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Modeling of Component Lifetime Based on Accelerated Acid Gas Permeation Measurements

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Modeling of Component Lifetime Based on Accelerated Acid Gas Permeation Measurements Modeling of component lifetime based on accelerated acid gas permeation measurements Gary Van Schooneveld, Don Grant, Debra Carrieri, Dennis Chilcote and Mark Litchy February 11, 2009 G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 1 Introduction • Metallic parts in chemical handling systems are subject to corrosion by acid gases like hydrogen chloride (HCl) and hydrogen fluoride (HF). – Examples include springs in valves and magnets in mag drive and maglev pumps • Polymers, like perfluoroalcoxy (PFA), are often used to isolate these parts from acid gas containing liquids to prevent corrosion. • Acid gases in these liquids can permeate through polymers and corrode the parts. • One objective of this study was to determine the rates at which HCl and HF permeate through various polymers that could be used to encapsulate Levitronix pump impellers as a function of coating thickness, acid concentration and temperature. • The second objective was to determine pump impeller lifetime under controlled conditions. • The third objective was to combine the results of the first 2 objectives to develop a model to predict the lifetime of pump impellers coated with different polymers under different operating conditions. G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 2 Outline • Diffusion theory • Permeation rate measurement experimental procedures • The effect of operating conditions on permeation rate thru PFA – Concentration – Temperature – PFA thickness • Permeation rates of HCl and HF thru various polymers • Life test status • Predicted relative lifetimes under different operating conditions • Summary G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 3 Steady-state permeation Ρ AP M = V T Where M = Mass flow rate P = Permeability coefficient PV = Gas vapor pressure A = surface area available for diffusion T = material thickness Note: The mass flow rate is proportional to the gas vapor pressure; not the acid concentration. G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 4 Partial pressure of HF over hydrofluoric acid solutions 101 100 ) g 10-1 H m 10-2 m ( e -3 r 10 u s s 10-4 e r p r 10-5 o p a 10-6 V 80 ) -7 70 % 10 t 60 h ig 10-8 50 we ( 80 40 n 70 tio 30 a 60 tr n 50 20 e Te 40 c Source: Brosheer at all, Ind and Eng Chem mpe 30 10 n 39(3):423-427, 1947 and Hydrofluoric ratu Co re ( 20 0 Acid Properites, Honeywell (2002). °C) 10 G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 5 Comparison between vapor pressures of HF and HCl over hydrofluoric and hydrochloric acids HF HCl 101 101 100 100 ) ) g -1 10 -1 H m 10 t a m -2 ( 10 m -2 e ( 10 r u e -3 s r 10 s -3 u 10 e s r s -4 10 p e -4 r r 10 p o r 10-5 p o a 10-5 v p l a 10-6 C V 80 10-6 ) H -7 70 80 10 % ) 60 t 10-7 70 % gh t -8 60 h 10 50 ei ig (w 10-8 50 e 80 40 w on ( 70 30 i 80 40 n 60 rat 70 tio t 30 a 50 20 60 tr en n Te 40 c 50 20 e mp 30 10 on T 40 c era C em 10 n ture 20 0 pe 30 o (°C 10 ratu 20 C ) re ( 0 °C) 10 Source: Brosheer at all, Ind and Eng Chem 39(3):423-427, 1947 and Hydrofluoric Source: JH Perry, Chemical Acid Properites, Honeywell (2002). Engineers’ Handbook, 4th Edition, McGraw Hill (1963) p 3-61 G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 6 Comparison of HCl and HF vapor pressures Vapor pressure of HCl over selected hydrochloric acid solutions HCl concentration Temperature Vapor pressure (% by weight) (°C) (atm) 5 20 5.5 x 10-7 6.3 75 2.1 x 10-4 37 20 0.17 37 40 0.55 32 75 0.66 37 60 1.51 Vapor pressure of HF over selected hydrofluoric acid solutions HF concentration Temperature Vapor pressure (% by weight) (°C) (atm) 0.5 20 1.2 x 10-5 5.0 20 7.5 x 10-5 49 20 0.018 49 60 0.15 G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 7 Experimental approach – permeation measurements • Determine the effects of vapor pressure, temperature and coating thickness on permeation rates of HF and HCl through PFA. • Measure the permeation rate of HCl through various polymers as a function of temperature. – Polyethylene (PE) – Polypropylene (PP) – Polyvinylidene dofluoride (PVDF) – Ethylene-chlorotrifluoroethylene (ECTFE) – Perfluoroalcoxy (PFA) - 3 types – Polytetrafluoroethylene (PTFE) • Measure the permeation rate of HF through various polymers at room temperature. – Polypropylene (PP) – Polyvinylidene dofluoride (PVDF) – Ethylene-chlorotrifluoroethylene (ECTFE) – Perfluoroalcoxy (PFA) – Polytetrafluoroethylene (PTFE) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 8 Test System Schematic Flow Meter/Controller CDA Test Specimen HCl Solution Scrubber Temperature Controlled Chamber G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 9 Test conditions • Effect of concentration, temperature, and thickness on permeation rate: – HCl • Concentrations: 14-36% by weight • Temperatures: 30-75°C • 3 thicknesses (1.0, 1.5 and 2.0 mm) – HF • Concentrations: 5-49% by weight • Temperatures: 33-60°C • Comparison of polymer permeation rates – HCl • 35% by weight • Temperatures: 30-55°C – HF • 49% by weight • 33°C • All tests run in triplicate G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 10 1200 33°C 1000 Sample #1 Sample #2 Sample #3 Blank #1 800 Blank #2 Example of permeation 600 data – 49% HF at 3 400 temperatures Total mass permeated(µmoles) 200 0 0 5 10 15 20 25 Time (days) 1200 1200 46°C 60°C Sample #1 Sample #1 1000 1000 Sample #2 Sample #2 Sample #3 Sample #3 Blank #1 Blank #1 800 Blank #2 800 Blank #2 600 600 400 400 Total mass permeated (µmoles) mass Total permeated Total massTotal permeated (µmoles) 200 200 0 0 0 5 10 15 20 25 0 5 10 15 20 25 30 Time (days) Time (days) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 11 The effect of vapor pressure, temperature, and thickness on the permeation rates of HCl and HF through PFA G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 12 The effect of temperature and hydrochloric acid concentration on HCl permeation rate through 1.5mm thick samples 100 14% HCl 20% HCl 27% HCl - day) 10 36% HCl 2 1 0.1 Permeation rate (µMoles/cm Permeation 0.01 30 40 50 60 70 80 Temperature (°C) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 13 Permeability coefficient Ρ AP M = V T Where M = Mass flow rate P = Permeability coefficient PV = Gas vapor pressure A = surface area available for diffusion T = material thickness Permeability coefficient units Gas volume – thickness ---------------------------------------------------------- Area in contact with gas– Time - Vapor pressure cm3 (g) – mm ----------------- m2 – day - atm G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 14 The effect of temperature on the permeability coefficient of HCl through PFA 10000 - day - atm) - day 2 1000 (g) - mm / m (g) 3 100 14% HCl 20% HCl 27% HCl 1.5mm thick samples 36% HCl Permeability coefficient (cm 10 25 30 35 40 45 50 55 60 65 70 75 80 Temperature (°C) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 15 The effect of thickness on the permeability coefficient of HCl through PFA 10000 - day - atm) - day 2 1000 (g) - mm / (g) m 3 100 14% HCl 20% HCl 27% HCl 36% HCl 1.0 mm thick 2.0 mm thick Permeability coefficientPermeability (cm 10 25 30 35 40 45 50 55 60 65 70 75 80 Temperature (°C) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix. Slide 16 The effect of temperature on the permeability coefficient of HF through PFA 10000 -day-atm) 2 1000 (g)-mm/M 49% HF 3 27% HF 5% HF 100 Permeation Coefficient (cm 10 25 30 35 40 45 50 55 60 65 70 75 80 Temperature (° C) G Van Schooneveld et al (2009). Presented at the Ultra Pure Fluid and CT Associates, Inc. Wafer Cleaning Conference 2009, sponsored by Levitronix.
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