DOCSLIB.ORG

Univerza V Ijubljanl

Total Page：16

File Type：pdf, Size：1020Kb

Download full-text PDF Read full-text
Univerza V Ijubljanl US REPORT R-610 Conference Paper October 1972 ON THE PREPARATION OF PURE XENON TETRAFLUORIDE M.BOHINC, J.SLIVNIK, B.ŽEMVA univerza v Ijubljanl We regret t-.hat some of the pages in the microfiche copy of this report may not be up to the proper legibility standards, even though the best possible copy was used for preparing the master fiche. KEYWORDS XENON TETRAFLUORIDE SYNTHESIS Odobrile Oddelek ta kemijo in Konifija sa ti»k US (natisnjeno na US v 200 izvodih) US REPORT R-610 Oi* THE PREPARATION OF PURE XEUON TETRAFLUORIDE* M.Bohinc, J.Slivnik and B.Žemva Institute "J.Stefan" and Faculty of Natural Sciences and Technology, Ljubljana, University of Ljubljana, Yugoslavia ABSTRACT. Methods for preparation of xenon tetrafluoride, which have been published up to now, yield product which are usually contamined by xenon difluoride and hexafluoride. The main problem of the purification of xenon tetrafluoride is the removal of traces of difluoride. So far, only one method for chemical purifi­ cation of XeFi, has been published. For the preparation of pure xenon tetrafluoride the thermal dissociation of hexafluoride can be employed. As we have reported earlier, it proceeded according to the following equation: XeF6 «•"* XeFi, + F2. Xenon tetrafluoride of purity bether than 99 vt> was obtained by dissociation of the compound formed between sodium fluoride and xenon hexafluoride, published elsewhere, at 300 C. The possibility of the removal of traces of XeF2 observed in products thus obtained, using cobalt difluoride will be dis­ cussed. The purity of XeFi, was determined by checking its melting point and infrared spectra of vapours. Nowadays the preparation of xenon fluorides does not repre­ sent any appreciable problem. These syntheses are in principle similar to the syntheses of some higher fluorides. One of course should keep in mind that the most of the methods described so far yield besides of the main product also a small amounts, up to few percent, of the others two xenon fluorides. * Presented at 4tn European Symposium on Fluorine Chemistry, Ljubljana, August 2bth - Sept. 1st, 1972. The simplest is the preparation of xenon difluoride: hv Xe • F2 ^7 • XeF2 room temp. Its simple photosynthesis was reported by Streng ( ) and Holloway (2*3) already in 1965 and 1966. Xenon hexafluoride can be separated from the mixture of xenon fluorides, because of its com­ paratively higher vapour pressure, by trap to trap sublimation. The method reported by Malm (") and Sheft (5) is very suitable for the preparation of somewhat larger quantities, up to few grams of xenon hexafluoride: 50°C NaF • XeF + XeF«, + XeF J T + flaF.XeF* + XeFi, + 69 2 ove^- night ^^ 120°C pump off NaF+XeF* * XeF* ^^ ^ XeF* + XeFa pump off It is based on the selective absorption of xenon hexafluoride on sodium fluoride at 50 C and desorption at 120 C. The preparation of pure xenon tetrafluoride, however, seems to be very difficult, specially so since it form already at room temperature an addition molecular compound with xenon difluoride having lower vapour pressure than xenon tetrafluoride (*): TOOm tem XeF2 • XeF% ?' > XeF2.XeF„ Preparation of pure xenon tetrafluoride which involves purifi­ cation with arsenic pentafluoride in the solution of bromine pentafluoride was reported by Bartlett and Sladky (7): XeF. • XeF, • XeF, "Z™™™* • *f W • • Xe2F3/AsFft/ • XeF„ '>vtk(%> XeF* dyn« vacuum - 2 - In our experiments very often larger quantities up to several ten grams of pure xenon tetrafluoride are needed. Therefore we have decided to investigate the possibility of synthetizing larger quantities of xenon tetrafluoride utilizing the experience gained in our study of the thermal dissociation of xenon hexafluoride. This work was reported on the 5 International Symposium on Fluorine Chemistry in Moscow (8). The dissociation was found to o follow at 330 C the following equation: XeFfc 9*± XeF* + F2 It should be emphasized here, that at the conditions employed we did not obtain any indication of the presence of xenon difluoride which could have been possibly formed by the thermal dissociation of xenon tetrafluoride. Our work was planned along the following lines: * preparation of mixture of xenon tetrafluoride and hexafluoride which would not contain any xenon difluoride, - separation of both by the sorption of xenon hexafluoride on sodium fluoride. Xenon hexafluoride was prepared at 300 C starting with the mixture of xenon and fluorine having a molar ratio 1:20 with the total pressure amounting 60 atm. It was purified by the already mentioned sodium fluoride method ( • ). Before the use, sodium fluoride was heated at 500°C for 18 hours, then treated with fluorine at 10 atm pressure for 20 hours at 200 C. Subsequently fluorine was thoroughly pumped off, the solid in addition treated with xenon hexafluoride at 150°C and finally pumped on in high vacuum at 350°C. In a typical experiment 13 grama of sodium fluoride (treated as it was mentioned before) was put into 120 ml nickel reaction vessel and 11 grams of xenon hexafluoride were added by subli­ mation. The reaction vessel was then put into a furnace at 350 • 5 C for two and a half hours. The evolved fluorine was - 3 - pumped away at the liquid nitrogen temperature, vhile in the re­ action vessel; sodium fluoride, xenon tetrafluoride and hexa- fluoride remained: 350 ± 5 c NaF.XeF* * NaF • XeF* + XeF* + F 7 time 2,5 hours 2 *-196°C I-pump off F2 (1,7 g) The decomposition with the subsequent taking fluorine avay vas repeated seven times. From the diagram (Fig. 1) shoving the time dependence of xenon hexafluoride thermal dissociation, it is evident that the dissociation is practically concluded after the seventh run. T«350**5*C NoF XtF,—^ XeFt •IfciF *F, 2.S 7.5 12.5 IS 17,5 20 timifh] - 1»,- In order to bind the possibly remaining traces of xenon hexafluo­ ride the mixture in the reaction vessel was heated at 50 C overnight and the volatiles were sublimed away, afterwords at the same tempera­ ture. In the infrared spectrum of their vapour, however, we observed besides of the strong absorption band of xenon tetrafluoride also a band of xenon hexafluoride. The product was then in addition pumpied by trap to trap sublimation: 50°C > HaF • XeF6 • XeF., ^° ? UJ.» NaF.XeF* • XeF* -—- over night dyn.vacuum (0,6 g) (9,lg) —* XeF„ + some XeF6 room temp. ( x trap to trap subl. ^ (9M) (8.5 g) The purified product had melting point at 117,1 t 0,05 C, exactly as at the temperature reported by Schreiner and coworkers: 117*10 C (9) for the melting point of xenon tetrafluoride, Also, the infrared spectrum of the vapour revealed only the presence of xenon tetrafluoride. The yield of the procedure was found to be 89»5 %' From 11,3 g of XeF* 95»5 % disscc. Q • ° after trap to trap subl. • & v In the course of this work we have examine also another method of preparation of pure xenon tetrafluoride. It was found in our laboratory, that cobalt difluoride is oxidized to the trifluoride at room temperature very rapidly by xenon difluoride, whereas the rate of oxidation is very low when xenon tetra­ fluoride is used for that purpose. This difference in rates of oxidation could be possibly employed for the separation of xenon di fluoride and tetrafluoride. The purity of xenon tetrafluoride obtained after this purification is, nevertheless, lower as com­ pound by the purity of xenon tetrafluoride obtained by the thermal dissociation of xenon hexafluoride. Mixtures of xenon - 5 - difluoride and tetrafluoride is shaken at roor temperature with a larger excess of cobalt difluoride. At -80 C the evolved xenon is pumped away, and xenon tetrafluoride is then sublimed in dynamic vacuum from the reaction mixture at room temperature. The method could be used only for the preparation of smaller amounts of xenon tetrafluoride. With greater amounts there is danger of xenon difluoride inclusion in the crystals of xenon tetrafluoride. In conclusion we can say that the thermal dissociation of xenon hexafluoride in the presence of sodium fluoride is suitable for the preparation of pure xenon tetrafluoride. ACKNOWLtiDGEMMT - The financial support of the "Boris Kidrič" Foundation, Ljubljana is greatefully acknowledged. REFERENCES: (*) L.V.Streng, A.G.Streng, Inorg.Chem., U_9 1370 (1965) (2) J.H.Holloway, J.Chem.Educ., j+3, 202 O966) (3) J.H.Holloway, Chem.Commun., 1966. 22 (**) J.G.Malm, F.Schreiner, D.W.Osborne, Inorg.Nucl.Chem.Lett., 1, 97 (1965) (5) I.Sheft, T.M.Spittler, F.Martin, Science, J]£, 701 ( 196*0 (6) J.H.Burns, R.D.Ellison, H.A.Levy, J.Phys.Chem,, 6J, 1569 (1963) (7) N.Bartlett, F.O.Sladky, J.Am.Chem.Soc., <?0, 5316 (1968) (*) J.Slivnik, B.Žemva, B.Frlec, T.Ogrin, Study of the fiuorine- xenon reactions, 5th Intern.Symp. on Fluorine Chem.»Moscow, 21.-26.July 1969; US Report R-566 (*) F.Schreiner, G.McDonald, C.L.Chernick, J.PhyB.Chem.. 72. 1162 (I96ti) .
Load more

Recommended publications
  • Reactions of Some Ammonium Fluorometalates with Xef2
    Reactions of Some Ammonium Fluorometalates with XeF2 Jože Slivnik+*, Branko Družina, and Boris Žemva Jozef Stefan Institute and+Faculty for Natural Sciences and Technology, Edvard Kardelj University, Ljubljana, Yugoslavia Dedicated to Prof. Dr. Drs. h. c. Oskar Glemser on the occasion of his 70th birthday Z. Naturforsch. 36b, 1457-1460 (1981); received May 7, 1981 Xenon Difluoride Reactions, Ammonium Fluorometalates, Hydrazinium Fluorometalates The reactions between (NH^TiFe, (NH^ZrFe, (NfL^HfFe, (NELtfeVFe, (NH4)3CrF6, NH4MnF3, (NH4)3FeFe and excess xenon difluoride were investigated. The listed am- monium fluorometalates react with xenon difluoride to form corresponding xenon(II) fluorometalates, monoammonium fluorometalates with metal in the same oxidation state, and ammonium fluorometalates with metal in higher oxidation state, respectively. The reactions between binary fluorides and xenon following new compounds, not accessible by other difluoride or xenon hexafluoride, respectively, yield conventional methods, were isolated and charac- a series of xenon(II) or xenon(VI) fluorometalates. terized: XeFe • FeF3 [3], XeF6 • ZrF4, XeF6 • HfF4 We have investigated these reactions in detail [11], XeF6 • 2 AlFs and XeF6 • GaF3 [12]. This study succeeded to isolate and identify seven xenon(II) is still being continued. and thirteen xenon(VI) fluorometalates [1]. Following the same basic approach we extended Since in some cases the reaction between binary the investigations recently onto reactions between fluoride and xenon hexafluoride did not proceed at xenon difluoride or xenon hexafluoride and am- all under the applied reaction conditions, we monium fluorometalates. supposed that the binary fluoride is not reactive enough and that the reaction might proceed if the Experimental binary fluoride would be available in a more Materials reactive form.
    [Show full text]
  • Problems for Chapter 17
    Molecular Modeling Problems Chapter 17 1. Argon Compounds? One of the major advantages of calculation over experiment is that “reality does not get in the way”. It is no harder to investigate the properties of labile compounds that may be difficult to isolate and characterize experimentally than it is to investigate those of stable compounds. In fact, it is possible to say whether experimental characterization can ever be achieved, that is, if the molecule of interest is actually an energy minimum. Noble gas compounds illustrate this. While xenon compounds are now numerous and a few compounds of krypton have now been reported, no argon compounds have been isolated or characterized. Do argon analogues of known xenon and krypton compounds actually exist (in the sense that they represent energy minima)? If so, do they exhibit similar geometries and charge distribution as their analogues? Obtain equilibrium geometries for argon difluoride, krypton difluoride and xenon difluoride using the Hartree-Fock 3-21G model. Start from bent structures even though. KrF2 and XeF2 are known to be linear (and ArF2 might very well be assumed to be linear as well). While the geometry optimization is able to move from a non-linear to a linear structure, it cannot do the reverse. Follow each optimization by an infrared spectrum calculation to tell you whether or not the structure is actually an energy minimum. Are KrF2 and XeF2 linear molecules? Is the calculated Kr-F bond distance in reasonable accord with the experimental value of 1.89Ǻ (the bond distance in XeF2 linear is not known)? Is ArF2 an energy minimum? Is it linear? If ArF2 is an energy minimum, is dissociation to Ar and F2 endothermic or exothermic? Are the corresponding dissociations of KrF2 and XeF2 endothermic or exothermic? Obtain electrostatic potential maps for the three compounds and display side by side on screen (and on the same scale).
    [Show full text]
  • Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides
    molecules Review Noble Gas Bonding Interactions Involving Xenon Oxides and Fluorides Antonio Frontera Department of Chemistry, Universitat de les Illes Balears, Crta de valldemossa km 7.5, 07122 Palma de Mallorca (Baleares), Spain; [email protected] Academic Editor: Felice Grandinetti Received: 17 July 2020; Accepted: 27 July 2020; Published: 28 July 2020 Abstract: Noble gas (or aerogen) bond (NgB) can be outlined as the attractive interaction between an electron-rich atom or group of atoms and any element of Group-18 acting as an electron acceptor. The IUPAC already recommended systematic nomenclature for the interactions of groups 17 and 16 (halogen and chalcogen bonds, respectively). Investigations dealing with noncovalent interactions involving main group elements (acting as Lewis acids) have rapidly grown in recent years. They are becoming acting players in essential fields such as crystal engineering, supramolecular chemistry, and catalysis. For obvious reasons, the works devoted to the study of noncovalent Ng-bonding interactions are significantly less abundant than halogen, chalcogen, pnictogen, and tetrel bonding. Nevertheless, in this short review, relevant theoretical and experimental investigations on noncovalent interactions involving Xenon are emphasized. Several theoretical works have described the physical nature of NgB and their interplay with other noncovalent interactions, which are discussed herein. Moreover, exploring the Cambridge Structural Database (CSD) and Inorganic Crystal Structure Database (ICSD), it is demonstrated that NgB interactions are crucial in governing the X-ray packing of xenon derivatives. Concretely, special attention is given to xenon fluorides and xenon oxides, since they exhibit a strong tendency to establish NgBs. Keywords: noble gas interactions; noncovalent interactions; crystal packing; xenon 1.
    [Show full text]
  • Chemistry of the Noble Gases*
    CHEMISTRY OF THE NOBLE GASES* By Professor K. K. GREE~woon , :.\I.Sc., sc.D .. r".lU.C. University of N ewca.stle 1tpon Tyne The inert gases, or noble gases as they are elements were unsuccessful, and for over now more appropriately called, are a remark­ 60 years they epitomized chemical inertness. able group of elements. The lightest, helium, Indeed, their electron configuration, s2p6, was recognized in the gases of the sun before became known as 'the stable octet,' and this it was isolated on ea.rth as its name (i]A.tos) fotmed the basis of the fit·st electronic theory implies. The first inert gas was isolated in of valency in 1916. Despite this, many 1895 by Ramsay and Rayleigh; it was named people felt that it should be possible to induce argon (apy6s, inert) and occurs to the extent the inert gases to form compounds, and many of 0·93% in the earth's atmosphere. The of the early experiments directed to this end other gases were all isolated before the turn have recently been reviewed.l of the century and were named neon (v€ov, There were several reasons why chemists new), krypton (KpVn'TOV, hidden), xenon believed that the inert gases might form ~€vov, stmnger) and radon (radioactive chemical compounds under the correct con­ emanation). Though they occur much less ditions. For example, the ionization poten­ abundantly than argon they cannot strictly tial of xenon is actually lower than those of be called rare gases; this can be illustrated hydrogen, nitrogen, oxygen, fl uorine and by calculating the volumes occupied a.t s.t.p.
    [Show full text]
  • The Noble Gases
    The Noble Gases The Noble Gases (inert gases, Group 0, Group 18 or the helium group) are notoriously unreactive elements (‘noble’ means unreactive in chemistry) and in their elemental state they exist as monoatomic gases – gases whose ‘molecules’ are single atoms of the element, since the atoms are reluctant to react with anything, including one-another. This inertness is due to the fact that they have stable outer electron shells, with stable octets of electrons (full s and p subshells) except helium, which has a stable full inner shell. The electronic configurations are: Helium (He): 1s2 Neon (Ne): 1s2 2s2 2p6 Argon (Ar): [Ne] 3s2 3p6 Krypton (Kr): [Ar] 3d10 4s2 4p6 Xenon (Xe): [Kr] 4d10 5s2 5p6 Radon (Rn): [Xe] 5d10 6s2 6p6 Nevertheless, this group does have some interesting chemistry and also exhibit interesting physical properties. Reactivity increases down the group. Often helium is included as the first member of the group. Helium (He) Helium is chemically a highly unreactive element. It only forms transient species when electric discharges are passed through a mixture of helium gas and another gaseous element. for example, passing an electric discharge through a mixture of helium and hydrogen forms the transient molecule HHe, which has a very short half-life. HHeF is metastable. Neon (Ne) Neon is chemically the most unreactive element. It forms no true compounds, and no neutral molecules. Ionic molecules are known, e.g. (NeAr)+, (NeH)+, (HeNe)+ and Ne+. Argon (Ar) The unstable argon fluorohydride, HArF, is known. Ar also forms clathrates (see krypton) with water and highly unstable ArH+ and ArF are known.
    [Show full text]
  • 5.157 TABLE 5.29 Van Der Waals' Constants for Gases the Van Der
    DEAN #37261 (McGHP) RIGHT INTERACTIVE top of rh PHYSICAL PROPERTIES 5.157 base of rh cap height TABLE 5.29 Van der Waals’ Constants for Gases base of text The van der Waals’ equation of state for a real gas is: na2 ͩͪP ϩ (V Ϫ nb) ϭ nRT for n moles V2 where P is the pressure, V the volume (in liters per mole ϭ 0.001 m3 per mole in the SI system), T the temperature (in degrees Kelvin), n the amount of substance (in moles), and R the gas constant. To use the values of a and b in the table, P must be expressed in the same units as in the gas constant. Thus, the pressure of a standard atmosphere may be expressed in the SI system as follows: 1 atm ϭ 101,325 N · mϪ2 ϭ 101,325 Pa ϭ 1.01325 bar The appropriate value for the gas constant is: 0.083 144 1 L · bar · KϪ1 · molϪ1 or 0.082 056 L · atm · KϪ1 · molϪ1 The van der Waals’ constants are related to the critical temperature and pressure, tc and Pc, in Table 6.5 by: 27 RT22 RT a ϭ ccand b ϭ 64 Pcc8 P Substance a,L2 · bar · molϪ2 b,L·molϪ1 Acetaldehyde 11.37 0.08695 Acetic acid 17.71 0.1065 Acetic anhydride 26.8 0.157 Acetone 16.02 0.1124 Acetonitrile 17.89 0.1169 Acetyl chloride 12.80 0.08979 Acetylene 4.516 0.05218 Acrylic acid 19.45 0.1127 Acrylonitrile 18.37 0.1222 Allene 8.235 0.07467 Allyl alcohol 15.17 0.1036 Aluminum trichloride 42.63 0.2450 2-Aminoethanol 7.616 0.0431 Ammonia 4.225 0.03713 Ammonium chloride 2.380 0.00734 Aniline 29.14 0.1486 Antimony tribromide 42.08 0.1658 Argon 1.355 0.03201 Arsenic trichloride 17.23 0.1039 Arsine 6.327 0.06048 Benzaldehyde 30.30 0.1553 Benzene 18.82
    [Show full text]
  • The Noble Gases
    INTERCHAPTER K The Noble Gases When an electric discharge is passed through a noble gas, light is emitted as electronically excited noble-gas atoms decay to lower energy levels. The tubes contain helium, neon, argon, krypton, and xenon. University Science Books, ©2011. All rights reserved. www.uscibooks.com Title General Chemistry - 4th ed Author McQuarrie/Gallogy Artist George Kelvin Figure # fig. K2 (965) Date 09/02/09 Check if revision Approved K. THE NOBLE GASES K1 2 0 Nitrogen and He Air P Mg(ClO ) NaOH 4 4 2 noble gases 4.002602 1s2 O removal H O removal CO removal 10 0 2 2 2 Ne Figure K.1 A schematic illustration of the removal of O2(g), H2O(g), and CO2(g) from air. First the oxygen is removed by allowing the air to pass over phosphorus, P (s) + 5 O (g) → P O (s). 20.1797 4 2 4 10 2s22p6 The residual air is passed through anhydrous magnesium perchlorate to remove the water vapor, Mg(ClO ) (s) + 6 H O(g) → Mg(ClO ) ∙6 H O(s), and then through sodium hydroxide to remove 18 0 4 2 2 4 2 2 the carbon dioxide, NaOH(s) + CO2(g) → NaHCO3(s). The gas that remains is primarily nitrogen Ar with about 1% noble gases. 39.948 3s23p6 36 0 The Group 18 elements—helium, K-1. The Noble Gases Were Kr neon, argon, krypton, xenon, and Not Discovered until 1893 83.798 radon—are called the noble gases 2 6 4s 4p and are noteworthy for their rela- In 1893, the English physicist Lord Rayleigh noticed 54 0 tive lack of chemical reactivity.
    [Show full text]
  • Crystal Structure Transformations in Binary Halides
    1 A UNITED STATES DEPARTMENT OF A111D3 074^50 IMMERCE JBLICAT10N NSRDS—NBS 41 HT°r /V\t Co^ NSRDS r #C£ DM* ' Crystal Structure Transformations in Binary Halides u.s. ARTMENT OF COMMERCE National Bureau of -QC*-| 100 US73 ho . 4 1^ 72. NATIONAL BUREAU OF STANDARDS 1 The National Bureau of Standards was established by an act of Congress March 3, 1901. The Bureau's overall goal is to strengthen and advance the Nation’s science and technology and facilitate their effective application for public benefit. To this end, the Bureau conducts research and provides: (1) a basis for the Nation’s physical measure- ment system, (2) scientific and technological services for industry and government, (3) a technical basis for equity in trade, and (4) technical services to promote public safety. The Bureau consists of the Institute for Basic Standards, the Institute for Materials Research, the Institute for Applied Technology, the Center for Computer Sciences and Technology, and the Office for Information Programs. THE INSTITUTE FOR BASIC STANDARDS provides the central basis within the United States of a complete and consistent system of physical measurement; coordinates that system with measurement systems of other nations; and furnishes essential services leading to accurate and uniform physical measurements throughout the Nation’s scien- tific community, industry, and commerce. The Institute consists of a Center for Radia- tion Research, an Office of Measurement Services and the following divisions: Applied Mathematics—Electricity—Heat—Mechanics—Optical Physics—Linac Radiation 2—Nuclear Radiation 2—Applied Radiation 2—Quantum Electronics 3— Electromagnetics 3—Time and Frequency 3—Laboratory Astrophysics 3—Cryo- 3 genics .
    [Show full text]
  • 844AR ESD Safe Coating for Plastic
    844AR ESD Safe Coating for Plastic MG Chemicals UK Limited Version No: A-1.00 Issue Date: 02/07/2021 Safety data sheet according to REACH Regulation (EC) No 1907/2006, as amended by UK REACH Regulations SI 2019/758 Revision Date: 02/07/2021 L.REACH.GB.EN SECTION 1 Identification of the substance / mixture and of the company / undertaking 1.1. Product Identifier Product name 844AR Synonyms SDS Code: 844AR-Liquid; 844AR-900ML, 844AR-3.78L | UFI:JFR0-202H-V006-0AJ1 Other means of identification ESD Safe Coating for Plastic 1.2. Relevant identified uses of the substance or mixture and uses advised against Relevant identified uses Static protection for electronic components Uses advised against Not Applicable 1.3. Details of the supplier of the safety data sheet Registered company name MG Chemicals UK Limited MG Chemicals (Head office) Heame House, 23 Bilston Street, Sedgely Dudley DY3 1JA United Address 9347 - 193 Street Surrey V4N 4E7 British Columbia Canada Kingdom Telephone +(44) 1663 362888 +(1) 800-201-8822 Fax Not Available +(1) 800-708-9888 Website Not Available www.mgchemicals.com Email [email protected] [email protected] 1.4. Emergency telephone number Association / Organisation Verisk 3E (Access code: 335388) Emergency telephone +(44) 20 35147487 numbers Other emergency telephone +(0) 800 680 0425 numbers SECTION 2 Hazards identification 2.1. Classification of the substance or mixture Classified according to GB-CLP Regulation, UK SI H336 - Specific target organ toxicity - single exposure Category 3 (narcotic effects), H225 - Flammable Liquid Category 2, H318 - Serious Eye 2019/720 and UK SI 2020/1567 Damage/Eye Irritation Category 1, H351 - Carcinogenicity Category 2 [1] Legend: 1.
    [Show full text]
  • Safety Data Sheet Material Name: Autoclean SDS ID: 00231763 (SINGAPORE)
    Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) SECTION 1: Identification Product identifier Material Name AutoClean Synonyms XENON DIFLUORIDE; XENON FLUORIDE (XeF2); XENON(II) FLUORIDE (F2Xe); F2Xe Chemical Family fluoride, inorganic Product Use semiconductor manufacture, general synthetic chemical Restrictions on Use None known. Details of the supplier of the safety data sheet Entegris, Inc. 129 Concord Road Building 2 Billerica, MA 01821 USA Telephone Number: +1-952-556-4181 Telephone Number: +1-800-394-4083 (toll free within North America) Supplier Entegris Singapore Pte. Ltd. 30A Kallang Place, #13-01 Singapore 339213 Telephone: +65-6745-2422 Fax: +65-6745-4477 Emergency # 800-101-2201 (CHEMTREC Toll Free in country) +(65)-31581349 (CHEMTREC local in country) 1-703-527-3887 (CHEMTREC International) E-mail: [email protected] SECTION 2: Hazards identification Singapore Standard SS 586-2:2014 Oxidizing Solids - Category 2 Acute Toxicity - Oral - Category 3 Acute Toxicity - Inhalation - Dust/Mist - Category 2 Skin Corrosion/Irritation - Category 1 Serious Eye Damage/Eye Irritation - Category 1 Specific Target Organ Toxicity - Single Exposure - Category 3 ( respiratory system ) Label elements ____________________________________________________________ Page 1 of 11 Issue date: 2020-05-13 Revision 3.3 Print date: 2020-05-13 Safety Data Sheet Material Name: AutoClean SDS ID: 00231763 (SINGAPORE) Hazard symbols Signal word Danger Hazard statements H272 May intensify fire; oxidizer. H330 Fatal if inhaled. H301 Toxic if swallowed. H314 Causes severe skin burns and eye damage. H335 May cause respiratory irritation. Precautionary statements Prevention P210 Keep away from heat. P220 Keep/Store away from clothing/combustible materials. P221 Take any precaution to avoid mixing with combustibles.
    [Show full text]
  • Lawrence Berkeley National Laboratory Recent Work
    Lawrence Berkeley National Laboratory Recent Work Title TAUTOMERISM IN XENON HEXAFLUORIDE: AN INVESTIGATION OF XENON HEXAFLUORIDE AND ITS COMPLEXES BY RAMAN SPECTROSCOPY Permalink https://escholarship.org/uc/item/4t37825s Authors Adams, Chris J. Bartlett, Neil. Publication Date 1977-12-01 eScholarship.org Powered by the California Digital Library University of California · Submitted to Israel Journal of Chemistry (In Press) LBL-3136 }- Preprint .. · U!:-'::: i!\1-lY A"'l.J i.JOCUl·tiZ.l'-:.TS £2CTION TAUI'OMERI~ IN XENON HEXAFLUORIDE: AN INVESTIGATION OF XENON HEXAFLUORIDE AND ITS C(M>LEXES BY RAM\N SPECTROSCOPY Chris J. Adams and Neil Bartlett December 1977 Prepared for the U. S. Department of Energy under Contract W-7405-ENG-48 TWO-WEEK LOAN COPY This is a Library Circulating Copy which may be borrowed for two weeks. For a personal retention copy, call Tech. Info. Dioision, Ext. 5716 DISCLAIMER This document was prepared as an account of work sponsored by the United States Government. While this document is believed to contain correct information, neither the United States Government nor any agency thereof, nor the Regents of the University of · California, nor any of their employees, makes any warranty, express or implied, or assumes any legal responsibility for the accuracy, completeness, or usefulness of any information, apparatus, product, or process disclosed, or represents that its use would not infringe privately owned rights. Reference herein to any specific commercial product, process, or service by its trade name, trademark, manufacturer, or otherwise, does not necessarily constitute or imply its endorsement, recommendation, or favoring by the United States Government or any agency thereof, or the Regents of the University of California.
    [Show full text]
  • United States Patent Office Patented June 29, 1965
    3,192,016 United States Patent Office Patented June 29, 1965 2 3,192,016 used before for the processing of uranium compounds, XENON HEXAFLUORDE AND METHOD and its pipe lines contained some lower uranium fluorides. OF MAKING After the xenon hexafluoride had been stored in the ap John G. Maim, Naperville, Irving Sheft, Oak Park, paratus for about an hour, all uranium had disappeared Howard H. Claassen, Wheaton, and Cedric L. Chernick, from the pipelines. It had been converted to the volatile River Forest, E., assignors to the United States of uranium hexafluoride by the Xenon hexafluoride. America as represented by the United States Atomic In the following, an example is given to illustrate the Energy Commission No Drawing. Fied Dec. 18, 1962, Ser. No. 245,951 process of producing xenon hexafluoride. 7 Claims. (C. 23-205) O Example This invention deals with xenon hexafluoride, a method of making this novel compound, and it also deals with 5.25 millinoles of xenon and 110 millimoles of fluorine fluorination processes using Xenon hexafluoride. gas were introduced into and sealed in an 87-cc. nickel It has been found that a mixture containing Xenon and container. The gas mixture was heated in this container an excess of fluorine over the amount required for the pro 5 at about 300° C. for 16 hours, whereby a pressure of duction of xenon hexafluoride, when heated in a her about 60 atmospheres built up. After this heating period, metically sealed container, reacts to form xenon hexa the nickel container was cooled to room temperature, fluoride.
    [Show full text]