonal elements greater than ±0.92

ƒ Investigate further to ensure unique. – Adjust fit values by 10-20%, do they return to same result? – Can one of the correlated parameters be fixed at nominal value and still get good MSE?

© 2010, All Rights Reserved 37 General Rules

ƒ Find the simplest optical model that fits Experimental Data.

ƒ Verify uniqueness of the model.

ƒ Optical 'constants' for materials are not always constant, and quality of fit can only be as good as the optical constants assumed in the model.

© 2010, All Rights Reserved 38 Saving Results

ƒ Model: Layered structure including current results and fit parameters.

ƒ Material File: Optical constants or dispersion parameters for layer

ƒ Environment: Everything shown on the screen. – Can be sensitive to software version.

© 2010, All Rights Reserved Demonstration

ƒ Demo1_SiO2 on Si – Use published tabulated values for n,k.

© 2010, All Rights Reserved WVASE32 Short-Cuts

ƒ CTRL-D: Defaults ƒ CTRL-R: Range-Select Data ƒ CTRL-G: Generate ƒ CTRL-F: Normal Fit ƒ CTRL-T: Toggle Through Graphs ƒ SHIFT-CTRL-T: Toggle graphs in reverse order.

© 2010, All Rights Reserved Further References

1. Hiroyuki Fujiwara, Spectroscopic Ellipsometry: Principles and Applications, John Wiley & Sons, 2007.

2. Handbook of Ellipsometry, Tompkins and Irene, eds., William Andrew Publishing, NY, 2005.

3. H. G. Tompkins, and W.A.McGahan, Spectroscopic Ellipsometry and , John Wiley & Sons, New York, 1999.

4. H. G. Tompkins, A User’s Guide to Ellipsometry, Academic Press, San Diego, 1993.

5. R.M.A. Azzam, and N.M.Bashara, Ellipsometry and Polarized Light, North Holland Press, Amsterdam 1977, Second edition, 1987.

ICSE Conference Proceedings:

1. Thin Solid Films Vol. 455-456, (2004) M. Fried, K. Hingerl, and J. Humlicek, Editors, Elsevier Science.

2. Thin Solid Films Vol. 313-314 (1998) R.W.Collins, D.E.Aspnes, and E.A. Irene, Editors, Elsevier Science.

3. Spectroscopic Ellipsometry, A.C.Boccara, C.Pickering, J.Rivory, eds, Elsevier Publishing, Amsterdam, 1993.

© 2010, All Rights Reserved Extra Slides

ƒ The following slides provide additional details pertaining to this section. Specifically, they cover instrumentation in more detail.

© 2010, All Rights Reserved Data Acquisition

ƒ (Range and Number)? – Wavelengths of interest? – Where is film transparent? – Film Thickness? – Sharp features in data? ƒ Angles? – What are Substrate and Films? – Single or Multilayers? – Complex materials?

© 2010, All Rights Reserved Wavelengths? ƒ Resolve data features.

Film Steps Steps (nm) Experimental Data Thickness (eV) 100 Exp E 65° < 200 nm 0.1 eV 20 nm Data every 2nm Exp E 75° 80 200 - 500 nm 0.05 eV 10 nm 60 500 nm - 1 40

0.025 eV 5 nm in degrees

μm Ψ 20 1 -3 μm 0.01eV 2 nm 0 0 300 600 900 1200 1500 1800 2 nm, Wavelength (nm) >3 μm Long wavelengths 2.5 μm Oxide

© 2010, All Rights Reserved Angles Brewster's Angle 85°

ƒ One angle is often 80° GaAs* Ge* * Si* 75° InP sufficient, but more ZnSe* SiC* 70° Si3N4 angles helps with * Ta2O5 Angle 65° ITO* * confidence. Al2O3 60° * SiO2 * TiO2 * ƒ When choosing 55° * approx. value of H2O N@ λ=650nm 50° multiple angles, 1 1.5 2 2.5 3 3.5 4 4.5 5 best to have one Refractive Index

above, one below, Generated for n=3.5, k=0 and one near 1.0 Rp 0.8 Brewster Angle Rs 0.6

0.4 Reflection

0.2

0.0 0 20 40 60 80 Angle of Incidence (°) © 2010, All Rights Reserved Typical Angles

Typical Angle Combinations: Angle of (spot-length)/ » Thin films on Si: 65°, 75° Incidence (beam-dia.) » Thick films on Si: 60°, 75° 25° 1.1 35° 1.2 or 55, 65°, 75° 45° 1.4 » n-matched films on glass: 55°, 56.5°, 58° 55° 1.7 » Other films on glass: 50°, 60°, 70° 65° 2.4 75° 3.9 » Films on metals: 65°, 75° 80° 5.8 » Anisotropic & Graded films: 55°, 65°, 75° 85° 11.5 or 45°, 60°, 75° Spot size vs. angle

© 2010, All Rights Reserved Ellipsometers ƒ Every Ellipsometer contains the same basic components

P ola G riza ion Light ene tio rizat r n ola er Detector Source ator P lyz Ana

Sample

ƒ SE also needs wavelength selection.

© 2010, All Rights Reserved Optical Components

Polarizer: only allows linear polarization to exit. Compensator: retard orthogonal electric fields by 90°.

X Polarizer E Axis Y Compensator E Axis

E

Z

© 2010, All Rights Reserved Rotating Analyzer Ellipsometer

Linearly Polarized

Rotating S Polarizer sample analyzer A(t) = ωt = 2πft γ θ

Detector P converts light to voltage V(t)

Modulation ↔γ

θ t

© 2010, All Rights Reserved How RAE measures Ψ and Δ

V(t) V(t) α cos(2ωt) DC Modulation ↔γ β sin(2ωt)

θ t t

FromFrom Jones Jones Matrix Matrix analysis analysis of of the the RAE RAE optical optical system: system: V(t)V(t) = = DC DC + + α αcos(2cos(2ωωt)t)+ + β βsin(2sin(2ωωt)t)

a tan2 Ψ - tan2 P α = DC = 2 2 α and β are normalized tan Ψ + tan P Fourier coefficients b 2 tan Ψ cos Δ tan P β = = DC tan2 Ψ + tan2 P

© 2010, All Rights Reserved Limitations of RAE

Polarizers can not distinguish unpolarized polarizer and circular polarizations.

polarizer

Compensators can measure unpolarized from compensator circular polarizations.

compensator

© 2010, All Rights Reserved AutoRetarderTM

ƒ AutoRetarderTM changes polarization delivered to sample for optimum measurement condition.

© 2010, All Rights Reserved AutoRetarder™

© 2010, All Rights Reserved RCE P o lar te L Gen iza ta s er tion n S a S tio A) α tor ta a S (P te riz (P I RCE = dc + α 2 cos(2Cs )+ β 2 sin(2Cs )+ α 4 cos(4Cs)+ β 4 sin(4Cs ) P S ola er G) P lyz D na α A P ⋅C P C dc = 1+ = 1+ sin()()2Ψ cos Δ A 2 2 ()() 2 = −P ⋅ S = −P sin 2Ψ sin Δ β 2 = 0 P ⋅C P P ⋅ N P SAMPLE = − = − sin()()2Ψ cos Δ β = = cos()2Ψ 4 2 2 4 2 2

For isotropic (depolarizing) sample: To calculate Ψ & Δ ⎡ 1 − N m 0 0 ⎤ ⎡ 1 − PN 0 0 ⎤ ⎢− N 1 0 0 ⎥ ⎢− PN P 0 0 ⎥ -α /α yields tan(Δ) ⎢ m ⎥ ⎢ ⎥ 2 4 M sample = = ⎢ 0 0 Cm S m ⎥ ⎢ 0 0 PC PS ⎥ ⎢ ⎥ ⎢ ⎥ -β4, α2, or α4 yields Ψ ⎣ 0 0 − S m C m ⎦ ⎣ 0 0 − PS PC ⎦ -dc required to calculate depolarization N = cos()2Ψ C = sin()()2Ψ sin Δ ()() S = sin 2Ψ cos Δ P = N 2 + C 2 + S 2 ≤ 1 %depolarization = (1− P)×100%

© 2010, All Rights Reserved