coatings Article The Structure, Morphology, and Mechanical Properties of Ta-Hf-C Coatings Deposited by Pulsed Direct Current Reactive Magnetron Sputtering Alexis de Monteynard 1,2 , Huan Luo 3, Mohamed Chehimi 4, Jaafar Ghanbaja 5, Sofiane Achache 1,2, Manuel François 1 , Alain Billard 3 and Frédéric Sanchette 1,2,* 1 ICD LASMIS: Université de Technologie de Troyes, Antenne de Nogent, Pôle Technologique de Haute-Champagne, 52800 Nogent, France;
[email protected] (A.M.); sofi
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[email protected] (M.F.) 2 Nogent International Center for CVD Innovation, LRC CEA-ICD LASMIS, UT.T, Antenne de Nogent-52, Pôle Technologique de Haute-Champagne, 52800 Nogent, France 3 Institut FEMTO-ST: CNRS, UTBM, Univ. Bourgogne Franche-Comté, Site de Montbéliard, F-90010 Belfort Cedex, France;
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[email protected] (A.B.) 4 Université Paris Est: ICMPE (UMR 7182), CNRS, UPEC, 2-8 rue Henri Dunant, 94320 Thiais, France;
[email protected] 5 Institut Jean Lamour (UMR CNRS 7198), Université de Lorraine, 54000 Nancy, France;
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[email protected] Received: 31 January 2020; Accepted: 27 February 2020; Published: 28 February 2020 Abstract: Ta, Hf, TaCx, HfCx, and TaxHf1-xCy coatings were deposited by reactive pulsed Direct Current (DC) magnetron sputtering of Ta or Hf pure metallic targets in Ar plus CH4 gas mixtures. The properties have been investigated as a function of the carbon content, which is tuned via the CH4 flow rate. The discharge was characterized by means of Optical Emission Spectroscopy and, in our conditions, both Ta-C and Hf-C systems seem to be weakly reactive.